CN113025965B - 电子枪装置和蒸镀装置 - Google Patents

电子枪装置和蒸镀装置 Download PDF

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Publication number
CN113025965B
CN113025965B CN202011541580.7A CN202011541580A CN113025965B CN 113025965 B CN113025965 B CN 113025965B CN 202011541580 A CN202011541580 A CN 202011541580A CN 113025965 B CN113025965 B CN 113025965B
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CN
China
Prior art keywords
magnet
pole
main surface
electron beam
magnetic field
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Active
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CN202011541580.7A
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English (en)
Chinese (zh)
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CN113025965A (zh
Inventor
后田以诚
矶野坚一
大桥童吾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
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Ulvac Inc
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Publication date
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Publication of CN113025965A publication Critical patent/CN113025965A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
CN202011541580.7A 2019-12-24 2020-12-23 电子枪装置和蒸镀装置 Active CN113025965B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019232930A JP6815473B1 (ja) 2019-12-24 2019-12-24 電子銃装置及び蒸着装置
JP2019-232930 2019-12-24

Publications (2)

Publication Number Publication Date
CN113025965A CN113025965A (zh) 2021-06-25
CN113025965B true CN113025965B (zh) 2022-02-11

Family

ID=74164568

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011541580.7A Active CN113025965B (zh) 2019-12-24 2020-12-23 电子枪装置和蒸镀装置

Country Status (4)

Country Link
JP (1) JP6815473B1 (ja)
KR (1) KR102452196B1 (ja)
CN (1) CN113025965B (ja)
TW (1) TWI747679B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113817992A (zh) * 2021-10-28 2021-12-21 成都天一国泰真空设备有限公司 一种用于真空镀膜机电子枪的电磁铁偏转结构

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3302049A (en) * 1963-05-03 1967-01-31 Rca Corp Magnet means for correction of blue beam lateral deflection for color television receiver tubes
US3535428A (en) * 1968-07-17 1970-10-20 Air Reduction Apparatus for producing and directing an electron beam
DE3050343C2 (de) * 1980-04-25 1985-06-27 Stanislav Petrovič Dmitriev Einrichtung zur Elektronenbestrahlung von Objekten
JPH0830267B2 (ja) * 1987-04-16 1996-03-27 日本真空技術株式会社 電子ビ−ム蒸発源装置
JPH01319242A (ja) * 1988-06-20 1989-12-25 Hitachi Ltd ビーム強度分布制御方法及び装置
FR2644930B1 (fr) * 1989-03-21 1996-04-26 Cameca Lentille electromagnetique composite a focale variable
US5418348A (en) * 1992-10-29 1995-05-23 Mdc Vacuum Products, Inc. Electron beam source assembly
US8709706B2 (en) * 2011-06-15 2014-04-29 Applied Materials, Inc. Methods and apparatus for performing multiple photoresist layer development and etching processes
JP5831252B2 (ja) 2012-01-25 2015-12-09 トヨタ自動車株式会社 情報通信システム
CN203373418U (zh) * 2012-04-09 2014-01-01 株式会社新柯隆 电子枪装置
KR101557341B1 (ko) * 2012-09-26 2015-10-06 (주)비엠씨 플라즈마 화학 기상 증착 장치
WO2016092788A1 (ja) * 2014-12-10 2016-06-16 株式会社アルバック 電子ビーム蒸発源及び真空蒸着装置

Also Published As

Publication number Publication date
TWI747679B (zh) 2021-11-21
JP2021101039A (ja) 2021-07-08
CN113025965A (zh) 2021-06-25
TW202135113A (zh) 2021-09-16
JP6815473B1 (ja) 2021-01-20
KR20210082097A (ko) 2021-07-02
KR102452196B1 (ko) 2022-10-06

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