CN111334852B - 石英玻璃坩埚 - Google Patents
石英玻璃坩埚 Download PDFInfo
- Publication number
- CN111334852B CN111334852B CN201911316941.5A CN201911316941A CN111334852B CN 111334852 B CN111334852 B CN 111334852B CN 201911316941 A CN201911316941 A CN 201911316941A CN 111334852 B CN111334852 B CN 111334852B
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- CN
- China
- Prior art keywords
- layer
- crucible
- natural
- quartz
- synthetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 139
- 239000013078 crystal Substances 0.000 claims abstract description 120
- 238000007789 sealing Methods 0.000 claims abstract description 82
- 239000010453 quartz Substances 0.000 claims abstract description 59
- 239000006060 molten glass Substances 0.000 claims abstract description 19
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 15
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 21
- 239000003345 natural gas Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 4
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 4
- 239000002689 soil Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 abstract description 9
- 229910052760 oxygen Inorganic materials 0.000 abstract description 9
- 239000011521 glass Substances 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 285
- 229910052710 silicon Inorganic materials 0.000 description 44
- 239000010703 silicon Substances 0.000 description 44
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 42
- 239000000155 melt Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 19
- 238000002844 melting Methods 0.000 description 18
- 230000008018 melting Effects 0.000 description 18
- 239000000843 powder Substances 0.000 description 17
- 239000012535 impurity Substances 0.000 description 15
- 239000002994 raw material Substances 0.000 description 15
- 238000002425 crystallisation Methods 0.000 description 11
- 230000008025 crystallization Effects 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 238000011835 investigation Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 238000011109 contamination Methods 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- -1 silicon alkoxide Chemical class 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 230000003313 weakening effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000005445 natural material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018-237641 | 2018-12-19 | ||
| JP2018237641A JP7024700B2 (ja) | 2018-12-19 | 2018-12-19 | 石英ガラスルツボ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111334852A CN111334852A (zh) | 2020-06-26 |
| CN111334852B true CN111334852B (zh) | 2022-03-04 |
Family
ID=71140984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911316941.5A Active CN111334852B (zh) | 2018-12-19 | 2019-12-19 | 石英玻璃坩埚 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7024700B2 (https=) |
| KR (1) | KR102342039B1 (https=) |
| CN (1) | CN111334852B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111996589A (zh) * | 2020-08-31 | 2020-11-27 | 宁夏富乐德石英材料有限公司 | 抑制引晶硅液面抖动的石英坩埚及其制备方法 |
| US11987900B2 (en) * | 2020-11-11 | 2024-05-21 | Globalwafers Co., Ltd. | Methods for forming a silicon substrate with reduced grown-in nuclei for epitaxial defects and methods for forming an epitaxial wafer |
| JP7673758B2 (ja) * | 2020-12-18 | 2025-05-09 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法 |
| US20250270732A1 (en) * | 2022-04-18 | 2025-08-28 | Shin-Etsu Quartz Products Co., Ltd. | Quartz glass crucible for pulling single crystal silicon ingot |
| CN116924661A (zh) * | 2023-07-28 | 2023-10-24 | 新沂市中大石英科技有限公司 | 一种使用人工水晶石英砂生产高纯石英玻璃坩埚的方法 |
| CN120309155B (zh) * | 2025-06-16 | 2025-10-10 | 浙江美晶新材料股份有限公司 | 一种石英坩埚及其制备方法与应用 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0388793A (ja) * | 1989-08-30 | 1991-04-15 | Mitsubishi Materials Corp | シリコン単結晶引上げ用石英ルツボ |
| CN102485972A (zh) * | 2010-12-03 | 2012-06-06 | 日本超精石英株式会社 | 氧化硅玻璃坩埚 |
| CN204918839U (zh) * | 2015-09-11 | 2015-12-30 | 江西中昱新材料科技有限公司 | 一种石英坩埚 |
| CN108531978A (zh) * | 2018-04-09 | 2018-09-14 | 江阴龙源石英制品有限公司 | 一种大规模集成电路用5层复合石英坩埚及其制备方法和表面处理方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05252157A (ja) | 1992-03-06 | 1993-09-28 | Matsushita Electric Ind Co Ltd | 呼制御装置 |
| JP3136533B2 (ja) | 1995-04-28 | 2001-02-19 | 三菱マテリアルクォーツ株式会社 | シリコン単結晶引上げ用石英ルツボ |
| JP4447738B2 (ja) | 2000-05-31 | 2010-04-07 | 信越石英株式会社 | 多層構造の石英ガラスルツボの製造方法 |
| KR100718314B1 (ko) * | 2003-05-01 | 2007-05-15 | 신에쯔 세끼에이 가부시키가이샤 | 실리콘 단결정 인상용 석영유리 도가니 및 그 제조방법 |
| JP4678667B2 (ja) | 2004-06-07 | 2011-04-27 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法 |
| JP4789437B2 (ja) * | 2004-07-16 | 2011-10-12 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスるつぼおよびその製造方法 |
| KR100847500B1 (ko) | 2006-03-30 | 2008-07-22 | 코바렌트 마테리얼 가부시키가이샤 | 실리카 유리 도가니 |
| JP4798714B2 (ja) | 2007-03-28 | 2011-10-19 | コバレントマテリアル株式会社 | シリコン単結晶引上用シリカガラスルツボ |
| US8272234B2 (en) | 2008-12-19 | 2012-09-25 | Heraeus Shin-Etsu America, Inc. | Silica crucible with pure and bubble free inner crucible layer and method of making the same |
| WO2011013695A1 (ja) | 2009-07-31 | 2011-02-03 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用シリカガラスルツボ |
| JP5685894B2 (ja) * | 2010-11-05 | 2015-03-18 | 信越半導体株式会社 | 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法 |
| KR101293526B1 (ko) * | 2011-01-28 | 2013-08-06 | 쟈판 스파 쿼츠 가부시키가이샤 | 실리콘 단결정 인상용 석영 유리 도가니 및 그의 제조 방법 |
| JP6351534B2 (ja) | 2015-04-01 | 2018-07-04 | クアーズテック株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
-
2018
- 2018-12-19 JP JP2018237641A patent/JP7024700B2/ja active Active
-
2019
- 2019-12-18 KR KR1020190169722A patent/KR102342039B1/ko active Active
- 2019-12-19 CN CN201911316941.5A patent/CN111334852B/zh active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0388793A (ja) * | 1989-08-30 | 1991-04-15 | Mitsubishi Materials Corp | シリコン単結晶引上げ用石英ルツボ |
| CN102485972A (zh) * | 2010-12-03 | 2012-06-06 | 日本超精石英株式会社 | 氧化硅玻璃坩埚 |
| CN204918839U (zh) * | 2015-09-11 | 2015-12-30 | 江西中昱新材料科技有限公司 | 一种石英坩埚 |
| CN108531978A (zh) * | 2018-04-09 | 2018-09-14 | 江阴龙源石英制品有限公司 | 一种大规模集成电路用5层复合石英坩埚及其制备方法和表面处理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102342039B1 (ko) | 2021-12-22 |
| CN111334852A (zh) | 2020-06-26 |
| JP7024700B2 (ja) | 2022-02-24 |
| KR20200076636A (ko) | 2020-06-29 |
| JP2020100515A (ja) | 2020-07-02 |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |