CN113287006A - 单晶x射线结构解析装置以及试样保持架安装装置 - Google Patents

单晶x射线结构解析装置以及试样保持架安装装置 Download PDF

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Publication number
CN113287006A
CN113287006A CN201980088771.1A CN201980088771A CN113287006A CN 113287006 A CN113287006 A CN 113287006A CN 201980088771 A CN201980088771 A CN 201980088771A CN 113287006 A CN113287006 A CN 113287006A
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China
Prior art keywords
sample holder
sample
ray
applicator
single crystal
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Pending
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CN201980088771.1A
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English (en)
Chinese (zh)
Inventor
佐藤孝
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Rigaku Corp
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Rigaku Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20025—Sample holders or supports therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20016—Goniometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/309—Accessories, mechanical or electrical features support of sample holder

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  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201980088771.1A 2018-11-22 2019-11-21 单晶x射线结构解析装置以及试样保持架安装装置 Pending CN113287006A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018-218756 2018-11-22
JP2018218756 2018-11-22
PCT/JP2019/045689 WO2020105720A1 (ja) 2018-11-22 2019-11-21 単結晶ｘ線構造解析装置および試料ホルダ取り付け装置

Publications (1)

Publication Number Publication Date
CN113287006A true CN113287006A (zh) 2021-08-20

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CN201980088771.1A Pending CN113287006A (zh) 2018-11-22 2019-11-21 单晶x射线结构解析装置以及试样保持架安装装置

Country Status (5)

Country Link
US (1) US11835476B2 (enExample)
EP (1) EP3885749B1 (enExample)
JP (1) JP7237373B2 (enExample)
CN (1) CN113287006A (enExample)
WO (1) WO2020105720A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022073621A1 (en) * 2020-10-09 2022-04-14 Merck Patent Gmbh Flexible sample holder for crystalline sponge

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030152194A1 (en) * 2001-12-12 2003-08-14 The Regents Of The University Of California Integrated crystal mounting and alignment system for high-throughput biological crystallography
CN1534289A (zh) * 2003-03-26 2004-10-06 ������ѧ��ʽ���� X射线衍射装置
CN106932419A (zh) * 2017-04-19 2017-07-07 南京大学 X射线衍射仪毛细样品管支架及其使用方法
CN107764847A (zh) * 2016-08-18 2018-03-06 株式会社理学 X射线衍射装置
CN108335962A (zh) * 2017-01-19 2018-07-27 日本株式会社日立高新技术科学 带电粒子束装置
CN108449987A (zh) * 2015-11-24 2018-08-24 保罗·谢勒学院 通过收集x射线衍射图像以原子分辨率解析晶体的晶体结构的系统和方法
CN108693202A (zh) * 2017-03-29 2018-10-23 株式会社岛津制作所 X射线分析装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3053502B2 (ja) 1992-12-25 2000-06-19 日機装株式会社 粉末品分析用試料の精秤分取装置
JPH11304999A (ja) * 1998-04-22 1999-11-05 Rigaku Denki Kk Ｘ線結晶構造解析装置のための試料保持用ゴニオメータ
US20030068829A1 (en) 2001-06-25 2003-04-10 Symyx Technologies, Inc. High throughput crystallographic screening of materials
JP3640383B2 (ja) 2001-09-10 2005-04-20 独立行政法人理化学研究所 サンプルの支持機構
JP3888577B2 (ja) * 2001-11-02 2007-03-07 トヨタ自動車株式会社 水素吸蔵合金の結晶構造解析方法
JP4121146B2 (ja) 2005-06-24 2008-07-23 株式会社リガク 双晶解析装置
US7660389B1 (en) * 2007-08-17 2010-02-09 Bruker Axs, Inc. Sample alignment mechanism for X-ray diffraction instrumentation
JP5024968B2 (ja) * 2009-03-02 2012-09-12 株式会社リガク Ｘ線及び熱分析装置
JP2010286431A (ja) * 2009-06-15 2010-12-24 Rigaku Corp 凍結結晶の処理装置及び処理方法
US8571177B2 (en) * 2010-03-01 2013-10-29 Cornell University Goniometer base apparatus and method
WO2011115223A1 (ja) 2010-03-18 2011-09-22 独立行政法人理化学研究所 生体高分子の結晶化条件探査方法及びそれに用いる装置
JP2013156218A (ja) 2012-01-31 2013-08-15 Japan Synchrotron Radiation Research Institute 微小試料用キャピラリー
EP2894242B1 (en) 2012-09-07 2020-01-15 Japan Science and Technology Agency Guest-compound-enveloping polymer-metal-complex crystal, method for producing same, method for preparing crystal structure analysis sample, and method for determining molecular structure of organic compound
JP6131595B2 (ja) 2012-12-28 2017-05-24 株式会社ニコン 測定方法
WO2015132909A1 (ja) 2014-03-05 2015-09-11 株式会社島津製作所 試料分析システム
US10976267B2 (en) 2014-07-31 2021-04-13 Japan Science And Technology Agency Method of analyzing diffraction data obtained from a single crystal of a porous compound and a compound for which a structure is to be determined
DE102015224143B3 (de) * 2015-12-03 2017-02-23 Incoatec Gmbh Verfahren zur Justage der Primärseite eines Röntgendiffraktometers und zugehöriges Röntgendiffraktometer
US10794844B2 (en) * 2016-08-10 2020-10-06 Proto Manufacturing, Ltd. Mounting system and sample holder for X-ray diffraction apparatus
US11815475B2 (en) 2017-03-01 2023-11-14 The University Of Tokyo Method for identifying molecular structure
JP6872700B2 (ja) 2017-03-21 2021-05-19 大学共同利用機関法人 高エネルギー加速器研究機構 カセット装填装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030152194A1 (en) * 2001-12-12 2003-08-14 The Regents Of The University Of California Integrated crystal mounting and alignment system for high-throughput biological crystallography
CN1534289A (zh) * 2003-03-26 2004-10-06 ������ѧ��ʽ���� X射线衍射装置
CN108449987A (zh) * 2015-11-24 2018-08-24 保罗·谢勒学院 通过收集x射线衍射图像以原子分辨率解析晶体的晶体结构的系统和方法
CN107764847A (zh) * 2016-08-18 2018-03-06 株式会社理学 X射线衍射装置
CN108335962A (zh) * 2017-01-19 2018-07-27 日本株式会社日立高新技术科学 带电粒子束装置
CN108693202A (zh) * 2017-03-29 2018-10-23 株式会社岛津制作所 X射线分析装置
CN106932419A (zh) * 2017-04-19 2017-07-07 南京大学 X射线衍射仪毛细样品管支架及其使用方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
YASUHIDE INOKUMA ETAL: "X-ray analysis on the nanogram to microgram scale using porous complexes", NATURE, vol. 495, pages 461 - 466, XP055400439, DOI: 10.1038/nature11990 *

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US20220128491A1 (en) 2022-04-28
EP3885749A1 (en) 2021-09-29
WO2020105720A1 (ja) 2020-05-28
JP7237373B2 (ja) 2023-03-13
US11835476B2 (en) 2023-12-05
JPWO2020105720A1 (ja) 2021-10-07
EP3885749A4 (en) 2022-10-12
EP3885749B1 (en) 2025-02-19

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Application publication date: 20210820