CN115745931B - 酸酐化合物、由其制得的聚酰亚胺与薄膜 - Google Patents
酸酐化合物、由其制得的聚酰亚胺与薄膜 Download PDFInfo
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- -1 Anhydride compound Chemical class 0.000 title claims abstract description 55
- 229920001721 polyimide Polymers 0.000 title claims abstract description 32
- 239000004642 Polyimide Substances 0.000 title claims abstract description 28
- 239000000126 substance Substances 0.000 claims abstract description 14
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 6
- 239000001257 hydrogen Substances 0.000 claims abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229930195734 saturated hydrocarbon Chemical group 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 7
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 abstract description 6
- 229920006395 saturated elastomer Polymers 0.000 abstract description 4
- 229910000077 silane Inorganic materials 0.000 abstract description 4
- JXASPPWQHFOWPL-UHFFFAOYSA-N Tamarixin Natural products C1=C(O)C(OC)=CC=C1C1=C(OC2C(C(O)C(O)C(CO)O2)O)C(=O)C2=C(O)C=C(O)C=C2O1 JXASPPWQHFOWPL-UHFFFAOYSA-N 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 12
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 6
- 238000010511 deprotection reaction Methods 0.000 description 4
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 4
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical class OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- CXISKMDTEFIGTG-UHFFFAOYSA-N [4-(1,3-dioxo-2-benzofuran-5-carbonyl)oxyphenyl] 1,3-dioxo-2-benzofuran-5-carboxylate Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(OC=2C=CC(OC(=O)C=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)=O)=C1 CXISKMDTEFIGTG-UHFFFAOYSA-N 0.000 description 2
- 125000003158 alcohol group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 2
- 230000037361 pathway Effects 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 2
- LOCTYHIHNCOYJZ-UHFFFAOYSA-N (4-aminophenyl) 4-aminobenzoate Chemical compound C1=CC(N)=CC=C1OC(=O)C1=CC=C(N)C=C1 LOCTYHIHNCOYJZ-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 1
- QGMGHALXLXKCBD-UHFFFAOYSA-N 4-amino-n-(2-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1C(=O)NC1=CC=CC=C1N QGMGHALXLXKCBD-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- 229910015845 BBr3 Inorganic materials 0.000 description 1
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-UHFFFAOYSA-N Dicyclopentadiene Chemical compound C1C2C3CC=CC3C1C=C2 HECLRDQVFMWTQS-UHFFFAOYSA-N 0.000 description 1
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 1
- CVBNKQABXHUYRX-UHFFFAOYSA-N NC1=CC=C(OC2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1.NC1=CC=C(OC2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1 Chemical compound NC1=CC=C(OC2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1.NC1=CC=C(OC2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1 CVBNKQABXHUYRX-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CFTXGNJIXHFHTH-UHFFFAOYSA-N bis(4-aminophenyl) benzene-1,4-dicarboxylate Chemical compound C1=CC(N)=CC=C1OC(=O)C1=CC=C(C(=O)OC=2C=CC(N)=CC=2)C=C1 CFTXGNJIXHFHTH-UHFFFAOYSA-N 0.000 description 1
- HRQGCQVOJVTVLU-UHFFFAOYSA-N bis(chloromethyl) ether Chemical compound ClCOCCl HRQGCQVOJVTVLU-UHFFFAOYSA-N 0.000 description 1
- 125000006278 bromobenzyl group Chemical group 0.000 description 1
- 229940061627 chloromethyl methyl ether Drugs 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- FGTJJHCZWOVVNH-UHFFFAOYSA-N tert-butyl-[tert-butyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)O[Si](C)(C)C(C)(C)C FGTJJHCZWOVVNH-UHFFFAOYSA-N 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 1
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- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
- C08G73/1071—Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
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- C07—ORGANIC CHEMISTRY
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- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/87—Benzo [c] furans; Hydrogenated benzo [c] furans
- C07D307/89—Benzo [c] furans; Hydrogenated benzo [c] furans with two oxygen atoms directly attached in positions 1 and 3
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- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
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- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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Abstract
本揭露提供一种酸酐化合物、由其制得的聚酰亚胺与包括该聚酰亚胺的薄膜,所述酸酐化合物的化学结构为或其中R1是或每一R4各自独立为C1‑6的烷撑基,m是0至10的整数,且m'是1至10的整数;n是1至10的整数;每一R2各自独立为氢、C1‑6的饱和或不饱和的烃基、CF3、硅醇基、硅烷基、或Al(OH)3;以及R3为硅醇基、硅烷基、或Al(OH)3。酸酐化合物可与二胺化合物反应形成聚酰亚胺。本揭露的酸酐化合物所形成的聚酰亚胺具有较低的介电常数、介电损耗与吸湿性,因此适用于作为5G板材。
Description
技术领域
本揭露关于酸酐化合物、由其制得的聚酰亚胺和包括该聚酰亚胺的薄膜。
背景技术
随着网络的普及,人们追求更高速、延迟低的通讯质量,为因应网络覆盖率更广、传播速率更快的5G时代,具低传送损失(Dielectric Loss,Df)、低介电常数(DielectricConstant,Dk)的电路板材料的需求大增;以聚酰亚胺(Polyimide,PI)薄膜为例,传统的聚酰亚胺薄膜板材已无法满足高频高速的需求,适用于5G高频高速的异质聚酰亚胺薄膜(Modified PI,MPI)成为业界备受关注的产品。
综上所述,目前亟需开发新颖的板材合成原料以符合上述需求。
发明内容
本揭露一实施例提供的酸酐化合物,其化学结构为
其中R1是/>每一R4各自独立为C1-6的烷撑基,m是0至10的整数,且m'是1至10的整数;n是1至10的整数;每一R2各自独立为氢、C1-6的饱和或不饱和的烃基、CF3、硅醇基、硅烷基、或Al(OH)3;以及R3为/>硅醇基、硅烷基、或Al(OH)3。
本揭露一实施例提供的聚酰亚胺,是由酸酐化合物与二胺化合物反应而成,其中酸酐化合物的化学结构为 其中R1是/> 每一R4各自独立为C1-6的烷撑基,m是0至10的整数,且m'是1至10的整数;n是1至10的整数;以及每一R2各自独立为氢、C1-6的饱和或不饱和的烃基、CF3、硅醇基、硅烷基、或Al(OH)3。
本揭露一实施例提供的薄膜,包括上述聚酰亚胺,其厚度为10μm至75μm,且10GHz下的介电常数为2.5至3之间。
具体实施方式
本揭露一实施例提供的酸酐化合物,其化学结构为
其中R1是/>每一R4各自独立为C1-6的烷撑基,m是0至10的整数,且m'是1至10的整数;n是1至10的整数;每一R2各自独立为氢、C1-6的饱和或不饱和的烃基、CF3、硅醇基、硅烷基、或Al(OH)3;以及R3为/>硅醇基、硅烷基、或Al(OH)3。
上述的酸酐化合物的合成方法可为取与在酸性催化剂如AlCl3、HF、或其他合适酸性催化剂的存在下,反应形成二醇化合物,反应式如下所示:
接着可取BnBr(溴基芐)、MeOCH2Cl(chloromethyl methyl ether,氯甲醚)、TBSCl(tert-butyldimethylsilyl ether,叔丁基二甲基硅基)、MsCl(methanesulfonylchloride,甲基磺酰氯)、或硫酸二甲酯保护二醇化合物的单侧醇基。以MsCl为例,反应式如下所示:
接着可取上述含保护基的化合物与氯化偏苯三酸酐反应,以形成酸酐化合物如下式:
接着去保护,如下式所示。去保护反应可采用HCl、I2、F-、LDA(二异丙基胺基锂)、BBr3、或其他合适试剂。
接着可取R3-Cl进行取代反应,以形成酸酐化合物如下式:
在一些实施例中,上述反应所形成的酸酐化合物的化学结构可为
在其他实施例中,可直接取上述二醇化合物与氯化偏苯三酸酐反应以形成酸酐化合物如下式:
在一些实施例中,上述反应形成的酸酐化合物的化学结构为
在一些实施例中,可先氢化二醇化合物后,取BnBr、MeOCH2Cl、TBSCl、MsCl、或硫酸二甲酯保护二醇化合物的单侧醇基。下式反应以MsCl为例:
接着可取上述含保护基的化合物与氯化偏苯三酸酐反应,以形成酸酐化合物如下式:
接着去保护,如下式所示。去保护反应可采用HCl、I2、F-、LDA、BBr3、或其他合适试剂。
接着可取R3-Cl进行取代反应,以形成酸酐化合物如下式:
在一些实施例中,上述反应所形成的酸酐化合物的化学结构可为
另一方面,可先氢化二醇化合物后,再与氯化偏苯三酸酐反应以形成酸酐化合物如下式:
在一些实施例中,上述反应形成的酸酐化合物的化学结构可为
应理解的是,上述反应仅用以举例说明酸酐化合物的可能合成路径,而非唯一可行的合成路径。本技术领域中具有通常知识者自可依需求采用任何可行的合成方式,形成本揭露的酸酐化合物。
本揭露一实施例提供的聚酰亚胺,是由上述酸酐化合物与二胺化合物反应而成,以二酸酐化合物为例,如下式所示:
在上式中,R7对应二胺化合物的种类,如下所述。x是聚酰亚胺重复单元的重复数目,其与聚酰亚胺的分子量有关。
在一些实施例中,二胺化合物的化学结构为其中p是0至5的整数;每一R5各自为-O-、-NH-、C1-4的烷撑基、-SO2-、-CF2-、-C2F4-、-(C=O)O-、-O(C=O)-、-(C=O)NH-、或-NH(C=O)-;以及每一R6各自为H、CH3、或CF3。举例来说,二胺化合物可为4,4'-二氨基二苯醚(4,4'-oxydianiline,ODA),其结构为在一些实施例中,二胺化合物可为对氨基苯甲酸对氨基苯酯(4-aminobenzoic acid 4-aminophenyl ester),其结构为/>在一些实施例中,二胺化合物可为1,4-双(4-氨基苯氧基)苯(1,4-bis(4-aminophenoxy)benzene),其结构为/>在一些实施例中,二胺化合物可为对苯二甲酸二对氨基苯酯(1,4-benzenedicarboxylic acid bis(4-aminophenyl)ester),其结构为/>在一些实施例中,二胺化合物可为2,2'-双[4-(4-氨基苯氧基苯基)]丙烷(4,4'-(4,4'-isopropylidene diphenyl-1,1'-diyldioxy)dianiline),其结构为/>
本揭露一实施例提供的薄膜,包括上述聚酰亚胺,其厚度为10μm至75μm,且于10GHz下的介电常数为2.5至3之间。聚酰亚胺的薄膜其介电常数与厚度相关。若聚酰亚胺的薄膜于10GHz下的介电常数过大,则不符5G板材应用。
为让本揭露的上述内容和其他目的、特征和优点能更明显易懂,下文特举出较佳实施例,作详细说明如下:
[实施例]
在下述实施例中,薄膜在10GHz下的介电常数的量测方法为JISC2565,在10GHz下的介电损耗的量测方法为JISC2565。
实施例1
取AlCl3(0.10mol,13.11g)作为酸性催化剂,加入二甲基酚(DMP,1.18mol,144.15g)的溶液中溶解后,加入双环戊二烯(DCPD,0.60mol,78.00g)加热反应后,降温至室温并加入氢氧化钾溶液(5wt%,0.06mol)以中和反应,接着以甲苯萃取上述反应的产物如二醇化合物。上述反应如下:
将吡啶(0.13mol,13.11g)加入氯化偏苯三酸酐(TMAC,0.33mol,70.00g)的溶液中,再慢慢滴入二醇化合物的溶液并反应24小时,去除溶剂后烘干即可得酸酐化合物,其氢谱如下:1H NMR(400MHz,CDCl3):δ2.14(s,4H,aliphatic),2.19(s,9H,aliphatic),2.31(s,2H,aliphatic bridge),7.14(s,4H,-Ar),8.23(d,2H,phthalic anhydride,J=7.88Hz),8.76(d,2H,phthalic anhydride,J=7.88Hz),8.88(s,2H,phthalic anhydride)。上述反应如下:
取上述酸酐化合物与ODA于25℃下反应6小时,以形成聚酰亚胺。将聚酰亚胺的溶液涂布成厚度约为50μm的薄膜,量测薄膜于10GHz下的介电常数(2.80)、10GHz下的介电损耗(0.006)、与吸湿性(0.5%)。
比较例1
取对-亚苯基-双苯偏三酸酯二酐(TAHQ)与ODA于25℃下反应6小时,以形成聚酰亚胺。将聚酰亚胺的溶液涂布成厚度约为50μm的薄膜,量测薄膜于10GHz下的介电常数(3.5)、10GHz下的介电损耗(0.007)、与吸湿性(0.6%)。TAHQ的化学结构如下:
由实施例1及比较例1的比较可知,本揭露实施例的酸酐化合物所形成的聚酰亚胺具有较低的介电常数、介电损耗与吸湿性,因此适用于作为5G板材。
虽然本揭露已以数个较佳实施例揭露如上,然其并非用以限定本揭露,任何所属技术领域中具有通常知识者,在不脱离本揭露的精神和范围内,当可作任意的更动与润饰,因此本揭露的保护范围当视后附的申请专利范围所界定者为准。
Claims (6)
1.一种酸酐化合物,其化学结构为
其中n是1至10的整数;
每一R2各自独立为氢或C1-6的饱和烃基以及
R3为
2.如权利要求1的酸酐化合物,其化学结构为
3.一种聚酰亚胺,是由权利要求1所述的酸酐化合物与二胺化合物反应而成。
4.如权利要求3的聚酰亚胺,其中该二胺化合物的化学结构为
其中p是0至5的整数;
每一R5各自为-O-、-NH-、C1-4的烷撑基、-SO2-、-CF2-、-C2F4-、-(C=O)O-、-O(C=O)-、-(C=O)NH-、或-NH(C=O)-;以及
每一R6各自为H、CH3、或CF3。
5.如权利要求3的聚酰亚胺,其中该二胺化合物的化学结构为
6.一种薄膜,包括权利要求3的聚酰亚胺,其厚度为10μm至75μm,且10GHz下的介电常数为2.5至3之间。
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TW201531502A (zh) * | 2014-02-10 | 2015-08-16 | Chin Yee Chemical Industres Co Ltd | 含磷聚苯醚、含磷酚基聚苯醚組成物、含磷不飽和基聚苯醚組成物、含磷環氧基聚苯醚組成物及其用途 |
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