KR20220166186A - Stage device, exposure apparatus, and article manufacturing method - Google Patents

Abstract

The present invention is to provide a stage device capable of highly accurately measuring a position of a stage. A stage device according to the present invention includes: a stage having a first reflection surface perpendicular in a first direction, and configured so as to be driven in the first direction; a first measurement part for measuring a position of the stage in the first direction by emitting first measurement light to the first reflection surface followed by receiving the first measurement light reflected by the first reflection surface; a second measurement part for measuring a wavelength of second measurement light propagating in a first atmospheric area; and a control part for correcting a measurement result of the first measurement part based on the wavelength of the second measurement light changing in accordance with atmospheric fluctuation in the first atmospheric area, generated when the stage is driven along the first direction.

Description

Stage apparatus, exposure apparatus, and manufacturing method of articles

The present invention relates to a stage device, an exposure device, and a method for manufacturing an article.

BACKGROUND ART Conventionally, there is known a stage device equipped with an interferometer that measures the position of a stage by emitting measurement light toward a reflective surface provided on a stage and then receiving the measurement light reflected by the reflective surface.

At this time, when the refractive index of the air in the space fluctuates according to changes in the environment of the space where the measurement light travels between the interferometer and the reflective surface, that is, temperature, humidity, atmospheric pressure, etc., the wavelength of the measurement light changes. An error occurs in the measured value of the position of

Patent Literature 1 corrects the wavelength of the measurement light and, consequently, the measured value of the position of the stage by detecting a change in the refractive index of the air in the space by making the correction light also propagate in the space where the measurement light by the interferometer travels. A stage device capable of doing this is disclosed.

Japanese Unexamined Patent Publication No. 2003-65712

For example, in order to realize high productivity, a substrate stage installed in an exposure apparatus may perform both step driving and scan driving in each of two mutually perpendicular directions.

Therefore, in the space around the substrate stage, atmospheric fluctuations in each of the two directions occur simultaneously.

On the other hand, in the stage device disclosed in Patent Literature 1, by the correction light traveling in a space, changes in the environment including temperature, humidity, and atmospheric pressure in the space, and in a direction parallel to the traveling direction of the correction light It is possible to measure the change in the refractive index of the atmosphere according to the atmospheric fluctuations in the air.

Therefore, when attempting to measure the position of such a substrate stage using the stage apparatus, fluctuations in the atmosphere in the direction perpendicular to the traveling direction of the correction light also occur in the space, causing errors in the measured refractive index fluctuations of the atmosphere. will be included

Then, when the change in the refractive index of the air in the space obtained by the correction light is used as it is for correcting the wavelength of the measurement light in the interferometer when the stage moves in two directions perpendicular to each other, the interferometer An error is also included in the measured position value of the stage.

Therefore, an object of the present invention is to provide a stage device capable of measuring the position of a stage with high accuracy.

A stage apparatus according to the present invention includes a stage having a first reflecting surface perpendicular to a first direction and configured to be drivable in the first direction, and a first measurement beam directed toward the first reflecting surface. A first measurement unit that measures the position of the stage in the first direction by receiving the first measurement light reflected by the first reflective surface after emitting the light, and a first measurement light that propagates to the first standby area Based on the second measurement unit for measuring the wavelength of the measurement light of 2, and the wavelength of the second measurement light that changes according to atmospheric fluctuations in the first waiting area generated when the stage is driven along the first direction, It is characterized by comprising a control unit for correcting the measurement result of the first measurement unit.

ADVANTAGE OF THE INVENTION According to this invention, the stage apparatus which can measure the position of a stage with high precision can be provided.

[Fig. 1] A schematic XZ cross-sectional projection view of an exposure apparatus including a stage apparatus according to the present embodiment.
[Fig. 2] A schematic diagram of a stage device according to the first embodiment and a schematic diagram for explaining the configuration of a wavelength compensator.
[Fig. 3] A diagram showing the temporal change of measured values acquired by the wavelength compensator.
[Fig. 4] A flowchart showing a process of creating a table and a process of calculating a movement amount of a stage in the stage apparatus according to the first embodiment.
[Fig. 5] A flowchart showing a process of creating a table and a flowchart showing a process of calculating a movement amount of a stage in the stage device according to the second embodiment.
[Fig. 6] A schematic configuration diagram of a stage device according to a third embodiment.
[Fig. 7] A flowchart showing exposure processing in an exposure apparatus including a stage apparatus according to a fourth embodiment.

A stage device according to the present embodiment will be described in detail below with reference to the accompanying drawings. In addition, the drawings shown below are drawn on a scale different from the actual one in order to make the present embodiment easily understandable.

In addition, the embodiment described below is an example as a realization means of the present embodiment, and should be appropriately modified or changed depending on the configuration of the device to which the present embodiment is applied and various conditions.

In the following description, the Z direction is the direction perpendicular to the substrate loading surface of the substrate stage, and the X direction (second direction) and Y are the two directions orthogonal to each other in the cross section (first cross section) parallel to the substrate loading surface. It is called the direction (first direction).

[First Embodiment]

A position measuring device using an interferometer is widely used in fields requiring high-precision positioning control.

In such a position measurement device, the interferometer measures position based on the wavelength of the laser, but if the wavelength of the laser, that is, the measurement beam, changes due to the change in the refractive index of the atmosphere depending on the temperature, humidity, and atmospheric pressure in the position measurement space, the measurement target An error occurs in the measured value of the position of

In order to reduce such an error, it is necessary to correct the measured position value based on the change in the wavelength of the laser.

As a method of correcting the measured position value in an interferometer, there is, for example, the following method.

That is, a sensor for detecting at least one of the environment of the position measurement space, that is, temperature, humidity, and air pressure is provided, and a change in refractive index of the air in the position measurement space is calculated from a value detected by the sensor.

Then, the measured position value can be corrected from the calculated change in the refractive index of the atmosphere.

In addition, by measuring the same object after the lengthening beam is advanced in each of the vacuum space and the atmospheric space, by calculating the wavelength of the lengthening beam in each of the vacuum space and the atmospheric space, the change in the refractive index of the atmosphere in the atmospheric space save

In addition, there is also a method of correcting the measured position value by an interferometer based on the obtained change in the refractive index of the air.

A measuring device that obtains the change in the refractive index of the air in the air space from the difference in the wavelength of the lengthening beam in each of the vacuum space and the air space is called a wavelength compensator or a wavelength tracker.

As described above, the wavelength of the lengthening beam emitted from the interferometer and traveling through the position measurement space is determined by changes in the environment including temperature, humidity, and air pressure in the position measurement space, and atmospheric conditions generated by the movement of the measurement target. It changes with time according to the fluctuation of the refractive index of the atmosphere according to the fluctuation.

And, the wavelength compensator can measure the change in the refractive index of the air due to the change in the environment in the air space and the atmospheric fluctuations caused by the movement of the measurement target in a direction parallel to the traveling direction of the measurement beam. there is.

On the other hand, in some cases, for example, a substrate stage installed in an exposure apparatus performs both step driving and scan driving in two mutually perpendicular directions in order to realize high productivity.

Therefore, in the space around the substrate stage, atmospheric fluctuations in each of the two directions occur simultaneously.

Therefore, when the substrate stage is driven in this way, atmospheric fluctuations also occur in the direction perpendicular to the traveling direction of the lengthening beam in the atmospheric space within the wavelength compensator, thereby reducing the variation of the refractive index of the atmospheric air in the atmospheric space to be measured. errors will be included.

Then, when the change in the refractive index of the atmosphere obtained by the wavelength compensator is used as it is to correct the time change of the wavelength of the measurement light in the interferometer when the stage is moved in two directions perpendicular to each other, the interferometer Errors are also included in the measured value of the position of the stage.

In recent years, in order to further improve productivity in exposure equipment, since the substrate stage and the original stage have been driven at high speed and high acceleration, atmospheric fluctuations in the position measurement space become large, and the above error also increases. .

So, in this embodiment, it aims at providing the stage apparatus which can correct|amend the position measurement value of a stage with high precision.

Fig. 1 shows a schematic projection view in XZ section of an exposure apparatus 1 provided with a stage apparatus according to the present embodiment.

As shown in Fig. 1, an exposure apparatus 1 projects a pattern formed on a reticle 20 (original plate) onto a wafer 40 (substrate) by a step-and-scan method. It is suitable for sub-micron or quarter-micron lithography processes.

The exposure apparatus 1 includes an illumination apparatus 10, a reticle stage 25, a projection optical system 30, a wafer stage 45, a control system 60, an alignment detection system 70, and a focus tilt detection system 150. is provided.

In addition, the exposure apparatus 1 also includes an interferometer system for detecting the position of each of the reticle stage 25 and the wafer stage 45 in the XY plane (see Fig. 2).

That is, the stage device according to this embodiment is composed of the reticle stage 25 or the wafer stage 45 and the interferometer system.

The lighting device 10 is composed of a light source unit 12 and an illumination optical system 14, and illuminates the reticle 20 on which a pattern to be transferred to the wafer 40 is formed.

The light source unit 12 is configured to emit laser light, and a light source such as a KRF excimer laser with a wavelength of about 248 nm or an ARF excimer laser with a wavelength of about 193 nm can be used, for example.

Incidentally, the light source used in the light source unit 12 is not limited to the excimer laser as described above, and a F2 laser with a wavelength of about 157 nm or an EVT light with a wavelength of 20 nm or less may be used.

The illumination optical system 14 is an optical system that guides the light flux emitted from the light source unit 12 to the reticle 20, and specifically, forms the light flux emitted from the light source unit 12 into a light flux having a slit shape optimal for exposure. After that, light is guided to the reticle 20 .

The illumination optical system 14 is composed of a lens, a mirror, an optical integrator, a diaphragm, and the like.

Specifically, in the illumination optical system 14, for example, a condenser lens, a fly-eye lens, an aperture stop, a condenser lens, a slit, and an imaging optical system are arranged sequentially from the light source unit 12 side to the reticle stage 25 side. there is.

The illumination optical system 14 can guide the luminous flux emitted from the light source unit 12 to the reticle 20 regardless of the axial luminous flux and the off-axial luminous flux.

Further, the optical integrator used in the illumination optical system 14 includes a fly-eye lens or an integrator formed by stacking two sets of cylindrical lens array (or lenticular lens) plates.

However, it is not limited to this, and an optical rod or a diffraction element can also be used as an optical integrator.

The reticle stage 25 is configured to hold the reticle 20 via a reticle chuck (not shown), and is connected to a moving mechanism composed of a linear motor (not shown) or the like.

Accordingly, by drive-controlling the reticle stage 25 in rotational directions around the X-axis, Y-axis, and Z-axis in addition to the translational direction parallel to the X-axis, Y-axis, and Z-axis, the reticle 20 and the reticle chuck are moved. It can be moved in the corresponding translational direction and in the corresponding rotational direction.

The projection optical system 30 has a function of condensing the light flux from the object plane onto the image plane, that is, condensing the diffracted light diffracted by the pattern formed on the reticle 20 onto the wafer 40. do.

The wafer stage 45 is configured to hold the wafer 40 by means of a wafer chuck 46 and is connected to a moving mechanism including a linear motor (not shown).

Accordingly, the wafer 40 and the wafer chuck ( 46) can be moved in the corresponding translational direction and in the corresponding rotational direction.

In addition, the reticle stage 25 and the wafer stage 45 are each driven at a predetermined speed ratio to each other, and their respective positions are measured by an interferometer to be described later.

In addition, the reticle stage 25 and the projection optical system 30 are installed on a lens barrel pedestal (not shown) supported via a damper on a base frame mounted on a floor or the like, for example.

The wafer stage 45 is installed on a stage table (not shown) supported on a floor or the like via a damper having a damping function, for example.

The focus tilt detection system 150 is composed of a light projecting unit 152 and a light receiving unit 154. Then, the luminous flux emitted from the light projecting unit 152 is reflected by the wafer 40 and then received by the light receiving unit 154, so that the focus of the projection optical system 30 with respect to the wafer 40 or the image of the wafer 40 Tilt can be detected.

The control system 60 is composed of a CPU, a memory, and the like, and electrically controls the lighting device 10, the reticle stage 25, the wafer stage 45, the alignment detection system 70, and the focus tilt detection system 150. By being connected to, the operation of the entire exposure apparatus 1 is collectively controlled.

The alignment detection system 70 detects the positional displacement of the wafer 40 in directions parallel to the X axis and the Y axis, and shifts the optical axis from the optical axis of the projection optical system 30 in the XY plane. Consists of.

That is, the alignment detection system 70 is a so-called off-axis optical system that uses non-exposure light.

The reticle 20 used in the exposure apparatus 1 is made of, for example, quartz, and a circuit pattern to be transferred to the wafer 40 is formed on the reticle 20 .

Then, the reticle 20 is held by the reticle stage 25 and moves when the reticle stage 25 is driven.

The wafer 40 is, for example, an object to be processed on which a photoresist is coated on a silicon substrate. In addition, the wafer 40 is also an object to be detected for position detection by the alignment detection system 70 and the focus tilt detection system 150 .

As described above, in the exposure apparatus 1, the exposure light emitted from the light source unit 12 is guided to the reticle 20 by the illumination optical system 14.

Then, the diffracted light diffracted by the pattern formed on the reticle 20 is guided onto the wafer 40 by the projection optical system 30, and the pattern is projected (transferred) onto the wafer 40.

Here, in the exposure apparatus 1, the reticle stage 25 and the wafer stage 45 are arranged so that the reticle 20 and the wafer 40 are optically conjugate with respect to the projection optical system 30.

Then, the pattern formed on the reticle 20 is transferred onto the wafer 40 by scanning the reticle stage 25 and the wafer stage 45 at a speed ratio corresponding to the reduction ratio of the pattern.

In the above, the exposure apparatus 1 employing the step-and-scan method has been described, but the stage apparatus according to the present embodiment described in detail below is also applicable to the exposure apparatus of the step-and-repeat method. can do.

Next, a stage device according to the present embodiment will be described.

Fig. 2(a) shows a schematic configuration diagram of the stage apparatus 100 according to the present embodiment.

The stage device 100 according to the present embodiment includes a Y mirror 33, a Y interferometer 34 (first measurement unit), a Y light pickup 37, a Y detection unit 38, and a Y wavelength compensator ( 39) (second measuring unit).

Further, the stage device 100 according to the present embodiment includes a Y stage 41 (stage, first stage), an X stage 42 (second stage), and a control unit. In addition, the control unit has a signal processing unit 61, a sequence control unit 81 and a Y wavelength correction unit 82.

As shown in FIG. 2(a), the stage 45, which is, for example, the wafer stage 45, has a Y stage 41 and an X stage 42, specifically, the Y stage 41 ), the X stage 42 is arranged.

Further, since the Y stage 41 is configured to be drivable in the Y direction and the X stage 42 is configured to be drivable in the X direction, the stage 45 is capable of being driven in the X-Y cross section. Consists of.

Further, the Y mirror 33 is disposed on the Y stage 41 and has a reflective surface perpendicular to the Y direction (first reflective surface). The Y-length beam 35 (first measurement light) emitted from the Y interferometer 34 is incident on the reflection surface of the Y mirror 33.

Then, the Y-length beam 35 reflected by the reflective surface of the Y mirror 33 interferes with a reference beam (reference light) not shown in the Y interferometer 34, thereby generating a Y interference beam 36. .

Further, the Y mirror 33 may be configured integrally with the Y stage 41 so that the Y stage 41 has a reflection surface perpendicular to the Y direction.

Then, the Y interference beam 36 emitted from the Y interferometer 34 is incident on the Y optical pickup 37 and the Y interference beam 36 is photoelectrically converted, resulting in an interference signal from the Y optical pickup 37. is output.

Then, a Y detector 38 installed on a measurement board (not shown) detects a phase difference between the interference signal and a reference signal from a laser head installed on the Y interferometer 34.

Accordingly, the distance Y ₀ between the Y interferometer 34 and the Y mirror 33 in the Y direction, that is, the measured position value Δm _Y corresponding to the movement amount ΔY of the Y stage 41 in the Y direction, is can be printed out.

Here, the wavelength of the Y length beam 35 emitted from the Y interferometer 34 is the position measurement space, that is, the environment of the space between the Y interferometer 34 and the Y mirror 33, specifically the temperature, It fluctuates according to changes in humidity and atmospheric pressure.

Therefore, in the measured position value Δm _Y output from the Y detection unit 38, an error occurs depending on the change in the wavelength of the Y-length beam 35.

Therefore, in the stage device 100 according to the present embodiment, a Y wavelength compensator 39 is provided to correct the wavelength of the Y side long beam 35 so as to correct the error of the measured position value Δm _Y. there is.

Fig. 2(b) shows a schematic diagram for explaining the configuration of the Y wavelength compensator 39.

As shown in Fig. 2(b), in the Y-wave compensator 39, an interferometer 401 and a mirror 402 are provided.

Further, between the interferometer 401 and the mirror 402, a vacuum region 403 and a standby region 404 (first standby region and second standby region) are perpendicular to the traveling direction of the length beam. They are installed so that they stand side by side in one direction.

In the Y-wave compensator 39, the length beam emitted from the interferometer 401 and reflected by the mirror 402 interferes with a reference beam (not shown), thereby forming a vacuum region 403 and a standby region 404. ), the wavelengths λ _v and λ _a of the side length beam in each are measured.

At this time, the difference between the wavelength λ _v in the vacuum region 403 and the wavelength λ _a in the standby region 404 of the measuring beam (second measurement light, fourth measurement light, and fifth measurement light) The relationship can be expressed as Equation (1) below by the refractive index n of the atmosphere in the waiting area 404.

λ _a =λ _v /n ...(1)

In other words, in the Y wavelength compensator 39, the measurement result for the mirror 402 (predetermined object) by the lengthwise beam propagating through the standby area 404 and the lengthened beam propagating through the vacuum area 403 Measurement results for the mirror 402 by the above are compared with each other.

Accordingly, the refractive index n of the atmosphere in the standby area 404 can be measured by acquiring the wavelength λ _a of the side length beam in the standby area 404 .

Then, in the stage device 100 according to the present embodiment, the Y-length beam 35 emitted from the Y interferometer 34 is calculated by using the refractive index n of the atmosphere obtained by the Y wavelength compensator 39. It is possible to correct the fluctuation of the wavelength and, consequently, the error of the measured position value Δm _Y.

Specifically, the wavelength correction amount ΔC corresponding to the change in the refractive index n of the atmosphere obtained when the Y stage 41 is moved in the Y direction according to each of the plurality of stage driving conditions is calculated from the Y wavelength compensator 39 as Y It is input to the wavelength correction unit 82.

Then, the Y wavelength correction unit 82 creates a table ΔC _Y ' (first table) for each stage driving condition from the input wavelength correction amount ΔC for various stage driving conditions, and stores it. are doing

In other words, in the stage device 100 according to the present embodiment, the sequence control unit 81 adjusts the driving conditions to the Y-wavelength correction unit according to the driving conditions of the Y stage 41 when the measured position value Δm _Y is obtained. Send to (82).

Then, the Y wavelength correction unit 82 outputs a table ΔC _Y ' corresponding to the driving condition to the signal processing unit 61 based on the received driving condition.

Further, the stage driving conditions referred to here include setting conditions such as type of driving such as step driving or scan driving, magnitude of speed or acceleration, and driving profile.

Accordingly, the signal processing unit 61 corrects the position measurement value Δm _Y by the Y interferometer 34 using the table ΔC _Y ' by the Y wavelength compensator 39, thereby correcting the Y-direction of the Y stage 41. The movement amount ΔY in can be output.

In addition, the refractive index n of the atmosphere in the waiting area 404 of the Y wavelength compensator 39, that is, in the space between the Y interferometer 34 and the Y mirror 33, is expressed by the following equation (2) It can be expressed by the empirical formula of Edren.

[number 1]

...(2)

...(2)

In other words, if at least one of the temperature T, humidity H, and atmospheric pressure P changes with time t in the space between the Y interferometer 34 and the Y mirror 33, the refractive index n of the atmosphere in the space, The wavelength of the Y-length beam 35 emitted from the Y interferometer 34 changes with time.

Next, in the stage apparatus 100 according to the present embodiment, the position measurement value Δm _Y of the temporal change of the refractive index n of the atmosphere in the space between the Y interferometer 34 and the Y mirror 33 is A method for correcting the influence is explained.

Specifically, for the position measurement value Δm _Y of the temporal change of the refractive index n of the atmosphere in the space between the Y interferometer 34 and the Y mirror 33 when the Y stage 41 moves in the Y direction In order to correct the influence, a method for obtaining a table ΔC _Y ' by the Y wavelength correction unit 82 will be described.

As described above, the refractive index n of the air in the standby area 404 measured by the Y wavelength compensator 39 is the ratio of the temperature T, humidity H, and atmospheric pressure P of the air in the standby area 404. Depending on the time change, the time is changed according to Equation (2).

In addition, the refractive index n of the atmosphere in the standby area 404 changes with time also due to fluctuations in the air in the standby area 404 caused by the Y stage 41 being driven in the Y direction.

Furthermore, noise when the Y wavelength compensator 39 measures the refractive index n of the atmosphere in the standby area 404 is also superimposed, and such noise causes the difficulty of driving the Y stage 41, that is, the Y stage. The movement of (41) also changes time.

At this time, if air conditioning is performed in the space where the stage device 100 according to the present embodiment is installed, it is assumed that the temperature T and humidity H of the atmosphere in the waiting area 404 do not change over a sufficiently long time. can be considered

Therefore, the refractive index n of the atmosphere in the waiting area 404 measured by the Y wavelength compensator 39 is the atmospheric pressure P in the waiting area 404, i.e., the change in atmospheric pressure over time, and the Y stage 41 It is assumed that the time changes according to atmospheric fluctuations caused by the driving of and time-varying noise.

Fig. 3(a) is a measured value corresponding to the refractive index n of the air in the standby area 404 measured by the Y-wave compensator 39 when the Y stage 41 is driven in a predetermined manner. The time change 501 of is shown.

As described above, the time change 501 of the measured value shown in Fig. 3 (a) includes the time change of the atmospheric pressure in the waiting area 404, the atmospheric fluctuation due to the driving of the Y stage 41, and Components due to time-varying noise are included.

At this time, it is considered that the atmospheric pressure in the standby area 404 fluctuates with time at a sufficiently low frequency compared to atmospheric fluctuations due to driving of the Y stage 41 and noise that fluctuates with time.

Therefore, in the stage device 100 according to the present embodiment, the component separation due to the time change of atmospheric pressure is performed by inputting the time change 501 of the obtained measured value to the low pass filter.

In other words, in the stage device 100 according to the present embodiment, by inputting the time change 501 of the measured value to the low-pass filter, the first frequency corresponding to the low-frequency region among the time change 501 of the measured value Components (first component, fourth component, sixth component) in the region are acquired.

Fig. 3(b) shows the inter-change 601 of the measured value according to the time-variation of the atmospheric pressure thus obtained.

Then, in the stage device 100 according to the present embodiment, by taking the difference between the time change 501 and the time change 601, the remaining components, that is, atmospheric fluctuations and time due to the driving of the Y stage 41 The temporal change 701 of the measured value according to the fluctuating noise can be acquired.

Fig. 3(c) shows the time change 701 of the measured value according to the thus obtained atmospheric fluctuations due to the driving of the Y-stage 41 and time-varying noise.

In addition, it is considered that the noise superimposed in the measurement of the Y-wavelength compensator 39 varies with time at a sufficiently high frequency compared to atmospheric fluctuations caused by driving the Y-stage 41.

Then, in the stage device 100 according to the present embodiment, the time-varying noise component is removed by inputting the time-varying 701 of the measured value obtained next to the high-cut filter.

In other words, in the stage device 100 according to the present embodiment, by inputting the obtained time change 701 of the measured value to a high-cut filter, the second frequency domain component corresponding to the high-frequency region among the time change 701 of the measured value (The second component, the third component, and the fifth component) are removed.

In this way, it is possible to obtain a measured value following only atmospheric fluctuations caused by the driving of the Y stage 41, i.e., a temporal change in the refractive index n of the atmospheric air in the standby area 404.

In the stage device 100 according to the present embodiment, the dependence of the refractive index n of the atmosphere obtained in this way with time t is prepared and stored as a table ΔC _Y ' under predetermined driving conditions of the Y stage 41 .

Fig. 4(a) is a flowchart showing a process of creating a table ΔC _Y ' under various stage driving conditions by the Y wavelength correction unit 82 in the stage device 100 according to the present embodiment. all.

First, the environmental sensor 90 (third measuring unit) measures the temperature T, humidity H, and atmospheric pressure P of the air in the space near the waiting area 404 of the Y wavelength compensator 39, and the signal processing unit Step 61 stores the measured temperature T, humidity H and atmospheric pressure P (step S301).

Next, the signal processing unit 61 calculates the refractive index n of the air in the waiting area 404 by substituting the acquired temperature T, humidity H, and atmospheric pressure P into equation (2).

Then, the signal processing unit 61 determines the calculated value as the initial value n ₀ of the refractive index of the atmosphere in the waiting area 404 of the Y wavelength compensator 39 (step S302).

Next, the sequence control unit 81 sets the stage drive conditions in order to create a table ΔC _Y ' for predetermined stage drive conditions later (step S303).

Regarding the stage drive conditions set here, if the type of drive such as step drive or scan drive, the magnitude of speed or acceleration, drive profile, etc. are set, the atmospheric fluctuation due to the movement of the Y stage 41 in the Y direction It is preferable from the viewpoint of limiting the influence of

Then, while the sequence controller 81 drives the Y stage 41 based on the stage drive condition set in step S303, the Y wavelength compensator 39 uses the wavelength of the length beam in the waiting area 404. The time change of λ _a is measured (step S304).

Next, the Y wavelength correction unit 82 inputs the time change of the measured value obtained in step S304 to the low-pass filter, thereby determining the time change of the measured value obtained in step S304 by the time change in atmospheric pressure. Components are removed (step S305).

Next, the Y wavelength correction unit 82 inputs the time change of the measured value from which the component due to the time change of the atmospheric pressure has been removed in step S305 to a high cut filter, thereby removing the component due to the time change noise. .

Accordingly, the Y wavelength correction unit 82 determines the wavelength λ _a of the length beam according to atmospheric fluctuations in the waiting area 404 when the Y stage 41 is driven under predetermined stage driving conditions, that is, the atmospheric A table ΔC _Y ' representing the temporal change of the refractive index n can be created (step S306).

Then, the sequence control unit 81 determines whether or not to create a table ΔC _Y ' under different stage drive conditions (step S307).

If the table ΔC _Y ' is created under other stage driving conditions (Yex in step S307), the process returns to step S303.

On the other hand, if the table ΔC _Y ' is created for all stage driving conditions (NO in step S307), the process ends.

Fig. 4(b) shows a process for calculating the movement amount ΔY of the Y-stage 41 under predetermined stage driving conditions by the signal processing unit 61 in the stage apparatus 100 according to the present embodiment. It is a flow chart.

First, when the sequence control unit 81 starts driving the Y stage 41 under predetermined stage driving conditions, the Y wavelength compensator 39 determines the wavelength of the length beam in the waiting area 404. The time change of λ _a is measured (step S308).

Next, the Y wavelength correction unit 82 inputs the time change of the measured value obtained in step S308 to the low-pass filter, thereby determining the time change of the measured value obtained in step S308 by the time change of atmospheric pressure. get the ingredients

Then, the signal processing unit 61 adds the table ΔC _Y ' corresponding to the predetermined stage driving condition to the obtained component due to the time variation of the atmospheric pressure, thereby calculating the Y length beam 35 under the predetermined stage driving condition. ), the time change of the wavelength λ _a is determined (step S309).

Further, the signal processing unit 61 acquires the measured position value Δm _Y by the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving conditions.

Then, the signal processing unit 61 calculates the movement amount ΔY of the Y stage 41 by correcting the acquired position measurement value Δm _Y using the temporal change of the wavelength λ _a of the lengthening beam determined in step S309 (step S309). S310).

Then, the unit state of the interferometer 401 is checked (step S311).

If the interferometer 401 is operating normally (Yex of step S311), the process returns to step S308 to repeat position measurement, that is, to continue position measurement.

On the other hand, if a problem such as failure occurs in the unit state of the interferometer 401 (NO in step S311), the process ends.

As described above, in the stage apparatus 100 according to the present embodiment, when the Y stage 41 is driven under predetermined driving conditions, the wavelength λ _a of the length beam due to atmospheric fluctuations in the waiting area in which the length beam travels, That is, a table ΔC _Y ' representing the temporal change of the refractive index n of the air is prepared in advance.

Then, by correcting the measured position value Δm _Y by the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving conditions, using the prepared table ΔC _Y ', the Y-direction of the Y stage 41 The movement amount ΔY in can be obtained with high accuracy.

In other words, based on the wavelength λ _a of the lengthening beam that changes according to the atmospheric fluctuation in the waiting area generated when the Y stage 41 is driven along the Y direction, the position measurement value Δm _Y by the Y interferometer 34 correct the Thereby, the position of the Y stage 41 can be measured with high precision.

In the above, the Y-direction driving of the Y-stage 41 constituting the wafer stage 45 has been described, but the driving of the X-stage 42 in the X-direction is not limited thereto. can be applied

In addition, it is not limited to the wafer stage 45, and similarly can be applied to the driving of the reticle stage 25 in the Y direction and the driving in the X direction.

Incidentally, in the above, a low-pass filter and a high-cut filter are used as filters, but it does not matter if a band-pass filter is used instead.

In addition, the stage device 100 according to this embodiment is not limited to the exposure device 1 described above, and can also be used for pattern forming devices such as an imprint device and a drawing device.

Here, the imprint device is a device that forms a pattern of a cured product from which the pattern of the mold is transferred by bringing the imprint material supplied onto the substrate and the mold material into contact with each other and then applying curing energy to the imprint material.

Moreover, a drawing apparatus is a device which forms a pattern (latent image pattern) on a board|substrate by drawing on a board|substrate with a charged particle beam (electron beam) or a laser beam.

[Second Embodiment]

Fig. 5(a) is a flowchart showing a process of creating a table ΔC _Y ' under various stage drive conditions by the Y wavelength correction unit 82 in the stage device according to the second embodiment.

Since the stage apparatus according to the present embodiment has the same configuration as the stage apparatus 100 according to the first embodiment, the same part number is given to the same member, and the description thereof is omitted.

First, the environmental sensor 90 measures the temperature T, humidity H, and atmospheric pressure P of the air in the space near the waiting area 404 of the Y wavelength compensator 39, and the signal processing unit 61 measures The set temperature T, humidity H and atmospheric pressure P are stored (step S801).

Next, the signal processing unit 61 calculates the refractive index n of the air in the waiting area 404 by substituting the acquired temperature T, humidity H, and atmospheric pressure P into equation (2).

Then, the signal processing unit 61 determines the calculated value as the initial value n ₀ of the refractive index of the atmosphere in the waiting area 404 of the Y wavelength compensator 39 (step S802).

Next, the sequence control unit 81 sets the stage driving conditions in order to create a table ΔC _Y ' for predetermined stage driving conditions later (step S803).

Regarding the stage drive conditions set here, if the type of drive such as step drive or scan drive, the magnitude of speed or acceleration, drive profile, etc. are set, the atmospheric fluctuation due to the movement of the Y stage 41 in the Y direction It is preferable from the viewpoint of limiting the influence of

Then, while the Y stage 41 is driven by the sequence control unit 81 based on the stage driving condition set in step S803, the Y wavelength compensator 39 uses the wavelength λ of the length beam in the waiting area 404. The time change of _a is measured (step S804).

Next, the Y wavelength correction unit 82 inputs the time change of the measured value obtained in step S804 to the low-pass filter, thereby determining the time change of the measured value obtained in step S804 by the time change of atmospheric pressure. Components are removed (step S805).

Next, the Y wavelength correction unit 82 inputs the time change of the measured value from which the component due to the time change of the atmospheric pressure was removed in step S805 to a high cut filter, thereby removing the component due to the time change noise. .

Accordingly, the Y wavelength correction unit 82 determines the wavelength λ _a of the length beam according to atmospheric fluctuations in the standby region 404 when the Y stage 41 is driven under predetermined stage driving conditions, that is, the refractive index of the atmosphere. A table ΔC _Y ' representing the temporal change of n can be created (step S806).

Then, in the stage device according to the present embodiment, the Y wavelength correcting unit 82 calculates the dependence of the refractive index n of the air on the time t in the table ΔC _Y ' obtained in step S806 as a function of the time t. fit in In this way, the approximation function n(t) is obtained and stored (step S807).

Then, the sequence control unit 81 creates a table ΔC _Y ' for different stage driving conditions and determines whether to obtain an approximate function n(t) (step S808).

If the approximate function n(t) is determined by creating a table ΔC _Y ' under different stage driving conditions (Yex in step S808), the process returns to step S803.

On the other hand, if the approximate function n(t) is obtained by creating a table ΔC _Y ' for all stage drive conditions (NO in step S808), the process ends.

Fig. 5(b) is a flow chart showing a process for calculating the movement amount ΔY of the Y-stage 41 under predetermined stage driving conditions by the signal processing unit 61 in the stage device according to the present embodiment.

First, when the sequence control unit 81 starts driving the stage 41 under predetermined stage driving conditions, the Y wavelength compensator 39 determines the wavelength λ _a of the length beam in the waiting area 404. The time change of is measured (step S809).

Next, the Y wavelength correction unit 82 inputs the time change of the measured value obtained in step S809 to the low-pass filter, thereby determining the time change of the measured value obtained in step S809 by the time change of atmospheric pressure. get the ingredients

Then, the signal processing unit 61 adds the approximation function n(t) corresponding to the predetermined stage driving condition to the obtained component due to the time variation of the atmospheric pressure, thereby obtaining the Y-length beam ( 35) determines the temporal change of the wavelength λ _a (step S810).

Further, the signal processing unit 61 acquires the measured position value Δm _Y by the Y interferometer 34 when the Y stage 41 is driven under the predetermined stage driving conditions.

Then, the signal processing unit 61 calculates the movement amount ΔY of the Y stage 41 by correcting the obtained position measurement value Δm _Y using the temporal change of the wavelength λ _a of the lengthening beam determined in step S810 (step S810). S811).

Then, the unit state of the interferometer 401 is checked (step S812).

If the interferometer 401 is operating normally (Yex in step S812), it returns to step S809 to repeatedly measure the position.

On the other hand, if a problem such as failure occurs in the unit state of the interferometer 401 (NO in step S812), the process ends.

As described above, in the stage device according to the present embodiment, the wavelength λ _a of the length beam due to atmospheric fluctuations in the waiting area where the length beam travels when the Y stage 41 is driven under predetermined driving conditions, that is, An approximation function n(t) representing the temporal change of the refractive index n of the atmosphere is prepared in advance.

Then, by correcting the measured position value Δm _Y by the Y interferometer 34 when the Y stage 41 is driven under the predetermined driving conditions, using the created approximation function n(t), the Y stage 41 The movement amount ΔY in the Y direction can be obtained with high accuracy.

Thereby, the position of the Y stage 41 can be measured with high precision.

In the stage device according to this embodiment, instead of using the table ΔC _Y ' as it is, an approximation function n(t) is obtained from the table ΔC _Y ' and used.

Accordingly, even if the stage moving speed or the driving profile according to the layout during exposure is changed as the stage driving condition, the time of the wavelength λ _a of the Y-length beam 35 under the predetermined stage driving condition without newly acquiring a table. change can be determined.

Specifically, for example, in the case where only the size of the moving speed of the stage is changed with respect to the stage driving conditions other than the predetermined stage driving conditions, in the approximation function n(t) obtained under the other stage driving conditions Change the coefficient with respect to time t.

In this way, it is possible to obtain an approximate function n(t) under the predetermined stage driving conditions.

Thus, in the stage device according to the present embodiment, processing can be simplified by using the approximation function n(t), so throughput can be improved.

[Third Embodiment]

Fig. 6 shows a schematic configuration diagram of a stage apparatus 300 according to the third embodiment.

The stage device 300 according to the present embodiment includes a Y mirror 33, a Y interferometer 34 (first measurement unit), a Y light pickup 37, a Y detection unit 38, and a Y wavelength compensator. (39) (second measuring unit).

Further, the stage device 300 according to the present embodiment includes an X mirror 53, an X interferometer 54 (fourth measurement unit), an X optical pickup 57, an X detection unit 58, and an X wavelength computer. A pensator 59 (fifth measurement unit) is provided.

Furthermore, the stage apparatus 300 according to this embodiment includes a stage 45 and a control unit. In addition, the control unit has a signal processing unit 61, a sequence control unit 81, a Y wavelength correction unit 82 and an X wavelength correction unit 83.

As shown in FIG. 6, the stage 45, which is, for example, the wafer stage 45 has a Y stage and an X stage, which are not shown. Specifically, the X stage is mounted on the Y stage. .

Further, the Y mirror 33 is disposed on the Y stage and has a reflective surface perpendicular to the Y direction (first reflective surface). The Y-length beam 35 (first measurement light) emitted from the Y interferometer 34 is incident on the reflection surface of the Y mirror 33.

Then, the Y-length beam 35 reflected by the reflective surface of the Y mirror 33 interferes with a reference beam (not shown) in the Y interferometer 34, so that the Y interference beam 36 is generated.

Further, the Y mirror 33 may be configured integrally with the Y stage so that the Y stage has a reflection surface perpendicular to the Y direction.

Then, the Y interference beam 36 emitted from the Y interferometer 34 is incident on the Y optical pickup 37, and the Y interference beam 36 is photoelectrically converted, so that an interference signal is output from the Y optical pickup 37. do.

Then, a Y detector 38 installed on a lengthening board (not shown) detects a phase difference between the interference signal and a reference signal from a laser head installed on the Y interferometer 34.

Accordingly, the distance Y ₀ between the Y interferometer 34 and the Y mirror 33 in the Y direction, that is, the measured position value Δm _Y corresponding to the movement amount ΔY of the Y stage in the Y direction can be output. there is.

Similarly, the X mirror 53 is disposed on the X stage and has a reflective surface perpendicular to the X direction (second reflective surface). The X-length beam 55 (third measurement light) emitted from the X interferometer 54 enters the reflection surface of the X mirror 53.

Then, the X-length beam 55 reflected by the reflective surface of the X mirror 53 interferes with a reference beam (not shown) in the X interferometer 54, thereby generating an X interference beam 56.

Further, the X mirror 53 may be configured integrally with the X stage so that the X stage has a reflection surface perpendicular to the X direction.

Then, the X interference beam 56 emitted from the X interferometer 54 is incident on the X optical pickup 57, and the X interference beam 56 is photoelectrically converted, resulting in an interference signal from the X optical pickup 57. is output.

Then, an X detection unit 58 installed on a measurement board (not shown) detects a phase difference between the interference signal and a reference signal from a laser head installed on the X interferometer 54.

Accordingly, the distance X ₀ between the X interferometer 54 and the X mirror 53 in the X direction, that is, the measured position value Δm _X corresponding to the movement amount ΔX of the X stage in the X direction can be output. there is.

Further, the Y wavelength compensator 39 is closer to the optical path of the Y-length beam 35 between the Y interferometer 34 and the Y mirror 33 than the X wavelength compensator 59. .

Further, the X wavelength compensator 59 is closer to the optical path of the X-length beam 55 between the X interferometer 54 and the X mirror 53 than the Y wavelength compensator 39. .

Next, the measured position value Δm Y is corrected based on the wavelength correction amount ΔC obtained from the Y wavelength compensator 39, and the position measurement value Δm _Y is corrected based on the wavelength correction amount ΔC obtained from the X wavelength compensator 59. A process for correcting the measured value Δm _X is considered.

At this time, it should be noted that the stage driving conditions for obtaining the wavelength correction amount ΔC are not limited to driving along the X-direction of the X stage and driving along the Y-direction of the Y stage, but both are sometimes performed together. There is a need.

For example, in the Y-wavelength compensator 39, as shown in the stage devices according to the first and second embodiments, when the Y stage is driven along the Y direction, the refractive index n of the atmosphere Atmospheric fluctuations caused by the drive affect the time change of the measured value corresponding to .

However, as in the stage apparatus 300 according to the present embodiment, when the X stage is driven in the X direction and the Y stage is driven in the Y direction at the same time, atmospheric fluctuations caused by both drives cause the Y wavelength comparator. In the waiting area 404 of the pensator 39, turbulence or the like occurs.

When such turbulence or the like occurs in the waiting area 404, a large error occurs in the measured value corresponding to the refractive index n of the atmosphere, that is, the wavelength correction amount ΔC.

Therefore, if the wavelength correction amount ΔC is acquired based on the value measured by the Y wavelength compensator 39 and the measured position value Δm _Y is corrected using the acquired wavelength correction amount ΔC as it is, the calculated Y stage A large error occurs in the movement amount ΔY.

The occurrence of such a large error also occurs in the case of calculating the movement amount ΔX of the X stage by correcting the measured position value Δm _X using the wavelength correction amount ΔC acquired in the X wavelength compensator 59 as it is.

Therefore, in the stage apparatus 300 according to the present embodiment, as in the stage apparatuses according to the first and second embodiments, the table ΔC _Y ' and the X stage when the Y stage is driven along the Y direction A table ΔC _X ' when driven along the X direction is prepared in advance.

Then, when both the driving of the X stage along the X direction and the driving of the Y stage along the Y direction are both performed, the Y stage movement amount ΔY and the X stage movement amount ΔX are calculated using the tables ΔC _Y ' and ΔC _X ' .

Specifically, the table ΔC _X (first table) at the time when the X stage is driven stepwise along the X direction while the Y stage is stopped is X-wavelength compensation according to steps S301 to S306. Data 59 and Y wavelength compensator 39 create.

In addition, the table ΔC _Y (1) when the Y stage is driven stepwise along the Y direction while the X stage is stopped, the X wavelength compensator 59 and the Y wavelength compensator 39 are obtained according to steps S301 to S306. ) writes

In addition, the table ΔC _Y (2) (second table) obtained when the Y stage is scan-driven along the Y direction while the X stage is stopped is converted to the X wavelength computer according to steps S301 to S306. It is created by the pensator 59 and the Y wavelength compensator 39.

In this way, the tables ΔC _X , ΔC _Y (1) and ΔC _Y (2) acquired by the X wavelength compensator 59 and the Y wavelength compensator 39 respectively under the plurality of stage driving conditions are the Y wavelength It is stored in the correction unit 82 and the X wavelength correction unit 83.

Then, consider a stage drive condition in which, for example, the X stage moves stepwise along the X direction and the Y stage scans (scans move) along the Y direction.

In other words, consider a stage driving condition (predetermined driving condition) in which the stage 45 is driven in a direction (third direction) non-parallel to each of the X and Y directions in the XY section.

In this case, first, when calculating the movement amount ΔY of the Y stage, the change in time of the wavelength λ _AY of the Y-length beam 35 in the waiting area 404 is measured by the Y wavelength compensator 39, Acquire the correction amount ΔC.

Next, by inputting the acquired wavelength correction amount ΔC to a high-cut filter, time-varying noise is removed from the acquired wavelength correction amount ΔC.

In other words, by inputting the acquired wavelength correction amount ΔC to the high-cut filter, a component (third component) in the second frequency domain corresponding to the high-frequency region is removed from the wavelength correction amount ΔC.

Then, with respect to the wavelength correction amount ΔC from which time-varying noise is removed, the table ΔC _X obtained by the Y wavelength compensator 39 when step-driving the X stage along the X direction is multiplied by a predetermined coefficient, and then the difference is calculated. get drunk

Accordingly, it is possible to obtain a table ΔC _Y ' under the stage driving conditions, and to determine the temporal change of the wavelength λ _AY of the Y-length beam 35 emitted from the Y interferometer 34 corresponding to the table ΔC _Y '. there is.

In addition, the predetermined coefficient used here is determined from the degree of occurrence of atmospheric fluctuations accompanying step driving along the X direction of the X stage in the waiting area 404 of the Y wavelength compensator 39.

In other words, it is determined by driving conditions for step driving along the X direction of the X stage, including, for example, the magnitude of speed or acceleration, driving profile, and the like in step driving along the X direction of the X stage.

Then, the measured position value Δm _Y by the Y interferometer 34 when both the X stage and the Y stage constituting the stage 45 are driven under the above stage driving conditions is acquired.

Then, by correcting the acquired position measurement value Δm _Y using the table ΔC _Y ' obtained as described above, the movement amount ΔY of the Y stage can be calculated.

Similarly, when calculating the movement amount ΔX of the X stage, the wavelength correction amount ΔC is measured by measuring the time change of the wavelength λ _ax of the X-measurement beam 55 in the waiting area 404 by the X wavelength compensator 59. Acquire

Next, by inputting the acquired wavelength correction amount ΔC to a high-cut filter, time-varying noise is removed from the acquired wavelength correction amount ΔC.

In other words, by inputting the acquired wavelength correction amount ΔC to the high-cut filter, a component (fifth component) in the second frequency domain corresponding to the high-frequency region is removed from the wavelength correction amount ΔC.

Then, for the wavelength correction amount ΔC from which time-varying noise is removed, the table ΔC _Y (2) obtained by the X-wavelength compensator 59 when the Y stage is scan-driven along the Y direction is multiplied by a predetermined coefficient. difference after

Accordingly, it is possible to obtain a table ΔC _X ' under the above stage driving conditions, and to determine the temporal change of the wavelength λ _AX of the X-length beam 55 emitted from the X interferometer 54 corresponding to the table ΔC _X '. there is.

In addition, the predetermined coefficient used here is determined from the degree of occurrence of atmospheric fluctuation accompanying scan driving along the Y direction of the Y stage in the waiting area 404 of the X wavelength compensator 59.

In other words, it is determined by driving conditions for scan driving along the Y-direction of the Y stage, including, for example, the magnitude of speed or acceleration, driving profile, and the like in the scan driving along the Y-direction of the Y stage.

Then, the measured position value Δm _X by the X interferometer 54 when both the X stage and the Y stage constituting the stage 45 are driven under the above stage driving conditions is acquired.

Then, the movement amount ΔX of the X stage can be calculated by correcting the acquired position measurement value Δm _X using the table ΔC _X ′ obtained as described above.

As described above, in the stage apparatus 300 according to the present embodiment, the wavelength λ of the length beam due to atmospheric fluctuations in the waiting area where the length beam travels when the stage 45 is driven under predetermined driving conditions. _A , that is, prepare a table indicating the time change of the refractive index n of the atmosphere in advance.

Then, by correcting the measured position values by the interferometer when the stage is driven under the predetermined driving conditions using the prepared table, the movement amount of the stage 45 can be obtained with high accuracy.

In other words, the measured position value by the interferometer obtained when the stage 45 is driven is based on the wavelength λ _a of the length beam that changes according to atmospheric fluctuations in the standby region generated when the stage 45 is driven. correct Thereby, the position of the stage 45 can be measured with high precision.

Specifically, a table ΔC _Y when the Y stage is driven along the Y direction with the X stage stopped, and a table ΔC _X when the X stage is driven along the X direction with the Y stage stopped are obtained.

Then, when both the X-direction driving of the X stage and the Y-direction driving of the Y stage are performed together, the error included in the wavelength correction amount ΔC is removed using the tables ΔC _Y and ΔC _X , thereby moving the Y stage ΔY and the movement amount ΔX of the X stage is calculated.

Accordingly, even when both the driving of the X stage along the X direction and the driving of the Y stage along the Y direction are both performed, the positions of each of the X stages and Y stages constituting the stage 45 can be measured with high accuracy. there is.

[Fourth Embodiment]

Fig. 7 is a flowchart showing processing by the stage device when exposure is performed by the exposure device 1 having the stage device according to the fourth embodiment.

Incidentally, since the stage device according to the present embodiment has the same structure as the stage device according to any one of the first to third embodiments, the same parts are assigned the same reference numbers and descriptions thereof are omitted.

In a normal production line, a plurality of wafers 40 each coated with a resist constituting a predetermined lot are sequentially carried into the exposure apparatus 1 by an in-line conveyance device (not shown), and loaded into the exposure apparatus 1 Thus, wafer exposure processing of the same process is performed in large quantities in lot units.

As shown in Fig. 7, in the exposure apparatus 1 having the stage apparatus according to the present embodiment, when a predetermined wafer 40 is loaded onto the wafer stage 45 (step S1001), the loaded It is determined whether the wafer 40 is the first wafer of a predetermined lot (step S1002).

If the carried wafer 40 is the first wafer of a predetermined lot (Yex in step S1002), a calibration process including an alignment offset and a focus offset is performed on the wafer 40.

In addition, in recent years, in the calibration process for the wafer 40 at the head of the lot, in order to realize high overlap accuracy and exposure focus accuracy for all wafers 40 constituting the lot, There is a tendency to measure the entire shot area.

Also, while the calibration process is being performed, similarly to the stage apparatus according to any one of the first to third embodiments, the interferometer is subjected to stage driving conditions when each of the wafers 40 constituting the lot is exposed. Create a table for correcting measured values by

Then, the created table is stored (step S1003), and the process proceeds to step S1004.

On the other hand, if the carried wafer 40 is not the first wafer of the predetermined lot (NO of step S1002), step S1003 is not performed and step S1004 is performed.

Next, the exposure position is adjusted (corrected) with high accuracy by measuring the alignment of the carried wafer 40 (step S1004).

At this time, similarly to the stage device according to any one of the first to third embodiments, by correcting the measured values by the interferometer using the table created in step S1003 and the measured values by the wavelength compensator, the X stage and The movement amount of the Y stage is calculated with high precision.

Then, the wafer 40 on which the alignment process has been completed is scanned while synchronizing with the reticle 20, and exposure is performed for each shot area, thereby transferring the circuit pattern formed on the reticle 20 to the wafer 40 ( Step S1005).

At this time, using a table corresponding to the stage driving conditions including the position of the shot region where exposure is performed and the drive profile of the stage during exposure, and the measured values by the wavelength compensator, the measured values by the interferometer are calculated. corrected

Then, after exposure is performed on all the shot regions in the wafer 40, the wafer 40 is carried out of the exposure apparatus 1 (step S1006).

Here, the exposed wafer 40 is generally transported to the developing unit by an inline transport unit.

Next, it is determined whether exposure has been performed for all wafers 40 of the lot (step S1007).

If exposure has been performed for all the wafers 40 of the lot (Yex in step S1007), the process ends.

On the other hand, if exposure has not been performed on all the wafers 40 of the lot (NO of step S1007), the process returns to step S1001 and sequential exposure processing is performed on the remaining wafers 40 of the lot.

As described above, in the stage apparatus according to the present embodiment, the wavelength λ _a of the length beam due to atmospheric fluctuations in the standby region where the length beam travels when the stage is driven under predetermined driving conditions, that is, the refractive index of the atmosphere Create a table that shows the time change of n in advance.

Then, by correcting the measured position values by the interferometer when the stage is driven under the predetermined driving conditions using the prepared table, the movement amount of the stage can be obtained with high accuracy.

In this way, the position of the stage can be measured with high precision.

Further, in the stage apparatus according to the present embodiment, the process of creating the table is performed simultaneously with the calibration process including the alignment offset and focus offset for the wafer 40 at the head of the lot in the exposure apparatus 1. , Consists of.

In this way, the throughput at the time of performing the exposure process on each of the wafers 40 in the lot can be improved.

[Manufacturing method of article]

Next, a method for manufacturing the article according to the present embodiment will be described.

A method of manufacturing articles such as a semiconductor IC element, a liquid crystal display element, and an MES is a wafer coated with a photosensitive agent using an exposure apparatus 1 having a stage apparatus according to any one of the first to fourth embodiments. or a step of exposing a substrate such as a glass substrate.

Further, the method includes a step of developing the exposed substrate (photosensitizer) and another well-known step of processing the developed substrate.

In addition, etching, photoresist peeling, dicing, bonding, packaging, etc. are included in other well-known processes mentioned here.

According to the method for manufacturing an article according to the present embodiment, it is possible to manufacture a higher quality article than before.

In the above, although preferred embodiments have been described, various modifications and changes are possible within the scope of the gist without being limited to these embodiments.

33 Y mirror (first reflective surface)
34 Y interferometer (first measuring unit)
35 Y length beam (first measurement light)
39 Y-wavelength compensator (second measuring unit)
41 Y stage (stage)
61 signal processing unit (control unit)
81 sequence control unit (control unit)
82 Y wavelength correction unit (control unit)
100 stage device
404 waiting area (first waiting area)

Claims (22)

a stage having a first reflecting surface perpendicular to the first direction and configured to be drivable in the first direction;
After emitting the first measurement light toward the first reflection surface, by receiving the first measurement light reflected by the first reflection surface, the position of the stage in the first direction is determined. a first measuring unit for measuring;
a second measurement unit that measures the wavelength of the second measurement light propagating through the first standby area;
The measurement result of the first measuring section is corrected based on the wavelength of the second measuring light that changes according to atmospheric fluctuations in the first waiting area generated when the stage is driven along the first direction. a control unit that
A stage device characterized in that it is provided.
According to claim 1,
The control section displays a change in time of the wavelength of the second measurement light due to atmospheric fluctuations in the first waiting area generated when the stage is driven along the first direction under predetermined driving conditions. A stage device characterized by correcting the measurement result of the first measurement section based on the table of
According to claim 2,
The control unit,
measuring a time change of a wavelength of the second measurement light by the second measuring unit while driving the stage along the first direction under the predetermined driving condition;
Acquiring a first component in a first frequency domain by inputting a temporal change in the wavelength of the measured second measurement light to a low-pass filter;
determining a temporal change in the wavelength of the first measurement light under the predetermined driving conditions by adding the first table to the first component obtained;
A stage device characterized by correcting a measurement result of said first measurement unit based on a temporal change in the wavelength of the first measurement light determined in question.
According to claim 3,
A third measurement unit for measuring temperature, humidity and atmospheric pressure of a space in which the stage device is installed;
The control unit,
determining an initial value of the refractive index of the air in the first waiting area based on the measurement result of the third measuring unit;
measuring a time change of a wavelength of the second measurement light by the second measuring unit while driving the stage along the first direction under the predetermined driving condition;
The first component in the first frequency domain and the second component in the second frequency domain are obtained by inputting the temporal change in the wavelength of the measured second measurement light to a low pass filter and a high cut filter, respectively. Acquiring the components of
The stage device characterized in that the first table is created by removing the first component and the second component from the temporal change of the wavelength of the measured second measurement light.
According to claim 2,
The control unit,
measuring a time change of a wavelength of the second measurement light by the second measuring unit while driving the stage along the first direction under the predetermined driving condition;
Acquiring a first component in a first frequency domain by inputting a temporal change in the wavelength of the measured second measurement light to a low-pass filter;
determining a temporal change in the wavelength of the first measurement light under the predetermined driving condition by adding the obtained first component with an approximation function obtained from the first table;
A stage device characterized by correcting a measurement result of said first measurement unit based on a temporal change in the wavelength of the first measurement light determined in question.
According to claim 5,
A third measurement unit for measuring temperature, humidity and atmospheric pressure of a space in which the stage device is installed;
The control unit,
determining an initial value of the refractive index of the air in the first waiting area based on the measurement result of the third measuring unit;
measuring a time change of a wavelength of the second measurement light by the second measuring unit while driving the stage along the first direction under the predetermined driving condition;
The first component in the first frequency domain and the second component in the second frequency domain are obtained by inputting the temporal change in the wavelength of the measured second measurement light to a low pass filter and a high cut filter, respectively. Acquiring the components of
Creating the first table by removing the first component and the second component from the time change of the wavelength of the measured second measurement light;
A stage device characterized in that the approximate function is acquired by performing a fitting on the prepared first table.
A stage having a first reflecting surface perpendicular to the first direction and configured to be drivable in a first cross section parallel to the first direction and a second direction perpendicular to the first direction. Wow,
After emitting the first measurement light toward the first reflection surface, by receiving the first measurement light reflected by the first reflection surface, the position of the stage in the first direction is determined. a first measuring unit for measuring;
a second measurement unit that measures the wavelength of the second measurement light propagating through the first standby area;
The measurement result of the first measuring unit obtained when the stage is driven along a third direction non-parallel to each of the first direction and the second direction in the first cross section, a controller for correcting based on the wavelength of the second measurement light, which changes according to atmospheric fluctuations in the first standby area generated when driven along a second direction;
A stage device characterized in that it is provided.
According to claim 7,
The controller converts the measurement result of the first measuring unit obtained when the stage is driven along the third direction under a predetermined driving condition to the stage along the second direction under the first driving condition. A stage apparatus characterized in that correction is performed based on a first table showing temporal changes in the wavelength of the second measurement light due to atmospheric fluctuations in the first standby area generated when driven.
According to claim 8,
The control unit,
measuring a time change of a wavelength of the second measurement light by the second measuring unit while driving the stage along the third direction under the predetermined driving condition;
Acquiring a third component in the second frequency domain by inputting the time change of the wavelength of the measured second measurement light into a high-cut filter;
With respect to the time change of the wavelength of the measured second measurement light, after removing the third component, taking the difference between the first table multiplied by a predetermined coefficient, determining the temporal change of the wavelength of the first measurement light in
A stage device characterized by correcting a measurement result of said first measurement unit based on a temporal change in the wavelength of the first measurement light determined in question.
According to claim 9,
A third measurement unit for measuring temperature, humidity and atmospheric pressure of a space in which the stage device is installed;
The control unit,
determining an initial value of the refractive index of the air in the first waiting area based on the measurement result of the third measuring unit;
While driving the stage along the second direction under the first driving condition, the second measurement unit measures a change in wavelength of the second measurement light over time,
The fourth component in the first frequency domain and the third component in the second frequency domain are obtained by inputting the time change of the wavelength of the measured second measurement light into a low pass filter and a high cut filter, respectively. Acquiring the components of
The stage device characterized in that the first table is created by removing the third component and the fourth component from the temporal change of the wavelength of the measured second measurement light.
According to claim 8,
The stage has a second reflection surface perpendicular to the second direction,
The stage device,
After emitting the third measurement light toward the second reflection surface, by receiving the third measurement light reflected by the second reflection surface, the position of the stage in the second direction is determined. A fourth measuring unit for measuring;
A fifth measurement unit that measures the wavelength of the fourth measurement light propagating through the second waiting area;
equipped,
The controller converts the measurement result of the fourth measuring unit obtained when the stage is driven in the third direction under the predetermined driving condition to the stage in the first direction under the second driving condition. Therefore, the stage device characterized in that correction is performed based on a second table indicating a temporal change in the wavelength of the fourth measurement light due to atmospheric fluctuations in the second standby area generated when driven.
According to claim 11,
The control unit,
measuring a time change of a wavelength of the fourth measurement light by the fifth measurement unit while driving the stage along the third direction under the predetermined driving condition;
Acquiring a fifth component in the second frequency domain by inputting the time change of the wavelength of the measured fourth measurement light into a high-cut filter;
With respect to the time change of the wavelength of the measured fourth measurement light, after removing the fifth component, taking the difference between the second table multiplied by a predetermined coefficient, determining the time change of the wavelength of the third measurement light in
A stage device characterized by correcting a measurement result of the fourth measurement unit based on the time change of the wavelength of the third measurement light thus determined.
According to claim 12,
A third measurement unit for measuring temperature, humidity and atmospheric pressure of a space in which the stage device is installed;
The control unit,
determining an initial value of the refractive index of the air in the second waiting area based on the measurement result of the third measuring unit;
measuring a time change of a wavelength of the fourth measurement light by the fifth measuring unit while driving the stage along the first direction under the second driving condition;
The sixth component in the first frequency domain and the fifth component in the second frequency domain are obtained by inputting the time change of the wavelength of the measured fourth measurement light into a low-pass filter and a high-cut filter, respectively. Acquiring the components of
The stage device characterized in that the second table is created by removing the fifth component and the sixth component from the time change of the wavelength of the measured fourth measurement light.
According to claim 11,
The first standby area is closer to the optical path of the first measurement light compared to the second standby area;
The stage device characterized in that the second waiting area is closer to the optical path of the third measurement light compared to the first waiting area.
According to claim 1,
The first measuring unit measures the distance between the first measuring unit and the first reflecting surface from interference between the first measurement light reflected by the first reflecting surface and the reference light. A stage device characterized in that it is an interferometer for measuring.
According to claim 1,
The second measurement unit measures the measurement result of the predetermined target by the second measurement light propagating through the first standby area and the predetermined target by the fifth measurement light propagating through the vacuum area. A stage device characterized in that it is a wavelength compensator that measures the wavelength of the second measurement light by comparing the measurement result with each other.
According to claim 1,
The stage device is characterized in that the stage is composed of a first stage that drives along the first direction and a second stage that drives along a second direction perpendicular to the first direction.
An exposure device that exposes a substrate to transfer a pattern formed on the original plate to the substrate;
An exposure apparatus comprising the stage device according to any one of claims 1 to 17 for driving a substrate stage on which the substrate is mounted.
According to claim 18,
The exposure apparatus characterized in that, when exposing the substrate, the substrate stage performs a scanning movement in the first direction and a step movement in a second direction perpendicular to the first direction. .
According to claim 18,
characterized in that the control unit creates a first table indicating the temporal change of the wavelength of the second measurement light when calibration processing is performed for the substrate at the head of a predetermined lot loaded on the substrate stage. exposure device.
A step of exposing the substrate using the exposure apparatus according to claim 18;
a step of developing the exposed substrate;
a process of manufacturing an article from the developed substrate;
A method of manufacturing an article comprising:
A stage having a first reflection surface perpendicular to a first direction and configured to be drivable in the first direction; and after emitting a first measurement light toward the first reflection surface, the first stage A first measurement unit that measures the position of the stage in the first direction by receiving the first measurement light reflected by the reflection surface of the stage; and a second measurement unit that propagates through the first waiting area. A method of controlling the driving of the stage using a stage device having a second measuring unit for measuring the wavelength of light,
The measurement result of the first measuring section is corrected based on the wavelength of the second measuring light that changes according to atmospheric fluctuations in the first waiting area generated when the stage is driven along the first direction. A method comprising the step of doing.

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