CN114830837B - 陶瓷基板、复合基板及电路基板以及陶瓷基板的制造方法、复合基板的制造方法、电路基板的制造方法及多个电路基板的制造方法 - Google Patents

陶瓷基板、复合基板及电路基板以及陶瓷基板的制造方法、复合基板的制造方法、电路基板的制造方法及多个电路基板的制造方法 Download PDF

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CN114830837B
CN114830837B CN202080078894.XA CN202080078894A CN114830837B CN 114830837 B CN114830837 B CN 114830837B CN 202080078894 A CN202080078894 A CN 202080078894A CN 114830837 B CN114830837 B CN 114830837B
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ceramic substrate
manufacturing
present
sintering
substrate
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CN114830837A (zh
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津川优太
西村浩二
小桥圣治
江嶋善幸
汤浅晃正
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Denka Co Ltd
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CN202080078894.XA 2019-11-15 2020-11-13 陶瓷基板、复合基板及电路基板以及陶瓷基板的制造方法、复合基板的制造方法、电路基板的制造方法及多个电路基板的制造方法 Active CN114830837B (zh)

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JP2019-206751 2019-11-15
PCT/JP2020/042421 WO2021095844A1 (ja) 2019-11-15 2020-11-13 セラミック基板、複合基板及び回路基板並びにセラミック基板の製造方法、複合基板の製造方法、回路基板の製造方法及び複数の回路基板の製造方法

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DE102023103508A1 (de) * 2023-02-14 2024-08-14 Rogers Germany Gmbh Verfahren zur Herstellung eines Metall-Keramik-Substrats und ein Metall-Keramik-Substrat hergestellt mit einem solchen Verfahren

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JPH02141476A (ja) * 1988-11-21 1990-05-30 Murata Mfg Co Ltd セラミック基板の製造方法
JPH10167804A (ja) * 1996-12-11 1998-06-23 Denki Kagaku Kogyo Kk セラミックス基板及びそれを用いた回路基板とその製造方法
JP2005322758A (ja) * 2004-05-07 2005-11-17 Tdk Corp セラミック基板及びその製造方法
JP2007019123A (ja) * 2005-07-06 2007-01-25 Sumitomo Metal Electronics Devices Inc セラミック回路基板集合体
JP2007198626A (ja) * 2006-01-24 2007-08-09 Tdk Corp 焼成炉
JP2008186897A (ja) * 2007-01-29 2008-08-14 Tdk Corp 多層セラミック基板の製造方法
CN108495831A (zh) * 2016-03-28 2018-09-04 日立金属株式会社 氮化硅烧结基板、氮化硅烧结基板片、回路基板和氮化硅烧结基板的制造方法

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