CN116133743A8 - 输送等离子体处理原料的方法和装置 - Google Patents
输送等离子体处理原料的方法和装置 Download PDFInfo
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- CN116133743A8 CN116133743A8 CN202180062764.1A CN202180062764A CN116133743A8 CN 116133743 A8 CN116133743 A8 CN 116133743A8 CN 202180062764 A CN202180062764 A CN 202180062764A CN 116133743 A8 CN116133743 A8 CN 116133743A8
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- 238000000034 method Methods 0.000 title abstract 4
- 239000003153 chemical reaction reagent Substances 0.000 abstract 6
- 239000007788 liquid Substances 0.000 abstract 2
- 239000007787 solid Substances 0.000 abstract 2
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Abstract
本申请涉及用于将液体或固体原料输送到等离子体处理容器中的方法和装置。更具体地,本发明提供了一种在包括处理容器的装置中使用辉光放电等离子体处理样品的方法,该方法包括(i)在气体流量控制器的控制下通过气体输送管线将气态等离子体形成原料输送到处理容器中,并且在处理容器中由气态等离子体形成原料形成辉光放电等离子体;以及同时(ii)在试剂剂量控制器的控制下将试剂输送到处理容器中,其中试剂是液体或固体;(iii)使样品与辉光放电等离子体和试剂接触;其中气体流量控制器和试剂剂量控制器可以独立控制气态等离子体形成原料和试剂的输送速率。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2014776.5 | 2020-09-18 | ||
GB2014776.5A GB2598934B (en) | 2020-09-18 | 2020-09-18 | Method and apparatus for plasma processing |
GB2014779.9A GB2598936B (en) | 2020-09-18 | 2020-09-18 | Method and apparatus for plasma processing |
GB2014779.9 | 2020-09-18 | ||
PCT/EP2021/074727 WO2022058218A1 (en) | 2020-09-18 | 2021-09-08 | Methods and apparatus for delivering feedstocks for plasma treatment |
Publications (2)
Publication Number | Publication Date |
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CN116133743A CN116133743A (zh) | 2023-05-16 |
CN116133743A8 true CN116133743A8 (zh) | 2024-05-28 |
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Application Number | Title | Priority Date | Filing Date |
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CN202180062764.1A Pending CN116133743A (zh) | 2020-09-18 | 2021-09-08 | 输送等离子体处理原料的方法和装置 |
CN202180062404.1A Pending CN116113491A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
CN202180062428.7A Pending CN116133742A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
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CN202180062404.1A Pending CN116113491A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
CN202180062428.7A Pending CN116133742A (zh) | 2020-09-18 | 2021-09-17 | 等离子体处理的方法和装置 |
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US (3) | US20240024840A1 (zh) |
EP (3) | EP4213982A1 (zh) |
JP (1) | JP2023542903A (zh) |
KR (1) | KR20230069960A (zh) |
CN (3) | CN116133743A (zh) |
WO (3) | WO2022058218A1 (zh) |
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GB2610394A (en) | 2021-09-01 | 2023-03-08 | Haydale Graphene Ind Plc | Shoe sole |
GB2612057A (en) | 2021-10-20 | 2023-04-26 | Haydale Graphene Ind Plc | Heatable garment, fabrics for such garments, and methods of manufacture |
GB2625980A (en) | 2022-09-23 | 2024-07-10 | Haydale Graphene Ind Plc | Composition |
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Publication number | Priority date | Publication date | Assignee | Title |
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US3772799A (en) * | 1969-08-19 | 1973-11-20 | Mitsubishi Edogawa Kagaku Kk | Apparatus for treating a mixture |
US5012158A (en) * | 1986-07-25 | 1991-04-30 | National Research Institute For Metals | Plasma CVD apparatus |
JPH059075Y2 (zh) * | 1987-01-27 | 1993-03-05 | ||
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2021
- 2021-09-08 WO PCT/EP2021/074727 patent/WO2022058218A1/en active Application Filing
- 2021-09-08 CN CN202180062764.1A patent/CN116133743A/zh active Pending
- 2021-09-08 US US18/027,082 patent/US20240024840A1/en active Pending
- 2021-09-08 EP EP21773102.5A patent/EP4213982A1/en active Pending
- 2021-09-17 EP EP21782660.1A patent/EP4213984A1/en active Pending
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- 2021-09-17 JP JP2023517957A patent/JP2023542903A/ja active Pending
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- 2021-09-17 KR KR1020237012224A patent/KR20230069960A/ko unknown
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CN116113491A8 (zh) | 2024-05-28 |
US20240024840A1 (en) | 2024-01-25 |
EP4213983A1 (en) | 2023-07-26 |
US20230330619A1 (en) | 2023-10-19 |
WO2022058218A1 (en) | 2022-03-24 |
CN116133742A (zh) | 2023-05-16 |
US20240024841A1 (en) | 2024-01-25 |
EP4213984A1 (en) | 2023-07-26 |
WO2022058542A1 (en) | 2022-03-24 |
CN116133743A (zh) | 2023-05-16 |
CN116113491A (zh) | 2023-05-12 |
WO2022058546A1 (en) | 2022-03-24 |
JP2023542903A (ja) | 2023-10-12 |
EP4213982A1 (en) | 2023-07-26 |
KR20230069960A (ko) | 2023-05-19 |
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