CN112620279B - Wet process device - Google Patents
Wet process device Download PDFInfo
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- CN112620279B CN112620279B CN201911265514.9A CN201911265514A CN112620279B CN 112620279 B CN112620279 B CN 112620279B CN 201911265514 A CN201911265514 A CN 201911265514A CN 112620279 B CN112620279 B CN 112620279B
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- bearing
- glass substrate
- tank
- processing apparatus
- basket
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/045—Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
Abstract
The invention provides a wet process device which is used for a large-size rectangular glass substrate and comprises a processing tank, a support, a bearing assembly and at least one actuating mechanism. The top of the processing groove is provided with an opening, the bearing component is arranged on the bracket, and at least one part of the bearing component is used for bearing the glass substrate and can movably correspond to the opening and move to enter and exit the processing groove through the opening. The actuating mechanism is linked with the bearing assembly and can drive the bearing assembly to drive the glass substrate in the processing groove. Therefore, the large-size rectangular glass substrate can be processed and the yield is good.
Description
Technical Field
The invention relates to a wet process device for a chip, in particular to an immersion type wet process device for a large-size rectangular glass substrate.
Background
In the semiconductor process, high-precision processes such as circuit etching at the front end and the like are directly processed on the chip, and the related process precision of rear-end packaging is lower, so that the chip is generally cut into a plurality of chips, and then the chips are respectively attached to a glass substrate to be subjected to related packaging processes, thereby reducing the processing cost.
In the existing wet process, a nozzle sprays liquid medicine on the surface of a rotating substrate, and the liquid medicine cannot uniformly cover all parts of the surface of the substrate, particularly all corners of a rectangular substrate. Furthermore, if the glass substrate is enlarged to increase the processing speed, when the size of the glass substrate is large (generally, at least one side is larger than 300mm), the process yield is low because the glass substrate is too heavy to control the acceleration and deceleration. Therefore, the current wet process cannot take into account both the processing speed and the process yield.
Disclosure of Invention
The invention provides a soaking type wet process device for a large-size rectangular glass substrate.
The invention provides a wet process device which comprises a processing tank, a bracket, a bearing assembly and at least one actuating mechanism. The top of the processing groove is provided with an opening, the bearing component is arranged on the bracket, and at least one part of the bearing component is used for bearing the glass substrate and can movably correspond to the opening and move to enter and exit the processing groove through the opening. The actuating mechanism is linked with the bearing assembly and can drive the bearing assembly to horizontally move the glass substrate in the treatment tank.
In the wet process device, a plurality of supporting columns for supporting the glass substrate are convexly arranged at the bottom in the bearing component. The bearing component is provided with a lifting device which is linked with the bearing component and can lift the bearing component to enter and exit the processing groove through the opening. The bearing assembly comprises a seat body and a bearing basket, the seat body is connected with the support, the bearing basket is pivoted on the seat body through a rotating shaft rod and is vertically arranged, the actuating mechanism comprises a motor, and the motor is linked with the rotating shaft rod and can drive the rotating shaft rod to rotate so as to drive the bearing basket to horizontally rotate.
The wet process device comprises a support, a bearing component, an actuating mechanism and a reciprocating actuator, wherein the bearing component can be connected with the support in a translation mode, and the actuating mechanism comprises the reciprocating actuator which is linked with the bearing component to drive the bearing component to horizontally reciprocate. The reciprocating actuator comprises a cam, a motor and a connecting rod, the cam is pivoted with the support, one end of the connecting rod is pivoted with the cam and is pivoted on one side of the rotating center of the cam, the other end of the connecting rod is pivoted with the bearing component, and the motor is linked with the cam to drive the cam to rotate and reciprocate the connecting rod so as to reciprocate the bearing component.
The wet process device comprises a bearing assembly, a bearing basket and a turning actuator, wherein the bearing basket is used for bearing a glass substrate, the bearing basket is pivoted and hung on the base, the turning actuator is linked with the bearing basket, and the turning actuator can drive the bearing basket to turn and tilt relative to the base. The wet process device further comprises a washing mechanism, the washing mechanism comprises an inclined rail and a washing pipeline, the inclined rail is arranged on one side of the support, a plurality of upper nozzles and a plurality of lower nozzles which are arranged in an up-down opposite mode are arranged on the washing pipeline, the washing pipeline is arranged on the inclined rail, and when the bearing basket inclines, the washing pipeline can move along the inclined rail to move the upper nozzles and the lower nozzles to the upper side and the lower side of the bearing basket respectively so as to wash two surfaces of the glass substrate.
The wet process device of the invention has at least one slope surface formed at the bottom of the treatment tank and at least one drainage valve arranged corresponding to the lower edge of the slope surface. The slope surface is provided with a plurality of slope surfaces, the upper edges of the slope surfaces are connected to form a ridge part, and at least one drainage valve is arranged corresponding to the lower edge of each slope surface. The water discharge valve comprises a cylinder, a piston and an actuating element, one end of the cylinder is communicated with the bottom of the treatment tank through a liquid discharge port, the other end of the cylinder is communicated with the circulating tank, the piston is movably arranged in the cylinder, the piston is connected with the actuating element and can be moved by the actuating element to plug the liquid discharge port, the piston forms a conical surface, and the conical surface is exposed out of the bottom of the treatment tank through the liquid discharge port. The treatment tank is provided with a liquid injection head which can be respectively communicated with a circulating tank and a drain valve; an overflow channel is arranged around the opening and communicated with the circulating groove, and a valve is arranged between the overflow channel and the circulating groove. The circulating grooves can be multiple, each circulating groove is communicated with the liquid injection head, and each circulating groove is communicated with each corresponding drain valve; the overflow channel is respectively communicated with each circulation groove, and a valve is respectively arranged between the overflow channel and each circulation groove. The liquid injection head can be communicated with a cleaning liquid groove.
The wet process device treats the glass substrate in a soaking mode, and drives the glass substrate to move in the liquid by the actuating mechanism so that the liquid can uniformly contact the surface of the glass substrate. Therefore, the wet process device can process large-size rectangular glass substrates and has good yield.
Drawings
Fig. 1 and 2 are schematic views of a wet processing apparatus according to a preferred embodiment of the present invention.
Fig. 3 to 9 are schematic views showing various states of use of the wet processing apparatus according to the preferred embodiment of the present invention.
Fig. 10 and 11 are schematic views of a flushing mechanism in a wet processing apparatus according to a preferred embodiment of the present invention.
FIG. 12 is a schematic flow diagram of a wet processing apparatus according to a preferred embodiment of the invention.
Wherein, the reference numbers:
10 glass substrate
20 liquid
100 treatment tank
101 opening
102 overflow channel
110 slope surface
111 ridge part
120 liquid filling head
200 support
300 bearing assembly
301 rotating shaft
302 turning shaft lever
310 seat body
311 slide rail
320 carrying basket
321 support column
322 soft cushion
330 lifting device
340 tumble actuator
400 actuating mechanism
410a/410b motor
420 reciprocating actuator
421 cam
422 connecting rod
500a valve
500 drainage valve
510 barrel
511 liquid discharge port
520 piston
521 conical surface
530 actuating element
610 circulation groove
620 cleaning liquid groove
630 discharge line
700 flushing mechanism
710 inclined rail
720 flushing pipeline
721 upper nozzle
722 lower nozzle
Detailed Description
Referring to fig. 1 and 2, the present invention provides a wet processing apparatus for large-sized rectangular glass substrates 10, which includes a processing bath 100, a support 200, a carrier assembly 300, and at least one actuating mechanism 400.
The top of the processing tank 100 is provided with an opening 101, and the carrier assembly 300 is disposed on the support 200. The processing tank 100 is filled with a liquid 20 such as a chemical solution for wet process or a cleaning liquid, and at least a portion of the carrier assembly 300 is movably disposed corresponding to the opening 101 and is capable of moving into and out of the processing tank 100 through the opening 101 for carrying the glass substrate 10, thereby immersing the glass substrate 10 in the chemical solution for wet process or cleaning in the cleaning liquid. The present invention is not limited to the form of the bracket 200, and the bracket 200 may be configured to allow the carrier assembly 300 to be disposed thereon so that the glass substrate 10 carried by the carrier assembly is disposed corresponding to the opening 101. Therefore, on the premise of achieving the aforementioned effects, the present invention does not limit the specific installation position of the bracket 200, for example, the bracket 200 may be installed beside the processing tank 100; or may be provided directly on the processing bath 100.
Specifically, the carrier assembly 300 at least includes a base 310 and a carrier basket 320, the base 310 is connected to the bracket 200, and the carrier basket 320 is used for carrying the glass substrate 10 and is suspended from the base 310. A plurality of support columns 321 for supporting the glass substrate 10 are protruded from the bottom of the carrier assembly 300, and specifically, the support columns 321 are disposed at the bottom of the carrier basket 320, and the top of each support column can be optionally provided with a cushion 322, so that the flatness tolerance of the glass substrate 10 can be overcome and the glass substrate 10 can be prevented from being undesirably shaken in the carrier basket 320.
Referring to fig. 1 to 4, the carrier assembly 300 is provided with a lifting device 330, the lifting device 330 is coupled with the carrier assembly 300 to lift the carrier assembly 300 into and out of the processing tank 100 through the opening 101, so as to move the glass substrate 10 carried thereon into and out of the processing tank 100 through the opening 101.
Preferably, the carrying basket 320 can be selectively pivoted to the base 310 by a turning shaft 302, and the turning shaft 302 is horizontally disposed. The carrier assembly 300 may further include a tilting actuator 340, wherein the tilting actuator 340 is coupled to the carrier basket 320, and the tilting actuator 340 can drive the carrier basket 320 to tilt along the tilting shaft 302 relative to the base 310. Thereby tilting the glass substrate 10 carried on the carrier basket 320 upside down. The carrier assembly 300 can reduce resistance of the liquid to the glass substrate 10 by obliquely immersing the glass substrate 10 in the liquid 20 in the processing bath 100.
The actuating mechanism 400 is coupled to the carrier assembly 300 to drive the carrier assembly 300 to move horizontally, thereby horizontally moving the glass substrate 10 in the processing tank 100 to make the surface of the glass substrate 10 uniformly contact with the liquid 20. In this embodiment, two specific embodiments of the actuating mechanism 400 are provided, which respectively drive the glass substrate 10 in different actuating manners.
Referring to fig. 5, the actuating mechanism 400 may be used to rotate the carrier basket 320 horizontally. In this embodiment, the basket 320 is pivoted to the base 310 by a rotating shaft 301, and the rotating shaft 301 is disposed upright, the actuating mechanism 400a includes a motor 410a, the motor 410a is coupled to the rotating shaft 301 and can drive the rotating shaft 301 to rotate so as to drive the basket 320 to rotate horizontally.
Referring to fig. 6-8, the actuating mechanism 400 may be used to horizontally shake the carrier basket 320. In this embodiment, the base 310 of the supporting assembly 300 is connected to the bracket 200 by a sliding rail 311 in a translatable manner, and the actuating mechanism 400 includes a reciprocating actuator 420, wherein the reciprocating actuator 420 drives the supporting assembly 300 to drive the base 310 and the supporting basket 320 thereon to reciprocate horizontally. The reciprocating actuator 420 can be driven by the motor 410b, the reciprocating actuator 420 includes a cam 421 and a link 422, the cam 421 is pivoted to the bracket 200, one end of the link 422 is pivoted to the cam 421 and pivoted to one side of the rotation center of the cam 421, the other end of the link 422 is pivoted to the bearing component 300, and the motor 410b is coupled with the cam 421 to drive the cam 421 to rotate and reciprocate the link 422 and further reciprocate the bearing component 300. However, the present invention is not limited thereto, and the reciprocating actuator 420 may be a pneumatic cylinder, which is connected to the carrier assembly 300 and driven by air pressure.
Referring to fig. 9 and 12, the processing tank 100 is provided with a liquid injection head 120, the liquid injection head 120 can be communicated with at least one circulation tank 610 and a cleaning liquid tank 620, the circulation tank 610 is used for storing the wet process liquid medicine, the cleaning liquid tank 620 is used for storing the cleaning liquid, and the liquid 20 is injected into the processing tank 100 through the liquid injection head 120. A corresponding number of the circulation tanks 610 may be provided to store various kinds of chemical solutions, respectively, according to the number of kinds of chemical solutions used in the wet process. In the present embodiment, two circulation grooves 610 are preferred, but the number is not limited in the present invention.
In the wet processing apparatus of the present invention, at least one slope 110 is formed at the bottom of the processing tank 100, and at least one drain valve 500 is disposed corresponding to the lower edge of the slope 110. The drain valve 500 comprises a cylinder 510, a piston 520 and an actuating element 530, wherein one end of the cylinder 510 is connected to the bottom of the processing tank 100 through a drain 511, the piston 520 is movably disposed in the cylinder 510, the piston 520 is connected to the actuating element 530 and can be moved by the actuating element 530 to close the drain 511, the piston 520 forms a tapered surface 521, and the tapered surface 521 is exposed out of the bottom of the processing tank 100 through the drain 511. The other end of the cylinder 510 may be selectively connected to a circulation tank 610 or directly discharged through a discharge line 630. According to the number of the types of the liquid chemicals used in the wet process, a corresponding number of the drain valves 500 may be provided, and the drain valves 500 are communicated to the corresponding circulation tanks 610 to recycle the liquid chemicals contained in the processing tank 100. In this embodiment, each circulation tank 610 is preferably connected to the liquid injection head 120 and each drain valve 500. The actuating elements 530 can control the opening and closing of the drain valves 500 according to the use requirements, thereby controlling the direction of the liquid 20 discharged from the processing tank 100.
The treatment tank 100 may optionally have a plurality of slopes 110, in this embodiment, a pair of slopes 110 disposed opposite to each other is preferably disposed in the treatment tank 100, but the present invention is not limited to the number of the slopes 110, the upper edges of the slopes 110 are connected to form a ridge 111, and at least one drain valve 500 is disposed corresponding to the lower edge of each slope 110. The water discharge speed can be increased by the slope 110 of the processing tank 100 and the tapered surface 521 of the water discharge valve 500, and the liquid 20 can be prevented from remaining.
An overflow channel 102 is disposed around the opening 101, the overflow channel 102 is connected to the circulation tanks 610, and a valve 500a is disposed between the overflow channel 102 and each circulation tank 610, but the present invention is not limited to the type of the valve 500a, and it is preferably the same as the aforementioned drain valve 500, but may be other types of valves. However, the overflow channel 102 may also be selectively connected to the drain line 630 for directly draining the cleaning solution, and another valve 500a may also be selectively disposed between the overflow channel 102 and the drain line 630. When the wet process device is used, the liquid injection head 120 continuously injects the liquid 20 into the treatment tank 100, and when the treatment tank 100 is full of water, the liquid 20 overflowing through the opening 101 can be collected in the overflow channel 102 and then flows back to the circulation tank 610 or is directly discharged. The direction of the liquid 20 discharged from the treatment tank 100 can be controlled by controlling the opening and closing of the valves 500a in the overflow channel 102 according to the use requirement. The edge of the opening 101 is preferably serrated to eliminate liquid level tension, so that the liquid level can be accurately controlled.
When the wet process device is used, the liquid injection head 120 is used to sequentially fill the processing tank 100 with the liquid medicines, and the actuating mechanism 400 is used to drive the bearing assembly 300 to sequentially immerse the glass substrate 10 in the liquid medicines. After the soaking process of each stage of the liquid medicine is completed, the liquid medicine in the processing tank 100 is discharged through the drain valve 500, the processing tank 100 is filled with the cleaning liquid through the liquid injection head 120, and the glass substrate 10 is immersed in the cleaning liquid for cleaning, wherein the glass substrate 10 can be rotated or shaken back and forth in the cleaning liquid by the actuating mechanism 400 during cleaning.
Referring to fig. 10 and 11, the wet processing apparatus of the present invention may further include a rinsing mechanism 700 for rinsing both surfaces of the glass substrate 10 while injecting the cleaning solution, in addition to the glass substrate 10 being cleaned by soaking. Specifically, the rinsing mechanism 700 includes an inclined rail 710 and a rinsing pipe 720, the inclined rail 710 is disposed at one side of the support 200, the rinsing pipe 720 has a plurality of upper nozzles 721 and a plurality of lower nozzles 722 disposed opposite to each other, and the rinsing pipe 720 is disposed on the inclined rail 710, when the carrier basket 320 is inclined, the rinsing pipe 720 can move along the inclined rail 710 to move the upper nozzles 721 and the lower nozzles 722 to the upper side and the lower side of the carrier basket 320, respectively, so as to rinse the two sides of the glass substrate 10. Therefore, the rinsing liquid after rinsing can flow down along the inclined glass substrate 10 to leave the glass substrate 10, thereby preventing the residual liquid from adhering to the surface of the glass substrate 10.
The wet process apparatus of the present invention treats the glass substrate 10 in a soaking manner, and drives the glass substrate 10 to move in the liquid 20 by the 400 actuating mechanism so that the liquid 20 can uniformly contact the surface of the glass substrate 10. Therefore, the wet processing apparatus of the present invention can process large-sized rectangular glass substrates 10 with good yield.
The present invention is capable of other embodiments, and various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (12)
1. A wet processing apparatus for a large-sized rectangular glass substrate, comprising:
the top of the processing tank is provided with an opening;
a support;
a bearing component arranged on the bracket, at least one part of the bearing component is used for bearing the glass substrate and can movably correspond to the opening configuration and move to enter and exit the processing tank through the opening, wherein the bearing component can be connected with the bracket in a translation way, the bearing component comprises a base body, a bearing basket used for bearing the glass substrate and a turning actuator, the bearing basket is pivoted and hung on the base body, the turning actuator is linked with the bearing basket, and the turning actuator can drive the bearing basket to turn and tilt relative to the base body;
at least one actuating mechanism which is linked with the bearing component and can drive the bearing component to drive the glass substrate in the processing tank, wherein the actuating mechanism comprises a reciprocating actuator which is linked with the bearing component and can drive the bearing component to horizontally reciprocate; and
and the flushing pipeline is arranged on the inclined track, and when the bearing basket inclines, the flushing pipeline can move along the inclined track to move the upper nozzles and the lower nozzles to the upper side and the lower side of the bearing basket respectively so as to flush the two surfaces of the glass substrate.
2. The wet processing apparatus as recited in claim 1, wherein a plurality of support posts are raised from a bottom portion of the carrier assembly for supporting the glass substrate.
3. The wet processing apparatus as claimed in claim 1, wherein the carrier assembly is provided with a lifting device, the lifting device being coupled to the carrier assembly to lift the carrier assembly into and out of the processing tank through the opening.
4. The wet processing apparatus as claimed in claim 1, wherein the base is connected to the support, the basket is pivotally mounted on the base by a rotating shaft, the rotating shaft is vertically disposed, and the motor of the actuating mechanism is coupled to the rotating shaft and can drive the rotating shaft to rotate to drive the basket to rotate horizontally.
5. The wet processing apparatus of claim 1, wherein the bottom of the treatment tank defines at least one sloped surface and at least one drain valve is disposed in correspondence with a lower edge of the sloped surface.
6. The wet processing apparatus of claim 5, wherein there are a plurality of ramps, the upper edges of each ramp are connected to form a ridge and at least one drain valve is provided corresponding to the lower edge of each ramp.
7. The wet processing apparatus as claimed in claim 5, wherein the drain valve comprises a cylinder, a piston and an actuating member, one end of the cylinder is connected to the bottom of the processing tank through a drain port, the other end of the cylinder is connected to a circulation tank, the piston is movably disposed in the cylinder, the piston is connected to the actuating member and can be moved by the actuating member to close the drain port, the piston forms a conical surface, and the conical surface is exposed out of the bottom of the processing tank through the drain port.
8. The wet processing apparatus as claimed in claim 5, wherein the processing tank is provided with a liquid injection head, and the liquid injection head and the drain valve are respectively communicated with a circulation tank.
9. The wet processing apparatus of claim 8, wherein an overflow channel is disposed around the opening, the overflow channel is in communication with the circulation tank, and a valve is disposed between the overflow channel and the circulation tank.
10. The wet processing apparatus as claimed in claim 8, wherein there are a plurality of circulation tanks, each of the circulation tanks is connected to the liquid injection head and each of the circulation tanks is connected to a corresponding one of the drain valves.
11. The wet processing apparatus of claim 10, wherein an overflow channel is disposed around the opening, the overflow channel is connected to each of the circulation tanks, and a valve is disposed between the overflow channel and each of the circulation tanks.
12. A wet processing apparatus according to claim 5, wherein the treatment tank is provided with a liquid injection head, and the liquid injection head communicates with a cleaning liquid tank.
Applications Claiming Priority (2)
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US201962912616P | 2019-10-08 | 2019-10-08 | |
US62/912,616 | 2019-10-08 |
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CN112620279B true CN112620279B (en) | 2022-06-24 |
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CN (1) | CN112620279B (en) |
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TWI823492B (en) * | 2022-07-22 | 2023-11-21 | 辛耘企業股份有限公司 | Device and exception handling method for single-wafer wet process |
CN117577577B (en) * | 2024-01-15 | 2024-03-15 | 南通丞胜机电设备有限公司 | Wet etching device for semiconductor chip |
CN117727674B (en) * | 2024-02-07 | 2024-05-03 | 中国科学院长春光学精密机械与物理研究所 | Semiconductor packaging device with heat dissipation device |
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JP6419053B2 (en) * | 2015-10-08 | 2018-11-07 | 東京エレクトロン株式会社 | Substrate processing method and substrate processing apparatus |
KR101927699B1 (en) * | 2016-10-31 | 2018-12-13 | 세메스 주식회사 | Apparatus and method for treating substrate |
CN107262437B (en) * | 2017-07-31 | 2019-12-06 | 京东方科技集团股份有限公司 | Cleaning device |
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2019
- 2019-12-03 TW TW108144171A patent/TWI718794B/en active
- 2019-12-11 CN CN201911265514.9A patent/CN112620279B/en active Active
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TWI718794B (en) | 2021-02-11 |
CN112620279A (en) | 2021-04-09 |
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