KR102835208B1 - 전자 빔 검사 장치 - Google Patents

전자 빔 검사 장치

Info

Publication number
KR102835208B1
KR102835208B1 KR1020220116827A KR20220116827A KR102835208B1 KR 102835208 B1 KR102835208 B1 KR 102835208B1 KR 1020220116827 A KR1020220116827 A KR 1020220116827A KR 20220116827 A KR20220116827 A KR 20220116827A KR 102835208 B1 KR102835208 B1 KR 102835208B1
Authority
KR
South Korea
Prior art keywords
electron beam
substrate
metal film
inspection device
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020220116827A
Other languages
English (en)
Korean (ko)
Other versions
KR20230052812A (ko
Inventor
아츠시 안도
다카히로 무라타
Original Assignee
가부시키가이샤 뉴플레어 테크놀로지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 뉴플레어 테크놀로지 filed Critical 가부시키가이샤 뉴플레어 테크놀로지
Publication of KR20230052812A publication Critical patent/KR20230052812A/ko
Application granted granted Critical
Publication of KR102835208B1 publication Critical patent/KR102835208B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20214—Rotation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20235—Z movement or adjustment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020220116827A 2021-10-13 2022-09-16 전자 빔 검사 장치 Active KR102835208B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2021-168233 2021-10-13
JP2021168233A JP7647483B2 (ja) 2021-10-13 2021-10-13 電子ビーム検査装置

Publications (2)

Publication Number Publication Date
KR20230052812A KR20230052812A (ko) 2023-04-20
KR102835208B1 true KR102835208B1 (ko) 2025-07-18

Family

ID=85797866

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220116827A Active KR102835208B1 (ko) 2021-10-13 2022-09-16 전자 빔 검사 장치

Country Status (5)

Country Link
US (1) US12261015B2 (enExample)
JP (1) JP7647483B2 (enExample)
KR (1) KR102835208B1 (enExample)
CN (1) CN115963137A (enExample)
TW (1) TWI846013B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
JP7647483B2 (ja) * 2021-10-13 2025-03-18 株式会社ニューフレアテクノロジー 電子ビーム検査装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110303844A1 (en) * 2009-02-27 2011-12-15 Hitachi High-Technologies Corporation Electron microscope, and specimen holding method
JP2020085838A (ja) * 2018-11-30 2020-06-04 株式会社ニューフレアテクノロジー 電子ビーム検査装置
JP2021106108A (ja) * 2019-12-26 2021-07-26 株式会社ニューフレアテクノロジー 電子ビーム検査装置

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US2753458A (en) * 1954-04-12 1956-07-03 Kazato Kenji Electron microscope
US6512227B2 (en) 1998-11-27 2003-01-28 Hitachi, Ltd. Method and apparatus for inspecting patterns of a semiconductor device with an electron beam
JP2000223542A (ja) 1998-11-27 2000-08-11 Hitachi Ltd 電子ビ―ムを用いた検査方法及び検査装置
US7220365B2 (en) * 2001-08-13 2007-05-22 New Qu Energy Ltd. Devices using a medium having a high heat transfer rate
JP2010272586A (ja) * 2009-05-19 2010-12-02 Hitachi High-Technologies Corp 荷電粒子線装置
US8368228B2 (en) * 2009-10-19 2013-02-05 Jeng-Jye Shau Area efficient through-hole connections
US8709945B2 (en) * 2011-01-26 2014-04-29 Jeng-Jye Shau Area efficient through-hole connections
JP2013239386A (ja) 2012-05-16 2013-11-28 Hitachi High-Technologies Corp 荷電粒子線装置
JP6139449B2 (ja) * 2014-03-26 2017-05-31 株式会社アドバンテスト ステージ装置および電子線装置
TWI594288B (zh) * 2016-03-14 2017-08-01 台灣電鏡儀器股份有限公司 電子顯微鏡
JP6966255B2 (ja) * 2017-08-10 2021-11-10 株式会社ニューフレアテクノロジー 画像取得装置の光学系調整方法
JP7074639B2 (ja) * 2017-11-03 2022-05-24 株式会社ニューフレアテクノロジー マルチビームの個別ビーム検出器、マルチビーム照射装置、及びマルチビームの個別ビーム検出方法
JP6966319B2 (ja) * 2017-12-22 2021-11-17 株式会社ニューフレアテクノロジー マルチビーム画像取得装置及びマルチビーム画像取得方法
JP2019145304A (ja) * 2018-02-20 2019-08-29 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、荷電粒子ビーム装置のステージ駆動範囲制限方法およびプログラム
WO2019211123A1 (en) * 2018-05-02 2019-11-07 Asml Netherlands B.V. E-beam apparatus
JP7198092B2 (ja) * 2018-05-18 2022-12-28 株式会社ニューフレアテクノロジー マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法
JP7057220B2 (ja) * 2018-05-24 2022-04-19 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置及びマルチ電子ビーム光学系の位置決め方法
JP7093242B2 (ja) 2018-06-27 2022-06-29 株式会社ニューフレアテクノロジー 荷電粒子ビーム画像取得装置
JP7194572B2 (ja) * 2018-12-04 2022-12-22 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置
JP2021077492A (ja) * 2019-11-07 2021-05-20 株式会社ニューフレアテクノロジー 電子ビーム検査装置及び電子ビーム検査方法
TWI774157B (zh) * 2019-12-27 2022-08-11 日商紐富來科技股份有限公司 帶電粒子束檢查裝置以及帶電粒子束檢查方法
CN113764246B (zh) * 2020-06-03 2025-04-18 宁波伯锐锶电子束科技有限公司 一种显微镜
JP7573396B2 (ja) * 2020-09-04 2024-10-25 株式会社ニューフレアテクノロジー θステージ機構及び電子ビーム検査装置
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
JP7647483B2 (ja) * 2021-10-13 2025-03-18 株式会社ニューフレアテクノロジー 電子ビーム検査装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110303844A1 (en) * 2009-02-27 2011-12-15 Hitachi High-Technologies Corporation Electron microscope, and specimen holding method
JP2020085838A (ja) * 2018-11-30 2020-06-04 株式会社ニューフレアテクノロジー 電子ビーム検査装置
JP2021106108A (ja) * 2019-12-26 2021-07-26 株式会社ニューフレアテクノロジー 電子ビーム検査装置

Also Published As

Publication number Publication date
TWI846013B (zh) 2024-06-21
TW202331769A (zh) 2023-08-01
KR20230052812A (ko) 2023-04-20
US20230113062A1 (en) 2023-04-13
CN115963137A (zh) 2023-04-14
US12261015B2 (en) 2025-03-25
JP7647483B2 (ja) 2025-03-18
JP2023058299A (ja) 2023-04-25

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