CN114720803B - Environment forming method and test system - Google Patents
Environment forming method and test system Download PDFInfo
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- CN114720803B CN114720803B CN202210352488.9A CN202210352488A CN114720803B CN 114720803 B CN114720803 B CN 114720803B CN 202210352488 A CN202210352488 A CN 202210352488A CN 114720803 B CN114720803 B CN 114720803B
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Abstract
The application discloses an environment forming method and a test system, belonging to the technical field of semiconductor test instruments; the technical points comprise that: s100, improving the cleanliness of the environment in advance by a circulating method of vacuumizing and filling nitrogen; s200, ventilation operation: the cleanliness of the environment reaches Class1 level by a nitrogen replacement method; s300, ultrahigh vacuum: firstly, directly vacuumizing the environment based on a backing pump, starting a molecular pump and heating the environment until the pressure in the environment is lower than 5 multiplied by 10 when the pressure in the environment reaches below 10pa ‑7 pa. By adopting the environment forming method and the test system, environmental support can be provided for scientific test of the semiconductor.
Description
Technical Field
The present invention relates to the field of semiconductor inspection, and more particularly, to an environmental forming method and a testing system.
Background
With the development of semiconductor and electronic industries, the above products have generated technical requirements of "ultra high vacuum + high cleanliness" during scientific experiments.
For the realization of "ultra-high vacuum + high cleanliness", the applicant searched "clean and vacuum and G01/IC" and found the following documents:
CN207472294U, high pressure resistant high cleanliness safety pressure test chamber, which records: one side of the box body is connected with high-pressure gas, and the other side of the box body is connected with a vacuum pump. The purpose is to regulate the pressure inside the tank by high pressure gas in cooperation with a pressure reducing valve. Further realize that: the cleanliness is high and can adapt to the proof box of different pressure demands.
The upstream customer proposes two quantitative indexes aiming at 'ultrahigh vacuum + high cleanliness':
1) The cleanliness at least meets the ISO14644-1 CLASS1 standard grade;
2) The vacuum degree at least satisfies the following conditions: the air pressure in the cavity is less than or equal to 5 multiplied by 10 -7 Pa。
CN207472294U is connected with a vacuum pump, but the vacuum degree that can be achieved by the vacuum pump is generally 3-4 pa. Therefore, the apparatus does not teach the development of an "ultra high vacuum + high cleanliness" test system.
Disclosure of Invention
The present invention is directed to an environmental forming method and a test system for overcoming the above-mentioned disadvantages of the prior art.
The technical scheme of the application is as follows:
an environmental forming method, the environmental requirement is a high cleanliness environment; the method comprises the following steps:
s100, improving the cleanliness of the environment in advance by a 'vacuumizing-nitrogen filling' circulating method;
and S200, replacing nitrogen in the environment to enable the cleanliness of the environment to reach Class1 (ISO 14644-1 standard).
An environment forming method, wherein the environment requirement is a high-cleanliness and ultra-high vacuum environment; which comprises the following steps:
s100, improving the cleanliness of the environment in advance by a 'vacuumizing-nitrogen filling' circulating method;
s200, ventilation operation: the environment is subjected to a nitrogen replacement method, so that the cleanliness of the environment reaches Class1 level;
s300, ultrahigh vacuum:
firstly, directly vacuumizing the environment based on a backing pump, starting a molecular pump to vacuumize to 10 ℃ when the pressure in the environment reaches below 10pa -2 pa～10 -3 pa；
Then, the environment edge is heated and cooled, and the molecular pump is kept on until the air pressure in the environment is lower than 5 x 10 -7 pa。
An environment forming method, wherein the environment requirement is a high-cleanliness and ultra-high vacuum environment; which comprises the following steps:
s100, vacuumizing the main body cavity for multiple times;
s101, vacuumizing for the first time, and reducing the air pressure in the main body cavity to be below 10 pa: opening a fifth pipeline valve, a preceding stage vacuum pump and a side pumping valve, pumping the air pressure of the equipment to be below 10Pa, and closing the side pumping valve;
s102, secondary vacuumizing:
firstly, inflating: the clean pipeline system is started, the air inlet valve is opened, and the air outlet valve is still closed; high-pressure nitrogen passes through the filter, is filtered and then enters the main body cavity A through the air inlet valve;
then, opening a side pumping valve, pumping air, and vacuumizing the box body to below 10 Pa;
s103, vacuumizing for the third time to the n times: same as S102;
s200, ventilation operation:
starting a clean pipeline system: the air inlet valve and the air outlet valve are both opened;
high-pressure nitrogen is filtered after passing through a filter, then enters a main body cavity A through an air inlet valve, and then passes through an air outlet valve and a high-resolution particle detector;
the high-resolution particle detector can monitor the particle quantity of the gas in real time;
s300, after the cleanliness of nitrogen gas obtained by monitoring of the high-resolution particle detector meets the CLASS 1-level standard; starting and closing a clean pipeline system;
s400, opening a fifth pipeline valve, a preceding stage vacuum pump and a side pumping valve, pumping the air pressure of the equipment to be below 10Pa, and closing the side pumping valve;
then, the molecular pump was started to evacuate to 10 -2 pa～10 -3 pa；
Then, the heating cover starts to work, and the outer surfaces of the main body cavity A and the switching cavity B are heated; the first gate valve and the second gate valve are kept open;
stopping heating after heating for a certain time;
in the process of temperature reduction, the vacuum degree is reduced to 5 multiplied by 10 -7 Pa。
Further, the heating temperature in S400 is 170 DEG to 200 deg.
Further, if in S400, when the air pressure is kept constant for a certain time, at this time, the leak detection valve is first opened, and the fifth pipeline valve is closed; and then helium is sprayed to each part of the box body on the outer side, and if a gas leakage point exists at the position, the leak detector can detect the gas leakage point.
Further, the number of times of vacuum pumping in S100 is n, and n is determined by the following method: and the inflation pressure in S100 is P atmospheric pressures, and the vacuumizing times n are as follows:
an assay system, comprising: the device comprises a main body cavity, 2 switching cavities, a heating cover, a main body cavity vacuum pipeline system and a clean pipeline system;
the main body cavity A is communicated with the switching cavity B;
the main body cavity A is placed in a robot hand; the adapter cavity is used for placing raw materials (such as a wafer);
heating covers are arranged on the outer sides of the main body cavity and the switching cavity;
the main body cavity is provided with an upper cover, and the upper cover is used for feeding and discharging materials.
Wherein, main part chamber vacuum piping system includes: the pipeline comprises a first pipeline, a second pipeline, a third pipeline, a fourth pipeline and a fifth pipeline;
the first pipeline, the second pipeline and the third pipeline are connected between the main body cavity and/or the switching cavity and the fourth pipeline in a variable connection mode; install in proper order on first pipeline: the device comprises a first gate valve, a first molecular pump, a first low gauge and a first isolating valve; the second pipeline is sequentially provided with: the second gate valve, the second molecular pump, the second low gauge and the second isolating valve; a bypass pumping valve is arranged on the third pipeline; a leak detection valve and a leak detector are arranged at the end part of the fourth pipeline; the fourth pipeline is also connected with a fifth pipeline, and the fifth pipeline is connected with a fifth pipeline valve and a preceding stage vacuum pump;
wherein, clean pipe-line system includes: an air inlet pipeline and an air outlet pipeline; the one end and the nitrogen gas source of air inlet pipeline are connected, and its other end is connected with the switching chamber, from the nitrogen gas source to the direction in switching chamber, install in proper order on air inlet pipeline: a meter, a filter, an intake valve;
and one end of the gas outlet pipeline is connected with the other adapter cavity, the other end of the gas outlet pipeline is connected with the evacuation pump, and a gas outlet valve and a high-resolution particle detector are sequentially arranged on the gas outlet pipeline in the direction from the adapter cavity to the evacuation pump.
The beneficial effect of this application lies in:
(1) The first invention of the present application is: how to coordinate the processing: vacuum pumping-high cleanliness process. In the art, the conventional thinking is: firstly, ventilating to a high-cleanliness space; then, rough pumping, fine pumping, heating, cooling and fine pumping are carried out to achieve ultra-vacuum (the molecular pump is not closed in the heating process).
The above idea is also the original design of the applicant, however, the practical findings are that:
first, the "scavenging" process is very slow in its development time and the filter loss is very large for high pressure nitrogen. After analysis, the inventor team thinks that:
when the ventilation process is directly used, the particles in the equipment do not directly flow out along with the airflow and can be dispersed to other space parts in the equipment.
The following process is proposed for the present application:
the synergistic design of rough vacuum pumping, air inflation, rough vacuum pumping (the air exhaust in the stage is not influenced by the speed), air exchange to Class1 Class (the air exhaust speed in the stage is limited), rough vacuum pumping and ultrahigh vacuum pumping is as follows:
firstly, a large amount of particles can be removed by using rough vacuumizing (reciprocating for 3 times);
then, the air was ventilated to Class 1.
Compared with the method of directly ventilating to Class1, the method can save about 50 to 70 percent of nitrogen. Meanwhile, the working beat can be greatly improved.
(2) The second invention of the present application is: and (5) selecting the type of the main pump.
For the apparatus of the present application, the selection method is as follows:
the main pump selection can be generally determined by the effective pumping speed, and the effective pumping speed Sp (L/s) at the pumping port of the container formed by the equipment is calculated by adopting the following formula:
P j the limit that the device can reachDegree of hollowness [ Pa]As a design value;
a-the effective surface area within the vessel formed by the apparatus, which can be determined by measurement;
q-the normal temperature air-out rate of the material in the vacuum container, unit: pa.L/(s.cm) 2 ) And can be determined by measurement.
(3) The third invention of the present application is: a method for guiding the use of downstream clients is provided.
The method comprises the following specific steps: when the number of times of vacuumizing of S100 is n, determining by adopting the following method: and the inflation pressure in S100 is P atmospheric pressures, and the vacuumizing times n are as follows:
(4) The apparatus of the present application is a multi-functional apparatus that can also be used to form high cleanliness environments, as well as to form ultra-high vacuum environments.
Drawings
The invention will be described in further detail with reference to examples of embodiments shown in the drawings, which should not be construed as limiting the invention in any way.
FIG. 1 is a schematic three-dimensional design of an ultra-high vacuum and high cleanliness test system (heating mantle not shown).
FIG. 2 is a schematic diagram of an ultra high vacuum and high cleanliness test system.
FIG. 3 is an elevation view of an ultra-high vacuum and high cleanliness testing system.
FIG. 4 is a top view of an ultra-high vacuum and high cleanliness testing system.
FIG. 5 is a gas circuit layout of an ultra-high vacuum and high cleanliness testing system.
FIG. 6 is a real view of an ultra high vacuum and high cleanliness test system (lid open).
FIG. 7 is a graph of the y-p relationship (sigmoid).
The reference numerals are illustrated below:
the main body cavity A, the switching cavity B and the heating cover C;
the device comprises a first pipeline 101, a first gate valve 102, a first molecular pump 103, a first low gauge 104 and a first isolating valve 105;
a second pipeline 201, a second gate valve 202, a second molecular pump 203, a second low gauge 204 and a second isolating valve 205;
a third line 301, a bypass suction valve 302;
a fourth line 401, a leak detection valve 402, a leak detector 403;
a fifth pipeline 501, a fifth pipeline valve 502, a backing vacuum pump 503;
a meter 601, a filter 602, and an intake valve 603.
Detailed description of the preferred embodiment
< example 1: ultra-high vacuum and high-cleanliness test system and working method >
< technical need >
The upstream customer proposes two quantitative indexes aiming at 'ultrahigh vacuum + high cleanliness':
1) The cleanliness is required to at least meet the grade of ISO14644-1 CLASS1 standard;
2) The vacuum degree at least satisfies the following conditions: the air pressure in the cavity is less than or equal to 5 multiplied by 10 -7 Pa。
For cleanliness, the known methods are: this is done by gas displacement.
For the degree of vacuum, known methods are: this is achieved by means of a vacuum pump. However, the above method generally can only achieve 2 to 5Pa. How to realize 5 x 10 -7 Pa is a high vacuum, and in particular the process of evacuation is not studied.
For the two requirements of cleanliness and vacuum degree, the conventional technology is as follows: according to the scheme of CN207472294U, cleanliness is firstly completed, and then vacuum degree is completed. These two technical requirements are not addressed organically in combination.
< first, structure design >
An ultra-high vacuum and high cleanliness testing system comprising: the device comprises a main body cavity A, 2 switching cavities B, a heating cover C, a main body cavity vacuum pipeline system and a clean pipeline system;
the main body cavity A is communicated with the switching cavity B;
the main body cavity A is placed in a robot hand;
heating covers are arranged on the outer sides of the main body cavity and the switching cavity;
the main body cavity is provided with an upper cover, and the upper cover is used for feeding and discharging materials.
Wherein, the design of heating jacket C:
first, the design requirements of the heating mantle C are fundamental considerations. The conventional vacuumizing requirement is generally only required to reach 2-5 pa, and the condition can be completed only by a backing pump. For accelerating higher vacuum pumping, the normal idea is to adopt a molecular pump, and the higher the precision of the molecular pump is, the better the pumping effect is. However, the above conventional thinking is 5 × 10 -7 Pa is no longer applicable.
For such high vacuum, no modification of the molecular pump can be resolved.
When the inventor team tests for the first time, the following results are found: after the molecular pump is adopted for pumping to a certain stage, the speed of vacuum degree reduction is very slow. And (3) mechanism analysis: some of the gases, particularly inert gases, tend to adsorb on the inner surfaces of the equipment. This results in a very slow rate of decrease of the vacuum inside the apparatus. As there is constant ingress of inert gas from the interior surfaces of the apparatus into the interior of the apparatus.
This phenomenon and the mechanism described above were previously not encountered and expected from the "vacuuming".
Secondly, the solution is to bake the equipment at high temperature by using a heating cover C, and the 5 x 10 can be obtained after complete degassing - 7 Ultra-high vacuum degree of Pa; due to the requirement of an ultra clean environment inside the vacuum chamber, the baking system needs to be implemented outside the equipment, but cannot be implemented inside the equipment.
Thirdly, the heating cover is composed of: a heating cover is sleeved on the outer side of the test system, and a heating wire is arranged in the heating cover; the heating cover is divided into a plurality of areas, and each area can be independently heated at a controlled temperature; the equipment is baked and deaerated by heating the hood. The reason for the above-described partition setting is also that: the heat resistant temperatures of different parts of the equipment are different. For example: the upper cover part has a rubber ring, and if the problem of the heating cover exceeds 180 degrees, the rubber ring can be damaged by heating.
Meanwhile, the temperature is low (the effect is not obvious when the temperature is lower than 150 degrees), so that the upper cover with the rubber ring is adopted at 160-170 degrees, and the rest part is heated at 170-200 degrees.
Wherein the main body cavity vacuum piping system comprises:
the device comprises a first pipeline 101, a first gate valve 102, a first molecular pump 103, a first low gauge 104 and a first isolating valve 105;
a second pipeline 201, a second gate valve 202, a second molecular pump 203, a second low gauge 204 and a second isolating valve 205;
a third line 301, a bypass suction valve 302;
a fourth line 401, a leak detection valve 402, a leak detector 403;
a fifth pipeline 501, a fifth pipeline valve 502, a backing vacuum pump 503;
the first pipeline 101, the second pipeline 201 and the third pipeline 301 are connected between the main body cavity a (which may also be a switching cavity) and the fourth pipeline 401 in a variable connection manner;
in the direction from the main body chamber a to the fourth pipe 401, sequentially mounted on the first pipe 101 are: a first gate valve 102, a first molecular pump 103, a first low gauge 104 and a first isolating valve 105;
in the direction from the main body cavity a to the fourth pipeline 401, sequentially mounted on the second pipeline 201 are: a second gate valve 202, a second molecular pump 203, a second low gauge 204 and a second isolating valve 205;
a bypass suction valve 302 is arranged on the third pipeline 301;
the end of the fourth pipeline is provided with a leak detection valve 402;
a fifth pipe 501 is connected to the fourth pipe, and a fifth pipe valve 502 and a backing vacuum pump 503 are connected to the fifth pipe 501.
Wherein, clean pipe-line system includes: an air inlet pipeline and an air outlet pipeline;
the one end and the nitrogen gas source of air inlet pipeline are connected, and its other end is connected with switching chamber B, from nitrogen gas source to switching chamber B's direction, install in proper order on air inlet pipeline: a meter 601, a filter 602, an intake valve 603;
one end of the air outlet pipeline is connected with the other adapter cavity B, the other end of the air outlet pipeline is connected with the evacuation pump, and an air outlet valve 604 and a high-resolution particle detector 605 are sequentially arranged on the air outlet pipeline from the adapter cavity B to the evacuation pump.
TABLE 1
| Device | Function of |
| |
Necessary pipeline of ultra-low vacuum-pumping pipeline |
| First gate valve 102 | For controlling the opening and closing of the |
| First |
Air pressure detection |
| First |
Providing suction power |
| A first block valve 105 | Preventing gas from flowing back into the |
| Second pipeline | |
| 201 | Necessary pipeline of ultra-low vacuum-pumping pipeline |
| Second gate valve 202 | For controlling the opening and closing of the |
| Second |
Providing suction power |
| |
Air pressure detection |
| Second block valve 205 | Preventing gas from flowing back into the apparatus |
| |
Necessary pipeline of pre-vacuum pumping pipeline |
| Bypass valve 302 | For controlling the opening and closing of the |
| |
Leak detection pipeline |
| |
For controlling opening and closing of the |
| |
For detecting whether the apparatus is sealed |
| |
Essential line of vacuum pumping pipeline (foreline) |
| |
For controlling the fifth conduit 501Open and close |
| |
Providing suction power |
Second, process design
The design of the process is a big difficulty of the application. Table 2 is a first comparison table of the present application in the design process.
TABLE 2
The solution of solution two, also not the best solution, as shown in table 2, apparently reduces one-pass vacuum process compared to solution one; however, the "purging" process of option two progresses very slowly and is very costly with high pressure nitrogen and filter loss. Therefore, the cooperation of vacuum pumping and high cleanliness is a difficult problem.
The following illustrates the process of the present application.
The working method comprises the following steps:
s100, performing multiple vacuumizing operations on the main body cavity A;
s101, vacuumizing for the first time, and reducing the air pressure in the main body cavity A to be below 10 pa: opening a fifth pipeline valve 502, a foreline vacuum pump 503 and a side pumping valve 302, pumping the air pressure of the equipment to be below 10Pa, and closing the side pumping valve;
s102, secondary vacuum pumping:
first, fill air (e.g., air pressure within the apparatus to atmospheric pressure): the clean pipeline system is started, the air inlet valve 603 is opened, and the air outlet valve 604 is still closed; the high-pressure nitrogen passes through the filter 602, then is filtered, and then enters the main body cavity A through the air inlet valve 603;
then, opening a side pumping valve, pumping air, and vacuumizing the box body to below 10 Pa;
s103, vacuumizing for the third time to the n times: same as S102;
the purpose of S101 to S103 is to improve cleanliness (which is considered to be rough replacement, and the cleanliness in the equipment has been improved to some extent).
S200, ventilation operation (fine ventilation):
starting a clean pipeline system: the inlet valve 603 and the outlet valve 604 are both opened;
the high-pressure nitrogen passes through a filter 602, is filtered, enters a main body cavity A through an air inlet valve 603, and then passes through an air outlet valve 604 and a high-resolution particle detector 605; the particle number of the gas can be monitored in real time by the high-resolution particle detector 605, so that whether the interior of the main body cavity A reaches the CLASS1 grade standard or not is known;
s300, after the cleanliness of the nitrogen gas obtained by monitoring of the high-resolution particle detector 605 meets the CLASS 1-level standard; starting and closing a clean pipeline system;
s400, S400, opening a fifth pipeline valve, a preceding stage vacuum pump and a side pumping valve, pumping the air pressure of the equipment to be below 10Pa, and closing the side pumping valve;
then, the molecular pump was started to evacuate to 10 -2 pa～10 -3 pa；
Then, the heating cover starts to work, and the outer surfaces of the main body cavity A and the switching cavity B are heated; the first gate valve and the second gate valve are kept open;
stopping heating after heating for a certain time;
during the temperature reduction process, the vacuum degree is reduced to 5 x 10 -7 Pa。
The test system provided by the application generally needs several days when a test is carried out, and if an air leakage point exists, the test is not meaningful.
For a device, large missing points are easy to find. Mainly small leak points are difficult to find. In particular: the vacuum degree reaches 10 -5～ 10 -6 pa, the vacuum degree can not be reduced any more when the molecular pump is started for a long time. At this time, it can be considered that: the device still has small missing points.
Therefore, leak detection also belongs to the necessary process:
if the vacuum degree is not continuously pumped in S400, the following description is given: when the system has a certain air leakage point (or the sealing degree is not enough; because the influence of the inert gas is eliminated at this time), the leak detection valve 402 is opened, and the fifth pipeline valve 502 is closed; and then helium is sprayed to each part of the box body on the outer side, and if a gas leakage point exists at the position, the leak detector can detect the gas leakage point.
< III, two difficulties in the design Process >
The first difficulty in the design process is the main pump selection.
For the apparatus of the present application, the selection method is as follows:
the main pump selection can be generally determined by the effective pumping speed, and the effective pumping speed Sp (L/s) at the pumping port of the container formed by the equipment is calculated by adopting the following formula:
P j ultimate vacuum degree [ Pa ] that the equipment can reach]As a design value;
P 0 extreme vacuum [ Pa ] of vacuum pump]，
Q 0 Gas load of the vacuum chamber (including leakage, outgas from the surface of the material, etc.) Pa.L/S during idle, after a long period of evacuation]Taking the air output after 24 hours of air extraction as a parameter;
Q 0 in a high vacuum state, the gas output of the vacuum container mainly depends on the gas output of the material in the vacuum cavity, which can be calculated by the following formula:
Q 0 ＝A×q
a-the effective surface area in the container formed by the equipment, which can be determined by measurement after the equipment is manufactured;
q-the normal temperature outgassing rate of the material in the vacuum container, unit: pa.L/(s.c)m 2 ) And can be determined by measurement.
A second challenge in the design process is how the number of ventilations and inflation pressure are determined in S100.
For this problem, the following analysis was performed:
the total number of particles in the original equipment is x, the rate of each time of reduction is y (the process of S100 inflation-vacuum pumping is the same, and y is assumed to be unchanged), and the number of times of vacuum pumping of S100 is n;
the total number of particles remaining z can be expressed as:
z＝x·(1-y) n
for the rate of decrease, it follows the S-curve law with the inflation pressure. I.e. at an inflation pressure of 0, y =0 (no gas entering, no abatement); the inflation pressure is ∞, y =1.0 (i.e. the gas charged is infinite and the particles are all depleted).
Based on the above formula, it can be seen that for different P 1 、P 2 In terms of:
therefore, the results of the parameters A and B can be known by measuring two groups of values P and n.
Based on the above theoretical analysis, the form of the fitted formula can be known through data analysis of the apparatus of the present application.
The unit of P in the above formula is atmospheric pressure, i.e., 1 atmosphere, 1.5 atmospheres.
That is, the inflation pressure is P atmospheres, the number of times of evacuation (assuming that y divided into the first evacuation is the same as the subsequent evacuation and has little influence on the calculation result) is:
The above formula is mainly used as a basis for guiding downstream customers to use.
The above-mentioned embodiments are only for convenience of illustration and are not intended to limit the invention in any way, and those skilled in the art will understand that the technical features of the invention can be modified or changed by other equivalent embodiments without departing from the scope of the invention.
Claims (1)
1. An environment shaping method is applied to a test system; characterized in that the test system comprises: the device comprises a main body cavity, 2 switching cavities, a heating cover, a main body cavity vacuum pipeline system and a clean pipeline system;
the switching cavity, the main body cavity and the other switching cavity are communicated in sequence;
the main body cavity is placed in a robot hand; the adapter cavity is used for placing raw materials;
heating covers are arranged on the outer sides of the main body cavity and the switching cavity;
the main body cavity is provided with an upper cover, and the upper cover is used for feeding and discharging materials;
wherein, main part chamber vacuum piping system includes: the pipeline comprises a first pipeline, a second pipeline, a third pipeline, a fourth pipeline and a fifth pipeline;
the first pipeline, the second pipeline and the third pipeline are connected between the main body cavity and the fourth pipeline in a variable connection mode;
according to the direction from the main body cavity to the fourth pipeline, install in proper order on first pipeline: install in proper order on first pipeline: the device comprises a first gate valve, a first molecular pump, a first low gauge and a first isolating valve; according to the direction from the main body cavity to the fourth pipeline, the second pipeline is sequentially provided with: the second gate valve, the second molecular pump, the second low gauge and the second isolating valve; a side pumping valve is arranged on the third pipeline; a leak detector is arranged at the end part of the fourth pipeline, and a leak detection valve is also arranged on the fourth pipeline; one end of the leak detection valve is connected with a leak detection instrument, and the other end of the leak detection valve is connected with a fourth pipeline; the fourth pipeline is also connected with a fifth pipeline, the end part of the fifth pipeline is provided with a preceding stage vacuum pump, and the fifth pipeline is also provided with a fifth pipeline valve; one end of a fifth pipeline valve is connected with the preceding stage vacuum pump, and the other end of the fifth pipeline valve is connected with a fifth pipeline;
wherein, clean pipe-line system includes: an air inlet pipeline and an air outlet pipeline; the one end and the nitrogen gas source of air inlet pipeline are connected, and its other end is connected with the switching chamber, from the direction of nitrogen gas source to switching chamber, install in proper order on air inlet pipeline: a meter, a filter, an intake valve;
one end of the gas outlet pipeline is connected with the other adapter cavity, the other end of the gas outlet pipeline is connected with the evacuation pump, and a gas outlet valve and a high-resolution particle detector are sequentially arranged on the gas outlet pipeline from the adapter cavity to the evacuation pump;
the adopted environment forming method comprises the following steps: the environment requirement is high cleanliness plus ultra-high vacuum environment; which comprises the following steps:
s100, performing multiple vacuumizing operations on the main body cavity, wherein the multiple vacuumizing operations comprise substeps S101-S103;
s101, vacuumizing for the first time, and reducing the air pressure in the main body cavity to be below 10 pa: opening a fifth pipeline valve, a preceding stage vacuum pump and a side pumping valve, pumping the air pressure of the equipment to be below 10Pa, and closing the side pumping valve;
s102, secondary vacuumizing: firstly, inflating: the clean pipeline system is started, the air inlet valve is opened, and the air outlet valve is still closed; high-pressure nitrogen passes through the filter, is filtered and then enters the main body cavity A through the air inlet valve; then, opening a side pumping valve, pumping air, and vacuumizing the box body to below 10 Pa;
s103, vacuumizing for the third time to the n times: same as S102;
wherein n is determined by the following method: and the inflation pressure in S100 is P atmospheric pressures, and the vacuumizing times n are as follows:
n={ln0.2/[ln（1-1/（1+e 2（1-0.125P） ））] }；
s200, ventilation operation: starting a clean pipeline system: the air inlet valve and the air outlet valve are both opened; high-pressure nitrogen passes through a filter, is filtered, enters the main body cavity through an air inlet valve, and then passes through an air outlet valve and a high-resolution particle detector; the high-resolution particle detector can monitor the particle quantity of the gas in real time;
s300, after the cleanliness of nitrogen gas obtained by monitoring of the high-resolution particle detector meets the CLASS 1-level standard; starting and closing a clean pipeline system;
s400, opening a fifth pipeline valve, a preceding stage vacuum pump and a side pumping valve, pumping the air pressure of the equipment to be below 10Pa, and closing the side pumping valve; then, the molecular pump was started to evacuate to 10 -2 pa~10 -3 pa; then, the heating cover starts to work to heat the outer surfaces of the main body cavity and the switching cavity; the first gate valve and the second gate valve are kept open; stopping heating after heating for a certain time; in the process of temperature reduction, the vacuum degree is reduced to 5 multiplied by 10 -7 Pa。
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