CN112740492A - 半导体激光器、光发射组件、光线路终端及光网络单元 - Google Patents

半导体激光器、光发射组件、光线路终端及光网络单元 Download PDF

Info

Publication number
CN112740492A
CN112740492A CN201980061913.5A CN201980061913A CN112740492A CN 112740492 A CN112740492 A CN 112740492A CN 201980061913 A CN201980061913 A CN 201980061913A CN 112740492 A CN112740492 A CN 112740492A
Authority
CN
China
Prior art keywords
layer
region
grating
laser
semiconductor laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201980061913.5A
Other languages
English (en)
Other versions
CN112740492B (zh
Inventor
程远兵
戴竞
董英华
杨素林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huawei Technologies Co Ltd
Original Assignee
Huawei Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huawei Technologies Co Ltd filed Critical Huawei Technologies Co Ltd
Publication of CN112740492A publication Critical patent/CN112740492A/zh
Application granted granted Critical
Publication of CN112740492B publication Critical patent/CN112740492B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1237Lateral grating, i.e. grating only adjacent ridge or mesa
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1206Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/124Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers incorporating phase shifts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06226Modulation at ultra-high frequencies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1228DFB lasers with a complex coupled grating, e.g. gain or loss coupling
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/125Distributed Bragg reflector [DBR] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B10/00Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
    • H04B10/27Arrangements for networking
    • H04B10/272Star-type networks or tree-type networks
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04JMULTIPLEX COMMUNICATION
    • H04J14/00Optical multiplex systems
    • H04J14/02Wavelength-division multiplex systems
    • H04J14/0227Operation, administration, maintenance or provisioning [OAMP] of WDM networks, e.g. media access, routing or wavelength allocation
    • H04J14/0241Wavelength allocation for communications one-to-one, e.g. unicasting wavelengths
    • H04J14/0242Wavelength allocation for communications one-to-one, e.g. unicasting wavelengths in WDM-PON
    • H04J14/0245Wavelength allocation for communications one-to-one, e.g. unicasting wavelengths in WDM-PON for downstream transmission, e.g. optical line terminal [OLT] to ONU
    • H04J14/0246Wavelength allocation for communications one-to-one, e.g. unicasting wavelengths in WDM-PON for downstream transmission, e.g. optical line terminal [OLT] to ONU using one wavelength per ONU
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/16Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
    • H01S2301/163Single longitudinal mode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/028Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0287Facet reflectivity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/0625Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
    • H01S5/06255Controlling the frequency of the radiation
    • H01S5/06256Controlling the frequency of the radiation with DBR-structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/0625Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
    • H01S5/06255Controlling the frequency of the radiation
    • H01S5/06258Controlling the frequency of the radiation with DFB-structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1039Details on the cavity length

Abstract

本申请实施例提供一种半导体激光器、光发射组件、光线路终端及光网络单元,半导体激光器包括衬底和在衬底上依次形成的下波导层、下限制层、中心层、上限制层、光栅层、上波导层和电极层;滤波区内上限制层、中心层和下限制层构成滤波区的芯层;滤波区的光栅层包括倾斜光栅。本申请可减小调制啁啾,减小传输光脉冲的色散。

Description

PCT国内申请,说明书已公开。

Claims (22)

  1. PCT国内申请,权利要求书已公开。
CN201980061913.5A 2019-01-04 2019-01-04 半导体激光器、光发射组件、光线路终端及光网络单元 Active CN112740492B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2019/070483 WO2020140286A1 (zh) 2019-01-04 2019-01-04 半导体激光器、光发射组件、光线路终端及光网络单元

Publications (2)

Publication Number Publication Date
CN112740492A true CN112740492A (zh) 2021-04-30
CN112740492B CN112740492B (zh) 2023-04-04

Family

ID=71406840

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980061913.5A Active CN112740492B (zh) 2019-01-04 2019-01-04 半导体激光器、光发射组件、光线路终端及光网络单元

Country Status (6)

Country Link
US (1) US20210296859A1 (zh)
EP (1) EP3869640B1 (zh)
JP (1) JP7206393B2 (zh)
KR (1) KR102495786B1 (zh)
CN (1) CN112740492B (zh)
WO (1) WO2020140286A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114094438A (zh) * 2022-01-24 2022-02-25 日照市艾锐光电科技有限公司 一种双电极共调制发射激光器
CN116387976A (zh) * 2023-06-05 2023-07-04 福建慧芯激光科技有限公司 一种具有内嵌式多阶光栅的边发射激光器的制备方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7458885B2 (ja) 2020-01-28 2024-04-01 日本ルメンタム株式会社 半導体光増幅器集積レーザ
CA3186204A1 (en) * 2020-07-23 2022-01-27 Sylvain Boudreau Semiconductor lasers with improved frequency modulation response
CN117203149A (zh) 2021-04-30 2023-12-08 三菱电机楼宇解决方案株式会社 乘客输送机用移动扶手的引导辊更换辅具
CN113823993B (zh) * 2021-11-23 2022-03-01 日照市艾锐光电科技有限公司 一种集成表面光栅有源滤波器的半导体激光器

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4873691A (en) * 1987-07-31 1989-10-10 Hitachi, Ltd. Wavelength-tunable semiconductor laser
JPH01273377A (ja) * 1988-04-26 1989-11-01 Furukawa Electric Co Ltd:The 分布ブラッグ反射器レーザ素子
US5155736A (en) * 1989-04-04 1992-10-13 International Business Machines Corporation Semiconductor laser element capable of changing emission wavelength, and method of driving the same
JPH0677571A (ja) * 1992-08-24 1994-03-18 Nippon Telegr & Teleph Corp <Ntt> 光導波路形フィルタ
JPH09186408A (ja) * 1996-01-04 1997-07-15 Canon Inc 分布反射型半導体レーザ
JP2000124543A (ja) * 1998-10-14 2000-04-28 Nippon Telegr & Teleph Corp <Ntt> 半導体モード同期レーザ
US6122299A (en) * 1997-12-31 2000-09-19 Sdl, Inc. Angled distributed reflector optical device with enhanced light confinement
WO2004088802A1 (ja) * 2003-03-31 2004-10-14 Nippon Telegraph And Telephone Corporation 光半導体素子および光半導体集積回路
CN101227061A (zh) * 2007-12-28 2008-07-23 武汉光迅科技股份有限公司 可调谐半导体激光器的制作方法及可调谐半导体激光器
JP2011158907A (ja) * 2011-02-03 2011-08-18 Pgt Photonics Spa チューナブル共鳴格子フィルタ
CN102544265A (zh) * 2012-01-20 2012-07-04 苏州大学 一种窄带陷波滤光输出的发光二极管及其制备方法
CN102742099A (zh) * 2011-12-20 2012-10-17 华为技术有限公司 激光器、无源光网络系统、装置以及波长控制方法
US20130308662A1 (en) * 2012-05-15 2013-11-21 Finisar Corporation Wavelength Tunable Laser
US8718111B1 (en) * 2011-05-27 2014-05-06 Clemson University Diode laser
JP2014116352A (ja) * 2012-12-06 2014-06-26 Fujitsu Ltd チャープ制御半導体レーザ
CN103986063A (zh) * 2014-05-15 2014-08-13 华中科技大学 一种基于带通滤波结构的单纵模半导体激光器
CN104917052A (zh) * 2015-07-06 2015-09-16 中国科学院半导体研究所 变周期倾斜光栅激光器及制备方法
CN108233177A (zh) * 2018-01-22 2018-06-29 华中科技大学 一种可调谐半导体激光器
CN108649426A (zh) * 2018-04-24 2018-10-12 青岛海信宽带多媒体技术有限公司 一种激光器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08162711A (ja) * 1994-11-30 1996-06-21 Fujikura Ltd 半導体レーザ及び光学フィルタ
US5901164A (en) * 1997-05-30 1999-05-04 Northern Telecom Limited Direct amplitude modulation of lasers
JP2001237494A (ja) 2000-02-25 2001-08-31 Mitsubishi Electric Corp 半導体レーザ装置
US6806114B1 (en) * 2001-11-07 2004-10-19 Nova Crystals, Inc. Broadly tunable distributed bragg reflector structure processing
KR100519922B1 (ko) * 2002-12-17 2005-10-10 한국전자통신연구원 다영역 자기모드 잠김 반도체 레이저 다이오드
KR100837404B1 (ko) * 2006-10-18 2008-06-12 삼성전자주식회사 반도체 광전 소자
JP5287460B2 (ja) * 2009-04-17 2013-09-11 富士通株式会社 半導体レーザ
WO2013173797A1 (en) * 2012-05-17 2013-11-21 Finisar Corporation Directly modulated laser for pon application
US10063032B2 (en) * 2016-03-06 2018-08-28 Finisar Corporation Distributed reflector laser
EP3611810B1 (en) * 2018-04-28 2021-06-02 Guangdong Oppo Mobile Telecommunications Corp., Ltd. Control system and control method for laser projector, laser projection assembly and terminal
US11018475B2 (en) * 2018-12-27 2021-05-25 Electronics And Telecommunications Research Institute High-output power quarter-wavelength shifted distributed feedback laser diode

Patent Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4873691A (en) * 1987-07-31 1989-10-10 Hitachi, Ltd. Wavelength-tunable semiconductor laser
JPH01273377A (ja) * 1988-04-26 1989-11-01 Furukawa Electric Co Ltd:The 分布ブラッグ反射器レーザ素子
US5155736A (en) * 1989-04-04 1992-10-13 International Business Machines Corporation Semiconductor laser element capable of changing emission wavelength, and method of driving the same
JPH0677571A (ja) * 1992-08-24 1994-03-18 Nippon Telegr & Teleph Corp <Ntt> 光導波路形フィルタ
JPH09186408A (ja) * 1996-01-04 1997-07-15 Canon Inc 分布反射型半導体レーザ
US6122299A (en) * 1997-12-31 2000-09-19 Sdl, Inc. Angled distributed reflector optical device with enhanced light confinement
JP2000124543A (ja) * 1998-10-14 2000-04-28 Nippon Telegr & Teleph Corp <Ntt> 半導体モード同期レーザ
WO2004088802A1 (ja) * 2003-03-31 2004-10-14 Nippon Telegraph And Telephone Corporation 光半導体素子および光半導体集積回路
CN101227061A (zh) * 2007-12-28 2008-07-23 武汉光迅科技股份有限公司 可调谐半导体激光器的制作方法及可调谐半导体激光器
JP2011158907A (ja) * 2011-02-03 2011-08-18 Pgt Photonics Spa チューナブル共鳴格子フィルタ
US8718111B1 (en) * 2011-05-27 2014-05-06 Clemson University Diode laser
CN102742099A (zh) * 2011-12-20 2012-10-17 华为技术有限公司 激光器、无源光网络系统、装置以及波长控制方法
CN102544265A (zh) * 2012-01-20 2012-07-04 苏州大学 一种窄带陷波滤光输出的发光二极管及其制备方法
US20130308662A1 (en) * 2012-05-15 2013-11-21 Finisar Corporation Wavelength Tunable Laser
JP2014116352A (ja) * 2012-12-06 2014-06-26 Fujitsu Ltd チャープ制御半導体レーザ
CN103986063A (zh) * 2014-05-15 2014-08-13 华中科技大学 一种基于带通滤波结构的单纵模半导体激光器
CN104917052A (zh) * 2015-07-06 2015-09-16 中国科学院半导体研究所 变周期倾斜光栅激光器及制备方法
CN108233177A (zh) * 2018-01-22 2018-06-29 华中科技大学 一种可调谐半导体激光器
CN108649426A (zh) * 2018-04-24 2018-10-12 青岛海信宽带多媒体技术有限公司 一种激光器

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114094438A (zh) * 2022-01-24 2022-02-25 日照市艾锐光电科技有限公司 一种双电极共调制发射激光器
CN114094438B (zh) * 2022-01-24 2022-05-31 日照市艾锐光电科技有限公司 一种双电极共调制发射激光器
CN116387976A (zh) * 2023-06-05 2023-07-04 福建慧芯激光科技有限公司 一种具有内嵌式多阶光栅的边发射激光器的制备方法
CN116387976B (zh) * 2023-06-05 2023-12-29 福建慧芯激光科技有限公司 一种具有内嵌式多阶光栅的边发射激光器的制备方法

Also Published As

Publication number Publication date
KR20210087085A (ko) 2021-07-09
CN112740492B (zh) 2023-04-04
JP2022516019A (ja) 2022-02-24
US20210296859A1 (en) 2021-09-23
EP3869640A4 (en) 2021-12-29
EP3869640A1 (en) 2021-08-25
WO2020140286A1 (zh) 2020-07-09
EP3869640B1 (en) 2024-03-20
JP7206393B2 (ja) 2023-01-17
KR102495786B1 (ko) 2023-02-06

Similar Documents

Publication Publication Date Title
CN112740492B (zh) 半导体激光器、光发射组件、光线路终端及光网络单元
US20070013996A1 (en) Quantum dot vertical lasing semiconductor optical amplifier
KR20090065982A (ko) 광 증폭기가 집적된 슈퍼루미네슨트 다이오드 및 이를이용한 외부 공진 레이저
US6519270B1 (en) Compound cavity reflection modulation laser system
Yamamoto High-speed directly modulated lasers
WO2019128341A1 (zh) 一种激光器芯片、光发射组件、光模块及网络设备
Lee Recent advances in long-wavelength semiconductor lasers for optical fiber communication
CN114094438B (zh) 一种双电极共调制发射激光器
JP2018074098A (ja) 半導体光集積回路
US6597718B2 (en) Electroabsorption-modulated fabry perot laser
Kim et al. 10 Gbps SOA-REAM using monolithic integration of planar buried-heterostructure SOA with deep-ridge waveguide EA modulator for colourless optical source in WDM-PON
JP5427371B2 (ja) データ伝送光電子装置
Stegmueller et al. 15-GHz modulation performance of integrated DFB laser diode EA modulator with identical multiple-quantum-well double-stack active layer
WO2022227577A1 (zh) 一种光信号的获取方法以及相关设备
De Felipe et al. 40 nm tuneable source for colourless ONUs based on dual hybridly integrated polymer waveguide grating lasers
US20050226283A1 (en) Single-mode semiconductor laser with integrated optical waveguide filter
CN116491037A (zh) 双输出直接调制激光设备、光网络单元和无源光网络
US6950233B1 (en) System and method for wavelength conversion using a VLSOA
CN218070543U (zh) 一种半导体激光器及其应用的10g pon olt、otdr检测光模块和大容量数据通信光模块
CN114825050B (zh) 一种级联多波长集成半导体激光器及其应用
Klamkin et al. High efficiency widely tunable SGDBR lasers for improved direct modulation performance
JP4653940B2 (ja) 通信用光制御装置
Gallet Hybrid III-V/Si lasers for optical communications
WO2022222919A1 (zh) 电吸收调制激光器、光发射组件和光终端
JP3450573B2 (ja) 半導体レーザ装置、その駆動方法及びそれを用いた光通信システム

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant