CN216556501U

CN216556501U - Tail row structure and LPCVD (low pressure chemical vapor deposition) equipment with same

Info

Publication number: CN216556501U
Application number: CN202122924307.9U
Authority: CN
Inventors: 张勇; 李锐; 罗伟斌; 李美诗
Original assignee: Shenzhen Headquarter SC New Energy Technology Corp
Current assignee: Shenzhen Headquarter SC New Energy Technology Corp
Priority date: 2021-11-25
Filing date: 2021-11-25
Publication date: 2022-05-17
Anticipated expiration: 2031-11-25

Abstract

The utility model discloses a tail bank structure and an LPCVD (low pressure chemical vapor deposition) device with the same. The tail row structure can be used as an alternative passage after other pipelines are damaged; the air pressure control valve can be used when the air pressure does not need to be accurately controlled, so that the use of the control regulating valve is reduced, and the service life of the control regulating valve is prolonged; the gas discharge problem when the equipment is abnormal can be treated more safely and effectively, and gases such as waste gas in the furnace tube and the like are conveyed to the tail gas treatment device.

Description

Tail row structure and LPCVD (low pressure chemical vapor deposition) equipment with same

Technical Field

The utility model relates to the field of LPCVD (Low Pressure Chemical Vapor Deposition) systems, in particular to a tail row structure and LPCVD equipment with the tail row structure.

Background

LPCVD is the deposition of a thin film on the surface of a substrate (silicon wafer, etc.) by a gas chemical reaction. The method is widely used for depositing polycrystalline silicon, silicon oxide, doped polycrystalline silicon, nitride, zinc oxide and the like, and meanwhile, the LPCVD equipment can also prepare a tunneling oxide layer (hereinafter referred to as an oxide layer for short), the oxide layer has great influence on the photoelectric conversion efficiency of the photovoltaic cell, and the oxide layer is one of the most key structures of the high-efficiency photovoltaic cell.

The deposition reaction is carried out in the reaction chamber, the tail exhaust structure is used for effectively conveying gases such as waste gas of the reaction chamber to a tail gas treatment plant system, proper process pressure is formed in the reaction chamber, deposition quality and efficiency are ensured, and the tail gas treatment plant system belongs to a structural unit with more key equipment. The process gas in the furnace tube is harmful to human bodies, is inflammable and explosive, and has strong toxicity in the gases such as phosphane, borane and the like. At present, tail exhaust structure, when vacuum pump assembly card is dead, equipment outage abnormal conditions such as, gas can be dead in boiler tube and tail exhaust pipe, perhaps when the abnormal conditions such as boiler tube internal gas pressure is big, also has the mode of exhaust gas through the factory's affair exhaust pipe, and these circumstances still have the safety risk, consequently, the abnormal handling is loaded down with trivial details, consuming time for a long time.

SUMMERY OF THE UTILITY MODEL

The present invention is directed to solving at least one of the problems of the prior art.

Therefore, the utility model provides a tail discharge structure which can be used as a spare pipeline, can prolong the service life of a control regulating valve, safely and effectively solves the problem of gas discharge when equipment is abnormal, and improves the product quality and the production capacity.

The utility model also provides LPCVD equipment with the tail row structure.

The tail bank structure according to an embodiment of the first aspect of the present invention includes:

the gas inlet end of the first pipeline assembly is communicated with the gas outlet end of the furnace tube, and the first pipeline assembly comprises a first valve and a control regulating valve which are sequentially arranged along the gas flow direction;

the gas inlet end of the second pipeline is used for being communicated with the gas outlet end of the furnace tube, a second valve is arranged on the second pipeline, and the gas outlet end of the second valve is communicated with the gas outlet end of the control regulating valve;

the air inlet end of the vacuum pump assembly is communicated with the air outlet end of the control regulating valve;

and the third pipeline is connected with the first pipeline assembly and/or the vacuum pump assembly in parallel, and a third valve is arranged on the third pipeline.

The tail row structure provided by the embodiment of the utility model at least has the following beneficial effects: the third pipeline is added in the tail row structure and can be used as an alternative passage after other pipelines are damaged; the air pressure control valve can be used when the air pressure does not need to be accurately controlled, so that the use of the control regulating valve is reduced, and the service life of the control regulating valve is prolonged; the gas discharge problem when the equipment is abnormal can be treated more safely and effectively, and gases such as waste gas in the furnace tube and the like are conveyed to the tail gas treatment device.

In some embodiments of the utility model, the third pipeline is connected in parallel with the first pipeline assembly and the vacuum pump assembly, the gas inlet end of the third valve is used for communicating with the gas outlet end of the furnace tube, and the gas outlet end of the third valve is communicated with the gas outlet end of the vacuum pump assembly.

In some embodiments of the utility model, the third pipeline is connected in parallel with the first pipeline assembly, the gas inlet end of the third valve is used for communicating with the gas outlet end of the furnace tube, and the gas outlet end of the third valve is communicated with the gas outlet end of the control regulating valve.

In some embodiments of the utility model, the third pipeline is connected in parallel with the vacuum pump assembly, the inlet end of the third valve is communicated with the outlet end of the control regulating valve, and the outlet end of the third valve is communicated with the outlet end of the vacuum pump assembly.

In some embodiments of the present invention, the tail gas exhaust structure includes a fourth pipeline, a fourth valve is disposed on the fourth pipeline, a gas inlet end of the fourth valve is communicated with a gas outlet end of the control regulating valve, and a gas outlet end of the fourth valve is communicated with a gas outlet end of the vacuum pump assembly.

In some embodiments of the present invention, the intake end of the vacuum pump assembly is in communication with a pre-pump filter.

In some embodiments of the present invention, a check valve is disposed on the third pipeline, and an airflow direction of the first check valve is from the furnace tube to the tail gas treatment device.

The LPCVD apparatus according to the second aspect of the embodiment of the present invention comprises a furnace tube, a tail gas exhaust structure according to the first aspect of the embodiment of the present invention, and a tail gas treatment device which are sequentially communicated.

The LPCVD equipment provided by the embodiment of the utility model has at least the following beneficial effects: by adopting the tail discharge structure, the use of a control regulating valve is reduced, the product quality is effectively improved, the shutdown maintenance time is greatly shortened, the time for preparing a product process is greatly shortened, the overall productivity is greatly improved, the tail discharge structure is also favorable for safely and effectively treating the gas discharge problem when equipment is abnormal, and gases such as waste gas in a furnace tube are conveyed into a tail gas treatment device.

In some embodiments of the utility model, the furnace tubes and the tail row structure are communicated through detachable process pipelines.

In some embodiments of the utility model, the process pipeline is connected to the furnace tube by a flange device.

Additional aspects and advantages of the utility model will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the utility model.

Drawings

The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

FIG. 1 is a schematic diagram of a first tail bank configuration according to an embodiment of the present invention;

FIG. 2 is a schematic diagram of a second tail bank configuration in accordance with an embodiment of the present invention;

FIG. 3 is a schematic view of a third tail row configuration in accordance with an embodiment of the present invention;

fig. 4 is a schematic view illustrating a connection between a tail row structure and a furnace tube tail according to an embodiment of the present invention.

Reference numerals:

a pressure switch 110;

a first pipeline assembly 121, a first valve 122, a control regulating valve 123;

a second line 131, a second valve 132, a first flow rate regulating valve 133, a second check valve 134;

vacuum pump assembly 140, pre-pump filter 141;

a third line 151, a third valve 152, a second flow rate adjustment valve 153, and a first check valve 154;

a fourth line 161, a fourth valve 162;

furnace tube 201, process pipeline 301, flange device 302, bellows 303, tail gas processing apparatus 401.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.

In the description of the present invention, it is to be understood that the plurality of means are two or more, and the above, below, inside and the like are understood to include the present numbers. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.

In the description of the present invention, unless otherwise explicitly limited, terms such as arrangement, installation, connection and the like should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific contents of the technical solutions.

Referring to fig. 1 to 3, the tail row structure according to the embodiment of the present invention includes a first pipe assembly 121, a second pipe 131, a vacuum pump assembly 140, and a third pipe 151.

The gas inlet end of the first pipeline assembly 121 is used for communicating with the gas outlet end of the furnace tube 201, the first pipeline assembly 121 comprises a first valve 122 and a control regulating valve 123 which are sequentially arranged along the gas flow direction, wherein the first valve 122 is used for controlling the on and off of gas flowing through the first pipeline assembly 121, and the control regulating valve 123 is used for controlling the gas pressure with high precision; the gas inlet end of the second pipeline 131 is used for communicating with the gas outlet end of the furnace tube 201, a second valve 132 is arranged on the second pipeline 131, the gas outlet end of the second valve 132 is communicated with the gas outlet end of the control regulating valve 123, wherein the second valve 132 is used for controlling the on/off of the gas flowing through the second pipeline 131; the gas inlet end of the vacuum pump assembly 140 is communicated with the gas outlet end of the control regulating valve 123, wherein the vacuum pump assembly 140 is used for pumping out gas in the furnace tube 201; a third pipeline 151, the third pipeline 151 being connected in parallel with the first pipeline assembly 121 and/or the vacuum pump assembly 140, the third pipeline 151 being provided with a third valve 152.

It should be noted that, as shown in fig. 1 to fig. 3, the air outlet of the vacuum pump assembly 140 is communicated with the air inlet of the exhaust gas treatment device 401.

Specifically, as shown in fig. 1, the third pipeline 151 is connected in parallel with the first pipeline assembly 121 and the vacuum pump assembly 140, a gas inlet end of the third valve 152 is used for communicating with a gas outlet end of the furnace tube 201, and a gas outlet end of the third valve 152 is communicated with a gas outlet end of the vacuum pump assembly 140.

Specifically, as shown in fig. 2, the third pipeline 151 is connected in parallel to the first pipeline assembly 121, the gas inlet end of the third valve 152 is used for communicating with the gas outlet end of the furnace tube 201, and the gas outlet end of the third valve 152 is communicated with the gas outlet end of the control regulating valve 123.

Specifically, as shown in FIG. 3, the third line 151 is connected in parallel to the vacuum pump assembly 140, the inlet of the third valve 152 is connected to the outlet of the control valve 123, and the outlet of the third valve 152 is connected to the outlet of the vacuum pump assembly 140.

It is understood that, as shown in fig. 1 and 3, the gas outlet of the third valve 152 may be communicated with the gas outlet of the vacuum pump assembly 140, and the gas is collected and flows to the exhaust gas treatment device 401; the outlet end of the third valve 152 may also be in direct communication with the inlet end of the exhaust gas treatment device 401.

The control regulating valve 123 is preferably a butterfly valve which has a simple structure and can control the air pressure with high precision.

Specifically, when the tail gas exhaust structure shown in fig. 1 is used for exhausting waste gas, the third valve 152 is opened, nitrogen enters the furnace tube 201 from the gas inlet end of the furnace tube 201, and enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201 together with the waste gas in the furnace tube 201, and the nitrogen and the waste gas flow through the third pipeline 151 in the tail gas exhaust structure and enter the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401; when the gas pressure in the furnace tube 201 is too high, the third valve 152 is opened, and the first valve 122 and the second valve 132 are also opened to assist in pressure relief, so as to prevent the furnace tube 201 from being damaged, nitrogen enters the furnace tube 201 from the gas inlet end of the furnace tube 201, enters the tail gas exhaust structure together with the exhaust gas in the furnace tube 201 from the gas outlet end of the furnace tube 201, enters the first pipeline assembly 121, the second pipeline 131 and the third pipeline 151 through the gas inlet end of the tail gas exhaust structure, and after the gas entering the first pipeline assembly 121 and the second pipeline 131 flows through the vacuum pump assembly 140, the gas flowing out of the third pipeline 151 and the gas flowing out of the gas outlet end of the vacuum pump assembly 140 are collected and enter the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401.

Specifically, when the tail gas exhaust structure shown in fig. 2 is used for exhausting waste gas, the third valve 152 is opened, nitrogen enters the furnace tube 201 from the gas inlet end of the furnace tube 201, and enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201 together with the waste gas in the furnace tube 201, and the nitrogen and the waste gas flow through the third pipeline 151, the vacuum pump assembly 140 and enter the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401 in the tail gas exhaust structure; when the gas pressure in the furnace tube 201 is too high, the third valve 152 is opened, and the first valve 122 and the second valve 132 are also opened to assist in pressure relief, so as to prevent the furnace tube 201 from being damaged, nitrogen enters the furnace tube 201 from the gas inlet end of the furnace tube 201, enters the tail exhaust structure together with the exhaust gas in the furnace tube 201 from the gas outlet end of the furnace tube 201, enters the first pipeline assembly 121, the second pipeline 131 and the third pipeline 151 respectively after passing through the gas inlet end of the tail exhaust structure, then is collected to the gas inlet end of the vacuum pump assembly 140, and enters the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401 after passing through the vacuum pump assembly 140.

Specifically, when the tail gas exhaust structure shown in fig. 3 is used for exhausting the exhaust gas, the first valve 122, the second valve 132 and the third valve 152 are opened, nitrogen enters the furnace tube 201 from the gas inlet end of the furnace tube 201, enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201 together with the exhaust gas in the furnace tube 201, enters the first pipeline assembly 121 and the second pipeline 131 through the gas inlet end of the tail gas exhaust structure, flows through the third pipeline 151 after being collected at the gas inlet end of the third pipeline 151, and enters the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401.

It is understood that the exhaust structure as shown in fig. 2 is not suitable for exhausting the exhaust gas when an abnormality occurs in the vacuum pump assembly 140.

Specifically, when the tail row structure shown in fig. 1 is used in an oxide layer preparation process, the method includes the following steps: s1: the material to be treated is placed on a quartz boat in the furnace tube 201, and is in a normal pressure state at the moment; s2: only opening the first valve 122 and the vacuum pump assembly 140, and vacuumizing to a first preset air pressure range (for example, the first preset air pressure range is 10-50mbar), wherein the gas in the furnace tube 201 enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201, flows through the first pipeline assembly 121 and the vacuum pump assembly 140, and finally enters the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401; s3: carrying out leak detection on the pipeline; s4: if the leak detection result of the step S3 shows that the gas does not leak, the temperature is raised to the process temperature for preparing the oxide layer, and the temperature is kept for 1min to ensure the temperature precision in the furnace tube 201, otherwise, the preparation of the oxide layer is suspended; s5: closing the first valve 122 and the vacuum pump assembly 140, opening the third valve 152, and rapidly introducing oxygen into the furnace tube 201 to raise the pressure of the furnace tube 201 to a second predetermined pressure range (for example, the second predetermined pressure range is 800-; s6: the third valve 152 is closed to prepare an oxide layer.

Specifically, when the tail row structure shown in fig. 2 is used in the oxide layer preparation process, the method includes the following steps: s1: the material to be treated is placed on a quartz boat in the furnace tube 201, and is in a normal pressure state at the moment; s2: only opening the first valve 122 and the vacuum pump assembly 140, and vacuumizing to a first preset air pressure range (for example, the first preset air pressure range is 10-50mbar), wherein the gas in the furnace tube 201 enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201, flows through the first pipeline assembly 121 and the vacuum pump assembly 140, and finally enters the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401; s3: carrying out leak detection on the pipeline; s4: if the leak detection result of the step S3 shows that the gas does not leak, the temperature is raised to the process temperature for preparing the oxide layer, and the temperature is kept for 1min to ensure the temperature precision in the furnace tube 201, otherwise, the preparation of the oxide layer is suspended; s5: closing the first valve 122 and the vacuum pump assembly 140, opening the third valve 152, and rapidly introducing oxygen into the furnace 201 to raise the pressure of the furnace 201 to a second predetermined pressure range (for example, the second predetermined pressure range is 800-; s6: the third valve 152 is closed to prepare an oxide layer.

Specifically, when the tail row structure shown in fig. 3 is used in the oxide layer preparation process, the method includes the following steps: s1: the material to be treated is placed on a quartz boat in the furnace tube 201, and is in a normal pressure state at the moment; s2: only opening the first valve 122 and the vacuum pump assembly 140, and vacuumizing to a first preset air pressure range (for example, the first preset air pressure range is 10-50mbar), wherein the gas in the furnace tube 201 enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201, flows through the first pipeline assembly 121 and the vacuum pump assembly 140, and finally enters the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401; s3: carrying out leak detection on the pipeline; s4: if the leak detection result of the step S3 shows that the gas does not leak, the temperature is raised to the process temperature for preparing the oxide layer, and the temperature is kept for 1min to ensure the temperature precision in the furnace tube 201, otherwise, the preparation of the oxide layer is suspended; s5: closing the vacuum pump assembly 140, opening the third valve 152, and rapidly introducing oxygen into the furnace tube 201 to raise the pressure of the furnace tube 201 to a second predetermined pressure range (for example, the second predetermined pressure range is 800-; s6: the third valve 152 is closed to prepare an oxide layer.

It should be noted that, when the tail row structure shown in fig. 3 is used in the oxide layer preparation process, the loss of the control regulating valve 123 is large, which increases the equipment maintenance cost and man-hour.

It should be noted that, when any of the tail-gate structures shown in fig. 1-3 is used in the oxide layer preparation process, when step S2 is implemented, the second valve 132 and the vacuum pump assembly 140 may be opened first, and when the pressure in the furnace tube 201 is reduced to a range close to the first predetermined pressure, the second valve 132 is closed, and the first valve 122 is opened, so as to further precisely regulate the pressure in the furnace tube 201. This can reduce the service time of the control regulating valve 123, improve the service life and the precision of the control regulating valve 123, and reduce the equipment maintenance cost and man-hour.

As shown in fig. 1-3, the tail gas exhaust device includes a pressure switch 110, an air outlet end of the pressure switch 110 is communicated with an air inlet end of the first pipeline assembly 121, and an air inlet end of the pressure switch 110 is used for being communicated with an air outlet end of the furnace tube 201. The pressure switch 110 can be used for detecting a pressure signal of gas in the furnace tube 201 to realize pressure monitoring and control. It should be noted that the connection mode of the pressure switch includes, but is not limited to, the above mode, and can be adjusted as required.

In some embodiments of the present invention, the second pipeline 131 is further provided with a first flow regulating valve 133, an inlet end of the first flow regulating valve 133 is communicated with an outlet end of the second valve 132, and an outlet end of the first flow regulating valve 133 is communicated with an outlet end of the control regulating valve 123 for regulating the flow of the gas flowing through the second pipeline 131. For example, when the gas pressure in the furnace 201 is too high, the gas in the furnace 201 is exhausted by using the tail-exhaust structure as shown in fig. 3, and the flow rate of the gas flowing through the second pipeline 131 is adjusted by adjusting the first flow rate adjusting valve 133, so that the gas pressure in the furnace 201 is prevented from being lowered due to too fast gas leakage in the furnace 201, the time loss caused by abnormal conditions is reduced, and the productivity is improved.

In some embodiments of the present invention, as shown in fig. 1-2, a second flow regulating valve 153 is further disposed on the third pipeline 151 for regulating the flow of the gas flowing through the third pipeline 151. As shown in fig. 1, an inlet end of the second flow regulating valve 153 is communicated with an outlet end of the third valve 152, and an outlet end of the second flow regulating valve 153 is communicated with an outlet end of the vacuum pump assembly 140; as shown in fig. 2, the inlet end of the second flow rate adjustment valve 153 communicates with the outlet end of the third valve 152, and the outlet end of the second flow rate adjustment valve 153 communicates with the outlet end of the control adjustment valve 123. For example, when the gas pressure in the furnace 201 is too high, and the tail discharge structure shown in fig. 1 is used to discharge the exhaust gas in the furnace 201, the second flow regulating valve 153 is regulated to regulate the flow rate of the gas flowing through the third pipeline 151, so that the decrease of the gas pressure in the furnace 201 due to too fast gas discharge in the furnace 201 can be avoided, the time loss caused by abnormal conditions can be reduced, and the productivity can be improved.

It should be noted that the third valve 152 is an electrically operated valve to avoid the risk of the leakage of the pipeline exhaust gas to the human health when the exhaust gas is exhausted.

In some embodiments of the present invention, as shown in fig. 2, the exhaust structure further includes a fourth pipeline 161, the fourth pipeline 161 is provided with a fourth valve 162, an air inlet of the fourth valve 162 is communicated with an air outlet of the control regulating valve 123, and an air outlet of the fourth valve 162 is communicated with an air outlet of the vacuum pump assembly 140. The fourth pipeline 161 may be used for exhausting or as a spare pipeline, and the fourth valve 162 is used for controlling the gas flowing through the fourth pipeline 161. For example, when the tail gas exhaust structure shown in fig. 2 is used for exhausting waste gas, the third valve 152 and the fourth valve 162 are opened, nitrogen enters the furnace tube 201 from the gas inlet end of the furnace tube 201, and enters the tail gas exhaust structure from the gas outlet end of the furnace tube 201 together with the waste gas in the furnace tube 201, the nitrogen and the waste gas flow through the third pipeline 151 and the fourth pipeline 161 in the tail gas exhaust structure, and enter the tail gas treatment device 401 from the gas inlet end of the tail gas treatment device 401, so that a situation that the waste gas cannot be exhausted due to the fact that the vacuum pump assembly 140 is locked and cannot operate can be avoided, loss of the vacuum pump assembly 140 can be reduced, and the service life of the vacuum pump assembly 140 can be prolonged.

It should be noted that the fourth valve 162 is an electrically operated valve to avoid the threat of the leakage of the pipeline exhaust gas to the human health when the exhaust gas is exhausted.

In some embodiments of the present invention, as shown in fig. 1 to fig. 3, the air inlet end of the vacuum pump assembly 140 is further connected to a pre-pump filter 141, wherein the pre-pump filter 141 is used for filtering gaseous dust impurities, so as to reduce damage of the dust impurities to the vacuum pump assembly 140, reduce maintenance difficulty and maintenance cost of the vacuum pump assembly 140, and reduce influence of the gaseous dust impurities on product quality.

In some embodiments of the present invention, the third pipeline 151 is provided with a first check valve 154, and the gas flow direction of the first check valve 154 is from the furnace 201 to the tail gas treatment device 401. The first one-way valve 154 can be used to prevent the tail gas from flowing backward, and avoid affecting the preparation and quality of the product. The particular location of the first check valve 154 on the third conduit 151 can be adjusted as desired.

It should be noted that the second pipeline 131 may be provided with a second check valve 134, and the airflow direction of the second check valve 134 is from the furnace tube 201 to the tail gas treatment device 401. The second check valve 134 can be used to prevent the tail gas from flowing backward, and avoid affecting the preparation and quality of the product. The specific location of the second check valve 134 on the second conduit 131 can be adjusted as desired.

It should be noted that the tail structure provided by the present invention is not only suitable for LPCVD equipment, but also suitable for Plasma Enhanced Chemical Vapor Deposition (PECVD), Atomic Layer Deposition (ALD), and other equipment.

The LPCVD apparatus according to the second embodiment of the present invention includes a furnace 201, the above-mentioned tail gas exhaust structure, and a tail gas treatment device 401.

According to the LPCVD equipment of the embodiment of the utility model, by adopting the tail row structure, the use of the control regulating valve 123 can be reduced, the product quality is effectively improved, the shutdown maintenance time is greatly shortened, the time for preparing the product is greatly shortened, the overall productivity is greatly improved, the problem of gas emission when the equipment is abnormal is safely and effectively solved, and gases such as waste gas in the furnace tube 201 are conveyed into the tail gas treatment device 401.

Referring to fig. 4, the furnace tube 201 is communicated with the tail row structure through a detachable process pipeline 301. So as to be convenient for dismounting the furnace tube, being beneficial to the operation and reducing the influence of dismounting the furnace tube on the production.

It can be understood that the number of the process pipelines 301 can be multiple, the process pipelines 301 are connected in sequence, the connection mode among the process pipelines 301 is detachable connection or integrated molding, the detachable connection is convenient for maintaining the pipelines, and the integrated molding has good air tightness. The detachable connection may be a flange connection, a threaded connection, or the like.

In some embodiments of the present invention, the process pipeline 301 is connected to the gas outlet end of the furnace 201 by a flange device 302, so as to facilitate the disassembly and assembly of the furnace 201.

It is understood that the connection of the process pipe 301 to the gas outlet end of the furnace 201 includes, but is not limited to, flange connection.

It can be understood that, as shown in fig. 4, the LPCVD apparatus further includes a corrugated tube 303, an air inlet end of the corrugated tube 303 is communicated with an air outlet end of the furnace tube 201, and an air outlet end of the corrugated tube 303 is communicated with an air inlet end of the process pipeline 301, so as to facilitate installation, and meanwhile, the positional deviation between the furnace tube 201 and the tail row structure can be accommodated.

It is understood that the vacuum pump assembly 140 and other devices need to be disposed at positions away from the furnace 201 for easy assembly and disassembly of the furnace 201.

While the preferred embodiments of the present invention have been described, the present invention is not limited to the above embodiments, and those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of the present invention, and such equivalent modifications or substitutions are included in the scope of the present invention defined by the claims.

Claims

1. A tail bank structure, comprising:

the gas inlet end of the first pipeline assembly (121) is communicated with the gas outlet end of the furnace tube (201), and the first pipeline assembly (121) comprises a first valve (122) and a control regulating valve (123) which are sequentially arranged along the gas flow direction;

the gas inlet end of the second pipeline (131) is used for being communicated with the gas outlet end of the furnace tube (201), a second valve (132) is arranged on the second pipeline (131), and the gas outlet end of the second valve (132) is communicated with the gas outlet end of the control regulating valve (123);

a vacuum pump assembly (140), wherein the air inlet end of the vacuum pump assembly (140) is communicated with the air outlet end of the control regulating valve (123);

a third pipeline (151), the third pipeline (151) is connected in parallel with the first pipeline assembly (121) and/or the vacuum pump assembly (140), and a third valve (152) is arranged on the third pipeline (151).

2. The tail bank structure of claim 1, wherein the third pipeline (151) is connected in parallel with the first pipeline assembly (121) and the vacuum pump assembly (140), the gas inlet end of the third valve (152) is used for communicating with the gas outlet end of the furnace tube (201), and the gas outlet end of the third valve (152) is communicated with the gas outlet end of the vacuum pump assembly (140).

3. The tail gas exhaust structure according to claim 1, wherein the third pipeline (151) is connected in parallel with the first pipeline assembly (121), the gas inlet end of the third valve (152) is used for communicating with the gas outlet end of the furnace tube (201), and the gas outlet end of the third valve (152) is communicated with the gas outlet end of the control regulating valve (123).

4. The exhaust arrangement according to claim 1, wherein the third line (151) is connected in parallel to the vacuum pump assembly (140), an inlet end of the third valve (152) is in communication with an outlet end of the control regulating valve (123), and an outlet end of the third valve (152) is in communication with an outlet end of the vacuum pump assembly (140).

5. The exhaust tail structure according to claim 3, characterized in that the exhaust tail structure comprises a fourth pipeline (161), a fourth valve (162) is arranged on the fourth pipeline (161), an air inlet end of the fourth valve (162) is communicated with an air outlet end of the control regulating valve (123), and an air outlet end of the fourth valve (162) is communicated with an air outlet end of the vacuum pump assembly (140).

6. The tail bank structure according to claim 1, wherein an air inlet end of the vacuum pump assembly (140) is communicated with a pre-pump filter (141).

7. The tail gas exhaust structure according to claim 1, wherein a first check valve (154) is arranged on the third pipeline (151), and the gas flow direction of the first check valve (154) is from the furnace tube (201) to the tail gas treatment device (401).

8. An LPCVD apparatus, characterized by comprising a furnace tube (201), a tail row structure according to any one of claims 1 to 7, and a tail gas treatment device (401) which are connected in sequence.

9. The LPCVD apparatus according to claim 8, wherein the furnace tubes (201) communicate with the tail row structure via detachable process piping (301).

10. LPCVD installation according to claim 9, characterized in that the process line (301) is connected to the furnace tube (201) by means of a flange device (302).