CN213511091U - Vacuum pipeline system for trace impurity replacement - Google Patents
Vacuum pipeline system for trace impurity replacement Download PDFInfo
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- CN213511091U CN213511091U CN202021066154.8U CN202021066154U CN213511091U CN 213511091 U CN213511091 U CN 213511091U CN 202021066154 U CN202021066154 U CN 202021066154U CN 213511091 U CN213511091 U CN 213511091U
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Abstract
The utility model relates to a vacuum pipe-line system for trace impurity replacement belongs to gas piping system technical field. The pipeline system of the utility model comprises a vacuum pump, a bent pipe, a vacuum air inlet main pipe, more than one equipment unit to be evacuated, an evacuation main valve, a vacuum gauge and an exhaust unit, wherein the vacuum air inlet main pipe, the vacuum pump and the exhaust unit are sequentially connected, the evacuation main valve and the vacuum gauge are arranged on the vacuum air inlet main pipe, the equipment unit to be evacuated is connected with the vacuum air inlet main pipe through the upward bent pipe, and the bent pipe design prevents welding slag and rust from entering the evacuation control valve, thereby prolonging the service life of the valve; the reasonable layout of the installation positions of the equipment units to be evacuated can reduce the loss of vacuum degree; the safety valve and the buffer tank which are additionally arranged on the pipeline system can avoid the impact of high-pressure gas on the vacuum pump, and the vacuumizing effect is improved.
Description
Technical Field
The utility model relates to a vacuum pipe-line system for trace impurity replacement belongs to gas piping system technical field.
Background
Ultra-high purity gas, high purity electronic mixed gas and other special gases are supplied to various fields of semiconductors, photovoltaics, optical fibers, LEDs, LCD technologies and the like, and the purity of the gas (including content indexes of gaseous impurities and fine particles) has great influence on the performance of semiconductor devices, so that the production process of the special gases needs the support of a vacuum system to ensure the purity of the gas.
In a vacuum system, a vacuum pump is used as a core device, vacuum is generated through mechanical operation, the inside of a closed pipeline system connected with an inlet of the vacuum pump is in a vacuum state, gas in an upstream closed system is pumped out, various trace impurities (such as oxygen, water, carbon monoxide, carbon dioxide and other gaseous impurities in nitrogen and certain fine particles) in the gas are simultaneously discharged, and the replacement effect of the trace impurities is related to the relative vacuum degree, the vacuumizing frequency and the replacement gas purity, namely the larger the absolute value of the relative vacuum degree is, the more the vacuumizing frequency is, the higher the replacement gas purity is, and the better the replacement effect of the trace impurities is. The relative vacuum degree is a difference between the pressure of the object to be measured and the atmospheric pressure of the measurement site, and is a value between 0 and-101.325 kPa (generally, a negative number) when the vacuum is measured. The exhaust gas is exhausted from the exhaust pipe of the vacuum pump.
The upstream pipeline of vacuum system usually need cover a plurality of equipments of waiting to take out, and the gas circuit is relatively complicated, and gaseous state impurity and some tiny particulate matters can be discharged along with the air current, but large granule impurity such as pipeline welding slag and rust can't be discharged, do the short distance along with the air current and remove usually, get into near the control valve of managing the pipeline of managing to find time, damage the part of valve, lead to leaking in the valve.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides a vacuum pipe-line system for trace impurity replacement mainly admits air through the vacuum and is responsible for's structure and layout design, has avoided welding slag and rust to get into the valve of managing to find time, can protect the vacuum valve, reduces the loss of vacuum, improves evacuation efficiency.
The purpose of the utility model is realized through the following technical scheme.
A vacuum pipeline system for replacing trace impurities comprises a vacuum pump, a bent pipe, a vacuum air inlet main pipe, more than one equipment unit to be evacuated, an evacuation main valve, a vacuum gauge and an exhaust unit;
the air inlet of the vacuum pump is connected with one end of the vacuum air inlet main pipe, the other end of the vacuum air inlet main pipe is sealed, and the air outlet of the vacuum pump is connected with the exhaust unit; each equipment unit to be evacuated is connected with the vacuum air inlet main pipe through an upward bent pipe, the bent pipe is connected with the vacuum air inlet main pipe and then moves upwards, and the bent pipe is 5-10 cm higher than the vacuum air inlet main pipe and then is connected with the equipment unit to be evacuated downwards; the main vacuum intake pipe between the bent pipe closest to the vacuum pump and the vacuum pump is successively provided with a main evacuation valve and a vacuum gauge.
Further, the apparatus unit to be evacuated includes an apparatus to be evacuated, an evacuation control valve, and a vacuum intake branch pipe;
one end of the vacuum air inlet branch pipe is connected with equipment to be evacuated, and the other end of the vacuum air inlet branch pipe is connected with the vacuum air inlet main pipe through a bent pipe.
Further, the exhaust unit comprises an exhaust main pipe and an exhaust head;
one end of the exhaust main pipe is connected with the air outlet of the vacuum pump, and the other end of the exhaust main pipe is connected with the exhaust head.
Furthermore, the equipment unit to be pumped is positioned right below the vacuum air inlet main pipe and is close to the vacuum pump as much as possible, so that the loss of vacuum degree is reduced while the operation of personnel and the maintenance of equipment are facilitated.
Furthermore, a safety valve is arranged on the vacuum air inlet main pipe between the bent pipe closest to the vacuum pump and the evacuation main valve, the safety valve is connected with the exhaust unit through a tail gas pipe, and the setting pressure of the safety valve is the air inlet design pressure of the vacuum pump;
when the gas pressure in the vacuum gas inlet main pipe reaches the designed gas inlet pressure of the vacuum pump, gas is discharged from the safety valve and is discharged through the tail gas pipe and the exhaust unit, so that the gas inlet pressure of the vacuum pump is lower than the designed pressure, and the vacuum pump is prevented from being impacted by high-pressure gas caused by misoperation.
Furthermore, a buffer tank is arranged on the vacuum inlet main pipe between the evacuation main valve and the vacuum pump, and the vacuum gauge is arranged on the buffer tank at the moment;
the high-pressure gas is reduced in pressure in the buffer tank, so that the vacuum pipeline system is suitable for vacuumizing the high-pressure gas.
Furthermore, the inner surfaces of the evacuation control valve and the vacuum branch inlet pipe are both of an electro-polishing (EP) grade, so that the adsorptivity of the valve and the pipeline is reduced, and the corrosion resistance is enhanced.
Further, when the trace impurity content of the gas is required to be ppb level, two or more vacuum pumps are connected in series in the piping system.
Further, the vacuum pump is an oil-free vacuum pump; the vacuum gauge can select a resistance gauge or an ionization gauge according to requirements and is used for displaying high vacuum degree.
The evacuation main valve can be opened only when the vacuum pump is started, so that the situation that the evacuation main valve is opened by mistake when the vacuum pump is not started, and air enters the evacuation pipeline system from the exhaust main pipe is avoided; the evacuation control valve can be opened only when the evacuation main valve is opened, preventing air or other piping gases from entering the piping system of the equipment unit to be evacuated.
Has the advantages that:
(1) the joint of the equipment unit to be evacuated and the vacuum intake main pipe is designed by adopting a bent pipe, and the bent pipe is 5-10 cm higher than the vacuum intake main pipe, so that welding slag and rust are prevented from entering the evacuation control valve, and the service life of the valve is prolonged.
(2) The equipment to be evacuated is arranged right below the main vacuum air inlet pipe and is as close as possible to the vacuum pump, so that the loss of vacuum degree is reduced while the operation of personnel and the maintenance of the equipment are facilitated.
(3) The vacuum air inlet main pipe is provided with the safety valve, and air is discharged from the safety valve when the air inlet pressure exceeds the design pressure, so that the air inlet pressure of the vacuum pump is ensured to meet the design, and the impact of high-pressure air on the vacuum pump is avoided.
(4) The buffer tank is arranged in front of the vacuum pump, so that high-pressure air is also suitable for the vacuum pipeline system, and the impact of the high-pressure air on the vacuum pump is avoided.
Drawings
Fig. 1 is a schematic structural view of a vacuum piping system described in embodiment 1.
Fig. 2 is a schematic structural view of the vacuum piping system described in embodiment 2.
Fig. 3 is a schematic structural view of the vacuum piping system described in embodiment 3.
The system comprises a flange blind plate 1, a bent pipe 2, a vacuum air inlet main pipe 3, a vacuum air inlet branch pipe 4, an evacuation control valve 5, equipment to be evacuated 6, an evacuation main valve 7, a vacuum gauge 8, a vacuum pump 9, an exhaust main pipe 10, an exhaust head 11, a safety valve 12, a tail gas pipe 13 and a buffer tank 14.
Detailed Description
The invention will be further explained with reference to the drawings and the detailed description.
In the following examples:
a vacuum pipeline system for replacing trace impurities comprises a vacuum pump 9, a bent pipe 2, a vacuum inlet main pipe 3, more than one equipment unit 6 to be evacuated, an evacuation main valve 7, a vacuum gauge 8 and an exhaust unit;
the apparatus unit to be evacuated includes an apparatus to be evacuated 6, an evacuation control valve 5, and a vacuum intake branch pipe 4;
the exhaust unit comprises an exhaust main pipe 10 and an exhaust head 11;
as shown in fig. 1, the connection relationship between the components in the vacuum piping system is as follows: one end of the vacuum air inlet main pipe 3 is connected with the flange blind plate 1 to realize sealing, the other end of the vacuum air inlet main pipe 3 is connected with an air inlet of a vacuum pump 9, one end of the exhaust main pipe 10 is connected with an air outlet of the vacuum pump 9, and one end of the exhaust main pipe 10 is connected with an exhaust head 11; one end of a branch vacuum air inlet pipe 4 is connected with equipment 6 to be evacuated, the other end of the branch vacuum air inlet pipe 4 is connected with a main vacuum air inlet pipe 3 through an upward bent pipe 2, the bent pipe 2 is connected with the main vacuum air inlet pipe 3 and then moves upwards, is 5-10 cm higher than the main vacuum air inlet pipe 3 and then is connected with the branch vacuum air inlet pipe 4 downwards; an evacuation main valve 7 and a vacuum gauge 8 are sequentially mounted on the vacuum inlet main pipe 3 between the elbow pipe 2 closest to the vacuum pump 9 and the vacuum pump 9.
Furthermore, the equipment unit to be pumped is arranged right below the vacuum air inlet main pipe 3 and is close to the vacuum pump 9 as much as possible, so that the loss of vacuum degree is reduced while the operation of personnel and the maintenance of equipment are facilitated.
Further, the vacuum pipeline system further comprises a safety valve 12 and an exhaust pipe 13; the setting pressure of the safety valve 12 is the air inlet design pressure of the vacuum pump 9, when the gas pressure in the vacuum air inlet main pipe 3 reaches the air inlet design pressure of the vacuum pump 9 or above, the gas is discharged from the safety valve 12 and is discharged through the tail gas pipe 13 and the exhaust unit, so that the air inlet pressure of the vacuum pump 9 is ensured to be lower than the design pressure;
the safety valve 12 is installed on the vacuum intake main pipe 3 between the elbow pipe 2 closest to the vacuum pump 9 and the evacuation main valve 7, one end of the exhaust pipe 13 is connected to the safety valve 12, and the other end of the exhaust pipe 13 is connected to the exhaust main pipe 10, as shown in fig. 2.
Further, the vacuum piping system may further include a buffer tank 14, the buffer tank 14 being disposed between the evacuation main valve 7 and the vacuum pump 9, in which case the vacuum gauge 8 is mounted on the buffer tank 14, as shown in fig. 3;
in case of a failure of the safety valve 12 or no safety valve 12 provided on the main vacuum inlet pipe 3, the high-pressure gas may be depressurized in the buffer tank 14, so that the vacuum piping system is suitable for evacuating the high-pressure gas.
Further, the vacuum pump 9 can be an oil-free vacuum pump, and the vacuum gauge 8 can be a resistance gauge or an ionization gauge as required; the inner surfaces of the evacuation control valve 5 and the vacuum branch intake pipe 4 are all polished electrically, so that the surface adsorptivity is reduced, and the corrosion resistance is enhanced.
Further, when the content of trace impurities in the gas is required to be ppb level, a plurality of vacuum pumps 9 may be selected in series.
Example 1
In the vacuum pipeline system shown in fig. 1, after a vacuum pump 9 is started, an evacuation main valve 7 is opened, after the evacuation main valve 7 is opened, an evacuation control valve 5 is opened, after residual gas in a gas cylinder to be treated (namely, equipment to be evacuated 6) is emptied to be lower than 0.5MPa, the vacuum pipeline system is connected to be vacuumized, a gas cylinder valve is opened, the indication of a vacuum gauge 8 reaches 50Pa and is kept for 20 minutes, the gas cylinder is evacuated to meet the requirement, the gas cylinder valve is closed, and the evacuation is stopped.
Example 2
In the vacuum pipeline system shown in fig. 2, the setting pressure of the safety valve 12 is set to 0.5MPa, the evacuation main valve 7 is opened after the vacuum pump 9 is started, the evacuation control valve 5 is opened after the evacuation main valve 7 is opened, the vacuum pipeline system is accessed for evacuation when the residual gas in the gas cylinder to be processed is 1MPa, the gas cylinder valve is opened, the safety valve 12 is opened when the gas passes through the safety valve 12, the gas is evacuated after passing through the tail gas pipe 13 and the exhaust main pipe 10, the safety valve 12 is closed after the gas pressure reaches below 0.5MPa, the gas continuously enters the vacuum inlet main pipe 3, the indication number of the vacuum gauge 8 reaches 50Pa and is kept for 20 minutes, the gas cylinder is evacuated to meet the requirement, the gas cylinder valve is closed, and the evacuation is stopped.
Example 3
In the vacuum pipeline system shown in fig. 3, the setting pressure of the safety valve 12 is set to 0.5MPa, the evacuation main valve 7 and the evacuation control valve 5 are sequentially opened after the vacuum pump 9 is started, the vacuum pipeline system is accessed for evacuation when the residual gas in the gas cylinder to be processed is 10MPa, the gas cylinder valve is opened, when the gas passes through the safety valve 12, the safety valve 12 is not opened due to a fault, the gas continuously enters the buffer tank 14, the gas pressure in the buffer tank 14 is 0.2MPa, the indication number of the vacuum gauge 8 reaches 50Pa and is kept for 20 minutes, the gas cylinder is evacuated to meet the requirement, the gas cylinder valve is closed, and the evacuation is stopped.
It can be seen from the above three embodiments that the vacuum pipeline system shown in fig. 3 can be used for vacuum pumping of high-pressure gas, and due to the dual functions of the safety valve 12 and the buffer tank 14, the impact of the high-pressure gas on the vacuum pump 9 can be avoided, and the vacuum pumping effect is optimal.
In summary, the above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. A vacuum pipeline system for replacing trace impurities is characterized in that: the pipeline system comprises a vacuum pump, a bent pipe, a vacuum air inlet main pipe, more than one equipment unit to be evacuated, an evacuation main valve, a vacuum gauge and an exhaust unit;
the air inlet of the vacuum pump is connected with one end of the vacuum air inlet main pipe, the other end of the vacuum air inlet main pipe is sealed, and the air outlet of the vacuum pump is connected with the exhaust unit; each equipment unit to be evacuated is connected with the vacuum air inlet main pipe through an upward bent pipe, the bent pipe moves upwards after being connected with the vacuum air inlet main pipe, and is downwards connected with the equipment unit to be evacuated after being 5-10 cm higher than the vacuum air inlet main pipe; the main vacuum intake pipe between the bent pipe closest to the vacuum pump and the vacuum pump is successively provided with a main evacuation valve and a vacuum gauge.
2. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: the equipment unit to be evacuated comprises equipment to be evacuated, an evacuation control valve and a vacuum inlet branch pipe;
one end of the vacuum air inlet branch pipe is connected with equipment to be evacuated, and the other end of the vacuum air inlet branch pipe is connected with the vacuum air inlet main pipe through a bent pipe.
3. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: the exhaust unit comprises an exhaust main pipe and an exhaust head;
one end of the exhaust main pipe is connected with the air outlet of the vacuum pump, and the other end of the exhaust main pipe is connected with the exhaust head.
4. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: the equipment unit to be pumped out is positioned right below the vacuum air inlet main pipe and is as close to the vacuum pump as possible.
5. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: and a safety valve is also arranged on the vacuum air inlet main pipe between the bent pipe closest to the vacuum pump and the evacuation main valve, the safety valve is connected with the exhaust unit through a tail gas pipe, and the setting pressure of the safety valve is the air inlet design pressure of the vacuum pump.
6. A vacuum pipe system for trace impurity replacement according to any one of claims 1 to 5, wherein: a buffer tank is also arranged on the vacuum inlet main pipe between the evacuation main valve and the vacuum pump, and the vacuum gauge is arranged on the buffer tank at the moment.
7. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: the inner surface of the evacuation control valve and the inner surface of the vacuum intake manifold are both of an electropolishing grade.
8. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: the vacuum pump is an oilless vacuum pump.
9. The vacuum line system for trace impurity replacement as claimed in claim 1, wherein: when the content of trace impurities of the gas is required to be ppb level, more than two vacuum pumps are connected in series in the pipeline system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021066154.8U CN213511091U (en) | 2020-06-11 | 2020-06-11 | Vacuum pipeline system for trace impurity replacement |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021066154.8U CN213511091U (en) | 2020-06-11 | 2020-06-11 | Vacuum pipeline system for trace impurity replacement |
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| CN213511091U true CN213511091U (en) | 2021-06-22 |
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| CN202021066154.8U Active CN213511091U (en) | 2020-06-11 | 2020-06-11 | Vacuum pipeline system for trace impurity replacement |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114720803A (en) * | 2022-04-05 | 2022-07-08 | 苏州中科科美科技有限公司 | Environment forming method and test system |
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2020
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114720803A (en) * | 2022-04-05 | 2022-07-08 | 苏州中科科美科技有限公司 | Environment forming method and test system |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 057550 No. five Weir Road, chemical industry gathering area, Feixiang District, Handan, Hebei, 1 Patentee after: China shipbuilding (Handan) Perry Special Gas Co.,Ltd. Address before: No.1 Weiwu Road, chemical industry gathering area, Feixiang County, Handan City, Hebei Province Patentee before: PERIC SPECIAL GASES Co.,Ltd. |
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| CP03 | Change of name, title or address |