KR102910937B1 - 스테이지 장치, 노광 장치, 및 물품의 제조 방법 - Google Patents

스테이지 장치, 노광 장치, 및 물품의 제조 방법

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Publication number
KR102910937B1
KR102910937B1 KR1020220061730A KR20220061730A KR102910937B1 KR 102910937 B1 KR102910937 B1 KR 102910937B1 KR 1020220061730 A KR1020220061730 A KR 1020220061730A KR 20220061730 A KR20220061730 A KR 20220061730A KR 102910937 B1 KR102910937 B1 KR 102910937B1
Authority
KR
South Korea
Prior art keywords
stage
wavelength
measurement
light
atmospheric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020220061730A
Other languages
English (en)
Korean (ko)
Other versions
KR20220166186A (ko
Inventor
유지 코스기
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20220166186A publication Critical patent/KR20220166186A/ko
Application granted granted Critical
Publication of KR102910937B1 publication Critical patent/KR102910937B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
KR1020220061730A 2021-06-09 2022-05-20 스테이지 장치, 노광 장치, 및 물품의 제조 방법 Active KR102910937B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021096623A JP7731699B2 (ja) 2021-06-09 2021-06-09 ステージ装置、露光装置、及び物品の製造方法
JPJP-P-2021-096623 2021-06-09

Publications (2)

Publication Number Publication Date
KR20220166186A KR20220166186A (ko) 2022-12-16
KR102910937B1 true KR102910937B1 (ko) 2026-01-12

Family

ID=84296878

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220061730A Active KR102910937B1 (ko) 2021-06-09 2022-05-20 스테이지 장치, 노광 장치, 및 물품의 제조 방법

Country Status (3)

Country Link
JP (1) JP7731699B2 (https=)
KR (1) KR102910937B1 (https=)
CN (1) CN115453824A (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020001086A1 (en) 1999-04-28 2002-01-03 De Groot Peter J. Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
JP2003065712A (ja) * 2001-08-21 2003-03-05 Canon Inc レーザ干渉計測長器、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
US20030151750A1 (en) * 2001-11-15 2003-08-14 Hill Henry A. Compensating for effects of variations in gas refractivity in interferometers
JP2010238933A (ja) 2009-03-31 2010-10-21 Advanced Mask Inspection Technology Kk Ｘｙステージ装置
US20150013427A1 (en) 2013-07-10 2015-01-15 Carl Zeiss Sms Gmbh Method for calibrating a position-measuring system and position-measuring system
JP2021012273A (ja) 2019-07-05 2021-02-04 キヤノン株式会社 測定装置、ステージ位置決め装置、露光装置、物品の製造方法及びコンピュータプログラム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03134503A (ja) * 1989-10-20 1991-06-07 Hitachi Ltd レーザ測長器及びそれにおける空気のゆらぎの補正方法
KR200211355Y1 (ko) * 1998-06-30 2001-04-02 김영환 스테이지 간섭계
JP2000331904A (ja) * 1999-05-17 2000-11-30 Canon Inc 露光装置およびデバイス製造方法
KR100578140B1 (ko) * 2004-10-07 2006-05-10 삼성전자주식회사 변위 측정을 위한 간섭계 시스템 및 이를 이용한 노광 장치
US7826063B2 (en) * 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
CN110553591B (zh) 2018-05-31 2021-01-01 上海微电子装备（集团）股份有限公司 一种位移测量系统和光刻机

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020001086A1 (en) 1999-04-28 2002-01-03 De Groot Peter J. Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
JP2003065712A (ja) * 2001-08-21 2003-03-05 Canon Inc レーザ干渉計測長器、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
US20030151750A1 (en) * 2001-11-15 2003-08-14 Hill Henry A. Compensating for effects of variations in gas refractivity in interferometers
JP2010238933A (ja) 2009-03-31 2010-10-21 Advanced Mask Inspection Technology Kk Ｘｙステージ装置
US20150013427A1 (en) 2013-07-10 2015-01-15 Carl Zeiss Sms Gmbh Method for calibrating a position-measuring system and position-measuring system
JP2021012273A (ja) 2019-07-05 2021-02-04 キヤノン株式会社 測定装置、ステージ位置決め装置、露光装置、物品の製造方法及びコンピュータプログラム

Also Published As

Publication number Publication date
CN115453824A (zh) 2022-12-09
KR20220166186A (ko) 2022-12-16
JP7731699B2 (ja) 2025-09-01
JP2022188520A (ja) 2022-12-21

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