CN112305872A - 光学装置、投影光学系统、曝光装置以及物品的制造方法 - Google Patents

光学装置、投影光学系统、曝光装置以及物品的制造方法 Download PDF

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Publication number
CN112305872A
CN112305872A CN202010737423.7A CN202010737423A CN112305872A CN 112305872 A CN112305872 A CN 112305872A CN 202010737423 A CN202010737423 A CN 202010737423A CN 112305872 A CN112305872 A CN 112305872A
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CN
China
Prior art keywords
gas
optical element
optical
optical device
gas discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010737423.7A
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English (en)
Chinese (zh)
Inventor
西川原朋史
关美津留
矢田裕纪
远藤淳生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN112305872A publication Critical patent/CN112305872A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN202010737423.7A 2019-07-31 2020-07-28 光学装置、投影光学系统、曝光装置以及物品的制造方法 Pending CN112305872A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019140817A JP7358106B2 (ja) 2019-07-31 2019-07-31 光学装置、投影光学系、露光装置及び物品の製造方法
JP2019-140817 2019-07-31

Publications (1)

Publication Number Publication Date
CN112305872A true CN112305872A (zh) 2021-02-02

Family

ID=74483431

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010737423.7A Pending CN112305872A (zh) 2019-07-31 2020-07-28 光学装置、投影光学系统、曝光装置以及物品的制造方法

Country Status (3)

Country Link
JP (1) JP7358106B2 (ja)
KR (1) KR20210015654A (ja)
CN (1) CN112305872A (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006058602A (ja) * 2004-08-20 2006-03-02 Ricoh Co Ltd 作像装置の冷却装置及び画像形成装置
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法
JP2016161923A (ja) * 2015-03-05 2016-09-05 キヤノン株式会社 露光装置及び物品の製造方法
CN206684477U (zh) * 2017-03-17 2017-11-28 东莞市川佳电子五金科技有限公司 一种光学镜筒高效降温装置
JP2018091919A (ja) * 2016-11-30 2018-06-14 キヤノン株式会社 露光装置及び物品の製造方法
US20190196396A1 (en) * 2017-12-27 2019-06-27 Ricoh Company, Ltd. Electronic device and image forming device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014157892A (ja) * 2013-02-15 2014-08-28 Canon Inc 露光装置、それを用いたデバイスの製造方法
JP2017068088A (ja) * 2015-09-30 2017-04-06 キヤノン株式会社 露光装置、温調装置、および物品の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006058602A (ja) * 2004-08-20 2006-03-02 Ricoh Co Ltd 作像装置の冷却装置及び画像形成装置
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法
JP2016161923A (ja) * 2015-03-05 2016-09-05 キヤノン株式会社 露光装置及び物品の製造方法
JP2018091919A (ja) * 2016-11-30 2018-06-14 キヤノン株式会社 露光装置及び物品の製造方法
CN206684477U (zh) * 2017-03-17 2017-11-28 东莞市川佳电子五金科技有限公司 一种光学镜筒高效降温装置
US20190196396A1 (en) * 2017-12-27 2019-06-27 Ricoh Company, Ltd. Electronic device and image forming device

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Publication number Publication date
JP2021026021A (ja) 2021-02-22
JP7358106B2 (ja) 2023-10-10
KR20210015654A (ko) 2021-02-10

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