CN112090843B - 一种用于清洗硅片的装置 - Google Patents
一种用于清洗硅片的装置 Download PDFInfo
- Publication number
- CN112090843B CN112090843B CN202010927248.8A CN202010927248A CN112090843B CN 112090843 B CN112090843 B CN 112090843B CN 202010927248 A CN202010927248 A CN 202010927248A CN 112090843 B CN112090843 B CN 112090843B
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- Prior art keywords
- cleaning
- tank
- opening
- silicon wafer
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/02—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area using chambers or hoods covering the area
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010927248.8A CN112090843B (zh) | 2020-09-07 | 2020-09-07 | 一种用于清洗硅片的装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010927248.8A CN112090843B (zh) | 2020-09-07 | 2020-09-07 | 一种用于清洗硅片的装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112090843A CN112090843A (zh) | 2020-12-18 |
CN112090843B true CN112090843B (zh) | 2022-10-14 |
Family
ID=73757492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010927248.8A Active CN112090843B (zh) | 2020-09-07 | 2020-09-07 | 一种用于清洗硅片的装置 |
Country Status (1)
Country | Link |
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CN (1) | CN112090843B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114520171B (zh) * | 2022-02-15 | 2023-03-21 | 智程半导体设备科技(昆山)有限公司 | 一种基于槽式清洗机的气流增强装置及方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001351891A (ja) * | 2001-04-04 | 2001-12-21 | Tokyo Electron Ltd | 処理装置 |
CN108346600A (zh) * | 2018-01-29 | 2018-07-31 | 山东大海新能源发展有限公司 | 一种硅片鼓泡清洗装置 |
CN209465405U (zh) * | 2018-11-17 | 2019-10-08 | 辽宁辽河油田辽实环境应急救援有限公司 | 封闭式化学清洗装置 |
CN210138632U (zh) * | 2019-06-19 | 2020-03-13 | 童岳军 | 一种化工原料生产用便于清洗的混合装置 |
CN210876527U (zh) * | 2019-09-11 | 2020-06-30 | 麦斯克电子材料有限公司 | 一种用于硅抛光片清洗机的控制化学液浓度的装置 |
CN211150580U (zh) * | 2019-12-31 | 2020-07-31 | 中威新能源(成都)有限公司 | 一种含有臭氧的碱性溶液清洗硅片的装置 |
CN111151489A (zh) * | 2019-12-31 | 2020-05-15 | 中威新能源(成都)有限公司 | 一种含有臭氧的喷淋式清洗硅片的方法 |
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2020
- 2020-09-07 CN CN202010927248.8A patent/CN112090843B/zh active Active
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Publication number | Publication date |
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CN112090843A (zh) | 2020-12-18 |
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TA01 | Transfer of patent application right |
Effective date of registration: 20211102 Address after: Room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi 710065 Applicant after: Xi'an yisiwei Material Technology Co.,Ltd. Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi 710065 Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi 710065 Patentee after: Xi'an Yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: Room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi 710065 Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |