CN112585298B - 气化器 - Google Patents

气化器 Download PDF

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Publication number
CN112585298B
CN112585298B CN201980035271.1A CN201980035271A CN112585298B CN 112585298 B CN112585298 B CN 112585298B CN 201980035271 A CN201980035271 A CN 201980035271A CN 112585298 B CN112585298 B CN 112585298B
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CN
China
Prior art keywords
porous member
outlet
porous
vaporization
raw material
Prior art date
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CN201980035271.1A
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English (en)
Chinese (zh)
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CN112585298A (zh
Inventor
小野弘文
八木茂雄
山本健太
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintec Corp
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Priority claimed from PCT/JP2019/016959 external-priority patent/WO2020021796A1/ja
Publication of CN112585298A publication Critical patent/CN112585298A/zh
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Publication of CN112585298B publication Critical patent/CN112585298B/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/06—Preventing bumping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J7/00—Apparatus for generating gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J7/00—Apparatus for generating gases
    • B01J7/02—Apparatus for generating gases by wet methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/24—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means incorporating means for heating the liquid or other fluent material, e.g. electrically

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
CN201980035271.1A 2018-07-24 2019-04-22 气化器 Active CN112585298B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2018138837 2018-07-24
JP2018-138837 2018-07-24
JP2019076185A JP6694093B2 (ja) 2018-07-24 2019-04-12 気化器
JP2019-076185 2019-04-12
PCT/JP2019/016959 WO2020021796A1 (ja) 2018-07-24 2019-04-22 気化器

Publications (2)

Publication Number Publication Date
CN112585298A CN112585298A (zh) 2021-03-30
CN112585298B true CN112585298B (zh) 2021-11-23

Family

ID=69588117

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980035271.1A Active CN112585298B (zh) 2018-07-24 2019-04-22 气化器

Country Status (4)

Country Link
JP (1) JP6694093B2 (ko)
KR (1) KR102292156B1 (ko)
CN (1) CN112585298B (ko)
TW (1) TWI699495B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7495334B2 (ja) 2020-11-26 2024-06-04 株式会社リンテック 気化器

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0445838A (ja) * 1990-06-09 1992-02-14 Stec Kk 液体材料供給システムにおける気化器
US7332040B1 (en) * 1999-09-09 2008-02-19 Tokyo Electron Limited Semiconductor manufacturing system having a vaporizer which efficiently vaporizes a liquid material
JP2009147356A (ja) * 2009-02-02 2009-07-02 Tokyo Electron Ltd 気化器及び成膜装置
CN102060268A (zh) * 2005-03-29 2011-05-18 卡西欧计算机株式会社 蒸发装置以及液体吸收件
JP2011156485A (ja) * 2010-02-02 2011-08-18 Tokyo Gas Co Ltd 気化装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS461535Y1 (ko) 1970-02-16 1971-01-20
JPH0528960U (ja) * 1991-09-26 1993-04-16 サンデン株式会社 液体混入検知機構
JPH06300197A (ja) * 1993-04-14 1994-10-28 Canon Inc 液体原料気化供給装置
JPH1085581A (ja) * 1996-05-24 1998-04-07 Ebara Corp 気化器
JP3650543B2 (ja) 1999-07-01 2005-05-18 株式会社リンテック 気化装置
JP2001239151A (ja) * 2000-03-01 2001-09-04 Toho Gas Co Ltd 気化装置
WO2006101767A2 (en) * 2005-03-16 2006-09-28 Advanced Technology Materials, Inc. System for delivery of reagents from solid sources thereof
JP4601535B2 (ja) * 2005-09-09 2010-12-22 株式会社リンテック 低温度で液体原料を気化させることのできる気化器
JP5179823B2 (ja) * 2007-09-28 2013-04-10 東京エレクトロン株式会社 気化器及び成膜装置
US8495973B2 (en) * 2009-11-03 2013-07-30 Protonex Technology Corporation Thin film vaporizer
JP6199744B2 (ja) * 2011-12-20 2017-09-20 株式会社日立国際電気 基板処理装置、半導体装置の製造方法および気化装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0445838A (ja) * 1990-06-09 1992-02-14 Stec Kk 液体材料供給システムにおける気化器
US7332040B1 (en) * 1999-09-09 2008-02-19 Tokyo Electron Limited Semiconductor manufacturing system having a vaporizer which efficiently vaporizes a liquid material
CN102060268A (zh) * 2005-03-29 2011-05-18 卡西欧计算机株式会社 蒸发装置以及液体吸收件
JP2009147356A (ja) * 2009-02-02 2009-07-02 Tokyo Electron Ltd 気化器及び成膜装置
JP2011156485A (ja) * 2010-02-02 2011-08-18 Tokyo Gas Co Ltd 気化装置

Also Published As

Publication number Publication date
KR102292156B1 (ko) 2021-08-24
TW202007896A (zh) 2020-02-16
JP6694093B2 (ja) 2020-05-13
JP2020020036A (ja) 2020-02-06
CN112585298A (zh) 2021-03-30
KR20200140389A (ko) 2020-12-15
TWI699495B (zh) 2020-07-21

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