CN110656313A - 一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 - Google Patents
一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 Download PDFInfo
- Publication number
- CN110656313A CN110656313A CN201910974708.XA CN201910974708A CN110656313A CN 110656313 A CN110656313 A CN 110656313A CN 201910974708 A CN201910974708 A CN 201910974708A CN 110656313 A CN110656313 A CN 110656313A
- Authority
- CN
- China
- Prior art keywords
- layer
- substrate
- oxide
- coating
- nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0676—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Abstract
本发明公布的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层是由CoNiCrAlY高熵合金粘结层、α‑Cr2O3氧化物模板层、α‑Al2O3氧化物支撑层、AlZrON氮氧化物衔接层、AlZrN氮化物耐磨层五个子层构成的整体,这五个子层的顺序是由内至外,涂层总厚度为1~2.5μm。其制备方法为:硬质合金基底被加热和离子刻蚀后,先利用电弧蒸发镀工艺在基底上沉积CoNiCrAlY层;然后使用磁控溅射工艺,再继续依次沉积α‑Cr2O3层、α‑Al2O3层、AlZrON层和AlZrN层。高熵合金粘结层的采用及不同功能子层的配合,使得涂层与硬质合金基底之间结合牢固,且涂层综合性能优良,工艺简单,易于实施。
Description
技术领域
本发明属于切削刀具表面涂层技术领域,具体涉及一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法。
背景技术
表面涂层是对切削刀具表面进行改性的重要途径。刀具上涂层的制备方法主要包括化学气相沉积技术(CVD)和物理沉积技术(PVD)两大类型。相比于CVD技术,PVD技术具有沉积温度低、对刀具基底材料性质影响小、可适用的刀具基底材料范围广等特点,特别是PVD中的磁控溅射技术制备的硬质涂层还具有表面质量好的优点,这对精密加工非常重要。但是,PVD涂层技术存在一个不足,即沉积粒子的能量低,从而使得沉积的涂层与基底之间结合性能较差。
随着切削加工要求不断提高和刀具加工条件的苛刻化,单一结构形式的硬质涂层的应用越来越受到局限;相反地,多层涂层、复杂结构涂层成为刀具涂层发展的趋势,尤其是以α-Al2O3涂层与氮化物涂层相结合的多层复合涂层具有非常广阔的应用前景。目前的CVD刀具涂层大多数都是α-Al2O3涂层与(碳)氮化物涂层相结合的多层复合涂层。但是,PVD涂层技术温度低的特点使得该方法在制备α晶体结构的Al2O3受到阻碍,因为沉积温度过低,能量不足,沉积的Al2O3通常为非晶结构或呈其他类型的晶体结构。即便是磁控溅射技术成功制备出晶体结构完整的α-Al2O3涂层,α-Al2O3氧化物涂层与氮化物涂层的结合以及涂层与基底材料的结合仍需不断探索。
发明内容
本发明的目的是克服现有技术存在的问题,提供一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层。
本发明的另一目的是提供一种上述与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层的制备方法。
本发明提供的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,涂层是由高熵合金粘结层、氧化物模板层、氧化物支撑层、氮氧化物衔接层、氮化物耐磨层五个子层构成的整体,这五个子层的顺序是由内至外,涂层总厚度为1~2.5μm。
其中,上述涂层中,所述高熵合金粘结层为CoaNibCrcAldYe,a+b+c+d+e=1,a、b、c、d、e的取值范围为0.15~0.4,厚度为50~200nm。
其中,上述涂层中,所述氧化物模板层为α-Cr2O3,厚度为100~300nm。
其中,上述涂层中,所述氧化物支撑层为α-Al2O3,厚度为500~1000nm。
其中,上述涂层中,所述氮氧化物衔接层为AlZrON,厚度为50~200nm。
其中,上述涂层中,所述氮化物耐磨层为AlZrN,厚度为300~800nm。
本发明提供的上述与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层的制备方法,包括以下步骤:
A、将清洁的基底材料装入涂层设备真空室中,抽真空并加热;
B、对基底表面进行离子刻蚀;
C、利用电弧蒸镀工艺制备高熵合金粘结层;
D、利用磁控溅射工艺制备氧化物模板层;
E、利用磁控溅射工艺制备氧化物支撑层;
F、利用磁控溅射工艺制备氮氧化物衔接层;
G、利用磁控溅射工艺制备氮化物耐磨层。
其中,上述方法步骤A中,所述抽真空并加热是先将背底真空抽至0.05Pa及以下时,打开炉壁的辅助加热装置对基底进行加热,同时打开机架转动电源使基底在真空室内进行自转和公转运动,至基底温度达到380℃;上述方法步骤B中,所述离子刻蚀是向真空室中通入氩气,调节氩气流量保证压强为0.1~0.25Pa,然后对基底施加-100~-200V的直流偏压和-200~-400V的脉冲偏压,利用离化的Ar+对基底表面进行刻蚀,刻蚀30~90min;上述方法步骤C中,所述电弧蒸镀工艺制备高熵合金粘结的工作压强为0.1~0.2Pa,蒸镀坩埚上通过的电弧电流为180~220A,蒸镀坩埚内放置的材料为CoaNibCrcAldYe高熵合金, a+b+c+d+e=1,a、b、c、d、e的取值范围为0.15~0.4,蒸镀时间为5~10min;上述方法步骤D中,所述磁控溅射工艺制备氧化物模板层的工作气体为Ar+O2,工作压强为0.2~0.45Pa,工作靶材为Cr溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间10~30min;上述方法步骤E中,所述磁控溅射工艺制备氧化物支撑层的工作气体为Ar+O2,工作压强为0.2~0.45Pa,工作靶材为Al溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间60~120min;上述方法步骤F中,所述磁控溅射工艺制备氮氧化物衔接层的工作气体为N2+O2,工作压强为0.2~0.45Pa,工作靶材为AlZr合金溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间8~20min;上述方法步骤G中,所述磁控溅射工艺制备氮化物耐磨层的工作气体为N2,工作压强为0.2~0.45Pa,工作靶材为AlZr合金溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间30~70min。
本发明与现有技术相比,具有如下优点:
1)本发明提供的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层由功能与成分均不同的五个子层构成,首先,高熵合金粘结层相比于传统的Cr、Ti纯金属粘结层及TiAl合金粘结层而言,具有更高的强韧性,能在刀具基底材料与表面涂层材料之间起到很好的粘结作用,使涂层与基底结合牢固,解决了金属陶瓷与涂层结合强度较低的问题;其次,使用的α-Cr2O3氧化物模板层有利于Al2O3按照α-Cr2O3的晶体结构结构外延生长,解决了物理气相沉积法由于温度低制备α-Al2O3困难的问题;再次,α-Al2O3氧化物支撑层与AlZrN氮化物耐磨层相结合,避免了单纯氧化物涂层硬度低、耐磨性不足的问题和单纯氮化物涂层热稳定性差、抗氧化性能不足的问题;最后,AlZrON氮氧化物衔接层实现了α-Al2O3层与AlZrN层的有机过渡,避免了α-Al2O3氧化物支撑层与AlZrN氮化物耐磨层的界面突变造成的应力过大或层间结合不稳的问题。
2)本发明提供的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层的制备方法是一种以阴极电弧沉积为主、蒸发镀工艺制备粘结层为辅的组合式离子镀工艺。镀膜前通过加热使基底材料中吸附的杂质释放,同时采用离化的Ar+对基底表面进行轰击刻蚀,增强了涂层与基底的结合;采用电弧蒸镀工艺蒸发高熵合金材料,在基底上沉积高熵合金粘结层,进一步地增强涂层与基底的结合能力且保持良好的韧性,电弧蒸发镀制备粘结层的优势是,沉积速率快,蒸发原料的尺寸、形状几乎不受限制,称重后装入蒸发坩埚内即可,而采用磁控溅射沉积粘结层,则需要将蒸发原料制成具有一定形状和尺寸的靶材,且溅射沉积的涂层结合性能差;但采用磁控溅射工艺制备中间层和表层可使涂层整体获得高的表面质量。在沉积涂层过程中,通过切换不同的靶工作,很容易多层复合涂层的制备,操作工艺简单且易于掌握和控制。
具体实施方式
下面通过具体实施例对本发明作进一步的说明,但本发明保护的内容不局限于以下实施例。
实施例1
将清洁的硬质合金基底装入等离子体增强复合式离子镀膜系统的真空室中,待背底真空抽至0.05Pa时,打开炉壁的辅助加热装置对基底进行加热,同时打开转动电源使基底不停地转动,加热至基底温度达到380℃;然后向真空室中通入氩气,调节氩气流量保证压强为0.2Pa,然后对基底施加-200V的直流偏压和-400V的脉冲偏压,利用离化的Ar+对基底表面进行刻蚀,刻蚀80min;依次关闭基底偏压、调节氩气流量,保证工作压强为0.15Pa,开启蒸发镀主弧电源进行蒸发镀膜,坩埚上的主弧电流为180A,蒸发原料为Co0.15Ni0.15Cr0.4Al0.15Y0.15块,蒸发沉积10min;关闭主弧电源,开启Cr溅射靶,靶电流设为7A,向真空室内通入氧气,调节氩气和氧气流量使工作压强为0.3Pa,对基底施加偏压-110V,沉积30min;开启Al电弧靶,靶电流设为6A,然后关闭Cr电弧靶电源,调节气体流量,控制压强为0.2Pa,基底偏压保持不变继续沉积120min;开启AlZr合金电弧靶,靶电流设为5A,然后关闭Al电弧靶电源,通入氮气,调节气体流量控制工作压强为0.25Pa,基底偏压设置为-60V,沉积10min;关闭氧气,调节气体流量使压强保持0.25Pa,靶电流调节为3A,基底偏压设置为-50V,沉积70min后结束。制备的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层由CoNiCrAlY高熵合金粘结层、α-Cr2O3氧化物模板层、α-Al2O3氧化物支撑层、AlZrON氮氧化物衔接层和AlZrN氮化物耐磨层共五个子层组成,各个子层之间以及涂层与基底结合牢固,综合性能优良。
实施例2
将清洁的硬质合金基底装入等离子体增强复合式离子镀膜系统的真空室中,待背底真空抽至0.05Pa时,打开炉壁的辅助加热装置对基底进行加热,同时打开转动电源使基底不停地转动,加热至基底温度达到380℃;然后向真空室中通入氩气,调节氩气流量保证压强为0.15Pa,然后对基底施加-200V的直流偏压和-300V的脉冲偏压,利用离化的Ar+对基底表面进行刻蚀,刻蚀30min;依次关闭基底偏压、调节氩气流量,保证工作压强为0.2Pa,开启蒸发镀主弧电源进行蒸发镀膜,坩埚上的主弧电流为220A,蒸发原料为Co0.2Ni0.2Cr0.2Al0.2Y0.2块,蒸发沉积5min;关闭主弧电源,开启Cr电弧靶,靶电流设为3A,向真空室内通入氧气,调节氩气和氧气流量使工作压强为0.45Pa,对基底施加偏压-90V,沉积10min;开启Al电弧靶,靶电流设为3A,然后关闭Cr电弧靶电源,调节气体流量,控制压强为0.45Pa,基底偏压调节为-110V,沉积60min;开启AlZr合金电弧靶,靶电流设为3A,然后关闭Al电弧靶电源,通入氮气,调节气体流量控制工作压强为0.45Pa,基底偏压调节为-60V,沉积20min;关闭氧气,调节气体流量使压强为0.2Pa,靶电流调节为7A,基底偏压调节为-50V,沉积30min后结束。制备的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层由CoNiCrAlY高熵合金粘结层、α-Cr2O3氧化物模板层、α-Al2O3氧化物支撑层、AlZrON氮氧化物衔接层和AlZrN氮化物耐磨层共五个子层组成,各个子层之间以及涂层与基底结合牢固,综合性能优良。
实施例3
将清洁的硬质合金基底装入等离子体增强复合式离子镀膜系统的真空室中,待背底真空抽至0.05Pa时,打开炉壁的辅助加热装置对基底进行加热,同时打开转动电源使基底不停地转动,加热至基底温度达到380℃;然后向真空室中通入氩气,调节氩气流量保证压强为0.15Pa,然后对基底施加-100V的直流偏压和-200V的脉冲偏压,利用离化的Ar+对基底表面进行刻蚀,刻蚀90min;依次关闭基底偏压、调节氩气流量,保证工作压强为0.2Pa,开启蒸发镀主弧电源进行蒸发镀膜,坩埚上的主弧电流为205A,蒸发原料为Co0.2Ni0.2Cr0.2Al0.2Y0.2块,蒸发沉积8min;关闭主弧电源,开启Cr电弧靶,靶电流设为5A,向真空室内通入氧气,调节氩气和氧气流量使工作压强为0.2Pa,对基底施加偏压-70V,沉积15min;开启Al电弧靶,靶电流设为4A,然后关闭Cr电弧靶电源,调节气体流量,控制压强为0.45Pa,基底偏压调节为-100V,沉积90min;开启AlZr合金电弧靶,靶电流设为5A,然后关闭Al电弧靶电源,通入氮气,调节气体流量控制工作压强为0.3Pa,基底偏压调节为-60V,沉积15min;关闭氧气,调节气体流量使压强为0.35Pa,靶电流调节为7A,基底偏压调节为-50V,沉积35min后结束。制备的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层由CoNiCrAlY高熵合金粘结层、α-Cr2O3氧化物模板层、α-Al2O3氧化物支撑层、AlZrON氮氧化物衔接层和AlZrN氮化物耐磨层共五个子层组成,各个子层之间以及涂层与基底结合牢固,综合性能优良。
Claims (8)
1.一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,涂层是由高熵合金粘结层、氧化物模板层、氧化物支撑层、氮氧化物衔接层、氮化物耐磨层五个子层构成的整体,这五个子层的顺序是由内至外,涂层总厚度为1~2.5μm。
2.根据权利要求1所述的一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,所述高熵合金粘结层为CoaNibCrcAldYe,a+b+c+d+e=1,a、b、c、d、e的取值范围为0.15~0.4,厚度为50~200nm。
3.根据权利要求1所述的一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,所述氧化物模板层为α-Cr2O3,厚度为100~300nm。
4.根据权利要求1所述的一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,所述氧化物支撑层为α-Al2O3,厚度为500~1000nm。
5.根据权利要求1所述的一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,所述氮氧化物衔接层为AlZrON,厚度为50~200nm。
6.根据权利要求1所述的一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层,其特征在于,所述氮化物耐磨层为AlZrN,厚度为300~800nm。
7.一种权利要求1~6任意一项所述的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层的制备方法,其特征在于,包括以下步骤:
A、将清洁的基底材料装入涂层设备真空室中,抽真空并加热;
B、对基底表面进行离子刻蚀;
C、利用电弧蒸镀工艺制备高熵合金粘结层;
D、利用磁控溅射工艺制备氧化物模板层;
E、利用磁控溅射工艺制备氧化物支撑层;
F、利用磁控溅射工艺制备氮氧化物衔接层;
G、利用磁控溅射工艺制备氮化物耐磨层。
8.根据权利要求7所述的与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层的制备方法,其进一步的特征在于,步骤A中,所述抽真空并加热是先将背底真空抽至0.05Pa及以下时,打开炉壁的辅助加热装置对基底进行加热,同时打开机架转动电源使基底在真空室内进行自转和公转运动,至基底温度达到380℃;步骤B中,所述离子刻蚀是向真空室中通入氩气,调节氩气流量保证压强为0.1~0.25Pa,然后对基底施加-100~-200V的直流偏压和-200~-400V的脉冲偏压,利用离化的Ar+对基底表面进行刻蚀,刻蚀30~90min;步骤C中,所述电弧蒸镀工艺制备高熵合金粘结的工作压强为0.1~0.2Pa,蒸镀坩埚上通过的电弧电流为180~220A,蒸镀坩埚内放置的材料为CoaNibCrcAldYe高熵合金, a+b+c+d+e=1,a、b、c、d、e的取值范围为0.15~0.4,蒸镀时间为5~10min;步骤D中,所述磁控溅射工艺制备氧化物模板层的工作气体为Ar+O2,工作压强为0.2~0.45Pa,工作靶材为Cr溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间10~30min;步骤E中,所述磁控溅射工艺制备氧化物支撑层的工作气体为Ar+O2,工作压强为0.2~0.45Pa,工作靶材为Al溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间60~120min;步骤F中,所述磁控溅射工艺制备氮氧化物衔接层的工作气体为Ar+N2+O2,工作压强为0.2~0.45Pa ,工作靶材为AlZr合金溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间8~20min;步骤G中,所述磁控溅射工艺制备氮化物耐磨层的工作气体为Ar+N2,工作压强为0.2~0.45Pa,工作靶材为AlZr合金溅射靶,靶电流为3~7A,基底施加的偏压为-50~-110V,沉积时间30~70min。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910974708.XA CN110656313B (zh) | 2019-10-14 | 2019-10-14 | 一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910974708.XA CN110656313B (zh) | 2019-10-14 | 2019-10-14 | 一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110656313A true CN110656313A (zh) | 2020-01-07 |
CN110656313B CN110656313B (zh) | 2021-04-30 |
Family
ID=69040841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910974708.XA Active CN110656313B (zh) | 2019-10-14 | 2019-10-14 | 一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110656313B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113199209A (zh) * | 2021-04-02 | 2021-08-03 | 无锡蓬天工具有限公司 | 一种高强度孔锯及制作方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1974205A (zh) * | 2005-12-02 | 2007-06-06 | 三菱麻铁里亚尔株式会社 | 表面包覆切削刀片及其制造方法 |
DE102009040785A1 (de) * | 2009-09-09 | 2011-03-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
CN103789726A (zh) * | 2014-02-17 | 2014-05-14 | 四川大学 | 与工具表面结合牢固的AlTiCrN/MoN纳米多层涂层及其制备方法 |
CN103789723A (zh) * | 2014-01-24 | 2014-05-14 | 四川大学 | 一种Cr/CrN/(Ti,Al,Si,Cr)N复合硬质涂层及其制备方法 |
CN104532185A (zh) * | 2014-12-22 | 2015-04-22 | 四川大学 | 一种非晶结构的CrAl(C,N)硬质涂层及其制备方法 |
CN105132908A (zh) * | 2015-10-16 | 2015-12-09 | 广东电网有限责任公司电力科学研究院 | 燃气轮机叶片热障涂层粘结层及其制备方法 |
CN109082641A (zh) * | 2018-08-28 | 2018-12-25 | 华南理工大学 | 一种三层膜结构涂层及其制备方法 |
-
2019
- 2019-10-14 CN CN201910974708.XA patent/CN110656313B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1974205A (zh) * | 2005-12-02 | 2007-06-06 | 三菱麻铁里亚尔株式会社 | 表面包覆切削刀片及其制造方法 |
DE102009040785A1 (de) * | 2009-09-09 | 2011-03-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
CN103789723A (zh) * | 2014-01-24 | 2014-05-14 | 四川大学 | 一种Cr/CrN/(Ti,Al,Si,Cr)N复合硬质涂层及其制备方法 |
CN103789726A (zh) * | 2014-02-17 | 2014-05-14 | 四川大学 | 与工具表面结合牢固的AlTiCrN/MoN纳米多层涂层及其制备方法 |
CN104532185A (zh) * | 2014-12-22 | 2015-04-22 | 四川大学 | 一种非晶结构的CrAl(C,N)硬质涂层及其制备方法 |
CN105132908A (zh) * | 2015-10-16 | 2015-12-09 | 广东电网有限责任公司电力科学研究院 | 燃气轮机叶片热障涂层粘结层及其制备方法 |
CN109082641A (zh) * | 2018-08-28 | 2018-12-25 | 华南理工大学 | 一种三层膜结构涂层及其制备方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113199209A (zh) * | 2021-04-02 | 2021-08-03 | 无锡蓬天工具有限公司 | 一种高强度孔锯及制作方法 |
CN113199209B (zh) * | 2021-04-02 | 2022-04-15 | 无锡蓬天工具有限公司 | 一种高强度孔锯及制作方法 |
Also Published As
Publication number | Publication date |
---|---|
CN110656313B (zh) | 2021-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Alami et al. | High power pulsed magnetron sputtering: Fundamentals and applications | |
CN107022761A (zh) | 基于类金刚石薄膜的复合厚膜及其镀膜方法 | |
CN111349901B (zh) | 一种切削刀具用耐高温氧化铝厚膜涂层的制备方法 | |
CN109628896B (zh) | 一种梯度结构TiAlSiYN多元纳米涂层及其制备方法 | |
US6503373B2 (en) | Method of applying a coating by physical vapor deposition | |
CN207313693U (zh) | 基于类金刚石薄膜的复合厚膜 | |
CN106011752B (zh) | 一种金属硬质膜的制备方法 | |
CN108118304A (zh) | 纳米复合涂层及其制备工艺 | |
CN110643936B (zh) | 一种适合铣削加工用的多层复合涂层及其制备方法 | |
CN110643953B (zh) | 一种适合铣削加工用的氧化铝/钛铝氮复合涂层及其制备方法 | |
CN112080723A (zh) | 金制品表面纳米多层复合抗划花膜及其制备方法 | |
CN106676471B (zh) | 一种金色及玫瑰金色氮化物涂层的制备方法 | |
CN110656313B (zh) | 一种与硬质合金结合牢固的氮化锆铝/氧化铝复合涂层及其制备方法 | |
CN106756841A (zh) | 一种刀具复合涂层的制备方法 | |
CN108823544A (zh) | 基于氮化钛复合膜及其制备方法 | |
WO2024065970A1 (zh) | 氧化物硬质涂层的复合沉积方法及涂层刀具 | |
CN110643951B (zh) | 一种抗高温氧化的铝铬硅氮与氧化铝多层复合涂层及其制备方法 | |
CN110616405B (zh) | 一种耐磨损阻扩散的氧化铝/氮化铝钛铬复合涂层及其制备方法 | |
CN110670019B (zh) | 一种抗月牙洼磨损的铝钛锆氮与氧化铝多层复合涂层及其制备方法 | |
CN204840841U (zh) | 一种蓝色陶瓷高尔夫推杆 | |
CN110643935B (zh) | 一种抗月牙洼磨损的氮化铝钛/氧化铝复合涂层及其制备方法 | |
CN110670020B (zh) | 一种与金属陶瓷结合牢固的锆铝氮与氧化铝多层复合涂层及其制备方法 | |
CN109136839B (zh) | 一种具有铝掺杂二硼化钛涂层的工件及其制备方法 | |
CN110643952B (zh) | 一种抗氧化的氧化铝/氮化钛硅复合涂层及其制备方法 | |
CN113174571B (zh) | 一种超微晶二硼化钛复合涂层及其制备方法和应用 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |