CN115453824A - 载置台装置、曝光装置以及物品的制造方法 - Google Patents

载置台装置、曝光装置以及物品的制造方法 Download PDF

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Publication number
CN115453824A
CN115453824A CN202210626974.5A CN202210626974A CN115453824A CN 115453824 A CN115453824 A CN 115453824A CN 202210626974 A CN202210626974 A CN 202210626974A CN 115453824 A CN115453824 A CN 115453824A
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CN
China
Prior art keywords
stage
wavelength
measurement
measurement light
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210626974.5A
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English (en)
Chinese (zh)
Inventor
小杉祐司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN115453824A publication Critical patent/CN115453824A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
CN202210626974.5A 2021-06-09 2022-06-06 载置台装置、曝光装置以及物品的制造方法 Pending CN115453824A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-096623 2021-06-09
JP2021096623A JP7731699B2 (ja) 2021-06-09 2021-06-09 ステージ装置、露光装置、及び物品の製造方法

Publications (1)

Publication Number Publication Date
CN115453824A true CN115453824A (zh) 2022-12-09

Family

ID=84296878

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210626974.5A Pending CN115453824A (zh) 2021-06-09 2022-06-06 载置台装置、曝光装置以及物品的制造方法

Country Status (3)

Country Link
JP (1) JP7731699B2 (https=)
KR (1) KR102910937B1 (https=)
CN (1) CN115453824A (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000331904A (ja) * 1999-05-17 2000-11-30 Canon Inc 露光装置およびデバイス製造方法
CN1758014A (zh) * 2004-10-07 2006-04-12 三星电子株式会社 用于测量位移的干涉仪系统以及采用该干涉仪系统的曝光系统
US20080062405A1 (en) * 2005-04-29 2008-03-13 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
JP2021012273A (ja) * 2019-07-05 2021-02-04 キヤノン株式会社 測定装置、ステージ位置決め装置、露光装置、物品の製造方法及びコンピュータプログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03134503A (ja) * 1989-10-20 1991-06-07 Hitachi Ltd レーザ測長器及びそれにおける空気のゆらぎの補正方法
KR200211355Y1 (ko) * 1998-06-30 2001-04-02 김영환 스테이지 간섭계
US6417927B2 (en) 1999-04-28 2002-07-09 Zygo Corporation Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
JP2003065712A (ja) * 2001-08-21 2003-03-05 Canon Inc レーザ干渉計測長器、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
US6842256B2 (en) * 2001-11-15 2005-01-11 Zygo Corporation Compensating for effects of variations in gas refractivity in interferometers
JP5002613B2 (ja) 2009-03-31 2012-08-15 株式会社東芝 Ｘｙステージ装置
DE102013213525B3 (de) 2013-07-10 2014-08-21 Carl Zeiss Sms Gmbh Verfahren zum Kalibrieren eines Positionsmeßsystems und Positionsmeßsystem
CN110553591B (zh) 2018-05-31 2021-01-01 上海微电子装备（集团）股份有限公司 一种位移测量系统和光刻机

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000331904A (ja) * 1999-05-17 2000-11-30 Canon Inc 露光装置およびデバイス製造方法
CN1758014A (zh) * 2004-10-07 2006-04-12 三星电子株式会社 用于测量位移的干涉仪系统以及采用该干涉仪系统的曝光系统
US20080062405A1 (en) * 2005-04-29 2008-03-13 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
JP2021012273A (ja) * 2019-07-05 2021-02-04 キヤノン株式会社 測定装置、ステージ位置決め装置、露光装置、物品の製造方法及びコンピュータプログラム

Also Published As

Publication number Publication date
KR102910937B1 (ko) 2026-01-12
KR20220166186A (ko) 2022-12-16
JP7731699B2 (ja) 2025-09-01
JP2022188520A (ja) 2022-12-21

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