CN113777891B - 可移动压板结构及具有该结构的曝光机及曝光机压板方法 - Google Patents

可移动压板结构及具有该结构的曝光机及曝光机压板方法 Download PDF

Info

Publication number
CN113777891B
CN113777891B CN202110954644.4A CN202110954644A CN113777891B CN 113777891 B CN113777891 B CN 113777891B CN 202110954644 A CN202110954644 A CN 202110954644A CN 113777891 B CN113777891 B CN 113777891B
Authority
CN
China
Prior art keywords
pressing plate
exposure
screw rod
movable
driving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110954644.4A
Other languages
English (en)
Chinese (zh)
Other versions
CN113777891A (zh
Inventor
周川
项铭
林垂真
张华�
吴越
冯军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hangzhou Xinjunzhe Micro Nano Technology Co ltd
Original Assignee
Hangzhou Xinnuo Microelectronics Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hangzhou Xinnuo Microelectronics Co ltd filed Critical Hangzhou Xinnuo Microelectronics Co ltd
Priority to CN202110954644.4A priority Critical patent/CN113777891B/zh
Priority to PCT/CN2021/125934 priority patent/WO2023019725A1/fr
Publication of CN113777891A publication Critical patent/CN113777891A/zh
Application granted granted Critical
Publication of CN113777891B publication Critical patent/CN113777891B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN202110954644.4A 2021-08-19 2021-08-19 可移动压板结构及具有该结构的曝光机及曝光机压板方法 Active CN113777891B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202110954644.4A CN113777891B (zh) 2021-08-19 2021-08-19 可移动压板结构及具有该结构的曝光机及曝光机压板方法
PCT/CN2021/125934 WO2023019725A1 (fr) 2021-08-19 2021-10-24 Structure mobile de pressage de carte, machine d'exposition dotée de ladite structure, et procédé de pressage de carte de machine d'exposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110954644.4A CN113777891B (zh) 2021-08-19 2021-08-19 可移动压板结构及具有该结构的曝光机及曝光机压板方法

Publications (2)

Publication Number Publication Date
CN113777891A CN113777891A (zh) 2021-12-10
CN113777891B true CN113777891B (zh) 2022-08-26

Family

ID=78838430

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110954644.4A Active CN113777891B (zh) 2021-08-19 2021-08-19 可移动压板结构及具有该结构的曝光机及曝光机压板方法

Country Status (2)

Country Link
CN (1) CN113777891B (fr)
WO (1) WO2023019725A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115356901B (zh) * 2022-09-23 2023-04-14 广东科视光学技术股份有限公司 一种用于光刻机的压紧装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110398884A (zh) * 2019-07-19 2019-11-01 东莞科视自动化科技有限公司 一种自动曝光机移载pcb夹板机构
CN212433578U (zh) * 2019-12-30 2021-01-29 苏州源卓光电科技有限公司 压板机构及曝光机
CN113777890A (zh) * 2021-08-18 2021-12-10 杭州新诺微电子有限公司 伸缩式压板机构及具有该结构的曝光机及曝光机压板方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08292576A (ja) * 1995-04-21 1996-11-05 Adtec Eng:Kk フィルムマスクを用いる露光装置のプラテン
JP2005101226A (ja) * 2003-09-24 2005-04-14 Hoya Corp 基板保持装置，基板処理装置，基板検査装置及び基板保持方法
JP4425903B2 (ja) * 2006-12-14 2010-03-03 日本精工株式会社 ワークチャック及びその制御方法
JP2013143824A (ja) * 2012-01-11 2013-07-22 Smc Corp 電動アクチュエータ
CN104977815B (zh) * 2015-07-03 2018-02-23 苏州微影激光技术有限公司 直写式曝光系统中的扫描台
CN112130423A (zh) * 2020-09-15 2020-12-25 合肥芯碁微电子装备股份有限公司 直写式光刻机吸盘压板装置及其控制方法
CN215729276U (zh) * 2021-08-19 2022-02-01 杭州新诺微电子有限公司 可移动压板结构及具有该结构的曝光机

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110398884A (zh) * 2019-07-19 2019-11-01 东莞科视自动化科技有限公司 一种自动曝光机移载pcb夹板机构
CN212433578U (zh) * 2019-12-30 2021-01-29 苏州源卓光电科技有限公司 压板机构及曝光机
CN113777890A (zh) * 2021-08-18 2021-12-10 杭州新诺微电子有限公司 伸缩式压板机构及具有该结构的曝光机及曝光机压板方法

Also Published As

Publication number Publication date
CN113777891A (zh) 2021-12-10
WO2023019725A1 (fr) 2023-02-23

Similar Documents

Publication Publication Date Title
CN109250486B (zh) 一种快速取放板装置及其取放设备和取放板方法
CN113777891B (zh) 可移动压板结构及具有该结构的曝光机及曝光机压板方法
CN215729276U (zh) 可移动压板结构及具有该结构的曝光机
CN214604686U (zh) 一种电路板板边切割治具
CN113843637A (zh) 一种可固定不同直径活塞杆的液压缸加工用切削设备
CN112170282A (zh) 一种电子配件加工用pcb电子线路板除尘装置
CN110402027A (zh) 一种用于pcb板的多工位定位开孔机构及其开孔方法
CN214925071U (zh) 一种线路板高效打孔器
CN213859718U (zh) 一种书架板生产用钻孔装置
CN211991018U (zh) 一种变压器骨架加工设备
CN114269078A (zh) 一种用于印刷电路板生产的压合机
CN210432069U (zh) 一种pcb线路板激光雕刻工装用夹具
CN220638171U (zh) 一种pcba生产用分板切割设备
CN219834517U (zh) 一种smt印刷贴片夹具
CN220592557U (zh) 一种pcb板倒角处理装置
CN219275775U (zh) 一种用于零件装配的夹紧旋转机构
CN218735808U (zh) 电子器件生产用固定装置
CN219679148U (zh) 一种电子元器件加工的自动化翻转机构
CN219987781U (zh) 一种物料固定效果好的机械式开料机
CN221158909U (zh) Pcb板高效焊锡装置
CN213857478U (zh) 电机端盖自动攻丝设备
CN216595397U (zh) 一种pcb电路板检测装置
CN216313533U (zh) 一种smt贴片通用夹具
CN212946530U (zh) 一种直线切割机
CN215510733U (zh) 玻璃加工用夹持组件及玻璃加工设备

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20240430

Address after: Room 165-4, Bonded Building, West Side of Bonded Road, Hangzhou Airport Economic Zone, Xiaoshan District, Hangzhou City, Zhejiang Province 310000

Patentee after: Hangzhou Xinjunzhe Micro Nano Technology Co.,Ltd.

Country or region after: China

Address before: 311200 No. 772-28, Yanfeng Village (Natural Village), Nanyang street, Xiaoshan District, Hangzhou City, Zhejiang Province

Patentee before: Hangzhou Xinnuo Microelectronics Co.,Ltd.

Country or region before: China

TR01 Transfer of patent right