CN112987491B - 制造钟表组件的方法和根据这种方法获得的组件 - Google Patents
制造钟表组件的方法和根据这种方法获得的组件 Download PDFInfo
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- B29C70/04—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts comprising reinforcements only, e.g. self-reinforcing plastics
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- B29C70/34—Shaping by lay-up, i.e. applying fibres, tape or broadsheet on a mould, former or core; Shaping by spray-up, i.e. spraying of fibres on a mould, former or core and shaping or impregnating by compression, i.e. combined with compressing after the lay-up operation
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- B81C99/00—Subject matter not provided for in other groups of this subclass
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- B81C99/0085—Manufacture of substrate-free structures using moulds and master templates, e.g. for hot-embossing
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Abstract
本发明涉及一种制造金属钟表组件的方法,其特征在于其包括借助LIGA‑UV型方法形成多层次光敏树脂模具的步骤和使用至少两个导电层电镀沉积至少一种金属的层以形成基本达到光敏树脂的顶表面的块体的步骤。
Description
技术领域
本发明涉及借助LIGA技术制造多层次(multi-level)复杂金属结构的方法。本发明还涉及用这种方法获得的此类金属结构,特别是钟表组件。
背景技术
符合上述定义的方法是已知的。特别地,A. B. Frazier等人所著的标题为"Metallic Microstuctures Fabricated Using Photosensitive PolyimideElectroplating molds"并发表在the Journal of Microelectromechanical systems(第2卷, N deg. 2, 1993年6月)中的文章描述了在通过光敏树脂层的照相平版法制成的聚酰亚胺模具中通过电镀生长(galvanic growth)制造多层次金属结构的方法。这种方法包括下列步骤:
- 在基材上制造用于后续电镀生长步骤的牺牲金属层和打底层(priminglayer),
- 铺设光敏聚酰亚胺层,
- 通过与要获得的结构的层次的轮廓对应的掩模用UV辐射照射聚酰亚胺层,
- 通过溶解未照射部分而使聚酰亚胺层显影(developing)以获得聚酰亚胺模具,
- 通过电镀生长用镍填充模具直至其高度,并获得基本平坦的顶表面,
- 通过真空蒸发在整个顶表面上沉积薄铬层,
- 在铬层上沉积新的光敏树脂层,
-通过与要获得的结构的下一层次的轮廓对应的新掩模照射该树脂层,
- 使聚酰亚胺层显影以获得新模具,
- 通过电镀生长用镍填充新模具直至其高度,
- 将多层次结构和聚酰亚胺模具与牺牲层和基材分离,
- 将多层次结构与聚酰亚胺模具分离。
要理解的是,上述方法原则上可重复实施以获得具有多于两个层的金属结构。
专利文献WO2010/020515A1描述了在将部件的金属电镀沉积在模具中的步骤前通过制造与要获得的最终部件对应的完整光刻胶模具(photoresist mould)来制造具有多个层次的部件。使用这种方法只能制造水平投影包含在彼此中的多层次部件。
从专利文献EP2405301A1中也获知包括至少两个层次的光刻胶模具,在基材中形成的层次仅包括垂直和光滑侧面。
这些方法只能制造基本几何形状是圆柱形的部件,并且不能制造包含复杂几何形状,如斜边或倒角的部件。
发明内容
本发明的目标在于通过提供一种制造多层次金属钟表组件的方法弥补上述缺点及其它缺点,所述方法将热冲压步骤与LIGA技术组合,其中对每个层次都将导电层与树脂层相结合以能够在多层次组件的情况下实现可靠的电镀生长。
本发明的目标还在于能够制造具有通过LIGA技术一般不可行的复杂几何形状的钟表件。
为此,本发明涉及一种制造钟表组件的方法,其包括下列步骤:
a) 提供基材、在其上沉积第一导电层和施加第一光敏树脂层;
b) 借助缓冲器(buffer)进行第一树脂层的热冲压,其通过将缓冲器压到距基材的预定距离以保留树脂层,从而将第一树脂层成型并界定钟表组件的第一层次;
c) 通过界定所述组件的第二层次的掩模照射成型的第一树脂层,并溶解光敏树脂层的未照射区以在适当位置暴露出第一导电层并形成包括第一和第二层次的模具;
d) 在模具中从第一导电层开始通过电铸沉积金属层以形成组件,所述层基本达到第一光敏树脂层的顶表面;
e) 相继除去基材、第一导电层和树脂以释放组件。
这种方法因此能够制造多层次部件。
根据本发明的进一步有利的替代实施方案:
- 步骤b)在真空中进行;
- 在步骤b)的过程中,在70℃至150℃之间加热树脂层;
- 缓冲器具有凸版印记,将所述印记的至少一部分设置为在步骤b)的过程中压到基材表面附近;
- 缓冲器的所述印记界定组件的所述至少第一层次;
- 所述方法包括在步骤c)和d)之间的任选步骤,其包括在树脂层的照射区上局部沉积第二导电层;
- 通过模版掩模沉积第二导电层;
- 通过印刷墨水或导电树脂沉积第二导电层;
- 所述导电层为Au、Ti、Pt、Ag、Cr、Pd类型或至少两种这些材料的叠层;
- 所述基材由硅制成;
- 所述基材由透明材料制成;
- 由透明材料制成的基材包括在其一个面上的金属化区以形成掩模;
- 所述导电层具有50nm至500nm的厚度。
最后,本发明涉及根据本发明的方法获得的钟表组件,例如擒纵叉组装件(palletassembly)或擒纵轮。
因此要理解的是,根据本发明的方法可特别有利地用于制造钟表组件。
附图说明
参考附图,从根据本发明的方法的一个实施例的以下详述中更清楚显现本发明的其它特征和优点,这一实施例仅用于举例说明而非限制,其中:
- 图1至6图示说明用于制造钟表组件的本发明的一个实施方案的方法步骤。
具体实施方式
本发明涉及制造至少一种钟表组件的方法。
第一步骤a)包括提供基材1,和在其上相继沉积导电层2和光敏树脂层3。
根据本发明的方法的步骤a)中所用的基材1例如由硅基材形成。在该方法的第一步骤a)的过程中,例如通过物理气相沉积(PVD)沉积导电层2,即能够引发金属电镀沉积的层。通常,导电层2为Au、Ti、Pt、Ag、Cr或Pd类型(图1),或至少两种这些材料的叠层,并具有50nm至500nm的厚度。例如,导电层2可由被金或铜层涂布的铬或钛的子层形成。
这种方法中所用的光敏树脂3优选是可以SU-8为名获得的八官能环氧类负型树脂,其被设计为在UV辐射的作用下聚合。
根据本发明的一个具体实施方案,该树脂以干膜形式呈现,然后将该树脂通过辊轧施加在基材1上。
或者,光敏树脂可以是被设计为在UV辐射的作用下分解的正性光刻胶。要理解的是,本发明不限于光敏树脂的某些具体类型。本领域技术人员知道如何从所有适于UV照相平版法的已知树脂中选择适合他们需要的光敏树脂。
通过任何合适的手段、通过离心涂布、旋涂或通过喷涂,在基材1上沉积树脂层3至所需厚度。树脂厚度通常在10 μm至1000 μm之间,优选在50 μm至300 μm之间。根据所需厚度和所用沉积技术,在一个或多个遍次中沉积第一树脂层3。
然后通常将树脂层3在90至120℃之间加热一段时间,该时间取决于沉积的厚度,以除去溶剂(预烘烤步骤)。这种加热使树脂干燥和硬化。
图2中图示说明的下一步骤b)包括进行第一树脂层3的热冲压以将其成型并界定钟表组件的第一层次。在第一阶段中将该树脂加热到70℃至150℃的温度,此时其变粘,以便能够借助压在其上的缓冲器5将其压缩以使其成型。这一步骤在真空中进行以防止在压制树脂层3时形成气泡。根据本发明,可将缓冲器5压到距基材1的预定距离以在基材1上保留树脂层。
有利地,缓冲器5具有能够表现出高度变化的凸版印记并因此能够界定该组件的至少第一层次,所述至少第一层次因此具有用常规LIGA法无法获得的复杂三维几何形状。
也可设想借助该缓冲器形成两个或更多个层次以产生要获得的组件的复杂几何形状。
图3中图示说明的下一步骤c)包括通过掩模4借助UV辐射照射第一树脂层3,掩模4界定要形成的组件的第二层次和因此使区3a光致聚合和使区3b未光致聚合。
可能需要树脂层3的退火步骤(后烘烤步骤)以完成由UV辐射引发的光致聚合。这种退火步骤优选在90℃至95℃之间进行。光致聚合区3a变得对大多数溶剂不敏感。另一方面,未光致聚合区能够随后被溶剂溶解。
然后,将光敏树脂层3的未光致聚合区3b溶解以如图4中在适当位置暴露出基材1的导电层2。通过借助合适的溶剂,如PGMEA(丙二醇甲基醚乙酸酯)溶解未光致聚合区3b来进行这一操作。由此制成界定该组件的第一层次和第二层次的光致聚合的光敏树脂模具3a。
根据本发明的一个有利的实施方案,基材1由透明材料制成以能够经过基材的背面照射树脂。
可以使用透明基材如硼硅玻璃(Pyrex®)或经得住加热到150℃的任何其它材料。该基材包括由锡掺杂的氧化铟(氧化铟锡,ITO)形成的第一透明导电层和与树脂层中要打开的区域垂直对齐的例如由钛和金合金(TiAu)制成的金属图案。ITO层用于确保整个表面的导电性,由此连接与开口垂直对齐的由钛和金合金制成的金属图案,同时允许光穿透到另一侧以使要聚合的区域聚合。
图5中图示说明的下一步骤d)包括对于电铸或电镀沉积,在该模具中从导电层2开始沉积金属层6直至形成块体(block),其优选达到小于模具高度的高度,以在后续机械加工过程中实现优异的机械强度。术语金属在本文中明显包括金属合金。通常,该金属选自镍、铜、金或银,和作为合金,金-铜、镍-钴、镍-铁、镍-磷或甚至镍-钨。一般而言,多层金属结构完全由相同合金或金属制成。但是,也可以在电镀沉积步骤的过程中改变金属或合金,以获得包括至少两个不同类型的层的金属结构。
为要根据电铸领域中众所周知的技术电沉积的各金属或合金选择电铸条件,特别是浴组成、该系统的几何形状、电压和电流密度。
可使用机械方法机械加工金属层6以获得由要制造的组件的厚度预先确定的厚度。
根据在步骤c)和d)之间进行的任选步骤,在通过热冲压成型的某些光致聚合区3a上局部沉积第二导电层。这种第二导电层可具有与第一导电层2相同的特征。
根据第一替代实施方案,使用借助光学校准定位的模版掩模。这样的设备使得可以确保掩模与基材上的光致聚合区3a的几何形状的适当对齐并因此确保在掩模保持尽可能靠近基材1时仅在所选光致聚合区3a的顶表面上沉积。
根据另一替代实施方案,通过3D打印以沉积第二导电层来完成第二导电层。
这样的解决方案能够选择性地和更精确地沉积第二导电层,因此有助于在步骤d)的过程中更好地控制电镀生长。
图6中图示说明的步骤e)包括通过用一系列湿法或干法侵蚀步骤除去基材、导电层或树脂层而释放组件,这些是本领域技术人员熟悉的操作。例如,借助湿法侵蚀除去第一导电层2和基材1,这可以从基材1无损地释放组件。显然,可用基于氢氧化钾(KOH)的溶液侵蚀硅基材。
在这种第一工序后,获得固定在树脂层中的组件,导电层2仍保持在原位。
第二工序包括借助O2等离子体侵蚀操作,穿插着中间金属层的湿法侵蚀操作除去树脂层3。
在这一步骤后,可清洁所得组件,任选在机床上再加工以进行机械加工操作或外观修整(cosmetic finishing)。在这一阶段后,该部件可直接使用或经过各种装饰和/或功能处理,通常是物理或化学沉积。
根据本发明的方法可特别有利地用于制造钟表组件,如游丝、擒纵叉组装件、轮、镶字块等。由于这种方法,可以制造与通过常规照相平版法操作获得的组件相比形状更多样化并具有更复杂几何形状的组件。这样的方法也可以获得在几何形状方面表现出良好可靠性的稳定组件。
Claims (14)
1.制造至少一种钟表组件的方法,其包括下列步骤:
a)提供基材(1)、在其上沉积第一导电层(2)和施加第一光敏树脂层(3);
b)借助缓冲器(5)进行第一光敏树脂层(3)的热冲压,其通过将缓冲器(5)压到距基材(1)的预定距离以保留树脂层,从而将第一光敏树脂层(3)成型并形成所述组件的第一层次;
c)通过界定所述组件的至少第二层次的掩模(4)照射成型的第一光敏树脂层(3),并溶解第一光敏树脂层(3)的未照射区(3b)以在适当位置暴露出第一导电层(2)并形成包括第一和第二层次的模具;
d)在模具中从第一导电层(2)开始通过电铸沉积金属层(6)以形成所述组件,金属层(6)达到第一光敏树脂层(3)的顶表面;
e)相继除去基材、第一导电层和树脂以释放所述组件。
2.根据权利要求1的方法,其特征在于步骤b)在真空中进行。
3.根据权利要求1或2的方法,其特征在于在步骤b)的过程中,在70℃至150℃之间加热第一光敏树脂层(3)。
4.根据权利要求1或2的方法,其特征在于缓冲器(5)具有凸版印记,将所述印记的至少一部分设置为在步骤b)的过程中压到基材表面附近。
5.根据权利要求4的方法,其特征在于缓冲器(5)的所述印记界定组件的所述至少第一层次。
6.根据权利要求1或2的方法,其特征在于其包括在步骤c)和d)之间的任选步骤,其包括在第一光敏树脂层(3)的照射区(3a)上局部沉积第二导电层。
7.根据权利要求6的方法,其特征在于通过模版掩模沉积第二导电层。
8.根据权利要求6的方法,其特征在于通过印刷墨水或导电树脂沉积第二导电层。
9.根据权利要求1或2的方法,其特征在于第一导电层(2)为Au、Ti、Pt、Ag、Cr、Pd类型。
10.根据权利要求1或2的方法,其特征在于基材(1)由硅制成。
11.根据权利要求1或2的方法,其特征在于基材(1)由透明材料制成。
12.根据权利要求11的方法,其特征在于由透明材料制成的基材(1)包括透明导电层和在其一个面上的金属化区以形成掩模。
13.根据权利要求1或2的方法,其特征在于第一导电层(2)具有50nm至500nm的厚度。
14.根据权利要求1至13之一的方法获得的钟表组件。
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