CN114375544A - 弹性波器件 - Google Patents

弹性波器件 Download PDF

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Publication number
CN114375544A
CN114375544A CN202080056332.5A CN202080056332A CN114375544A CN 114375544 A CN114375544 A CN 114375544A CN 202080056332 A CN202080056332 A CN 202080056332A CN 114375544 A CN114375544 A CN 114375544A
Authority
CN
China
Prior art keywords
phi
piezoelectric substrate
theta
film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080056332.5A
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English (en)
Chinese (zh)
Inventor
门田道雄
田中秀治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Tohoku University NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohoku University NUC filed Critical Tohoku University NUC
Publication of CN114375544A publication Critical patent/CN114375544A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/175—Acoustic mirrors
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
    • H03H9/02031—Characteristics of piezoelectric layers, e.g. cutting angles consisting of ceramic
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02062—Details relating to the vibration mode
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/56—Monolithic crystal filters
    • H03H9/564—Monolithic crystal filters implemented with thin-film techniques
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/56—Monolithic crystal filters
    • H03H9/566—Electric coupling means therefor
    • H03H9/568—Electric coupling means therefor consisting of a ladder configuration
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/542—Filters comprising resonators of piezoelectric or electrostrictive material including passive elements

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
CN202080056332.5A 2019-08-08 2020-08-04 弹性波器件 Pending CN114375544A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019-145908 2019-08-08
JP2019145908 2019-08-08
PCT/JP2020/029759 WO2021025004A1 (ja) 2019-08-08 2020-08-04 弾性波デバイス

Publications (1)

Publication Number Publication Date
CN114375544A true CN114375544A (zh) 2022-04-19

Family

ID=74502981

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080056332.5A Pending CN114375544A (zh) 2019-08-08 2020-08-04 弹性波器件

Country Status (4)

Country Link
US (1) US20220294415A1 (https=)
JP (1) JP7527604B2 (https=)
CN (1) CN114375544A (https=)
WO (1) WO2021025004A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7829370B2 (ja) * 2022-03-17 2026-03-13 太陽誘電株式会社 弾性波デバイス、フィルタ、およびマルチプレクサ
JP2023139785A (ja) * 2022-03-22 2023-10-04 リバーエレテック株式会社 弾性波素子及びそれを用いた原子発振器
WO2025211111A1 (ja) * 2024-04-01 2025-10-09 株式会社村田製作所 弾性波フィルタ、マルチプレクサ、高周波フロントエンド回路及び通信装置

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09162683A (ja) * 1995-12-06 1997-06-20 Matsushita Electric Ind Co Ltd 圧電共振子
US20050023932A1 (en) * 2003-07-31 2005-02-03 Tdk Corporation Piezoelectric resonator, filter and electronic component using the same
JP2005318547A (ja) * 2004-03-30 2005-11-10 Sanyo Electric Co Ltd バルク波デバイス
JP2006340007A (ja) * 2005-06-01 2006-12-14 Kyocera Corp 薄膜バルク音響波共振子およびフィルタならびに通信装置
US20130057360A1 (en) * 2010-04-23 2013-03-07 Teknologian Tutkimuskeskus Vtt Wide-band acoustically coupled thin-film baw filter
WO2013031748A1 (ja) * 2011-09-01 2013-03-07 株式会社村田製作所 圧電バルク波装置及びその製造方法
JP2013225945A (ja) * 2010-01-28 2013-10-31 Murata Mfg Co Ltd チューナブルフィルタ
JP2015502065A (ja) * 2011-11-11 2015-01-19 テクノロジアン テュトキムスケスクス ヴェーテーテーＴｅｋｎｏｌｏｇｉａｎ ｔｕｔｋｉｍｕｓｋｅｓｋｕｓ ＶＴＴ 向上した通過帯域特性を有する、横方向に結合されたバルク弾性波フィルタ
WO2016047255A1 (ja) * 2014-09-26 2016-03-31 国立大学法人東北大学 弾性波装置
WO2018097016A1 (ja) * 2016-11-25 2018-05-31 国立大学法人東北大学 弾性波デバイス
JP2018110317A (ja) * 2016-12-29 2018-07-12 新日本無線株式会社 バルク弾性波共振器
US20180205362A1 (en) * 2015-10-23 2018-07-19 Murata Manufacturing Co., Ltd. Elastic wave device
CN109478877A (zh) * 2017-06-30 2019-03-15 株式会社村田制作所 弹性波装置
CN109842397A (zh) * 2017-11-29 2019-06-04 株式会社村田制作所 弹性波装置、高频前端电路以及通信装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8219466B2 (en) * 2002-08-05 2012-07-10 John Yupeng Gui System and method for providing asset management and tracking capabilities
CN110582938B (zh) * 2017-04-26 2023-06-23 株式会社村田制作所 弹性波装置
WO2021172032A1 (ja) * 2020-02-28 2021-09-02 国立大学法人東北大学 弾性波デバイス
CN115021705B (zh) * 2022-06-27 2024-04-09 中国科学院上海微系统与信息技术研究所 一种高频声波谐振器及应用其的滤波器
WO2024032882A1 (en) * 2022-08-10 2024-02-15 Huawei Technologies Co., Ltd. Bulk acoustic resonator device with enhanced power handling capabilities by double layer piezoelectric material

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09162683A (ja) * 1995-12-06 1997-06-20 Matsushita Electric Ind Co Ltd 圧電共振子
US20050023932A1 (en) * 2003-07-31 2005-02-03 Tdk Corporation Piezoelectric resonator, filter and electronic component using the same
JP2005051447A (ja) * 2003-07-31 2005-02-24 Tdk Corp 圧電共振器およびそれを用いたフィルタならびに電子部品
JP2005318547A (ja) * 2004-03-30 2005-11-10 Sanyo Electric Co Ltd バルク波デバイス
JP2006340007A (ja) * 2005-06-01 2006-12-14 Kyocera Corp 薄膜バルク音響波共振子およびフィルタならびに通信装置
JP2013225945A (ja) * 2010-01-28 2013-10-31 Murata Mfg Co Ltd チューナブルフィルタ
JP2013528996A (ja) * 2010-04-23 2013-07-11 テクノロジアン テュトキムスケスクス ヴェーテーテー 広帯域音響結合薄膜ｂａｗフィルタ
US20130057360A1 (en) * 2010-04-23 2013-03-07 Teknologian Tutkimuskeskus Vtt Wide-band acoustically coupled thin-film baw filter
WO2013031748A1 (ja) * 2011-09-01 2013-03-07 株式会社村田製作所 圧電バルク波装置及びその製造方法
JP2015502065A (ja) * 2011-11-11 2015-01-19 テクノロジアン テュトキムスケスクス ヴェーテーテーＴｅｋｎｏｌｏｇｉａｎ ｔｕｔｋｉｍｕｓｋｅｓｋｕｓ ＶＴＴ 向上した通過帯域特性を有する、横方向に結合されたバルク弾性波フィルタ
WO2016047255A1 (ja) * 2014-09-26 2016-03-31 国立大学法人東北大学 弾性波装置
US20180205362A1 (en) * 2015-10-23 2018-07-19 Murata Manufacturing Co., Ltd. Elastic wave device
WO2018097016A1 (ja) * 2016-11-25 2018-05-31 国立大学法人東北大学 弾性波デバイス
JP2018110317A (ja) * 2016-12-29 2018-07-12 新日本無線株式会社 バルク弾性波共振器
CN109478877A (zh) * 2017-06-30 2019-03-15 株式会社村田制作所 弹性波装置
CN109842397A (zh) * 2017-11-29 2019-06-04 株式会社村田制作所 弹性波装置、高频前端电路以及通信装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
吴勇;吴孟强;蒋松涛;钟朝位;张树人;: "Ipsu薄膜体声波器件及其在通信系统中的应用", 四川大学学报(自然科学版), no. 06, 28 December 2007 (2007-12-28) *
陆晓欣;朱嘉琦;王赛;刘罡;刘远鹏;袁欣薇;霍施宇;: "以四面体非晶碳为布拉格反射栅高声阻抗材料的固贴式薄膜体声波谐振器性能仿真分析", 功能材料, no. 14, 30 July 2012 (2012-07-30) *

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US20220294415A1 (en) 2022-09-15
WO2021025004A1 (ja) 2021-02-11
JP7527604B2 (ja) 2024-08-05
JPWO2021025004A1 (https=) 2021-02-11

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Effective date of registration: 20250925

Address after: Kyoto Prefecture, Nagaoka, Tokyo, Beijing, East China, 1 feet, 1 orders, 10 times

Applicant after: Murata Manufacturing Co.,Ltd.

Country or region after: Japan

Address before: Miyagi Prefecture in Japan

Applicant before: TOHOKU University

Country or region before: Japan

TA01 Transfer of patent application right