CN115717229A - 耐等离子体涂布膜、其制造方法以及耐等离子体构件 - Google Patents
耐等离子体涂布膜、其制造方法以及耐等离子体构件 Download PDFInfo
- Publication number
- CN115717229A CN115717229A CN202210769546.8A CN202210769546A CN115717229A CN 115717229 A CN115717229 A CN 115717229A CN 202210769546 A CN202210769546 A CN 202210769546A CN 115717229 A CN115717229 A CN 115717229A
- Authority
- CN
- China
- Prior art keywords
- plasma
- rare earth
- earth metal
- metal compound
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 115
- 239000011248 coating agent Substances 0.000 title claims abstract description 112
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 44
- 239000011247 coating layer Substances 0.000 claims abstract description 140
- 150000002909 rare earth metal compounds Chemical class 0.000 claims abstract description 120
- 238000007751 thermal spraying Methods 0.000 claims abstract description 68
- 238000000034 method Methods 0.000 claims abstract description 53
- 239000000843 powder Substances 0.000 claims abstract description 41
- 239000002245 particle Substances 0.000 claims abstract description 34
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 33
- 239000010703 silicon Substances 0.000 claims abstract description 33
- 239000000725 suspension Substances 0.000 claims abstract description 30
- 230000003746 surface roughness Effects 0.000 claims abstract description 22
- 239000011817 metal compound particle Substances 0.000 claims abstract description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 32
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 15
- 229940105963 yttrium fluoride Drugs 0.000 claims description 13
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 claims description 13
- 238000005498 polishing Methods 0.000 claims description 11
- 239000010410 layer Substances 0.000 claims description 9
- CHBIYWIUHAZZNR-UHFFFAOYSA-N [Y].FOF Chemical compound [Y].FOF CHBIYWIUHAZZNR-UHFFFAOYSA-N 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 229910003460 diamond Inorganic materials 0.000 claims description 4
- 239000010432 diamond Substances 0.000 claims description 4
- 239000008187 granular material Substances 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 67
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 24
- 239000007921 spray Substances 0.000 description 17
- 238000000151 deposition Methods 0.000 description 15
- 239000000443 aerosol Substances 0.000 description 12
- 229910052786 argon Inorganic materials 0.000 description 12
- 230000008021 deposition Effects 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 230000035882 stress Effects 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 238000007750 plasma spraying Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- -1 polyethylene terephthalate Polymers 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000009432 framing Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C6/00—Coating by casting molten material on the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
- Analytical Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2021-0111370 | 2021-08-24 | ||
| KR1020210111370A KR102356172B1 (ko) | 2021-08-24 | 2021-08-24 | 내플라즈마성 코팅막의 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115717229A true CN115717229A (zh) | 2023-02-28 |
Family
ID=80252138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210769546.8A Pending CN115717229A (zh) | 2021-08-24 | 2022-06-30 | 耐等离子体涂布膜、其制造方法以及耐等离子体构件 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20230128726A1 (ko) |
| KR (1) | KR102356172B1 (ko) |
| CN (1) | CN115717229A (ko) |
| TW (1) | TWI791410B (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102535560B1 (ko) * | 2022-10-14 | 2023-05-26 | 주식회사 코미코 | 내플라즈마성 코팅막의 제조방법 |
| KR102674395B1 (ko) | 2023-12-04 | 2024-06-12 | 주식회사 디에프텍 | 이온빔 소스를 이용하여 내플라즈마 특성 향상을 위한 코팅 방법 |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030219544A1 (en) * | 2002-05-22 | 2003-11-27 | Smith William C. | Thermal spray coating process with nano-sized materials |
| US20040229031A1 (en) * | 2003-01-10 | 2004-11-18 | Maurice Gell | Coatings, materials, articles, and methods of making thereof |
| US20060037536A1 (en) * | 2003-10-24 | 2006-02-23 | Toshiba Ceramics Co., Ltd. | Plasma resistant member, manufacturing method for the same and method of forming a thermal spray coat |
| KR20130123821A (ko) * | 2012-05-04 | 2013-11-13 | (주)코미코 | 내 플라즈마 코팅막, 이의 제조 방법 및 내 플라즈마성 부품 |
| US20150321964A1 (en) * | 2014-05-07 | 2015-11-12 | Applied Materials, Inc. | Slurry plasma spray of plasma resistant ceramic coating |
| KR101721232B1 (ko) * | 2015-10-02 | 2017-03-29 | 주식회사 싸이노스 | 플라즈마 내성 코팅층 형성방법 |
| CN107592941A (zh) * | 2015-12-31 | 2018-01-16 | Ｋｏｍｉｃｏ有限公司 | 耐等离子体涂膜及其形成方法 |
| JP2019019413A (ja) * | 2018-10-16 | 2019-02-07 | 信越化学工業株式会社 | イットリウム系フッ化物溶射皮膜、該溶射皮膜を形成するための溶射材料、該溶射皮膜の形成方法、及び該溶射皮膜を含む耐食性皮膜 |
| US20190157047A1 (en) * | 2017-11-22 | 2019-05-23 | Applied Materials, Inc. | Plasma spray coating enhancement using graduated particle feed rate |
| US20200056278A1 (en) * | 2018-08-15 | 2020-02-20 | Shin-Etsu Chemical Co., Ltd. | Sprayed coating, method for manufacturing sprayed coating, sprayed member and spraying material |
| CN111279455A (zh) * | 2017-11-20 | 2020-06-12 | Ｋｏｍｉｃｏ有限公司 | 耐等离子性涂膜的制造方法及据此形成的耐等离子性构件 |
| KR102266655B1 (ko) * | 2020-12-10 | 2021-06-18 | (주)코미코 | 이트륨계 과립 분말을 이용한 용사 피막의 제조 방법 및 이를 이용하여 제조된 이트륨계 용사 피막 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100454987B1 (ko) | 2002-03-25 | 2004-11-06 | 주식회사 코미코 | 플라즈마 융사를 이용한 반도체 제조용 부품의 제조 및재생방법 |
| CA3026055A1 (en) * | 2016-04-19 | 2017-10-26 | The Broad Institute, Inc. | Novel crispr enzymes and systems |
| US11124659B2 (en) * | 2018-01-30 | 2021-09-21 | Lam Research Corporation | Method to selectively pattern a surface for plasma resistant coat applications |
-
2021
- 2021-08-24 KR KR1020210111370A patent/KR102356172B1/ko active IP Right Grant
-
2022
- 2022-06-30 TW TW111124411A patent/TWI791410B/zh active
- 2022-06-30 CN CN202210769546.8A patent/CN115717229A/zh active Pending
- 2022-07-26 US US17/874,154 patent/US20230128726A1/en not_active Abandoned
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030219544A1 (en) * | 2002-05-22 | 2003-11-27 | Smith William C. | Thermal spray coating process with nano-sized materials |
| US20040229031A1 (en) * | 2003-01-10 | 2004-11-18 | Maurice Gell | Coatings, materials, articles, and methods of making thereof |
| US20060037536A1 (en) * | 2003-10-24 | 2006-02-23 | Toshiba Ceramics Co., Ltd. | Plasma resistant member, manufacturing method for the same and method of forming a thermal spray coat |
| KR20130123821A (ko) * | 2012-05-04 | 2013-11-13 | (주)코미코 | 내 플라즈마 코팅막, 이의 제조 방법 및 내 플라즈마성 부품 |
| US20150321964A1 (en) * | 2014-05-07 | 2015-11-12 | Applied Materials, Inc. | Slurry plasma spray of plasma resistant ceramic coating |
| CN105474363A (zh) * | 2014-05-07 | 2016-04-06 | 应用材料公司 | 抗等离子体的陶瓷涂层的浆料等离子体喷涂 |
| KR101721232B1 (ko) * | 2015-10-02 | 2017-03-29 | 주식회사 싸이노스 | 플라즈마 내성 코팅층 형성방법 |
| CN107592941A (zh) * | 2015-12-31 | 2018-01-16 | Ｋｏｍｉｃｏ有限公司 | 耐等离子体涂膜及其形成方法 |
| CN111279455A (zh) * | 2017-11-20 | 2020-06-12 | Ｋｏｍｉｃｏ有限公司 | 耐等离子性涂膜的制造方法及据此形成的耐等离子性构件 |
| US20190157047A1 (en) * | 2017-11-22 | 2019-05-23 | Applied Materials, Inc. | Plasma spray coating enhancement using graduated particle feed rate |
| US20200056278A1 (en) * | 2018-08-15 | 2020-02-20 | Shin-Etsu Chemical Co., Ltd. | Sprayed coating, method for manufacturing sprayed coating, sprayed member and spraying material |
| CN110835720A (zh) * | 2018-08-15 | 2020-02-25 | 信越化学工业株式会社 | 喷涂涂层、制造喷涂涂层的方法、喷涂的部件及喷涂材料 |
| JP2019019413A (ja) * | 2018-10-16 | 2019-02-07 | 信越化学工業株式会社 | イットリウム系フッ化物溶射皮膜、該溶射皮膜を形成するための溶射材料、該溶射皮膜の形成方法、及び該溶射皮膜を含む耐食性皮膜 |
| KR102266655B1 (ko) * | 2020-12-10 | 2021-06-18 | (주)코미코 | 이트륨계 과립 분말을 이용한 용사 피막의 제조 방법 및 이를 이용하여 제조된 이트륨계 용사 피막 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI791410B (zh) | 2023-02-01 |
| KR102356172B1 (ko) | 2022-02-08 |
| TW202309337A (zh) | 2023-03-01 |
| US20230128726A1 (en) | 2023-04-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI615506B (zh) | 耐電漿塗膜及其形成方法 | |
| EP1277850B1 (en) | Sprayed film of yttria-alumina complex oxide | |
| CN115717229A (zh) | 耐等离子体涂布膜、其制造方法以及耐等离子体构件 | |
| JP5674479B2 (ja) | 還元プラズマに耐性のイットリウム含有セラミックコーティング | |
| TWI389248B (zh) | 用於電漿腔室部件的抗電漿塗層 | |
| KR101932429B1 (ko) | 내 플라즈마 코팅막, 이의 제조 방법 및 내 플라즈마성 부품 | |
| CN111279455A (zh) | 耐等离子性涂膜的制造方法及据此形成的耐等离子性构件 | |
| KR101110371B1 (ko) | 내플라즈마 결정질 세라믹 코팅막 및 그 제조방법 | |
| JP2013532770A (ja) | 半導体用途用の溶射複合コーティング | |
| KR101961411B1 (ko) | 대면적 oled 패널 제조용 챔버의 코팅재 및 그 제조 방법 | |
| KR20150013625A (ko) | 중요 챔버 구성요소들에 대한 플라즈마 스프레이 코팅 프로세스 향상 | |
| JPH10251871A (ja) | プラズマリアクタ用ボロンカーバイド部品 | |
| KR102266655B1 (ko) | 이트륨계 과립 분말을 이용한 용사 피막의 제조 방법 및 이를 이용하여 제조된 이트륨계 용사 피막 | |
| US11473181B2 (en) | Yittrium granular powder for thermal spray and thermal spray coating produced using the same | |
| CN115261762A (zh) | 喷镀用材料 | |
| TWI846618B (zh) | 耐電漿性塗佈膜及其製備方法 | |
| WO2015080134A1 (ja) | プラズマ装置用部品およびその製造方法 | |
| KR102522277B1 (ko) | 내플라즈마 2층 코팅막 구조물 및 이의 제조 방법 | |
| US20230223240A1 (en) | Matched chemistry component body and coating for semiconductor processing chamber | |
| KR20240145684A (ko) | Mlcc 검사 장비의 가공품 코팅 방법 | |
| US20230051800A1 (en) | Methods and apparatus for plasma spraying silicon carbide coatings for semiconductor chamber applications | |
| CN118222967A (zh) | 一种高致密度耐等离子侵蚀涂层的制备方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20230228 |