CN112363261B - 非金属材料的激光红外多波段兼容隐身薄膜及其制备方法 - Google Patents

非金属材料的激光红外多波段兼容隐身薄膜及其制备方法 Download PDF

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CN112363261B
CN112363261B CN202011125742.9A CN202011125742A CN112363261B CN 112363261 B CN112363261 B CN 112363261B CN 202011125742 A CN202011125742 A CN 202011125742A CN 112363261 B CN112363261 B CN 112363261B
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赵大鹏
汪家春
程立
陈宗胜
李志刚
吕相银
陈蕾蕾
时家明
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Abstract

本发明涉及一种非金属材料的激光红外多波段兼容隐身薄膜及其制备方法,该薄膜为多层膜结构,所述多层膜结构包括基底,以及在所述的基底上由内至外依次交替叠加的氟化钙层和碲层;所述氟化钙层的折射率为1.06‑1.46,碲层的折射率为2.3‑6.2;本发明的薄膜采用非金属材料实现了中远红外波段(3‑5μm和8‑14μm)和激光波长(1.064μm和10.6μm)的兼容隐身,同时在非探测波段(5‑8μm)具有较强散热能力,因其不含金属材料,所以对雷达波衰减很弱,易于实现同雷达吸波材料的兼容隐身,若将其应用于军事装备上,对于保护我军重要军事目标,提高武器装备的生存概率具有重要的意义。

Description

非金属材料的激光红外多波段兼容隐身薄膜及其制备方法
技术领域
本发明涉及军事隐身技术领域,尤其涉及一种非金属材料的激光红外多波段兼容隐身薄膜及其制备方法。
背景技术
现代战争中,多波段光电侦察与精确制导武器的广泛应用,对军事目标的生存带来巨大的威胁;隐身作为一种重要的对抗措施,目的是要降低目标和背景的辐射对比度或者减弱回波信号;由此产生了红外隐身、激光隐身、雷达隐身等军事需求。
为了能实现良好的多波段隐身效果,需要隐身材料在中远红外探测波段(3-5μm和8-14μm)具有低发射率(高反射率),在激光测距或激光目标指示器的工作波长上(1.064μm和10.6μm)具有低反射率,对于不透明材料而言,低发射率将导致高反射率,不利于激光隐身;而低反射率又会引起高发射率,不利于红外隐身,这成为多波段兼容隐身的一个难点问题。
由于目标温度通常比背景高,用低发射率材料进行红外隐身就能抑制目标的红外辐射,和背景融为一体。但是发射率低意味着向外发出的辐射弱,会影响目标自身的散热,严重的可能影响目标的正常工作,所以实现良好隐身还要解决隐身和散热的问题。
用含金属的材料制作成涂料或者薄膜也能实现红外隐身,但是这类涂料或者薄膜因为含有金属材料,对雷达波有较强的反射,这和雷达隐身所期望的低反射相矛盾。
发明内容
本发明的目的在于提供一种非金属材料的激光红外多波段兼容隐身薄膜及其制备方法。
为实现上述目的,本发明采用了以下技术方案:
一种非金属材料的激光红外多波段兼容隐身薄膜,该薄膜为多层膜结构,所述多层膜结构包括基底,以及在所述的基底上由内至外依次交替叠加的氟化钙层和碲层;所述氟化钙层的折射率为1.06-1.46,碲层的折射率为2.3-6.2。
优选的,所述基底为PI、PET、TPU、PVC、BOPP中的一种。
优选的,所述基底上共叠加有13层膜层,且最内层和最外层均为氟化钙层;所述的13层膜层由内至外的厚度依次为:910±20nm、700±20nm、210±10nm、290±10nm、60±10nm、1030±30nm、570±20nm、50±10nm、1330±30nm、150±10nm、430±20nm、120±10nm、980±10nm。
本发明还提供了上述非金属材料的激光红外多波段兼容隐身薄膜的制备方法,具体为采用物理气相沉积法于基底上依次交替沉积氟化钙层和碲层。
优选的,所述物理气相沉积法为电子束蒸发镀膜、热蒸发镀膜、磁控溅射镀膜中的一种
本发明的有益效果在于:
本发明的薄膜采用非金属材料实现了中远红外波段(3-5μm和8-14μm)和激光波长(1.064μm和10.6μm)的兼容隐身,同时在非探测波段(5-8μm)具有较强散热能力,因其不含金属材料,所以对雷达波衰减很弱,易于实现同雷达吸波材料的兼容隐身,若将其应用于军事装备上,对于保护我军重要军事目标,提高武器装备的生存概率具有重要的意义。
同时,本发明的制作原材料除基底外只需两种材料,膜系结构简单,重量轻、厚度薄,加工制作的工艺成熟,易于规模化生产和应用.
附图说明
图1为本发明的非金属材料的激光红外多波段兼容隐身薄膜的结构示意图,图中:0-基底,1、3、5、7、9、11、13-氟化钙层,2、4、6、8、10、12-碲层;
图2为本发明的非金属材料的激光红外多波段兼容隐身薄膜在380nm-15000nm波长范围的法向反射光谱图;
图3为本发明的非金属材料的激光红外多波段兼容隐身薄膜在1000nm-1150nm波长范围的法向反射光谱图。
具体实施方式
下面结合具体实施方式对本发明做进一步说明:
参照图1所示的非金属材料的激光红外多波段兼容隐身薄膜,其为多层膜结构,基底采用PI薄膜,在基底上依次交替叠加了氟化钙(CaF2)材料膜层和碲(Te)材料膜层(共13层),1层和13层均为氟化钙层,各膜层的厚度由内向外依次为:910nm、704nm、211nm、293nm、63nm、1032nm、574nm、50nm、1326nm、153nm、429nm、118nm、983nm。
本实施例采用电子束蒸发镀膜法制备,制备的工艺参数:背景真空度为5.0×10- 3Pa,碲(Te)的沉积速率为0.9nm/s,氟化钙(CaF2)的沉积速率为0.8nm/s,基底温度为120℃。
图2和图3均为本实施例的非金属材料的激光红外多波段兼容隐身薄膜的法向反射光谱图。
通过图2和图3可以知悉,本实施例在3-5μm的平均反射率为93.7%,在8-14μm的平均反射率为77.6%,在5-8μm的平均反射率为19.9%,在1.05-1.08μm的最大反射率为9.2%,在10.55-10.65μm的最大反射率为10.9%。
因此本发明能够实现中远红外波段(3-5μm和8-14μm)和激光波长(1.064μm和10.6μm)的兼容隐身,同时在非探测波段(5-8μm)具有较强散热能力。
以上所述的实施例仅仅是对本发明的优选实施方式进行描述,并非对本发明的范围进行限定,在不脱离本发明设计精神的前提下,本领域普通技术人员对本发明的技术方案作出的各种变形和改进,均应落入本发明权利要求书确定的保护范围内。

Claims (3)

1.一种非金属材料的激光红外多波段兼容隐身薄膜,其特征在于:该薄膜为非金属多层膜结构,所述多层膜结构包括非金属基底,以及在所述的基底上由内至外依次交替叠加的氟化钙层和碲层;所述氟化钙层的折射率为1.06-1.46,碲层的折射率为2.3-6.2;所述薄膜在3-5μm的平均反射率93.7%,在8-14μm的平均反射率77.6%,在5-8μm的平均反射率19.9%,在1.05-1.08μm的最大反射率9.2%,在10.55-10.65μm的最大反射率10.9%,能够实现中远红外波段和激光波长的兼容隐身,同时在非探测波段具有较强散热能力;所述中远红外波段的波长为3-5μm和8-14μm,所述激光波长为1.064μm和10.6μm,所述非探测波段的波长为5-8μm;
所采用隐身薄膜的制备方法,通过采用物理气相沉积法于基底上依次交替沉积氟化钙层和碲层;
所述基底上共叠加有13层膜层,且最内层和最外层均为氟化钙层;所述的13层膜层由内至外的厚度依次为:910±20nm、700±20nm、210±10nm、290±10nm、60±10nm、1030±30nm、570±20nm、50±10nm、1330±30nm、150±10nm、430±20nm、120±10nm、980±10nm。
2.根据权利要求1所述的非金属材料的激光红外多波段兼容隐身薄膜,其特征在于:所述基底为PI、PET、TPU、PVC、BOPP等非金属材料中的一种,从而具备良好的雷达波透明性。
3.根据权利要求1所述的非金属材料的激光红外多波段兼容隐身薄膜的制备方法,其特征在于:所述物理气相沉积法为电子束蒸发镀膜、热蒸发镀膜、磁控溅射镀膜中的一种。
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