CN112630242A - 一种扫描电镜样品导航方法 - Google Patents
一种扫描电镜样品导航方法 Download PDFInfo
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- CN112630242A CN112630242A CN202011407899.0A CN202011407899A CN112630242A CN 112630242 A CN112630242 A CN 112630242A CN 202011407899 A CN202011407899 A CN 202011407899A CN 112630242 A CN112630242 A CN 112630242A
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115396579A (zh) * | 2022-08-25 | 2022-11-25 | 昆明理工大学 | 一种自动拍摄扫描电镜的方法 |
CN115616018A (zh) * | 2022-11-08 | 2023-01-17 | 北京中科科仪股份有限公司 | 用于扫描电镜的定位方法、装置、电子设备及存储介质 |
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2020
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JPS61142648A (ja) * | 1984-12-14 | 1986-06-30 | Hitachi Ltd | 走査電子顕微鏡用試料台 |
JPH0613011A (ja) * | 1991-12-12 | 1994-01-21 | Denshi Kogaku Kenkyusho:Kk | 電子顕微鏡の試料位置制御装置 |
JP2007200573A (ja) * | 2006-01-23 | 2007-08-09 | Hitachi High-Technologies Corp | 電子顕微鏡およびその制御方法 |
CN101532970A (zh) * | 2008-03-11 | 2009-09-16 | 宝山钢铁股份有限公司 | 多晶体中各组成晶粒的晶体取向和微观力学性能测定方法 |
US20170039696A1 (en) * | 2014-04-11 | 2017-02-09 | Changzhou Trina Solar Energy Co., Ltd. | Method and apparatus for detecting crystal orientation of silicon wafer |
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CN105225909A (zh) * | 2015-09-17 | 2016-01-06 | 北京大学 | 一种扫描电镜样品台定位装置及其定位方法 |
US20190122026A1 (en) * | 2016-05-17 | 2019-04-25 | Horiba France Sas | Micro-localisation method and device for an imaging instrument and a measuring apparatus |
US20190012520A1 (en) * | 2016-11-07 | 2019-01-10 | Institute Of Automation, Chinese Academy Of Sciences | Method for Microscopic Image Acquisition Based on Sequential Section |
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CN110455797A (zh) * | 2019-07-31 | 2019-11-15 | 钢研纳克检测技术股份有限公司 | 金相显微镜矩阵归一化校正方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115396579A (zh) * | 2022-08-25 | 2022-11-25 | 昆明理工大学 | 一种自动拍摄扫描电镜的方法 |
CN115616018A (zh) * | 2022-11-08 | 2023-01-17 | 北京中科科仪股份有限公司 | 用于扫描电镜的定位方法、装置、电子设备及存储介质 |
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