CN113355630B - 铝合金表面硬度涂层的制备方法 - Google Patents
铝合金表面硬度涂层的制备方法 Download PDFInfo
- Publication number
- CN113355630B CN113355630B CN202110910984.7A CN202110910984A CN113355630B CN 113355630 B CN113355630 B CN 113355630B CN 202110910984 A CN202110910984 A CN 202110910984A CN 113355630 B CN113355630 B CN 113355630B
- Authority
- CN
- China
- Prior art keywords
- target
- aluminum alloy
- altin
- zraltin
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
- C23C8/12—Oxidising using elemental oxygen or ozone
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C16/00—Alloys based on zirconium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
本申请涉及物理气相沉积成膜方法,具体为铝合金表面硬度涂层的制备方法。本申请在铝合金表面通过过渡层结构及交替复合膜层的制备,得到较高硬度的涂层,涂层与基体间结合性能也得到了改善。ZrAlTiN/AlTiN多层复合涂层结构设计,能够改善层间残余应力、硬度和断裂韧性之间的平衡,防止裂纹扩散。
Description
技术领域
本申请涉及物理气相沉积成膜方法,具体为铝合金表面硬度涂层的制备方法。
背景技术
铝合金,其具有比强度高、加工和成形性好、成本低以及可维修性好等一系列优点,被广泛应用于航空航天领域。火箭导弹等航天器的筒段、燃料箱、构件、骨架、外罩等结构部件和飞机的机翼、大梁等都大量使用了铝合金材料。铝合金材料较其他金属,比重量更低,有利于飞行器的减重,提高飞行经济性,增大航程。但是现有铝合金材料存在硬度不足的问题,当表面存在划痕或受外力后出现凹凸变形后,会影响飞行器的整体气动外形和结构强度。
物理气相沉积是新兴的一种表面涂层制备方法,可分为蒸镀、磁控溅射、离子镀等,其在高硬度膜层制备上的应用已经广泛展开,但是膜层与基体间的性质差异会导致膜基间存在开裂脱落的趋势,此外由于高硬度涂层自身内应力较高也存在产生裂纹的风险。
发明内容
本申请在铝合金表面通过过渡层及交替复合膜层的制备,得到较高硬度的涂层,涂层与基体间结合性能也得到了改善。具体的制备方法包括以下步骤:
基底预轰击:将处理腔加热至350~450℃,对腔体抽真空,使气压降至1×10-2-5×10-2Pa;打开基体偏压至-800~-1000V,然后通入25~30sccm的氩气,对铝合金基体表面进行Ar+轰击,在清洁基体表面的同时,使得铝合金基底表面暴露于腔室中,提高表面活性,便于后续反应能够进行。
制备得到氧化铝层:通入100~150sccm的O2,调整气压至0 .6~1 .5Pa,偏压为-60~-150V,使得被Ar+轰击后的铝合金表面氧化,得到氧化铝层。得到的氧化铝层起到过渡的作用,使得基体与后续物理气相沉积法制备得到的涂层之间结合力提高。
制备得到AlN过渡层:将基体偏压调至-80~-180V,通入250~400sccm的N2,点燃Al靶,调节气压至1×10-3-5×10-3Pa,腔室温度仍维持在350~450℃,脉冲电弧电源输出平均电流60~90A,频率:5~200Hz,占空比30%,沉积0.3微米厚度AlN过渡层,避免后续涂层与基体之间亲和性差异较大、层间应力过高。
制备ZrAlTiN/AlTiN交替复合层:基体置于腔室中心位置,ZrAlTi靶与AlTi靶分别置于基体两侧,基体在支架的带动下旋转,旋转速度1.5r/min,交替面向ZrAlTi靶与AlTi靶,最终溅射得到ZrAlTiN/AlTiN交替多层结构,通入25~40sccm的N2,调节气压至1×10-3-5×10-3Pa,真空腔室温度350~450℃,偏压-150~-180V,ZrAlTi靶、AlTi靶脉冲电流分别为90A和40A,ZrAlTiN/AlTiN复合层中ZrAlTiN层与AlTiN层调制比为2:1,调制周期为30~35nm最终,打开真空室取出样品,冷却至室温。该交替复合层中形成ZrN、AlTiN等氮化物相,硬度较高,采用交替多层结构能够降低涂层的内应力,提高涂层韧性,降低层间开裂的趋势。
ZrAlTi靶成分为:Zr 81.7At%,Al 15.2At%,Ti 3.1At%;
AlTi靶成分为:Al 50At%,Ti 50At%。
本申请在铝合金表面通过过渡层结构及交替复合膜层的制备,得到较高硬度的涂层,涂层与基体间结合性能也得到了改善。ZrAlTiN/AlTiN多层复合涂层结构设计,能够改善层间残余应力、硬度和断裂韧性之间的平衡,防止裂纹扩散。
具体实施方式
实施例1
基底预轰击:将处理腔加热至400℃,对腔体抽真空,使气压降至3×10-2Pa;打开基体偏压至-900V,然后通入30sccm的氩气;
制备得到氧化铝层:通入100sccm的O2,调整气压至1Pa,偏压为-110V,使得被Ar+轰击后的铝合金表面氧化,得到氧化铝层;
制备得到AlN过渡层:将基体偏压调至-100V,通入350sccm的N2,点燃Al靶,调节气压至3×10-3Pa,腔室温度仍维持在400℃,脉冲电弧电源输出平均电流70A,频率:110Hz,占空比30%,沉积0.3微米厚度AlN过渡层,避免后续涂层与基体之间亲和性差异较大、层间应力过高。
制备ZrAlTiN/AlTiN交替复合层:基体置于腔室中心位置,ZrAlTi靶与AlTi靶分别置于基体两侧,基体在支架的带动下旋转,旋转速度1.5r/min,交替面向ZrAlTi靶与AlTi靶,最终溅射得到ZrAlTiN/AlTiN交替多层结构,通入30sccm的N2,调节气压至2×10-3Pa,真空腔室温度400℃,偏压-150V,ZrAlTi靶、AlTi靶脉冲电流分别为90A和40A,ZrAlTiN/AlTiN复合层中ZrAlTiN层与AlTiN层调制比为2:1,调制周期为30~35nm;ZrAlTi靶成分为:Zr81.7At%,Al 15.2At%,Ti 3.1At%;AlTi靶成分为:Al 50At%,Ti 50At%。交替复合层中形成ZrN、AlTiN等氮化物相,硬度较高,采用交替多层结构能够降低涂层的内应力,提高涂层韧性,降低层间开裂的趋势,划痕法检测结合力达到60N,硬度为32.1GPa。
实施例2
基底预轰击:将处理腔加热至420℃,对腔体抽真空,使气压降至4×10-2Pa;打开基体偏压至-850V,然后通入30sccm的氩气;
制备得到氧化铝层:通入150sccm的O2,调整气压至1.2Pa,偏压为-100V,使得被Ar+轰击后的铝合金表面氧化,得到氧化铝层;
制备得到AlN过渡层:将基体偏压调至-90V,通入400sccm的N2,点燃Al靶,调节气压至2×10-3Pa,腔室温度仍维持在400℃,脉冲电弧电源输出平均电流70A,频率:110Hz,占空比30%,沉积0.3微米厚度AlN过渡层,避免后续涂层与基体之间亲和性差异较大、层间应力过高。
制备ZrAlTiN/AlTiN交替复合层:基体置于腔室中心位置,ZrAlTi靶与AlTi靶分别置于基体两侧,基体在支架的带动下旋转,旋转速度1.5r/min,交替面向ZrAlTi靶与AlTi靶,最终溅射得到ZrAlTiN/AlTiN交替多层结构,通入40sccm的N2,调节气压至2×10-3Pa,真空腔室温度400℃,偏压-160V,ZrAlTi靶、AlTi靶脉冲电流分别为90A和40A,ZrAlTiN/AlTiN复合层中ZrAlTiN层与AlTiN层调制比为2:1,调制周期为30~35nm;ZrAlTi靶成分为:Zr81.7At%,Al 15.2At%,Ti 3.1At%;AlTi靶成分为:Al 50At%,Ti 50At%。交替复合层中形成ZrN、AlTiN等氮化物相,硬度较高,采用交替多层结构能够降低涂层的内应力,提高涂层韧性,降低层间开裂的趋势,划痕法检测结合力达到63N,硬度为31.4GPa。
Claims (2)
1.一种铝合金表面硬度涂层的制备方法,其特征在于,
制备得到氧化铝层:通入100~150sccm的O2,调整气压至0 .6~1 .5Pa,偏压为-60~-150V,使得被Ar+轰击后的铝合金表面氧化,得到氧化铝层;
制备得到AlN过渡层:将基体偏压调至-80~-180V,通入250~400sccm的N2,点燃Al靶,调节气压至1×10-3~5×10-3Pa,腔室温度仍维持在350~450℃,脉冲电弧电源输出平均电流60~90A,频率:5~200Hz,占空比30%;
制备ZrAlTiN/AlTiN交替复合层:通入25~40sccm的N2,调节气压至1×10-3~5×10- 3Pa,真空腔室温度350~450℃,偏压-150~-180V,ZrAlTi靶、AlTi靶脉冲电流分别为90A和40A,ZrAlTi靶成分为:Zr 81.7At%,Al 15.2At%,Ti 3.1At%;AlTi靶成分为:Al 50At%,Ti50At%,ZrAlTiN/AlTiN复合层中ZrAlTiN层与AlTiN层调制比为2:1,调制周期为30~35nm,制备ZrAlTiN/AlTiN交替复合层过程中基体置于腔室中心位置,ZrAlTi靶与AlTi靶分别置于基体两侧,基体在支架的带动下旋转,旋转速度1.5r/min,交替面向ZrAlTi靶与AlTi靶,溅射得到ZrAlTiN/AlTiN交替多层结构,最终,打开真空室取出样品,冷却至室温。
2.根据权利要求1所述的制备方法,其特征在于,还包括基底预轰击步骤,将处理腔加热至350~450℃,对腔体抽真空,使气压降至1×10-2~5×10-2Pa;打开基体偏压至-800~-1000V,然后通入25~30sccm的氩气,对铝合金基体表面进行Ar+轰击,在清洁基体表面的同时,使得铝合金基底表面暴露于腔室中,提高表面活性,便于后续反应能够进行。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110910984.7A CN113355630B (zh) | 2021-08-10 | 2021-08-10 | 铝合金表面硬度涂层的制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110910984.7A CN113355630B (zh) | 2021-08-10 | 2021-08-10 | 铝合金表面硬度涂层的制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113355630A CN113355630A (zh) | 2021-09-07 |
CN113355630B true CN113355630B (zh) | 2021-10-29 |
Family
ID=77540863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110910984.7A Active CN113355630B (zh) | 2021-08-10 | 2021-08-10 | 铝合金表面硬度涂层的制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN113355630B (zh) |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6433071A (en) * | 1987-07-30 | 1989-02-02 | Toshiba Corp | Ceramic sintered body |
US7582521B2 (en) * | 2007-05-04 | 2009-09-01 | Texas Instruments Incorporated | Dual metal gates for mugfet device |
CN101709450B (zh) * | 2009-11-30 | 2011-06-15 | 沈阳大学 | 一种氮化锆钛铝氮梯度硬质反应膜的制备方法 |
US8887532B2 (en) * | 2010-08-24 | 2014-11-18 | Corning Incorporated | Glass-forming tools and methods |
CN102321868A (zh) * | 2011-09-15 | 2012-01-18 | 吴江市精工铝字制造厂 | 一种泡沫铝材料的抗高温氧化涂层的制备工艺 |
CN103354220B (zh) * | 2013-06-17 | 2016-04-20 | 苏州晶品光电科技有限公司 | 用于光学和电子器件的图案化结构基板 |
US9971073B2 (en) * | 2014-04-14 | 2018-05-15 | Corning Incorporated | Enhanced performance metallic based optical mirror substrates |
CN104060230B (zh) * | 2014-04-25 | 2017-06-06 | 湛江师范学院 | 一种TiZrAlSiON纳米复合超硬涂层刀具及其制备方法 |
CN104152857B (zh) * | 2014-08-13 | 2017-05-17 | 徐州力泰钢结构有限公司 | 一种高硬度TiAlZrN/CrN纳米多层涂层及其制备方法 |
CN104928637B (zh) * | 2015-05-19 | 2017-12-22 | 上海新弧源涂层技术有限公司 | 高硬度CrAlSiN纳米复合结构保护性涂层及其制备方法 |
KR101753104B1 (ko) * | 2015-09-18 | 2017-07-05 | 한국야금 주식회사 | 절삭공구용 경질피막 |
KR102064172B1 (ko) * | 2017-09-01 | 2020-01-09 | 한국야금 주식회사 | 내마모성과 인성이 우수한 경질피막 |
CN108754415B (zh) * | 2018-04-28 | 2020-11-17 | 广东工业大学 | 一种周期性多层纳米结构AlTiN/AlCrSiN硬质涂层及其制备方法和应用 |
KR102112084B1 (ko) * | 2018-11-30 | 2020-05-18 | 한국야금 주식회사 | 절삭공구용 경질피막 |
CN110670019B (zh) * | 2019-10-14 | 2021-04-02 | 四川大学 | 一种抗月牙洼磨损的铝钛锆氮与氧化铝多层复合涂层及其制备方法 |
CN111304612B (zh) * | 2020-03-30 | 2022-02-08 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | 具有高硬度和高抗氧化性能的CrAlN/AlN纳米多层涂层及其制备方法 |
-
2021
- 2021-08-10 CN CN202110910984.7A patent/CN113355630B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN113355630A (zh) | 2021-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109161841B (zh) | 一种AlCrN/AlCrSiN超硬纳米复合多层涂层及其制备方法和应用 | |
CN108690956B (zh) | 电弧离子镀-磁控溅射复合沉积高温耐磨减摩AlTiN纳米多层涂层及其制备方法和应用 | |
CN111349901B (zh) | 一种切削刀具用耐高温氧化铝厚膜涂层的制备方法 | |
CN111621752A (zh) | AlCrSiN/AlCrN/AlCrON/AlCrN多层纳米复合涂层的制备工艺 | |
CN110306190A (zh) | 一种多元纳米梯度涂层刀具及其制备方法 | |
CN113652659B (zh) | 一种与基体冶金结合的高熵合金氮化物涂层的制备方法 | |
CN101310969B (zh) | 一种用于Ti-Al合金的Al/Al2O3/MCrAlY复合涂层及制备方法 | |
US8293345B1 (en) | Device housing and method for making the same | |
CN102560338B (zh) | 一种金属陶瓷涂层及其制备方法 | |
CN113355630B (zh) | 铝合金表面硬度涂层的制备方法 | |
CN110158035B (zh) | 耐高温海洋环境腐蚀的金属-金属氮化物多层涂层及制备 | |
CN101294284A (zh) | 一种耐冲蚀抗疲劳等离子表面复合强化方法 | |
CN111020497B (zh) | 一种周期性多层结构AlTiN/AlCrO涂层及其制备方法 | |
CN109957756A (zh) | 一种铝/氧化铝复合阻氢涂层 | |
CN114351087B (zh) | 一种CrAlVSiN涂层的制备方法 | |
CN114293148A (zh) | 一种钛合金表面修复与强化功能涂层一体化的涂层材料及其制备方法和应用 | |
GB2606327A (en) | Thermal protection system for lightweight hypersonic missile fin | |
CN113174571A (zh) | 一种超微晶二硼化钛复合涂层及其制备方法和应用 | |
CN111850483A (zh) | 一种多层梯度硬质涂层及其制备工艺 | |
CN112941461A (zh) | 一种复合超硬强韧涂层材料以及制备方法 | |
CN114164405B (zh) | 刀具厚膜氮化物涂层及其制备方法 | |
CN110656313A (zh) | 一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 | |
CN109234672B (zh) | 一种用于γ-AlTi合金防护的耐高温熔盐腐蚀纳米多层复合涂层及其制备方法 | |
CN114134371B (zh) | 一种TiAl合金用双层抗氧化涂层及其制备方法 | |
CN110565051A (zh) | 具有颜色层的金刚石涂层刀具及其制备方法、加工设备 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: Area B, No.1 Factory building, No.26 Siwei Road, development zone, Dongli District, Tianjin Patentee after: BEIJING AEROSPACE TIANMEI TECHNOLOGY Co.,Ltd. Patentee after: Beijing Aerospace Hexing Technology Co., Ltd Address before: Area B, No.1 Factory building, No.26 Siwei Road, development zone, Dongli District, Tianjin Patentee before: BEIJING AEROSPACE TIANMEI TECHNOLOGY Co.,Ltd. Patentee before: Beijing Aerospace Hexing Technology Co., Ltd |
|
CP01 | Change in the name or title of a patent holder |