CN113994485B - 图像显示装置的制造方法以及图像显示装置 - Google Patents

图像显示装置的制造方法以及图像显示装置

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Publication number
CN113994485B
CN113994485B CN202080043754.9A CN202080043754A CN113994485B CN 113994485 B CN113994485 B CN 113994485B CN 202080043754 A CN202080043754 A CN 202080043754A CN 113994485 B CN113994485 B CN 113994485B
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CN
China
Prior art keywords
layer
light
wiring
insulating film
semiconductor layer
Prior art date
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Active
Application number
CN202080043754.9A
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English (en)
Chinese (zh)
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CN113994485A (zh
Inventor
秋元肇
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Nichia Corp
Original Assignee
Nichia Corp
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Publication date
Application filed by Nichia Corp filed Critical Nichia Corp
Publication of CN113994485A publication Critical patent/CN113994485A/zh
Application granted granted Critical
Publication of CN113994485B publication Critical patent/CN113994485B/zh
Active legal-status Critical Current
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0133Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
    • H10H20/01335Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018Bonding of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/833Transparent materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0361Manufacture or treatment of packages of wavelength conversion means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0364Manufacture or treatment of packages of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/84Coatings, e.g. passivation layers or antireflective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • H10H20/8515Wavelength conversion means not being in contact with the bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/857Interconnections, e.g. lead-frames, bond wires or solder balls

Landscapes

  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Led Device Packages (AREA)
  • Led Devices (AREA)
CN202080043754.9A 2019-05-10 2020-05-01 图像显示装置的制造方法以及图像显示装置 Active CN113994485B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019-089679 2019-05-10
JP2019089679 2019-05-10
PCT/JP2020/018397 WO2020230667A1 (ja) 2019-05-10 2020-05-01 画像表示装置の製造方法および画像表示装置

Publications (2)

Publication Number Publication Date
CN113994485A CN113994485A (zh) 2022-01-28
CN113994485B true CN113994485B (zh) 2026-03-24

Family

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Country Status (5)

Country Link
US (2) US12087895B2 (https=)
JP (1) JP7484078B2 (https=)
CN (1) CN113994485B (https=)
TW (1) TWI842889B (https=)
WO (1) WO2020230667A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102851311B1 (ko) * 2020-05-14 2025-08-28 삼성디스플레이 주식회사 표시 장치
CN116235305B (zh) 2020-11-25 2026-03-06 日亚化学工业株式会社 图像显示装置的制造方法以及图像显示装置
JP7684851B2 (ja) * 2021-06-29 2025-05-28 株式会社ジャパンディスプレイ 表示装置
TWI843136B (zh) * 2022-02-25 2024-05-21 友達光電股份有限公司 顯示面板與其製作方法
CN115425047B (zh) * 2022-08-26 2025-09-23 湖北长江新型显示产业创新中心有限公司 一种显示面板和显示装置
WO2025206044A1 (ja) * 2024-03-27 2025-10-02 ソニーセミコンダクタソリューションズ株式会社 発光装置および画像表示装置

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CN101529605A (zh) * 2006-10-27 2009-09-09 佳能株式会社 半导体构件、半导体物品制造方法以及使用该制造方法的led阵列
CN107331670A (zh) * 2017-07-10 2017-11-07 深圳市华星光电技术有限公司 显示面板及其制作方法、显示设备
CN108615740A (zh) * 2018-05-26 2018-10-02 矽照光电(厦门)有限公司 柔性有源彩色半导体发光显示模块及柔性显示屏

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JP2002141492A (ja) 2000-10-31 2002-05-17 Canon Inc 発光ダイオードディスプレイパネル及びその製造方法
DE50313254D1 (de) 2002-05-10 2010-12-23 Zeiss Carl Smt Ag Reflektives roentgenmikroskop zur untersuchung von objekten mit wellenlaengen = 100nm in reflexion
JP2009094144A (ja) * 2007-10-04 2009-04-30 Canon Inc 発光素子の製造方法
JP4917582B2 (ja) * 2008-07-25 2012-04-18 住友化学株式会社 アクティブマトリクス基板、ディスプレイパネル、表示装置およびアクティブマトリクス基板の製造方法
JP2010055070A (ja) * 2008-07-30 2010-03-11 Sumitomo Chemical Co Ltd 表示装置および表示装置の製造方法
JP5320270B2 (ja) * 2009-11-25 2013-10-23 株式会社沖データ 表示パネルの製造方法
JP5532908B2 (ja) 2009-12-22 2014-06-25 カシオ計算機株式会社 薄膜トランジスタ及び薄膜トランジスタの製造方法
KR100986560B1 (ko) 2010-02-11 2010-10-07 엘지이노텍 주식회사 발광소자 및 그 제조방법
JP6254674B2 (ja) 2013-03-15 2017-12-27 アップル インコーポレイテッド 冗長性スキームを備えた発光ダイオードディスプレイパネル
US8987765B2 (en) 2013-06-17 2015-03-24 LuxVue Technology Corporation Reflective bank structure and method for integrating a light emitting device
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JP6584799B2 (ja) 2015-03-16 2019-10-02 アルパッド株式会社 半導体発光素子
CN104916527B (zh) * 2015-05-15 2018-03-02 京东方科技集团股份有限公司 显示基板及其制造方法、显示装置
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JP2018066953A (ja) 2016-10-21 2018-04-26 株式会社半導体エネルギー研究所 表示装置の作製方法
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CN111108613B (zh) * 2017-09-13 2024-01-16 夏普株式会社 Led单元、图像显示元件及其制造方法
CN108183156A (zh) * 2017-12-26 2018-06-19 深圳市华星光电技术有限公司 微型发光二极管显示面板及其制作方法
JP7079106B2 (ja) 2018-01-24 2022-06-01 シャープ株式会社 画像表示素子、及び画像表示素子の製造方法
CN109300932B (zh) * 2018-11-12 2024-01-23 严光能 Led显示器及其制作方法

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CN101529605A (zh) * 2006-10-27 2009-09-09 佳能株式会社 半导体构件、半导体物品制造方法以及使用该制造方法的led阵列
CN107331670A (zh) * 2017-07-10 2017-11-07 深圳市华星光电技术有限公司 显示面板及其制作方法、显示设备
CN108615740A (zh) * 2018-05-26 2018-10-02 矽照光电(厦门)有限公司 柔性有源彩色半导体发光显示模块及柔性显示屏

Also Published As

Publication number Publication date
TWI842889B (zh) 2024-05-21
WO2020230667A1 (ja) 2020-11-19
TW202101414A (zh) 2021-01-01
US12087895B2 (en) 2024-09-10
JPWO2020230667A1 (https=) 2020-11-19
US20240395996A1 (en) 2024-11-28
US20220069187A1 (en) 2022-03-03
CN113994485A (zh) 2022-01-28
JP7484078B2 (ja) 2024-05-16

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