CN115453824A - Stage apparatus, exposure apparatus, and method of manufacturing article - Google Patents

Stage apparatus, exposure apparatus, and method of manufacturing article Download PDF

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Publication number
CN115453824A
CN115453824A CN202210626974.5A CN202210626974A CN115453824A CN 115453824 A CN115453824 A CN 115453824A CN 202210626974 A CN202210626974 A CN 202210626974A CN 115453824 A CN115453824 A CN 115453824A
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wavelength
measuring
stage
light
measurement
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Inventor
小杉祐司
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The invention relates to a stage device, an exposure apparatus, and a method of manufacturing an article. Provided is a mounting table device capable of measuring the position of a mounting table with high accuracy. The present invention provides a mounting table device, comprising: a mounting table having a 1 st reflecting surface perpendicular to the 1 st direction and configured to be capable of being driven in the 1 st direction; a 1 st measuring unit configured to measure a position of the mounting table in a 1 st direction by emitting a 1 st measuring beam toward the 1 st reflecting surface and receiving the 1 st measuring beam reflected by the 1 st reflecting surface; a 2 nd measuring unit for measuring a wavelength of a 2 nd measuring light propagating through the 1 st atmospheric region; and a control unit that corrects the measurement result of the 1 st measurement unit based on a wavelength of the 2 nd measurement light that changes with atmospheric fluctuation in the 1 st atmospheric region that occurs when the stage is driven in the 1 st direction.

Description

Stage apparatus, exposure apparatus, and method of manufacturing article
Technical Field
The invention relates to a stage device, an exposure device and a method for manufacturing an article.
Background
Conventionally, there is known a mounting table apparatus including an interferometer that emits measurement light toward a reflection surface provided on a mounting table, receives the measurement light reflected by the reflection surface, and measures a position of the mounting table.
At this time, when the refractive index of the atmosphere in the space where the measurement light travels between the interferometer and the reflection surface slightly varies with the environment of the space, that is, changes in temperature, humidity, air pressure, and the like, the wavelength of the measurement light changes, and an error occurs in the position measurement value of the mounting table.
Patent document 1 discloses a mounting table device that can correct the wavelength of measurement light and further correct a position measurement value of a mounting table by detecting a variation in the refractive index of the atmosphere in a space where the measurement light of an interferometer travels by also passing the correction light through the space.
Documents of the prior art
Patent literature
Patent document 1: japanese patent laid-open No. 2003-65712
Disclosure of Invention
Problems to be solved by the invention
For example, in order to achieve high productivity, a substrate mounting table provided in an exposure apparatus may perform stepping driving and scanning driving in two directions perpendicular to each other at the same time.
Therefore, in the surrounding space of the substrate placing table, the atmospheric fluctuations in the two directions are generated together.
On the other hand, in the mounting table device disclosed in patent document 1, the correction light traveling in the space can be used to measure the variation of the refractive index of the atmosphere according to the variation of the environment including the temperature, humidity, and air pressure in the space and the atmospheric fluctuation in the direction parallel to the traveling direction of the correction light.
Therefore, when the position of the substrate mounting table is measured using the mounting table device, an atmospheric fluctuation in a direction perpendicular to the traveling direction of the correction light is generated in the space, and thus an error is included in the fluctuation of the refractive index of the measured atmospheric.
When the stage is moved in two directions perpendicular to each other, if the change in the refractive index of the atmosphere in the space obtained by the correction light is directly used for the correction of the wavelength of the measurement light by the interferometer, an error is included in the position measurement value measured by the interferometer on the stage.
Accordingly, an object of the present invention is to provide a mounting table apparatus capable of measuring the position of a mounting table with high accuracy.
Means for solving the problems
The mounting table device of the present invention is characterized by comprising: a mounting table having a 1 st reflecting surface perpendicular to a 1 st direction and configured to be drivable in the 1 st direction; a 1 st measuring unit configured to measure a position of the mounting table in a 1 st direction by emitting a 1 st measuring beam toward the 1 st reflecting surface and receiving the 1 st measuring beam reflected by the 1 st reflecting surface; a 2 nd measuring unit for measuring a wavelength of a 2 nd measuring light propagating through the 1 st atmospheric region; and a control unit for correcting the measurement result of the 1 st measurement unit based on the wavelength of the 2 nd measurement light that changes with the atmospheric fluctuation in the 1 st atmospheric region generated when the mounting table is driven in the 1 st direction.
ADVANTAGEOUS EFFECTS OF INVENTION
According to the present invention, it is possible to provide a mounting table device capable of measuring the position of a mounting table with high accuracy.
Drawings
Fig. 1 is a schematic XZ cross-sectional inner projection view of an exposure apparatus including a stage apparatus according to the present embodiment.
Fig. 2 is a schematic configuration diagram of the mounting table apparatus according to the first embodiment and a schematic diagram for explaining a configuration of the wavelength compensator.
Fig. 3 is a graph showing a temporal change in the measurement value obtained by the wavelength compensator.
Fig. 4 is a flowchart showing a process of creating a table in the mounting table apparatus according to the first embodiment, and a flowchart showing a process of calculating a movement amount of the mounting table.
Fig. 5 is a flowchart showing a process of creating a table in the mounting table apparatus according to the second embodiment, and a flowchart showing a process of calculating the movement amount of the mounting table.
Fig. 6 is a schematic configuration diagram of a mounting table apparatus according to a third embodiment.
Fig. 7 is a flowchart showing an exposure process in an exposure apparatus including a stage apparatus according to a fourth embodiment.
Description of the reference numerals
33. A Y mirror (1 st reflecting surface); 34. a Y interferometer (1 st measurement section); 35. a Y-length measuring beam (1 st measuring light); 39. a Y wavelength compensator (No. 2 measuring part); 41. a Y stage (stage); 61. a signal processing unit (control unit); 81. a timing control unit (control unit); 82. a Y wavelength correction unit (control unit); 100. a mounting table device; 404. atmospheric region (1 st atmospheric region).
Detailed Description
Hereinafter, the mounting table apparatus according to the present embodiment will be described in detail based on the attached drawings. In order to make the present embodiment easily understandable, the drawings shown below are drawn on a scale different from the actual scale.
The embodiments described below are examples of means for realizing the present embodiment, and should be modified or changed as appropriate depending on the configuration of an apparatus to which the present embodiment is applied and various conditions.
In the following description, a direction perpendicular to a substrate mounting surface of the substrate mounting table is referred to as a Z direction, and two directions orthogonal to each other in a cross section (1 st cross section) parallel to the substrate mounting surface are referred to as an X direction (2 nd direction) and a Y direction (1 st direction).
[ first embodiment ]
A position measuring apparatus using an interferometer is widely used in the field where high-precision positioning control is required.
In such a position measuring apparatus, the interferometer performs position measurement with reference to the wavelength of the laser light, but when the refractive index of the atmosphere changes depending on the temperature, humidity, and air pressure of the position measuring space and the wavelength of the length measuring beam, which is the laser light, changes, an error occurs in the position measurement value of the measurement object.
In order to reduce such errors, it is necessary to correct the position measurement value based on a change in the wavelength of the laser light.
As a method for correcting a position measurement value in an interferometer, for example, the following method is available.
That is, a sensor is provided that detects at least one of temperature, humidity, and air pressure, which are environments in the position measurement space, and a change in refractive index of the atmosphere in the position measurement space is calculated from a detection value of the sensor.
The position measurement value can be corrected based on the calculated change in the refractive index of the atmosphere.
Further, the wavelength of the length measuring beam in each of the vacuum space and the air space is calculated by measuring the same object after the length measuring beam travels in the vacuum space and the air space, respectively, thereby obtaining the change in the refractive index of the air in the air space.
There is also a method of correcting the position measurement value of the interferometer based on the obtained change in the refractive index of the atmosphere.
The measuring device that determines the change in the refractive index of the atmosphere in the air space based on the difference between the vacuum space and the air space in the wavelength of the measuring beam is called a wavelength compensator or a wavelength tracker.
As described above, the wavelength of the measuring beam emitted from the interferometer and traveling in the position measurement space changes with time according to the fluctuation of the refractive index of the atmosphere corresponding to the fluctuation of the environment including the temperature, humidity, and atmospheric pressure in the position measurement space and the atmospheric fluctuation generated according to the movement of the measurement object.
The wavelength compensator can measure the change in the refractive index of the atmosphere according to the change in the environment in the atmosphere space and the fluctuation in the atmosphere caused by the movement of the measurement target in the direction parallel to the traveling direction of the length measuring beam.
On the other hand, for example, in order to achieve high productivity, a substrate mounting table provided in an exposure apparatus may perform stepping drive and scanning drive in two directions perpendicular to each other at the same time.
Therefore, in the space around the substrate mounting table, the atmospheric fluctuations in the two directions are generated together.
Therefore, when the substrate mounting table is driven in this manner, an atmospheric fluctuation in the direction perpendicular to the traveling direction of the measurement light beam also occurs in the atmospheric space in the wavelength compensator, and thus an error is included in the measured fluctuation of the refractive index of the atmospheric space.
When the stage is moved in two directions perpendicular to each other, if the change in the refractive index of the atmosphere obtained by the wavelength compensator is used as it is to correct the temporal change in the wavelength of the measurement light in the interferometer, the position measurement value of the stage by the interferometer also includes an error.
In recent years, in an exposure apparatus, in order to further improve productivity, since the substrate mounting table and the original plate mounting table are driven at high speed and high acceleration, the atmospheric fluctuation in the position measurement space is also increased, and thus the error is also increased.
Therefore, an object of the present embodiment is to provide a mounting table apparatus capable of correcting a position measurement value of a mounting table with high accuracy.
Fig. 1 shows a schematic XZ cross-sectional inner projection view of an exposure apparatus 1 including a stage apparatus according to the present embodiment.
As shown in fig. 1, the exposure apparatus 1 is a projection type exposure apparatus that projects a pattern formed on a reticle 20 (original plate) onto a wafer 40 (substrate) by a step-and-scan method, and is suitable for a photolithography process of submicron, quarter micron or less.
The exposure apparatus 1 includes an illumination device 10, a reticle stage 25, a projection optical system 30, a wafer stage 45, a control system 60, an alignment detection system 70, and a focus tilt detection system 150.
The exposure apparatus 1 also includes an interferometer system (see fig. 2) for detecting the positions of the reticle stage 25 and the wafer stage 45 in the XY plane.
That is, the stage apparatus of the present embodiment includes the reticle stage 25 or the wafer stage 45 and the interferometer system.
The illumination device 10 includes a light source unit 12 and an illumination optical system 14, and illuminates the reticle 20 on which a pattern to be transferred to the wafer 40 is formed.
The light source section 12 is configured to emit laser light, and can use light sources such as a KrF excimer laser having a wavelength of about 248nm, an ArF excimer laser having a wavelength of about 193nm, and the like.
The light source used in the light source unit 12 is not limited to the excimer laser as described above, and an F2 laser having a wavelength of about 157nm or a light source that emits EUV (Extreme Ultra Violet) light having a wavelength of 20nm or less may be used.
The illumination optical system 14 is an optical system that guides the light beam emitted from the light source unit 12 to the reticle 20, and specifically, the light beam emitted from the light source unit 12 is shaped into a light beam having a slit shape optimal for exposure and then guided to the reticle 20.
The illumination optical system 14 is constituted by a lens, a mirror, an optical integrator, a diaphragm, and the like.
Specifically, the illumination optical system 14 includes, for example, a condenser lens, a fly-eye lens, an aperture stop, a condenser lens, a slit, and an imaging optical system, which are arranged in this order from the light source section 12 side toward the reticle stage 25 side.
The illumination optical system 14 can guide the light beam emitted from the light source unit 12 to the reticle 20 regardless of the on-axis light beam and the off-axis light beam.
The optical integrator used in the illumination optical system 14 includes an integrator formed by superimposing a fly-eye lens and two sets of cylindrical lens array (or lenticular lens) plates.
However, the present invention is not limited to this, and an optical rod or a diffraction element may be used as the optical integrator.
The reticle stage 25 is configured to hold the reticle 20 through a reticle chuck not shown, and is connected to a moving mechanism configured by a linear motor not shown.
Thus, the reticle 20 and the reticle chuck can be moved in the translational direction and the rotational direction by driving and controlling the reticle stage 25 in the translational direction parallel to the X, Y, and Z axes and in the rotational direction around the X, Y, and Z axes.
The projection optical system 30 has a function of condensing a light flux from an object plane on an image plane, that is, condensing diffracted light diffracted by a pattern formed on the reticle 20 on the wafer 40.
The wafer stage 45 is configured to hold the wafer 40 by a wafer chuck 46, and is connected to a moving mechanism including a linear motor and the like, not shown.
Thus, by driving and controlling the wafer stage 45 in the translational direction parallel to the X, Y, and Z axes and in the rotational direction around the X, Y, and Z axes, the wafer 40 and the wafer chuck 46 can be moved in the translational direction and the rotational direction.
The reticle stage 25 and the wafer stage 45 are driven so as to have a predetermined speed ratio, and the positions thereof are measured by an interferometer as described later.
The reticle stage 25 and the projection optical system 30 are provided on a lens barrel stage, not shown, supported on a base frame placed on a floor or the like via a damper, for example.
The wafer stage 45 is provided on a stage table, not shown, supported on a floor or the like via a damper having a vibration damping function, for example.
The focus tilt detection system 150 includes a light projecting section 152 and a light receiving section 154. The light beam emitted from the light projecting section 152 is reflected by the wafer 40 and then received by the light receiving section 154, so that the focus of the projection optical system 30 with respect to the wafer 40 and the tilt of the wafer 40 can be detected.
The control system 60 is composed of a CPU, a memory, and the like, and is electrically connected to the illumination device 10, the reticle stage 25, the wafer stage 45, the alignment detection system 70, and the focus tilt detection system 150, thereby collectively controlling the operation of the entire exposure apparatus 1.
The alignment detection system 70 is configured to detect a positional deviation of the wafer 40 in a direction parallel to the X axis and the Y axis, and an optical axis thereof is shifted from an optical axis of the projection optical system 30 in the XY plane.
That is, the alignment detection system 70 is an optical system of a so-called off-axis system using non-exposure light.
The reticle 20 used in the exposure apparatus 1 is made of, for example, quartz, and a circuit pattern to be transferred to the wafer 40 is formed on the reticle 20.
The reticle 20 is held by the reticle stage 25, and is driven and moved by the reticle stage 25.
The wafer 40 is a target object coated with a photoresist on a silicon substrate, for example. The wafer 40 is also an object to be detected for position detection by the alignment detection system 70 and the focus tilt detection system 150.
As described above, in the exposure apparatus 1, the exposure light emitted from the light source unit 12 is guided to the reticle 20 by the illumination optical system 14.
Then, diffracted light diffracted by the pattern formed on the reticle 20 is guided onto the wafer 40 by the projection optical system 30, so that the pattern is projected (transferred) onto the wafer 40.
In the exposure apparatus 1, the reticle stage 25 and the wafer stage 45 are disposed such that the reticle 20 and the wafer 40 are optically conjugate with each other with respect to the projection optical system 30.
Then, the reticle stage 25 and the wafer stage 45 are scanned at a speed ratio corresponding to the reduction ratio of the pattern, whereby the pattern formed on the reticle 20 is transferred onto the wafer 40.
In the above description, the exposure apparatus 1 using the step-and-scan method is described, but the stage apparatus of the present embodiment described in detail below can be applied to an exposure apparatus using a step-and-repeat method.
Next, the mounting table apparatus of the present embodiment will be explained.
Fig. 2 (a) is a schematic configuration diagram of the mounting table apparatus 100 according to the present embodiment.
The stage apparatus 100 of the present embodiment includes a Y mirror 33, a Y interferometer 34 (1 st measurement unit), a Y optical pickup 37, a Y detection unit 38, and a Y wavelength compensator 39 (2 nd measurement unit).
The mounting table apparatus 100 of the present embodiment includes a Y mounting table 41 (mounting table, 1 st mounting table), an X mounting table 42 (2 nd mounting table), and a control unit. The control unit includes a signal processing unit 61, a timing control unit 81, and a Y-wavelength correction unit 82.
As shown in fig. 2 (a), for example, a stage 45 as a wafer stage 45 includes a Y stage 41 and an X stage 42, and specifically, the Y stage 41 is provided with the X stage 42.
The Y stage 41 and the X stage 42 are configured to be drivable in the Y direction and the XY section, respectively, so that the stage 45 is configured to be drivable in the XY direction.
The Y mirror 33 is disposed on the Y stage 41, and has a reflection surface (1 st reflection surface) perpendicular to the Y direction. The Y-side beam 35 (1 st measurement light) emitted from the Y interferometer 34 is incident on the reflection surface of the Y mirror 33.
The Y-length beam 35 reflected by the reflection surface of the Y mirror 33 interferes with a reference beam (reference light), not shown, in the Y interferometer 34, and a Y interference beam 36 is generated. The Y mirror 33 may be integrally configured with the Y stage 41, and the Y stage 41 may have a reflection surface perpendicular to the Y direction.
Next, the Y interference light beam 36 emitted from the Y interferometer 34 enters the Y optical pickup 37, and the Y interference light beam 36 is photoelectrically converted, whereby an interference signal is output from the Y optical pickup 37.
The Y detector 38 provided on the not-shown length measuring plate detects a phase difference between the interference signal and a reference signal from the laser head provided on the Y interferometer 34.
This enables output of the distance Y in the Y direction from the Y interferometer 34 to the Y mirror 33 0 That is, the position measurement value Δ m corresponding to the movement amount Δ Y of the Y stage 41 in the Y direction Y 。
Here, the wavelength of the Y-measuring beam 35 emitted from the Y-interferometer 34 varies depending on the environment of the position measurement space, that is, the space between the Y-interferometer 34 and the Y-mirror 33, specifically, changes in temperature, humidity, air pressure, and the like.
Therefore, the position measurement value Δ m output from the Y detection unit 38 Y In this case, an error occurs in accordance with a variation in the wavelength of the Y-measuring beam 35.
Therefore, in the stage apparatus 100 of the present embodiment, the position measurement value Δ m is corrected in such a manner Y The wavelength of the Y-measuring beam 35 is corrected in accordance with the error of (3), and a Y-wavelength compensator 39 is provided.
Fig. 2 (b) is a schematic diagram for explaining the structure of the Y-wavelength compensator 39.
As shown in fig. 2 (b), an interferometer 401 and a mirror 402 are provided in the Y-wavelength compensator 39.
Between the interferometer 401 and the mirror 402, a vacuum region 403 and an atmospheric region 404 (1 st atmospheric region, 2 nd atmospheric region) are provided so as to be aligned in a direction perpendicular to the traveling direction of the length measuring beam.
In the Y-wavelength compensator 39, the measuring beam emitted from the interferometer 401 and reflected by the mirror 402 interferes with a reference beam not shown, and the wavelength λ of the measuring beam in each of the vacuum region 403 and the atmospheric region 404 is measured v And λ a 。
At this time, the wavelength λ of the measuring beam (2 nd measuring light, 4 th measuring light, 5 th measuring light) in the vacuum region 403 v With the wavelength lambda in the atmospheric region 404 a The relationship therebetween can be expressed by the refractive index n of the atmosphere in the atmosphere region 404 as expressed by the following expression (1).
λ a ＝λ v /n…(1)
In other words, in the Y-wavelength compensator 39, the measurement result for the mirror 402 (predetermined object) based on the length measuring beam propagating in the atmospheric region 404 and the measurement result for the mirror 402 based on the length measuring beam propagating in the vacuum region 403 are compared with each other.
Thereby, by acquiring the wavelength λ of the length measuring beam in the atmospheric region 404 a The refractive index n of the atmosphere in the atmospheric region 404 can be measured.
In addition, in the stage apparatus 100 of the present embodiment, the refractive index n of the atmosphere acquired by the Y-wavelength compensator 39 can be used to correct the variation in the wavelength and the position measurement value Δ m of the Y-wavelength measurement beam 35 emitted from the Y interferometer 34 Y The error of (2).
Specifically, the wavelength correction amount Δ C corresponding to the change in the refractive index n of the atmosphere obtained when the Y stage 41 is moved in the Y direction in accordance with each of the plurality of stage driving conditions is input from the Y wavelength compensator 39 to the Y wavelength correction unit 82.
Then, the user can use the device to perform the operation,the Y-wavelength correction unit 82 creates a table Δ C under each stage drive condition based on the inputted wavelength correction amount Δ C under each stage drive condition Y ' (table 1), and stores it.
That is, in the mounting table apparatus 100 of the present embodiment, the position measurement value Δ m is obtained from the acquired position measurement value Y The timing control unit 81 transmits the driving conditions of the Y stage 41 to the Y wavelength correction unit 82.
Then, the Y-wavelength correction section 82 corrects the table Δ C corresponding to the driving condition based on the received driving condition Y ' to the signal processing section 61.
The stage driving conditions include setting conditions such as the types of driving such as stepping driving and scanning driving, the speed, the magnitude of acceleration, and the driving curve.
Thus, the signal processing section 61 uses the table Δ C of the Y-wavelength compensator 39 Y ' position measurement Δ m for Y interferometer 34 Y The amount of movement Δ Y in the Y direction of the Y stage 41 can be output by performing the correction.
The refractive index n of the atmosphere in the atmospheric region 404 of the Y wavelength compensator 39, that is, the atmosphere in the space between the Y interferometer 34 and the Y mirror 33 can be expressed by an empirical expression of idelun (Edlen) expressed by the following expression (2).
[ number 1]
Figure BDA0003678163110000111
That is, when at least one of the temperature T, the humidity H, and the air pressure P changes with time T in the space between the Y interferometer 34 and the Y mirror 33, the refractive index n of the atmosphere in the space and the wavelength of the Y-side long beam 35 emitted from the Y interferometer 34 change with time.
Next, in the stage apparatus 100 of the present embodiment, the temporal change in the refractive index n of the atmosphere in the space between the Y interferometer 34 and the Y mirror 33 is measured as the position measurement value Δ m Y The method for correcting the influence of。
Specifically, the following method is explained: position measurement value Δ m for temporal change of refractive index n of atmosphere in space between Y interferometer 34 and Y mirror 33 when Y stage 41 moves in Y direction Y The Y wavelength correcting section 82 obtains the table Δ C Y The method of' above.
As described above, the refractive index n of the atmosphere in the atmospheric region 404 measured by the Y-wavelength compensator 39 changes with time according to equation (2) in accordance with the temporal variations in the temperature T, humidity H, and barometric pressure P of the atmosphere in the atmospheric region 404.
In addition, the refractive index n of the atmosphere in the atmosphere region 404 also changes with time due to fluctuations in the atmosphere generated in the atmosphere region 404 by the Y stage 41 being driven in the Y direction.
Further, noise when the Y wavelength compensator 39 measures the refractive index n of the atmosphere in the atmosphere area 404 is also superimposed, and such noise also changes with time due to the busy driving of the Y stage 41, that is, the movement of the Y stage 41.
At this time, if the space in which the mounting table apparatus 100 of the present embodiment is installed is air-conditioned, it can be considered that the temperature T and the humidity H of the atmosphere in the atmosphere area 404 do not change for a sufficiently long time.
Therefore, it is considered that the refractive index n of the atmosphere in the atmospheric region 404 measured by the Y-wavelength compensator 39 changes with time according to the atmospheric pressure P in the atmospheric region 404, that is, the temporal variation of the atmospheric pressure, the atmospheric fluctuation due to the driving of the Y stage 41, and the noise varying with time.
Fig. 3 (a) shows a time change 501 of the measurement value corresponding to the refractive index n of the atmosphere in the atmospheric region 404 measured by the Y wavelength compensator 39 when the Y stage 41 is driven in a predetermined manner.
As described above, the temporal change 501 of the measurement values shown in fig. 3 (a) includes components due to the temporal fluctuation of the atmospheric pressure in the atmospheric region 404, the atmospheric fluctuation due to the driving of the Y stage 41, and the noise varying with time.
At this time, it can be considered that the atmospheric pressure in the atmospheric region 404 fluctuates with time at a frequency sufficiently lower than the atmospheric fluctuation and the time-varying noise caused by the driving of the Y stage 41.
Therefore, in the mounting table apparatus 100 of the present embodiment, the temporal change 501 of the acquired measurement value is input to the low-pass filter, thereby separating components due to the temporal fluctuation of the atmospheric pressure.
In other words, in the mounting table apparatus 100 according to the present embodiment, the time change 501 of the measurement value is input to the low-pass filter, and thereby the components (1 st component, 4 th component, 6 th component) in the 1 st frequency region corresponding to the low frequency region in the time change 501 of the measurement value are acquired.
Fig. 3 (b) shows a temporal change 601 in the measurement value associated with the temporal fluctuation in atmospheric pressure acquired in this way.
In addition, in the mounting table apparatus 100 according to the present embodiment, by obtaining the difference between the time change 501 and the time change 601, the time change 701 of the measurement value can be obtained, which is the remaining component, that is, the atmospheric fluctuation and the time-varying noise caused by the driving of the Y mounting table 41.
Fig. 3 (c) shows a time change 701 of the measurement values thus obtained, which is accompanied by atmospheric fluctuation and time-varying noise due to driving of the Y stage 41.
In addition, it can be considered that the noise superimposed in the measurement of the Y-wavelength compensator 39 fluctuates with time at a frequency sufficiently higher than the atmospheric fluctuation caused by the driving of the Y stage 41.
Therefore, in the mounting table apparatus 100 of the present embodiment, the time variation 701 of the acquired measurement value is input to the high-frequency cutoff filter, thereby removing a component due to the noise varying with time.
In other words, in the stage apparatus 100 according to the present embodiment, the time variation 701 of the acquired measurement value is input to the high-frequency cutoff filter, and thereby the 2 nd frequency region components (the 2 nd component, the 3 rd component, and the 5 th component) corresponding to the high-frequency region in the time variation 701 of the measurement value are removed.
This makes it possible to obtain a measurement value resulting from atmospheric fluctuations caused by driving of the Y stage 41, that is, a temporal change in the refractive index n of the atmosphere in the atmospheric region 404.
In the mounting table device 100 of the present embodiment, the dependency of the refractive index n of the atmosphere obtained in this manner on the time t is created and stored as the table Δ C under the predetermined driving conditions of the Y mounting table 41 Y ’。
Fig. 4 (a) is a table Δ C showing various table driving conditions created by the Y wavelength correction unit 82 in the table apparatus 100 according to the present embodiment Y ' is a flowchart of the process of.
First, the environment sensor 90 (the 3 rd measuring unit) measures the temperature T, humidity H, and air pressure P of the atmosphere in the space near the atmospheric region 404 of the Y-wavelength compensator 39, and the signal processing unit 61 stores the measured temperature T, humidity H, and air pressure P (step S301).
Next, the signal processing unit 61 calculates the refractive index n of the atmosphere in the atmosphere region 404 by substituting the acquired temperature T, humidity H, and air pressure P into equation (2).
Then, the signal processing unit 61 determines the calculated value as an initial value n of the refractive index of the atmosphere in the atmospheric region 404 of the Y-wavelength compensator 39 0 (step S302).
Next, the timing control unit 81 creates a table Δ C under predetermined table driving conditions Y ' the stage driving conditions are set (step S303).
Regarding the stage driving conditions set here, it is preferable to limit the influence of atmospheric fluctuations caused by the movement of the Y stage 41 in the Y direction, by setting the type of driving such as stepping driving and scanning driving, the speed, the magnitude of acceleration, and the driving curve.
Then, the timing control unit 81 drives the Y stage 41 based on the stage driving conditions set in step S303, and measures the wavelength λ of the measurement beam in the atmospheric region 404 using the Y wavelength compensator 39 a Time change (step S304).
Next, the Y-wavelength correction unit 82 inputs the temporal change in the measurement value acquired in step S304 to the low-pass filter, thereby removing a component due to the temporal variation in the atmospheric pressure from the temporal change in the measurement value acquired in step S304 (step S305).
Next, the Y-wavelength correcting section 82 removes a component due to noise that fluctuates with time by inputting, to the high-frequency cut filter, the time variation of the measurement value from which the component due to the temporal fluctuation of the atmospheric pressure is removed in step S305.
Thus, the Y-wavelength correction unit 82 can create the table Δ C Y ', the table Δ C Y ' denotes a wavelength λ of the length measuring beam accompanying atmospheric fluctuation in the atmospheric region 404 when the Y stage 41 is driven under predetermined stage driving conditions a I.e., the temporal change in the refractive index n of the atmosphere (step S306).
The timing control unit 81 determines whether or not to create the table Δ C under the other stage driving conditions Y ' is determined (step S307).
If the table Δ C is prepared under other table driving conditions Y In case of ` (Yes at step S307), the process returns to step S303.
On the other hand, when the table Δ C was prepared under all the table driving conditions Y ' in the case (No at step S307), the process ends.
Fig. 4 (b) is a flowchart showing a process of calculating the movement amount Δ Y of the Y stage 41 under predetermined stage driving conditions by the signal processing unit 61 in the stage apparatus 100 according to the present embodiment.
First, when the timing control unit 81 starts driving the Y stage 41 under predetermined stage driving conditions, the Y wavelength compensator 39 measures the wavelength λ of the measuring beam in the atmospheric region 404 a Time (step S308).
Next, the Y-wavelength correction section 82 inputs the temporal change in the measurement value acquired in step S308 to the low-pass filter, thereby acquiring a component due to the temporal variation in the atmospheric pressure from the temporal change in the measurement value acquired in step S308.
Then, the signal processing unit 61 drives the predetermined mounting tableTable Δ C corresponding to dynamic conditions Y ' add the obtained components due to the temporal variation of the atmospheric pressure to determine the wavelength λ of the Y-measuring beam 35 under the predetermined stage driving condition a Time change (step S309).
The signal processing unit 61 acquires the position measurement value Δ m of the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving condition Y 。
Then, the signal processing unit 61 uses the wavelength λ of the measured-length beam determined in step S309 a To correct the acquired position measurement Δ m Y Thereby, the movement amount Δ Y of the Y stage 41 is calculated (step S310).
Then, the cell state of the interferometer 401 is checked (step S311).
If the interferometer 401 is operating normally (Yes at step S311), the position measurement is repeated, i.e., the position measurement is continued, and the process returns to step S308.
On the other hand, if a failure or the like occurs in the cell state of the interferometer 401 (No in step S311), the process ends.
As described above, in the mounting table apparatus 100 of the present embodiment, the table Δ C is prepared in advance Y ', the table Δ C Y ' represents the wavelength λ of the measurement beam accompanying the atmospheric fluctuation of the atmospheric region where the measurement beam travels when the Y stage 41 is driven under predetermined driving conditions a I.e. the temporal variation of the refractive index n of the atmosphere.
Then, the prepared table Δ C was used Y ' to correct the position measurement value Δ m of the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving condition Y Thus, the movement amount Δ Y of the Y stage 41 in the Y direction can be accurately obtained.
In other words, the wavelength λ of the length measuring beam based on the atmospheric fluctuation in the atmospheric region generated when the Y stage 41 is driven in the Y direction changes a Position measurement Δ m for Y interferometer 34 Y And (6) carrying out correction. This enables the position of the Y stage 41 to be measured with high accuracy.
In the above description, the Y stage 41 constituting the wafer stage 45 is driven in the Y direction, but the present invention is not limited thereto, and the present invention can be similarly applied to the X direction driving of the X stage 42.
The present invention is not limited to the wafer stage 45, and can be similarly applied to the driving of the reticle stage 25 in the Y direction and the driving in the X direction.
In the above, a low-pass filter and a high-frequency cut filter are used as filters, but a band-pass filter may be used instead.
The stage apparatus 100 according to the present embodiment is not limited to the exposure apparatus 1, and may be used in a patterning apparatus such as a stamp apparatus and a drawing apparatus.
Here, the imprint apparatus is an apparatus that forms a pattern of a cured product to which a molded pattern is transferred by bringing an imprint material and a mold material supplied onto a substrate into contact with each other and then applying energy for curing to the imprint material.
The drawing device is a device that forms a pattern (latent image pattern) on a substrate by drawing the substrate with a charged particle beam (electron beam) or a laser beam.
[ second embodiment ]
FIG. 5 (a) is a table Δ C showing various table driving conditions created by the Y-wavelength correction unit 82 in the table mounting apparatus according to the second embodiment Y ' is a flowchart of the process of.
Since the mounting table apparatus of the present embodiment has the same configuration as the mounting table apparatus 100 of the first embodiment, the same members are denoted by the same reference numerals, and the description thereof is omitted.
First, the environment sensor 90 measures the temperature T, humidity H, and air pressure P of the atmosphere in the space near the atmospheric region 404 of the Y-wavelength compensator 39, and the signal processing unit 61 stores the measured temperature T, humidity H, and air pressure P (step S801).
Next, the signal processing unit 61 calculates the refractive index n of the atmosphere in the atmosphere region 404 by substituting the acquired temperature T, humidity H, and air pressure P into equation (2).
Then, the signal processing unit 61 determines the calculated value as an initial value n of the refractive index of the atmosphere in the atmospheric region 404 of the Y-wavelength compensator 39 0 (step S802).
Next, the timing control unit 81 makes a table Δ C under predetermined table driving conditions Y ' the stage driving conditions are set (step S803).
The stage driving conditions set here are preferably set to limit the influence of atmospheric fluctuations caused by the movement of the Y stage 41 in the Y direction, for example, by setting the type of driving such as step driving and scan driving, the speed, the magnitude of acceleration, and the driving curve.
Then, while the timing control unit 81 drives the Y stage 41 based on the stage driving conditions set in step S803, the Y wavelength compensator 39 measures the wavelength λ of the length measuring beam in the atmospheric region 404 a Time (step S804).
Next, the Y-wavelength correcting section 82 removes a component due to temporal variation in atmospheric pressure from the temporal variation in the measurement value acquired in step S804 by inputting the temporal variation in the measurement value acquired in step S804 to a low-pass filter (step S805).
Next, the Y-wavelength correction section 82 inputs the temporal change of the measurement value from which the component due to the temporal fluctuation of the atmospheric pressure is removed in step S805 to the high-frequency cut filter, thereby removing the component due to the noise that fluctuates with time.
Thus, the Y-wavelength correction unit 82 can create the table Δ C Y ', the table Δ C Y ' denotes the wavelength λ of the length measuring beam accompanying the atmospheric fluctuation in the atmospheric region 404 when the Y stage 41 is driven under predetermined stage driving conditions a I.e., the temporal change in the refractive index n of the atmosphere (step S806).
In the mounting table apparatus of the present embodiment, the Y-wavelength correction unit 82 applies the table Δ C acquired in step S806 with a function related to time t Y The dependence of the refractive index n of the atmosphere in' with respect to time t is fitted. ByThen, the approximation function n (t) is obtained and stored (step S807).
Then, the timing control section 81 performs whether or not to create the table Δ C under the other stage driving conditions Y ' and a decision of the approximation function n (t) is obtained (step S808).
If the table Δ C is prepared under other table driving conditions Y ' when the approximation function n (t) is obtained (Yes at step S808), the process returns to step S803.
On the other hand, when the table Δ C is prepared under all the table driving conditions Y ' when the approximation function n (t) is obtained (No in step S808), the process ends.
Fig. 5 (b) is a flowchart showing a process of calculating the movement amount Δ Y of the Y stage 41 under predetermined stage driving conditions by the signal processing unit 61 in the stage apparatus according to the present embodiment.
First, when the timing control unit 81 starts driving the Y stage 41 based on predetermined stage driving conditions, the Y wavelength compensator 39 measures the wavelength λ of the measuring beam in the atmospheric region 404 a Time of (a) is changed (step S809).
Next, the Y-wavelength correcting section 82 acquires a component caused by temporal variation in atmospheric pressure from the temporal variation in the measurement values acquired in step S809 by inputting the temporal variation in the measurement values acquired in step S809 to a low-pass filter.
Then, the signal processing unit 61 adds the approximate function n (t) corresponding to the predetermined stage driving condition to the obtained component due to the temporal fluctuation of the atmospheric pressure, thereby determining the wavelength λ of the Y measuring beam 35 under the predetermined stage driving condition a Time (step S810).
The signal processing unit 61 acquires a position measurement value Δ m of the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving condition Y 。
Then, the signal processing section 61 uses the wavelength λ of the length measuring beam determined in step S810 a To correct the acquired position measurement Δ m Y Thereby countingThe movement amount Δ Y of the Y stage 41 is calculated (step S811).
Then, the cell state of the interferometer 401 is checked (step S812).
When the interferometer 401 is operating normally (Yes at step S812), the process returns to step S809 to repeat the position measurement.
On the other hand, if a failure or other trouble occurs in the cell state of the interferometer 401 (No in step S812), the process ends.
As described above, in the mounting table apparatus of the present embodiment, the approximate function n (t) indicating the wavelength λ of the measurement light beam according to the atmospheric fluctuation in the atmospheric region in which the measurement light beam travels when the Y mounting table 41 is driven under the predetermined driving condition is prepared in advance a I.e. the temporal variation of the refractive index n of the atmosphere.
Then, the position measurement value Δ m of the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving condition is calculated by using the prepared approximate function n (t) Y The amount of movement Δ Y of the Y stage 41 in the Y direction can be accurately obtained by performing the calibration.
This enables the position of the Y stage 41 to be measured with high accuracy.
In the mounting table device of the present embodiment, the table Δ C is used instead of directly Y According to the table Δ C Y ' an approximation function n (t) is obtained and used.
Thus, even if the stage movement speed and the drive curve associated with the layout during exposure are changed as the stage drive conditions, the wavelength λ of the Y-length beam 35 under the predetermined stage drive conditions can be determined without newly acquiring a table a Time of change in time.
Specifically, for example, when a predetermined table driving condition is changed by the magnitude of the movement speed of the table with respect to another table driving condition, the coefficient with respect to time t is changed in the approximation function n (t) acquired under the other table driving condition.
This makes it possible to obtain the approximation function n (t) under the predetermined table driving conditions.
As described above, in the mounting table apparatus according to the present embodiment, the use of the approximation function n (t) can simplify the processing, and can improve the throughput.
[ third embodiment ]
Fig. 6 is a schematic configuration diagram of a mounting table apparatus 300 according to a third embodiment.
The mounting table device 300 of the present embodiment includes a Y mirror 33, a Y interferometer 34 (1 st measurement unit), a Y optical pickup 37, a Y detection unit 38, and a Y wavelength compensator 39 (2 nd measurement unit).
The stage apparatus 300 of the present embodiment includes an X mirror 53, an X interferometer 54 (4 th measurement unit), an X optical pickup 57, an X detection unit 58, and an X wavelength compensator 59 (5 th measurement unit).
The mounting table device 300 of the present embodiment includes a mounting table 45 and a control unit. The control unit includes a signal processing unit 61, a timing control unit 81, a Y-wavelength correction unit 82, and an X-wavelength correction unit 83.
As shown in fig. 6, for example, a mounting table 45 as the wafer mounting table 45 includes a Y mounting table and an X mounting table, not shown, and specifically, an X mounting table is mounted on the Y mounting table.
The Y mirror 33 is disposed on the Y stage, and has a reflection surface (1 st reflection surface) perpendicular to the Y direction. The Y-side long beam 35 (1 st measurement light) emitted from the Y interferometer 34 enters the reflection surface of the Y mirror 33.
The Y-side long beam 35 reflected by the reflection surface of the Y mirror 33 interferes with a reference beam not shown in the figure in the Y interferometer 34, and a Y interference beam 36 is generated.
The Y mirror 33 may be integrally configured with the Y stage, and the Y stage may have a reflection surface perpendicular to the Y direction.
Next, the Y interference light beam 36 emitted from the Y interferometer 34 enters the Y optical pickup 37, and the Y interference light beam 36 is photoelectrically converted, whereby an interference signal is output from the Y optical pickup 37.
Then, the Y detection unit 38 provided in the not-shown length measuring plate detects a phase difference between the interference signal and a reference signal from the laser head provided in the Y interferometer 34.
This enables output of the distance Y in the Y direction from the Y interferometer 34 to the Y mirror 33 0 That is, the position measurement value Δ m corresponding to the movement amount Δ Y of the Y stage in the Y direction Y 。
Similarly, the X mirror 53 is disposed on the X stage, and has a reflection surface (2 nd reflection surface) perpendicular to the X direction. The X-ray length measuring beam 55 (3 rd measuring beam) emitted from the X interferometer 54 enters the reflection surface of the X mirror 53.
Then, the X-wavelength beam 55 reflected by the reflection surface of the X mirror 53 interferes with a reference beam not shown in the figure in the X interferometer 54, and an X interference beam 56 is generated.
The X mirror 53 may be integrally formed with the X stage, and the X stage may have a reflection surface perpendicular to the X direction.
Next, the X interference beam 56 emitted from the X interferometer 54 enters the X optical pickup 57, and the X interference beam 56 is photoelectrically converted, thereby outputting an interference signal from the X optical pickup 57.
Then, the X detector 58 provided on the not-shown length measuring plate detects a phase difference between the interference signal and a reference signal from the laser head provided on the X interferometer 54.
This enables the output of the distance X in the X direction from the X interferometer 54 to the X mirror 53 0 That is, the position measurement value Δ m corresponding to the movement amount Δ X of the X stage in the X direction X 。
Further, the Y wavelength compensator 39 is closer to the optical path of the Y wavelength measuring beam 35 between the Y interferometer 34 and the Y mirror 33 than the X wavelength compensator 59.
The X-wavelength compensator 59 is closer to the optical path of the X-wavelength measurement beam 55 between the X interferometer 54 and the X mirror 53 than the Y-wavelength compensator 39.
Next, consideration is given to the position measurement value Δ m based on the wavelength correction amount Δ C acquired from the Y-wavelength compensator 39 Y Correction is made, and the position measurement value Δ m is corrected based on the wavelength correction amount Δ C acquired from the X-wavelength compensator 59 X And (6) carrying out correction processing.
In this case, the stage driving conditions for acquiring the wavelength correction amount Δ C are not limited to the respective driving of the X stage in the X direction and the driving of the Y stage in the Y direction, and it is necessary to pay attention to both the driving conditions.
For example, in the Y wavelength compensator 39, when the Y stage is driven in the Y direction as in the stage devices of the first and second embodiments, the atmospheric fluctuation caused by the driving affects the temporal change of the measurement value corresponding to the refractive index n of the atmosphere.
However, when the X stage is driven in the X direction and the Y stage is driven in the Y direction at the same time as in the stage apparatus 300 of the present embodiment, turbulence and the like are generated in the atmospheric region 404 of the Y wavelength compensator 39 due to atmospheric fluctuations caused by both the drives.
When such turbulence or the like occurs in the atmospheric region 404, a large error occurs in the wavelength correction amount Δ C, which is a measurement value corresponding to the refractive index n of the atmosphere.
Therefore, if it is desired to acquire the wavelength correction amount Δ C based on the value measured in the Y-wavelength compensator 39 and directly use the acquired wavelength correction amount Δ C to correct the position measurement value Δ m Y The calculated movement amount Δ Y of the Y stage has a large error.
In correcting the position measurement value Δ m by directly using the wavelength correction amount Δ C acquired in the X-wavelength compensator 59 X When the movement amount Δ X of the X stage is calculated, such a large error occurs similarly.
Therefore, in the mounting table apparatus 300 of the present embodiment, similarly to the mounting table apparatuses of the first and second embodiments, the table Δ C when the Y mounting table is driven in the Y direction is prepared in advance Y ' and Table Δ C when the X stage is driven in the X direction X ’。
When the X stage is driven in the X direction and the Y stage is driven in the Y direction, table Δ C is used Y ' and Δ C X ' calculating a movement amount Δ Y of the Y stage and a movement amount Δ X of the X stage.
Specifically, according to steps S301 to S306, the X-wavelength compensator 59 and the Y-wavelength compensatorThe wavelength compensator 39 creates a table Δ C when the X stage is step-driven in the X direction with the Y stage at rest (1 st driving condition) X (Table 1).
Further, according to steps S301 to S306, the X-wavelength compensator 59 and the Y-wavelength compensator 39 make a table Δ C when the Y stage is step-driven in the Y direction with the X stage stationary Y (1)。
In addition, according to steps S301 to S306, the X-wavelength compensator 59 and the Y-wavelength compensator 39 create a table Δ C when the Y stage is driven to scan in the Y direction (the 2 nd driving condition) with the X stage stationary Y (2) (Table 2).
In this manner, the tables Δ C acquired by the X-wavelength compensator 59 and the Y-wavelength compensator 39 under the plurality of stage driving conditions are respectively stored X 、ΔC Y (1) And Δ C Y (2) Is stored in the Y-wavelength correction unit 82 and the X-wavelength correction unit 83.
Then, for example, a stage driving condition in which the X stage is moved stepwise in the X direction and the Y stage is moved by scanning in the Y direction (scan movement) is considered.
In other words, a stage driving condition (predetermined driving condition) in which the stage 45 is driven in a direction (3 rd direction) not parallel to the X direction and the Y direction, respectively, in the XY section is considered.
In this case, first, when the movement amount Δ Y of the Y stage is calculated, the wavelength λ of the Y measuring beam 35 in the atmospheric region 404 is measured by the Y wavelength compensator 39 aY The wavelength correction amount deltac is obtained.
Next, by inputting the acquired wavelength correction amount Δ C to the high-frequency cut filter, noise that varies with time is removed from the acquired wavelength correction amount Δ C.
In other words, by inputting the acquired wavelength correction amount Δ C to the high-frequency cut filter, the component (3 rd component) in the 2 nd frequency region corresponding to the high-frequency region in the wavelength correction amount Δ C is removed.
Then, the wavelength correction amount Δ C from which the noise varying with time is removed is determined by Y when the X stage is stepped in the X directionTable Δ C obtained by wavelength compensator 39 X After multiplying by a predetermined coefficient, the difference is taken.
Thus, table Δ C under the above-mentioned stage driving conditions can be obtained Y ', determination and table Δ C Y ' corresponding wavelength λ of Y-side long beam 35 emitted from Y-interferometer 34 aY Time of change in time.
The predetermined coefficient used here is determined according to the degree of occurrence of atmospheric fluctuation in the atmospheric region 404 due to the step-by-step driving of the X stage in the X direction by the Y wavelength compensator 39.
That is, the drive conditions in the stepping drive of the X stage in the X direction including the speed and the magnitude of acceleration in the stepping drive of the X stage in the X direction, the drive curve, and the like are determined.
Then, a position measurement value Δ m of the Y interferometer 34 is acquired when both the X stage and the Y stage constituting the stage 45 are driven under the stage driving conditions Y 。
Then, by using the table Δ C obtained as described above Y To correct the acquired position measurement Δ m Y The movement amount Δ Y of the Y stage can be calculated.
Similarly, when the movement amount Δ X of the X stage is calculated, the wavelength λ of the X-wavelength beam 55 in the atmospheric region 404 is measured by the X-wavelength compensator 59 aX Thereby obtaining the wavelength correction amount deltac.
Next, by inputting the acquired wavelength correction amount Δ C to the high-frequency cut filter, noise that varies with time is removed from the acquired wavelength correction amount Δ C.
In other words, by inputting the acquired wavelength correction amount Δ C to the high-frequency cut filter, the component (5 th component) in the 2 nd frequency region corresponding to the high-frequency region in the wavelength correction amount Δ C is removed.
Then, as for the wavelength correction amount Δ C from which the noise varying with time is removed, the table Δ C acquired by the X-wavelength compensator 59 when the Y stage is scan-driven in the Y direction is used Y (2) Multiplying by a predetermined coefficient, takingAnd (4) poor.
Thus, table Δ C under the above-mentioned stage driving conditions can be obtained X ', determination and table Δ C X ' corresponding wavelength λ of X measured length beam 55 emitted from X interferometer 54 aX Time of change of (c).
The predetermined coefficient used here is determined according to the degree of occurrence of atmospheric fluctuation in the atmospheric region 404 due to the scanning drive of the Y stage in the Y direction by the X-wavelength compensator 59.
That is, the drive conditions for the scanning drive of the Y stage in the Y direction are determined based on, for example, the speed, the magnitude of acceleration, and the drive curve for the scanning drive of the Y stage in the Y direction.
Then, the position measurement value Δ m of the X interferometer 54 when both the X stage and the Y stage constituting the stage 45 are driven under the stage driving conditions described above is acquired X 。
Then, by using the table Δ C obtained as described above X To the acquired position measurement Δ m X The amount of movement Δ X of the X stage can be calculated by performing the correction.
As described above, in the mounting table device 300 of the present embodiment, the wavelength λ of the measurement beam indicating the atmospheric fluctuation in the atmospheric region where the measurement beam travels when the mounting table 45 is driven under the predetermined driving condition is previously prepared a I.e. a table of the temporal variation of the refractive index n of the atmosphere.
Then, by correcting the position measurement value of the interferometer when the stage is driven under the predetermined driving condition using the prepared table, the movement amount of the stage 45 can be accurately obtained.
In other words, the wavelength λ of the length measuring beam based on the change accompanying the atmospheric fluctuation in the atmospheric region generated when the stage 45 is driven a The position measurement value of the interferometer obtained when the stage 45 is driven is corrected. This enables the position of the mounting table 45 to be measured with high accuracy.
Specifically, the Y stage is moved in the Y direction while the X stage is stationaryTable Δ C during driving Y And a table Δ C when the X stage is driven in the X direction while the Y stage is stationary X 。
Then, when the drive of the X stage in the X direction and the drive of the Y stage in the Y direction are performed together, table Δ C is used Y And Δ C X The error included in the wavelength correction amount Δ C is removed, and the movement amount Δ Y of the Y stage and the movement amount Δ X of the X stage are calculated.
Accordingly, even when the X stage is driven in the X direction and the Y stage is driven in the Y direction, the positions of the X stage and the Y stage constituting the stage 45 can be measured with high accuracy.
[ fourth embodiment ]
Fig. 7 is a flowchart showing a process of the stage apparatus 1 including the stage apparatus according to the fourth embodiment when performing exposure.
Since the mounting table apparatus of the present embodiment has the same configuration as that of the mounting table apparatus of any one of the first to third embodiments, the same members are denoted by the same reference numerals and the description thereof is omitted.
In a typical production line, a plurality of wafers 40 each coated with a resist, which form a predetermined lot, are sequentially sent to the exposure apparatus 1 by an unillustrated in-line conveyance device, and a large number of wafer exposure processes of the same process are performed in a lot-by-lot basis by the exposure apparatus 1.
As shown in fig. 7, in the exposure apparatus 1 including the stage apparatus of the present embodiment, when a predetermined wafer 40 is loaded onto the wafer stage 45 (step S1001), it is determined whether or not the loaded wafer 40 is the top wafer of a predetermined lot (step S1002).
If the wafer 40 to be loaded is the top wafer of the predetermined lot (Yes in step S1002), the wafer 40 is subjected to the alignment process including the alignment offset and the focus offset.
In recent years, in the alignment process for the top wafer 40 of a lot, the entire shot area of the wafer 40 tends to be measured in order to achieve high overlay accuracy and exposure focus accuracy for all the wafers 40 constituting the lot.
During the calibration process, as in the stage apparatus according to any one of the first to third embodiments, a table for correcting the measurement values of the interferometer is created based on the stage driving conditions when the wafers 40 constituting the lot are exposed to light.
Then, the created table is stored (step S1003), and the process proceeds to step S1004.
On the other hand, if the wafer 40 to be loaded is not the top wafer of the predetermined lot (No in step S1002), the process proceeds to step S1004 without executing step S1003.
Next, the exposure position is adjusted (corrected) with high accuracy by performing alignment measurement on the carried-in wafer 40 (step S1004).
At this time, as in the mounting table device according to any one of the first to third embodiments, the movement amounts of the X mounting table and the Y mounting table are calculated with high accuracy by correcting the measurement value of the interferometer using the table and the measurement value of the wavelength compensator created in step S1003.
Then, the wafer 40 after the alignment process is scanned in synchronization with the reticle 20, and the circuit pattern formed on the reticle 20 is transferred to the wafer 40 by exposing each of the shot areas (step S1005).
At this time, the measurement value of the interferometer is corrected using the table and the measurement value of the wavelength compensator corresponding to the stage driving condition including the position of the irradiation region to be exposed, the driving curve of the stage at the time of exposure, and the like.
Then, after all the shot areas in the wafer 40 are exposed, the wafer 40 is sent out of the exposure apparatus 1 (step S1006).
Here, the exposed wafer 40 is generally conveyed to the development processing apparatus by an in-line conveying apparatus.
Next, it is determined whether or not all the wafers 40 of the lot have been exposed (step S1007).
When all the wafers 40 of the lot are exposed (Yes in step S1007), the process is terminated.
On the other hand, if all the wafers 40 of the lot are not exposed (No in step S1007), the process returns to step S1001, and the exposure processing is sequentially performed on the remaining wafers 40 of the lot.
As described above, in the stage device of the present embodiment, the wavelength λ of the measurement light beam indicating the atmospheric fluctuation in the atmospheric region where the measurement light beam travels when the stage is driven under the predetermined driving conditions is previously created a I.e. a table of the temporal variation of the refractive index n of the atmosphere.
Then, by correcting the position measurement value of the interferometer when the stage is driven under the predetermined driving condition using the prepared table, the movement amount of the stage can be accurately obtained.
This enables the position of the mounting table to be measured with high accuracy.
The stage apparatus according to the present embodiment is configured to perform the table preparation process and the alignment process including the alignment offset and the focus offset with respect to the top wafer 40 of the lot in the exposure apparatus 1.
This can improve the throughput when performing the exposure process on each wafer 40 of the lot.
[ method for producing an article ]
Next, a method for manufacturing an article according to the present embodiment will be described.
The method for manufacturing articles such as semiconductor IC devices, liquid crystal display devices, and MEMS includes a step of exposing a substrate such as a wafer or a glass substrate coated with a photosensitive agent by using an exposure apparatus 1 including the stage apparatus according to any one of the first to fourth embodiments.
The above method includes a step of developing the substrate (photosensitive agent) after exposure and other known steps of processing the substrate after development.
Other known processes described herein include etching, stripping of a photosensitive agent, dicing, bonding, and packaging.
According to the method for manufacturing an article of the present embodiment, an article having a higher quality than conventional articles can be manufactured.
While the preferred embodiments have been described above, the present invention is not limited to these embodiments, and various modifications and changes can be made within the scope of the gist thereof.

Claims (22)

1. A mounting table device is characterized by comprising:
a mounting table having a 1 st reflecting surface perpendicular to a 1 st direction and configured to be drivable in the 1 st direction;
a 1 st measuring unit configured to measure a position of the stage in the 1 st direction by emitting a 1 st measuring beam toward the 1 st reflecting surface and receiving the 1 st measuring beam reflected by the 1 st reflecting surface;
a 2 nd measuring unit for measuring a wavelength of a 2 nd measuring light propagating through the 1 st atmospheric region; and
and a control unit configured to correct a measurement result of the 1 st measurement unit based on a wavelength of the 2 nd measurement light that changes with atmospheric fluctuation in the 1 st atmospheric region generated when the stage is driven in the 1 st direction.
2. The table apparatus of claim 1,
the control unit corrects the measurement result of the 1 st measurement unit based on a 1 st table, the 1 st table indicating a temporal change in the wavelength of the 2 nd measurement light with atmospheric fluctuation in the 1 st atmospheric region generated when the stage is driven in the 1 st direction under a predetermined driving condition.
3. The table apparatus of claim 2,
the control unit measures a temporal change in the wavelength of the 2 nd measuring light by the 2 nd measuring unit while driving the mounting table in the 1 st direction under the predetermined driving condition,
acquiring a 1 st component in a 1 st frequency region by inputting the measured temporal change of the wavelength of the 2 nd measurement light to a low-pass filter,
determining a time change of the wavelength of the 1 st measuring light under the predetermined driving condition by adding the 1 st table to the obtained 1 st component,
the measurement result of the 1 st measurement unit is corrected based on the determined temporal change in the wavelength of the 1 st measurement light.
4. The table apparatus of claim 3, comprising:
a 3 rd measuring unit for measuring the temperature, humidity and air pressure of the space in which the mounting table device is installed,
the control part
Determining an initial value of the refractive index of the atmosphere in the 1 st atmosphere region based on the measurement result of the 3 rd measurement unit,
measuring a temporal change in a wavelength of the 2 nd measuring light by the 2 nd measuring unit while driving the stage in the 1 st direction under the predetermined driving condition,
acquiring the 1 st component in the 1 st frequency region and the 2 nd component in the 2 nd frequency region by inputting the measured temporal change of the wavelength of the 2 nd measuring light to a low-pass filter and a high-frequency cut-off filter, respectively,
the 1 st table is created by removing the 1 st component and the 2 nd component from the measured temporal change in the wavelength of the 2 nd measuring light.
5. The table apparatus of claim 2,
the control part
Measuring a temporal change in a wavelength of the 2 nd measuring light by the 2 nd measuring unit while driving the stage in the 1 st direction under the predetermined driving condition,
acquiring a 1 st component in a 1 st frequency region by inputting the measured temporal change of the wavelength of the 2 nd measurement light to a low-pass filter,
determining a temporal change in the wavelength of the 1 st measuring light under the predetermined driving condition by adding an approximation function obtained from the 1 st table to the obtained 1 st component,
the measurement result of the 1 st measurement unit is corrected based on the determined temporal change in the wavelength of the 1 st measurement light.
6. The table apparatus of claim 5, comprising:
a 3 rd measuring unit for measuring the temperature, humidity and air pressure of the space in which the mounting table device is installed,
the control part
Determining an initial value of the refractive index of the atmosphere in the 1 st atmosphere region based on the measurement result of the 3 rd measurement portion,
measuring a temporal change in a wavelength of the 2 nd measuring light by the 2 nd measuring unit while driving the stage in the 1 st direction under the predetermined driving condition,
acquiring the 1 st component in the 1 st frequency region and the 2 nd component in the 2 nd frequency region by inputting the measured temporal change of the wavelength of the 2 nd measuring light to a low-pass filter and a high-frequency cut-off filter, respectively,
creating the 1 st table by removing the 1 st component and the 2 nd component from the measured temporal change in the wavelength of the 2 nd measuring light,
the approximation function is obtained by fitting the fabricated table 1.
7. A mounting table device is characterized by comprising:
a mounting table having a 1 st reflecting surface perpendicular to a 1 st direction and configured to be capable of being driven in a 1 st cross section parallel to the 1 st direction and a 2 nd direction perpendicular to the 1 st direction;
a 1 st measuring unit configured to measure a position of the stage in the 1 st direction by receiving the 1 st measuring beam reflected by the 1 st reflecting surface after the 1 st measuring beam is emitted toward the 1 st reflecting surface;
a 2 nd measuring unit for measuring a wavelength of a 2 nd measuring light propagating through the 1 st atmospheric region; and
a control unit that corrects a measurement result of the 1 st measurement unit obtained when the stage is driven in the 1 st cross section in the 3 rd direction that is not parallel to the 1 st direction and the 2 nd direction, respectively, based on a wavelength of the 2 nd measurement light that varies with atmospheric fluctuation in the 1 st atmospheric region that occurs when the stage is driven in the 2 nd direction.
8. The table apparatus of claim 7,
the control unit corrects a measurement result of the 1 st measurement unit obtained when the stage is driven in the 3 rd direction under a predetermined driving condition based on a 1 st table, the 1 st table indicating a temporal change in wavelength of the 2 nd measurement light according to an atmospheric fluctuation in the 1 st atmospheric region generated when the stage is driven in the 2 nd direction under the 1 st driving condition.
9. The table apparatus of claim 8,
the control part
Measuring a temporal change in a wavelength of the 2 nd measuring light by the 2 nd measuring unit while driving the stage in the 3 rd direction under the predetermined driving condition,
acquiring a 3 rd component in a 2 nd frequency region by inputting the measured temporal change of the wavelength of the 2 nd measuring light to a high-frequency cut filter,
determining a temporal change in the wavelength of the 1 st measurement light under the predetermined driving condition by subtracting the 3 rd component from the 1 st table multiplied by a predetermined coefficient with respect to the measured temporal change in the wavelength of the 2 nd measurement light,
the measurement result of the 1 st measurement unit is corrected based on the determined temporal change in the wavelength of the 1 st measurement light.
10. The table apparatus of claim 9, comprising:
a 3 rd measuring part for measuring the temperature, humidity and air pressure of the space provided with the placing table device,
the control part
Determining an initial value of the refractive index of the atmosphere in the 1 st atmosphere region based on the measurement result of the 3 rd measurement portion,
measuring a temporal change in a wavelength of the 2 nd measuring light by the 2 nd measuring unit while driving the stage in the 2 nd direction under the 1 st driving condition,
acquiring a 4 th component in a 1 st frequency region and the 3 rd component in the 2 nd frequency region by inputting the measured temporal change of the wavelength of the 2 nd measuring light to a low-pass filter and a high-frequency cut-off filter, respectively,
the 1 st table is created by removing the 3 rd component and the 4 th component from the measured time change of the wavelength of the 2 nd measurement light.
11. The table apparatus of claim 8,
the mounting table has a 2 nd reflecting surface perpendicular to the 2 nd direction,
the mounting table device includes:
a 4 th measuring unit configured to measure a position of the stage in the 2 nd direction by emitting a 3 rd measuring beam toward the 2 nd reflecting surface and then receiving the 3 rd measuring beam reflected by the 2 nd reflecting surface; and
a 5 th measuring section for measuring a wavelength of a 4 th measuring light propagating through the 2 nd atmosphere region,
the control unit corrects the measurement result of the 4 th measurement unit obtained when the stage is driven in the 3 rd direction under the predetermined driving condition based on a 2 nd table, the 2 nd table indicating a temporal change in the wavelength of the 4 th measurement light accompanying atmospheric fluctuation in the 2 nd atmospheric region generated when the stage is driven in the 1 st direction under the 2 nd driving condition.
12. The table apparatus of claim 11,
the control part
Measuring a temporal change in a wavelength of the 4 th measuring beam by the 5 th measuring unit while driving the mounting table in the 3 rd direction under the predetermined driving condition,
acquiring a 5 th component in a 2 nd frequency region by inputting the measured temporal change of the wavelength of the 4 th measurement light to a high-frequency cutoff filter,
determining a temporal change in the wavelength of the 3 rd measuring light under the predetermined driving condition by subtracting the 5 th component from the 2 nd table multiplied by a predetermined coefficient with respect to the measured temporal change in the wavelength of the 4 th measuring light,
and correcting the measurement result of the 4 th measuring unit based on the determined temporal change in the wavelength of the 3 rd measuring light.
13. The mounting table apparatus according to claim 12, comprising:
a 3 rd measuring part for measuring the temperature, humidity and air pressure of the space provided with the placing table device,
the control part
Determining an initial value of the refractive index of the atmosphere in the 2 nd atmosphere region based on the measurement result of the 3 rd measurement portion,
measuring a temporal change in a wavelength of the 4 th measuring light by the 5 th measuring unit while driving the mounting table in the 1 st direction under the 2 nd driving condition,
acquiring a 6 th component in a 1 st frequency region and the 5 th component in the 2 nd frequency region by inputting the measured temporal change of the wavelength of the 4 th measurement light to a low-pass filter and a high-frequency cut-off filter, respectively,
the table 2 is created by removing the 5 th component and the 6 th component from the measured time change of the wavelength of the 4 th measurement light.
14. The table apparatus of claim 11,
the 1 st atmosphere region is closer to the optical path of the 1 st measuring light than the 2 nd atmosphere region,
the 2 nd atmosphere region is closer to the optical path of the 3 rd measuring light than the 1 st atmosphere region.
15. The table apparatus of claim 1,
the 1 st measuring unit is an interferometer that measures a distance between the 1 st measuring unit and the 1 st reflecting surface based on interference between the 1 st measuring light reflected by the 1 st reflecting surface and a reference light.
16. The table apparatus of claim 1,
the 2 nd measurement unit is a wavelength compensator that measures a wavelength of the 2 nd measurement light by comparing a measurement result for a predetermined object obtained based on the 2 nd measurement light propagating through the 1 st atmospheric region and a measurement result for the predetermined object obtained based on the 5 th measurement light propagating through the vacuum region with each other.
17. The table apparatus of claim 1,
the mounting table includes: a 1 st stage driven in the 1 st direction, and a 2 nd stage driven in a 2 nd direction perpendicular to the 1 st direction.
18. An exposure apparatus for exposing a substrate to light so as to transfer a pattern formed on an original plate to the substrate,
the disclosed device is provided with: the mounting table apparatus according to any one of claims 1 to 17, which drives a substrate mounting table on which the substrate is mounted.
19. The exposure apparatus according to claim 18,
the substrate stage performs a scanning movement in the 1 st direction and a stepping movement in the 2 nd direction perpendicular to the 1 st direction when exposing the substrate.
20. The exposure apparatus according to claim 18,
the control unit creates a 1 st table showing a temporal change in wavelength of the 2 nd measuring light when performing a calibration process on the first substrate of a predetermined lot placed on the substrate placing table.
21. A method for manufacturing an article, comprising the steps of:
exposing the substrate using the exposure apparatus according to claim 18;
developing the exposed substrate; and
fabricating an article from the developed substrate.
22. A method of controlling a drive of a mounting table using a mounting table apparatus, the mounting table apparatus comprising: the mounting table has a 1 st reflecting surface perpendicular to a 1 st direction, and is configured to be capable of being driven in the 1 st direction; a 1 st measuring unit configured to measure a position of the stage in the 1 st direction by receiving the 1 st measuring beam reflected by the 1 st reflecting surface after the 1 st measuring beam is emitted toward the 1 st reflecting surface; and a 2 nd measuring section for measuring a wavelength of the 2 nd measuring light propagating through the 1 st atmospheric region,
wherein the method comprises the following steps: the measurement result of the 1 st measurement unit is corrected based on the wavelength of the 2 nd measurement light that varies with atmospheric fluctuation in the 1 st atmospheric region that occurs when the stage is driven in the 1 st direction.
CN202210626974.5A 2021-06-09 2022-06-06 Stage apparatus, exposure apparatus, and method of manufacturing article Pending CN115453824A (en)

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