CN112346160B - 非金属可见光激光红外多波段兼容隐身薄膜及其制备方法 - Google Patents

非金属可见光激光红外多波段兼容隐身薄膜及其制备方法 Download PDF

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CN112346160B
CN112346160B CN202011125741.4A CN202011125741A CN112346160B CN 112346160 B CN112346160 B CN 112346160B CN 202011125741 A CN202011125741 A CN 202011125741A CN 112346160 B CN112346160 B CN 112346160B
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刘彪
时家明
吕相银
赵大鹏
汪家春
陈宗胜
李志刚
陈蕾蕾
程立
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Abstract

本发明涉及非金属可见光激光红外多波段兼容隐身薄膜及其制备方法，该薄膜为多层膜结构，所述多层膜结构包括基底，以及依次设置在基底上的中远红外隐身层和可见光隐身层。本发明所述的不含金属材料的可见光激光红外多波段兼容隐身薄膜，实现了可见光(380nm‑780nm)、中远红外波段(3‑5μm和8‑14μm)和激光波长(1.064μm和10.6μm)的兼容隐身，在多波段兼容隐身方面取得了新的突破。若将其应用于装备上，对于保护我军重要军事目标，提高武器装备的生存概率具有重要的意义。

Description

非金属可见光激光红外多波段兼容隐身薄膜及其制备方法
技术领域
本发明涉及军事隐身技术领域，尤其涉及一种非金属可见光激光红外多波段兼容隐身薄膜及其制备方法。
背景技术
近年来，侦察探测技术已经发展到能够同时利用电磁波的多个波段，包括可见光、激光、红外以及雷达波段。随着这些侦察探测能力的提高与复合，只对单一波段隐身的材料已经无法满足现代战争的需要，重要军事目标的生存受到了严重威胁。隐身作为一种重要的对抗措施，目的是要降低目标和背景的辐射对比度或者减弱回波信号。由此产生了红外隐身、激光隐身、雷达隐身等军事需求。
为了能实现良好的多波段隐身效果，需要隐身材料在可见光波段(380nm-780nm)表现出与周围背景一致的颜色特征，在中远红外探测波段(3-5μm和8-14μm)具有低发射率(高反射率)，在激光测距或激光目标指示器的工作波长上(1.064μm和10.6μm)具有低反射率，对于不透明材料而言，低发射率将导致高反射率，不利于激光隐身；而低反射率又会引起高发射率，不利于红外隐身，这成为多波段兼容隐身的一个难点问题。因而，研制出一种能够同时实现可见光、激光和中远红外隐身的材料对保护重要军事目标具有重要的价值。
由于此薄膜不含金属材料，对雷达波的传播影响较小，这和雷达隐身所期望的相符合。
发明内容
本发明的目的在于提供一种非金属可见光激光红外多波段兼容隐身薄膜及其制备方法，该薄膜能实现可见光(380-780nm)、中远红外波段(3-5μm和8-14μm)和激光波长(1.064μm和10.6μm)的兼容隐身。
为实现上述目的，本发明采用了以下技术方案：
一种非金属可见光激光红外多波段兼容隐身薄膜，该薄膜为多层膜结构，所述多层膜结构包括基底，以及依次设置在基底上的中远红外隐身层和可见光隐身层。
上述方案中，所述基底为无纺布，或PI、PET、TPU、PVC、BOPP中的一种；所述中远红外隐身层由高折射率材料和低折射率材料交替构成，所述可见光隐身层由两种低折射率材料交替构成。
进一步的，所述高折射率材料包括碲、硅、锗，所述低折射率材料包括硫化锌，硒化锌、氟化钙。
进一步的，所述中远红外隐身层为19层膜层，所述19层膜层由内向外的厚度分别为：605nm、1150nm、605nm、1150nm、605nm、2580nm、605nm、1150nm、605nm、1150nm、605nm、500nm、220nm、500nm、220nm、500nm、220nm、500nm、220nm；所述可见光隐身层为4层膜层，所述4层膜层由内向外的厚度分别为：25±5nm、25±5nm、95±25nm、135±25nm。
本发明还提供了上述非金属可见光激光红外多波段兼容隐身薄膜的制备方法，采用镀膜方法于基底上依次镀制远红外隐身层和可见光隐身层。
进一步的，所述镀膜方法为电子束蒸发镀膜、热蒸发镀膜、磁控溅射镀膜法中的一种
本发明的有益效果在于：
本发明的不含金属材料的可见光激光红外多波段兼容隐身薄膜，实现了可见光(380nm-780nm)、中远红外波段(3-5μm和8-14μm)和激光波长(1.064μm和10.6μm)的兼容隐身，在多波段兼容隐身方面取得了新的突破。若将其应用于装备上，对于保护我军重要军事目标，提高武器装备的生存概率具有重要的意义。
此外，本发明的可见光激光红外多波段兼容隐身薄膜性能可靠，经过附着力、高低温、湿热实验测试后，膜层性能满足实际应用需求。
附图说明
图1为本发明的可见光激光红外多波段兼容隐身薄膜的结构示意图；
图中：0-基底层，1-19层为中远红外与10.6μm激光隐身层，20-23层为可见光与1.06μm激光隐身层。
图2为本发明的可见光激光红外多波段兼容隐身薄膜在350nm-1100nm波长范围的法向反射光谱图；
图3为本发明的可见光激光红外多波段兼容隐身薄膜在2μm-15μm波长范围的法向反射光谱图。
具体实施方式
下面结合具体实施方式对本发明做进一步说明：
如图1-3所示，本实施例的非金属可见光激光红外多波段兼容隐身薄膜及其制备方法，其隐身薄膜的基底材料为PI薄膜，先在基底材料上镀制了中远红外与10.6μm激光隐身层，该层为19层结构，交替镀制了硒化锌(ZnSe)和碲(Te)，自内向外的厚度分别为：605nm、1150nm、605nm、1150nm、605nm、2580nm、605nm、1150nm、605nm、1150nm、605nm、500nm、220nm、500nm、220nm、500nm、220nm、500nm、220nm。然后在中远红外与10.6μm激光隐身层上镀制了可见光与1.06μm激光隐身层，该层为4层结构，交替镀制了硒化锌(ZnSe)和氟化钙(CaF2)。
通过不同厚度可实现不同颜色的显示，如蓝色特征薄膜由内至外的厚度分别为：30nm、20nm、110nm、150nm，绿色特征薄膜由内至外的厚度分别为：30nm、20nm、90nm、135nm，黄色特征薄膜由内至外的厚度分别为：30nm、20nm、80nm、125nm。
上述隐身薄膜使用电子束蒸发镀膜方式制备。制备的工艺参数为背景真空度为5.0×10-3Pa，碲(Te)的沉积速率为0.9nm/s，硫化硒(ZnSe)的沉积速率为0.1nm/s，氟化钙(CaF2)的沉积速率为0.05nm/s，基底温度为120℃。
图2和图3所示，图2、3为本发明的可见光激光红外多波段兼容隐身薄膜的法向反射光谱图。从图中分析可得，在3-5μm的平均反射率为98.6％，在8-14μm的平均反射率为95.1％，在1.05-1.08μm的最大反射率为4.1％，在10.55-10.65μm的最大反射率为4.9％，同时薄膜具有蓝色、绿色和黄色可见光特征，能够实现可见光(380nm-780nm)、中远红外波段(3-5μm和8-14μm)和激光波长(1.064μm和10.6μm)的兼容隐身
以上所述的实施例仅仅是对本发明的优选实施方式进行描述，并非对本发明的范围进行限定，在不脱离本发明设计精神的前提下，本领域普通技术人员对本发明的技术方案作出的各种变形和改进，均应落入本发明权利要求书确定的保护范围内。

Claims (4)

1.一种非金属可见光激光红外多波段兼容隐身薄膜，其特征在于：该薄膜为多层膜结构，所述多层膜结构包括基底，以及依次设置在基底上的中远红外隐身层和可见光隐身层；
所述基底为无纺布，或PI、PET、TPU、PVC、BOPP中的一种；
所述中远红外隐身层为19层膜层，所述19层膜层由内向外的厚度分别为：605nm、1150nm、605nm、1150nm、605nm、2580nm、605nm、1150nm、605nm、1150nm、605nm、500nm、220nm、500nm、220nm、500nm、220nm、500nm、220nm；
所述可见光隐身层为4层膜层，所述4层膜层由内向外的厚度分别为：25±5nm、25±5nm、95±25nm、135±25nm；
所述中远红外隐身层由高折射率材料和低折射率材料交替构成，所述可见光隐身层由两种低折射率材料交替构成。
2.根据权利要求1所述的非金属可见光激光红外多波段兼容隐身薄膜，其特征在于：所述高折射率材料包括碲、硅、锗，所述低折射率材料包括硫化锌，硒化锌、氟化钙。
3.根据权利要求1所述的非金属可见光激光红外多波段兼容隐身薄膜的制备方法，其特征在于：采用镀膜方法于基底上依次镀制远红外隐身层和可见光隐身层。
4.根据权利要求3所述的非金属可见光激光红外多波段兼容隐身薄膜的制备方法，其特征在于：所述镀膜方法为电子束蒸发镀膜、热蒸发镀膜、磁控溅射镀膜法中的一种。
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