CN115963137A - 电子束检查装置 - Google Patents

电子束检查装置 Download PDF

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Publication number
CN115963137A
CN115963137A CN202211251800.1A CN202211251800A CN115963137A CN 115963137 A CN115963137 A CN 115963137A CN 202211251800 A CN202211251800 A CN 202211251800A CN 115963137 A CN115963137 A CN 115963137A
Authority
CN
China
Prior art keywords
electron beam
substrate
metal film
inspection apparatus
support pin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN202211251800.1A
Other languages
English (en)
Chinese (zh)
Inventor
安藤厚司
村田贵比吕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nuflare Technology Inc
Original Assignee
Nuflare Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nuflare Technology Inc filed Critical Nuflare Technology Inc
Publication of CN115963137A publication Critical patent/CN115963137A/zh
Withdrawn legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/0203Protection arrangements
    • H01J2237/0206Extinguishing, preventing or controlling unwanted discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/047Changing particle velocity
    • H01J2237/0475Changing particle velocity decelerating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20214Rotation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20221Translation
    • H01J2237/20235Z movement or adjustment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2448Secondary particle detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2813Scanning microscopes characterised by the application
    • H01J2237/2817Pattern inspection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN202211251800.1A 2021-10-13 2022-10-13 电子束检查装置 Withdrawn CN115963137A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-168233 2021-10-13
JP2021168233A JP7647483B2 (ja) 2021-10-13 2021-10-13 電子ビーム検査装置

Publications (1)

Publication Number Publication Date
CN115963137A true CN115963137A (zh) 2023-04-14

Family

ID=85797866

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211251800.1A Withdrawn CN115963137A (zh) 2021-10-13 2022-10-13 电子束检查装置

Country Status (5)

Country Link
US (1) US12261015B2 (enExample)
JP (1) JP7647483B2 (enExample)
KR (1) KR102835208B1 (enExample)
CN (1) CN115963137A (enExample)
TW (1) TWI846013B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
JP7647483B2 (ja) * 2021-10-13 2025-03-18 株式会社ニューフレアテクノロジー 電子ビーム検査装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
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US2753458A (en) * 1954-04-12 1956-07-03 Kazato Kenji Electron microscope
US6512227B2 (en) 1998-11-27 2003-01-28 Hitachi, Ltd. Method and apparatus for inspecting patterns of a semiconductor device with an electron beam
JP2000223542A (ja) 1998-11-27 2000-08-11 Hitachi Ltd 電子ビ―ムを用いた検査方法及び検査装置
US7220365B2 (en) * 2001-08-13 2007-05-22 New Qu Energy Ltd. Devices using a medium having a high heat transfer rate
JP5417428B2 (ja) 2009-02-27 2014-02-12 株式会社日立ハイテクノロジーズ 電子顕微鏡および試料保持方法
JP2010272586A (ja) * 2009-05-19 2010-12-02 Hitachi High-Technologies Corp 荷電粒子線装置
US8368228B2 (en) * 2009-10-19 2013-02-05 Jeng-Jye Shau Area efficient through-hole connections
US8709945B2 (en) * 2011-01-26 2014-04-29 Jeng-Jye Shau Area efficient through-hole connections
JP2013239386A (ja) 2012-05-16 2013-11-28 Hitachi High-Technologies Corp 荷電粒子線装置
JP6139449B2 (ja) * 2014-03-26 2017-05-31 株式会社アドバンテスト ステージ装置および電子線装置
TWI594288B (zh) * 2016-03-14 2017-08-01 台灣電鏡儀器股份有限公司 電子顯微鏡
JP6966255B2 (ja) * 2017-08-10 2021-11-10 株式会社ニューフレアテクノロジー 画像取得装置の光学系調整方法
JP7074639B2 (ja) * 2017-11-03 2022-05-24 株式会社ニューフレアテクノロジー マルチビームの個別ビーム検出器、マルチビーム照射装置、及びマルチビームの個別ビーム検出方法
JP6966319B2 (ja) * 2017-12-22 2021-11-17 株式会社ニューフレアテクノロジー マルチビーム画像取得装置及びマルチビーム画像取得方法
JP2019145304A (ja) * 2018-02-20 2019-08-29 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、荷電粒子ビーム装置のステージ駆動範囲制限方法およびプログラム
WO2019211123A1 (en) * 2018-05-02 2019-11-07 Asml Netherlands B.V. E-beam apparatus
JP7198092B2 (ja) * 2018-05-18 2022-12-28 株式会社ニューフレアテクノロジー マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法
JP7057220B2 (ja) * 2018-05-24 2022-04-19 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
JP7093242B2 (ja) 2018-06-27 2022-06-29 株式会社ニューフレアテクノロジー 荷電粒子ビーム画像取得装置
JP2020085838A (ja) * 2018-11-30 2020-06-04 株式会社ニューフレアテクノロジー 電子ビーム検査装置
JP7194572B2 (ja) * 2018-12-04 2022-12-22 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置
JP2021077492A (ja) * 2019-11-07 2021-05-20 株式会社ニューフレアテクノロジー 電子ビーム検査装置及び電子ビーム検査方法
JP7342696B2 (ja) * 2019-12-26 2023-09-12 株式会社ニューフレアテクノロジー 電子ビーム検査装置
TWI774157B (zh) * 2019-12-27 2022-08-11 日商紐富來科技股份有限公司 帶電粒子束檢查裝置以及帶電粒子束檢查方法
CN113764246B (zh) * 2020-06-03 2025-04-18 宁波伯锐锶电子束科技有限公司 一种显微镜
JP7573396B2 (ja) * 2020-09-04 2024-10-25 株式会社ニューフレアテクノロジー θステージ機構及び電子ビーム検査装置
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
JP7647483B2 (ja) * 2021-10-13 2025-03-18 株式会社ニューフレアテクノロジー 電子ビーム検査装置

Also Published As

Publication number Publication date
TWI846013B (zh) 2024-06-21
TW202331769A (zh) 2023-08-01
KR102835208B1 (ko) 2025-07-18
KR20230052812A (ko) 2023-04-20
US20230113062A1 (en) 2023-04-13
US12261015B2 (en) 2025-03-25
JP7647483B2 (ja) 2025-03-18
JP2023058299A (ja) 2023-04-25

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