CN111788668A - 基板搬运装置以及基板搬运方法 - Google Patents
基板搬运装置以及基板搬运方法 Download PDFInfo
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- CN111788668A CN111788668A CN201980015141.1A CN201980015141A CN111788668A CN 111788668 A CN111788668 A CN 111788668A CN 201980015141 A CN201980015141 A CN 201980015141A CN 111788668 A CN111788668 A CN 111788668A
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- 239000000758 substrate Substances 0.000 title claims abstract description 620
- 238000000034 method Methods 0.000 title claims abstract description 80
- 230000003287 optical effect Effects 0.000 claims abstract description 141
- 230000007246 mechanism Effects 0.000 claims abstract description 72
- 230000002159 abnormal effect Effects 0.000 claims abstract description 67
- 238000012546 transfer Methods 0.000 claims abstract description 37
- 238000001514 detection method Methods 0.000 claims description 57
- 230000033001 locomotion Effects 0.000 claims description 57
- 230000008602 contraction Effects 0.000 claims description 20
- 230000005540 biological transmission Effects 0.000 claims description 10
- 238000006073 displacement reaction Methods 0.000 claims description 9
- 230000002265 prevention Effects 0.000 claims description 7
- 238000012545 processing Methods 0.000 description 164
- 238000003860 storage Methods 0.000 description 112
- 230000008569 process Effects 0.000 description 63
- 239000007788 liquid Substances 0.000 description 39
- 230000005856 abnormality Effects 0.000 description 24
- 210000000078 claw Anatomy 0.000 description 23
- 238000004891 communication Methods 0.000 description 12
- 238000005259 measurement Methods 0.000 description 12
- 230000032258 transport Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- 238000013461 design Methods 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 238000005192 partition Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 230000003028 elevating effect Effects 0.000 description 6
- 238000009434 installation Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 230000001174 ascending effect Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 208000034423 Delivery Diseases 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- -1 TMAH Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 208000034988 susceptibility to 3 restless legs syndrome Diseases 0.000 description 1
- 208000034986 susceptibility to 4 restless legs syndrome Diseases 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018-035510 | 2018-02-28 | ||
JP2018035510A JP7007948B2 (ja) | 2018-02-28 | 2018-02-28 | 基板搬送装置および基板搬送方法 |
PCT/JP2019/000740 WO2019167447A1 (ja) | 2018-02-28 | 2019-01-11 | 基板搬送装置および基板搬送方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111788668A true CN111788668A (zh) | 2020-10-16 |
Family
ID=67804892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201980015141.1A Pending CN111788668A (zh) | 2018-02-28 | 2019-01-11 | 基板搬运装置以及基板搬运方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7007948B2 (ja) |
KR (1) | KR102468631B1 (ja) |
CN (1) | CN111788668A (ja) |
TW (1) | TWI728306B (ja) |
WO (1) | WO2019167447A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113510689A (zh) * | 2020-04-10 | 2021-10-19 | 日本电产三协(浙江)有限公司 | 工业用机器人和工业用机器人的控制方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20240025052A1 (en) * | 2020-09-03 | 2024-01-25 | Kawasaki Jukogyo Kabushiki Kaisha | Substrate holding hand and substrate conveying robot |
TWI776412B (zh) * | 2021-03-03 | 2022-09-01 | 迅得機械股份有限公司 | 物件容器的移載裝置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07321165A (ja) * | 1994-05-24 | 1995-12-08 | Tokyo Electron Ltd | プローブ装置 |
JPH11145241A (ja) * | 1997-11-06 | 1999-05-28 | Toshiba Corp | マルチチャンバシステムおよび基板検出方法 |
CN101226878A (zh) * | 2007-01-15 | 2008-07-23 | 大日本网目版制造株式会社 | 基板处理装置以及基板处理方法 |
KR20120127220A (ko) * | 2011-05-12 | 2012-11-21 | 도쿄엘렉트론가부시키가이샤 | 기판 반송 장치, 이것을 구비하는 도포 현상 장치, 및 기판 반송 방법 |
JP2018010992A (ja) * | 2016-07-14 | 2018-01-18 | 東京エレクトロン株式会社 | フォーカスリング交換方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003100852A (ja) | 2001-09-25 | 2003-04-04 | Dainippon Screen Mfg Co Ltd | 基板飛び出し検出装置およびそれを用いた基板処理装置 |
JP4276440B2 (ja) | 2003-01-06 | 2009-06-10 | 東京エレクトロン株式会社 | 基板検出方法及び装置並びに基板処理装置 |
JP2009064807A (ja) * | 2007-09-04 | 2009-03-26 | Tokyo Electron Ltd | 基板位置ずれ検出システム |
JP2010283334A (ja) | 2009-05-01 | 2010-12-16 | Hitachi Kokusai Electric Inc | 基板処理装置及び半導体装置の製造方法 |
JP2012074485A (ja) * | 2010-09-28 | 2012-04-12 | Tokyo Electron Ltd | 基板処理装置及び基板搬送方法並びにその方法を実施するためのプログラムを記憶する記憶媒体 |
-
2018
- 2018-02-28 JP JP2018035510A patent/JP7007948B2/ja active Active
-
2019
- 2019-01-11 CN CN201980015141.1A patent/CN111788668A/zh active Pending
- 2019-01-11 WO PCT/JP2019/000740 patent/WO2019167447A1/ja active Application Filing
- 2019-01-11 KR KR1020207017812A patent/KR102468631B1/ko active IP Right Grant
- 2019-01-23 TW TW108102562A patent/TWI728306B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07321165A (ja) * | 1994-05-24 | 1995-12-08 | Tokyo Electron Ltd | プローブ装置 |
JPH11145241A (ja) * | 1997-11-06 | 1999-05-28 | Toshiba Corp | マルチチャンバシステムおよび基板検出方法 |
CN101226878A (zh) * | 2007-01-15 | 2008-07-23 | 大日本网目版制造株式会社 | 基板处理装置以及基板处理方法 |
KR20120127220A (ko) * | 2011-05-12 | 2012-11-21 | 도쿄엘렉트론가부시키가이샤 | 기판 반송 장치, 이것을 구비하는 도포 현상 장치, 및 기판 반송 방법 |
JP2018010992A (ja) * | 2016-07-14 | 2018-01-18 | 東京エレクトロン株式会社 | フォーカスリング交換方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113510689A (zh) * | 2020-04-10 | 2021-10-19 | 日本电产三协(浙江)有限公司 | 工业用机器人和工业用机器人的控制方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20200083623A (ko) | 2020-07-08 |
JP7007948B2 (ja) | 2022-01-25 |
WO2019167447A1 (ja) | 2019-09-06 |
JP2019153609A (ja) | 2019-09-12 |
KR102468631B1 (ko) | 2022-11-17 |
TWI728306B (zh) | 2021-05-21 |
TW201936471A (zh) | 2019-09-16 |
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