CN111302383B - 掺杂型氧化亚铜纳米材料及其制备方法和应用 - Google Patents
掺杂型氧化亚铜纳米材料及其制备方法和应用 Download PDFInfo
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- CN111302383B CN111302383B CN202010083093.4A CN202010083093A CN111302383B CN 111302383 B CN111302383 B CN 111302383B CN 202010083093 A CN202010083093 A CN 202010083093A CN 111302383 B CN111302383 B CN 111302383B
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- Prior art keywords
- thiocyanate
- ion
- doped
- cuprous
- cuprous oxide
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- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 title claims abstract description 61
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 229940112669 cuprous oxide Drugs 0.000 title claims abstract description 61
- 239000002086 nanomaterial Substances 0.000 title claims abstract description 49
- 238000002360 preparation method Methods 0.000 title claims abstract description 25
- 239000007864 aqueous solution Substances 0.000 claims abstract description 52
- 229910052751 metal Inorganic materials 0.000 claims abstract description 36
- 239000002184 metal Substances 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000000843 powder Substances 0.000 claims abstract description 20
- 239000002070 nanowire Substances 0.000 claims abstract description 12
- 239000010408 film Substances 0.000 claims description 80
- PDZKZMQQDCHTNF-UHFFFAOYSA-M copper(1+);thiocyanate Chemical compound [Cu+].[S-]C#N PDZKZMQQDCHTNF-UHFFFAOYSA-M 0.000 claims description 51
- 239000000243 solution Substances 0.000 claims description 38
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 229910021645 metal ion Inorganic materials 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 18
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 13
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 claims description 13
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052725 zinc Inorganic materials 0.000 claims description 12
- 239000011701 zinc Substances 0.000 claims description 12
- 239000007787 solid Substances 0.000 claims description 11
- 238000005406 washing Methods 0.000 claims description 11
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 5
- -1 iron ion Chemical class 0.000 claims description 5
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims description 4
- 238000013329 compounding Methods 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 3
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 2
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 claims description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 2
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 claims description 2
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims description 2
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 2
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 claims description 2
- 229910001422 barium ion Inorganic materials 0.000 claims description 2
- 229910001424 calcium ion Inorganic materials 0.000 claims description 2
- 229910001430 chromium ion Inorganic materials 0.000 claims description 2
- 229910001431 copper ion Inorganic materials 0.000 claims description 2
- 229910001448 ferrous ion Inorganic materials 0.000 claims description 2
- CKHJYUSOUQDYEN-UHFFFAOYSA-N gallium(3+) Chemical compound [Ga+3] CKHJYUSOUQDYEN-UHFFFAOYSA-N 0.000 claims description 2
- 229910001449 indium ion Inorganic materials 0.000 claims description 2
- RVPVRDXYQKGNMQ-UHFFFAOYSA-N lead(2+) Chemical compound [Pb+2] RVPVRDXYQKGNMQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910001425 magnesium ion Inorganic materials 0.000 claims description 2
- 229910001437 manganese ion Inorganic materials 0.000 claims description 2
- 229910001453 nickel ion Inorganic materials 0.000 claims description 2
- 229940116357 potassium thiocyanate Drugs 0.000 claims description 2
- 229910001427 strontium ion Inorganic materials 0.000 claims description 2
- PWYYWQHXAPXYMF-UHFFFAOYSA-N strontium(2+) Chemical compound [Sr+2] PWYYWQHXAPXYMF-UHFFFAOYSA-N 0.000 claims description 2
- GBNDTYKAOXLLID-UHFFFAOYSA-N zirconium(4+) ion Chemical compound [Zr+4] GBNDTYKAOXLLID-UHFFFAOYSA-N 0.000 claims description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 21
- 239000011248 coating agent Substances 0.000 abstract description 15
- 230000003373 anti-fouling effect Effects 0.000 abstract description 10
- 230000005284 excitation Effects 0.000 abstract description 6
- 239000000654 additive Substances 0.000 abstract description 5
- 230000000996 additive effect Effects 0.000 abstract description 5
- 239000008204 material by function Substances 0.000 abstract description 5
- 239000003086 colorant Substances 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 230000002194 synthesizing effect Effects 0.000 abstract 1
- 239000010949 copper Substances 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 6
- 239000010941 cobalt Substances 0.000 description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 6
- 238000005424 photoluminescence Methods 0.000 description 6
- 229910000368 zinc sulfate Inorganic materials 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- PGTXKIZLOWULDJ-UHFFFAOYSA-N [Mg].[Zn] Chemical compound [Mg].[Zn] PGTXKIZLOWULDJ-UHFFFAOYSA-N 0.000 description 4
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 4
- 229960001763 zinc sulfate Drugs 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- IUYOGGFTLHZHEG-UHFFFAOYSA-N copper titanium Chemical compound [Ti].[Cu] IUYOGGFTLHZHEG-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- PHCDZUPEIPGYOG-UHFFFAOYSA-N [Fe].[Co].[Zn] Chemical compound [Fe].[Co].[Zn] PHCDZUPEIPGYOG-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910017053 inorganic salt Inorganic materials 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011858 nanopowder Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000103 photoluminescence spectrum Methods 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 239000011686 zinc sulphate Substances 0.000 description 2
- 150000000703 Cerium Chemical class 0.000 description 1
- 229910021580 Cobalt(II) chloride Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L magnesium sulphate Substances [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- LUMVCLJFHCTMCV-UHFFFAOYSA-M potassium;hydroxide;hydrate Chemical compound O.[OH-].[K+] LUMVCLJFHCTMCV-UHFFFAOYSA-M 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G3/00—Compounds of copper
- C01G3/02—Oxides; Hydroxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/75—Cobalt
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/755—Nickel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/80—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with zinc, cadmium or mercury
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- B01J35/40—
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- B01J35/59—
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0201—Impregnation
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- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0236—Drying, e.g. preparing a suspension, adding a soluble salt and drying
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1606—Antifouling paints; Underwater paints characterised by the anti-fouling agent
- C09D5/1612—Non-macromolecular compounds
- C09D5/1618—Non-macromolecular compounds inorganic
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- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/58—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing copper, silver or gold
- C09K11/582—Chalcogenides
- C09K11/584—Chalcogenides with zinc or cadmium
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- C—CHEMISTRY; METALLURGY
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- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/60—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing iron, cobalt or nickel
- C09K11/602—Chalcogenides
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
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- C09K11/602—Chalcogenides
- C09K11/605—Chalcogenides with zinc or cadmium
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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Abstract
本发明属于纳米材料和光电功能材料技术领域,具体为掺杂型氧化亚铜纳米材料及其制备方法和应用。本发明以“金属离子‑硫氰酸根”水溶液作为掺杂液,制备掺杂型的氧化亚铜纳米材料。制得的掺杂型氧化亚铜纳米材料形态可调,可以是纳米线形态,也可以不是纳米线形态;制得的材料样品可以是掺杂型薄膜,也可以是掺杂型粉体。掺杂型氧化亚铜纳米材料在绿光(532纳米)激发下可以发射高亮度的红光,可作为三原色之一用于构建白光发光器件(LED)。本发明合成的纳米材料在功能材料和量子信息材料领域有重要价值;还可以用作涂层添加剂或者用于制作防污涂层。本发明提出的制备方法,绿色环保,简单高效,是一种合成掺杂型纳米材料的新路线。
Description
技术领域
本发明属于纳米材料和光电功能材料技术领域,具体涉及掺杂型氧化亚铜纳米材料及其制备方法和应用。
背景技术
金属氧化物材料具有广泛的应用价值。对金属氧化物的掺杂可以进一步改善和提升材料的性能和应用领域。早在1967年,I. T. Drapak就曾报道了ZnO / p-Cu2O异质结的电致发光。但是P型ZnO的掺杂效果仍然有极大的提升空间。
氧化亚铜在光电功能材料领域有潜在的重要价值,目前的关键问题在于高性能材料的制备技术,特别是有效的掺杂方法。有没有可能发展出一种通用的掺杂方法,这是目前需要解决的问题。
发明人前期发现,以硫氰酸亚铜为原料,可以很容易合成氧化亚铜纳米线材料。我们也发现其他多种“金属离子-硫氰酸根”水溶液体系可以用于合成金属氧化物纳米材料。我们还发现,硫氰酸亚铜通过与无机盐溶液反应实现掺杂,制备光电功能薄膜或者先进功能材料。[(1)徐伟,肖星星,夏鹏,一种氧化亚铜纳米线多孔薄膜及其制备方法和应用,发明专利申请号: 2014100140030;(2)徐伟,肖星星,夏鹏,孙倩,田果,一种氧化亚铜纳米线材料的制备方法,发明专利申请号: 2014100314653;(3)徐伟,孙倩,肖星星,夏鹏,田果. 一种片状氧化锌纳米材料的简易制备方法. 发明专利申请号:2014100412374;(4)徐伟,夏鹏,孙倩,张辉,金属氧化物纳米材料的绿色制备方法,发明专利申请号:201810170300.2;(5)徐伟,王涛,笪仕旭,徐琳绮,形态可控氧化锌纳米材料的绿色制备方法,发明专利申请号:201910359373.0;(6)徐伟, 笪仕旭,顾壮,张辉, 夏鹏, 徐琳绮. 金属氧化物及其水合物纳米化工材料及其绿色合成方法. 发明专利申请号:202010077196X;(7)徐伟,李宗宜,吴莹莹,甘营,张辉,复合型光电转换薄膜及其制备方法和应用. 发明专利申请号:2018101708063;(8)徐伟,吴莹莹,甘营,银掺杂硫氰酸亚铜薄膜及其制备方法和应用. 发明专利申请号:2018101703017;(9)徐伟,甘营,银盐和铈盐共掺杂的硫氰酸亚铜复合薄膜及其制备方法和应用.发明专利申请号:2018101702851]。
本发明发现了一种简单又有效的掺杂方法,为掺杂型氧化亚铜纳米材料的发展开辟了一条道路,也为高性能涂层材料的制备开出新路。
发明内容
本发明的目的在于提出掺杂型氧化亚铜纳米材料及其制备方法和应用,以促进氧化亚铜及其相关材料的发展。
本发明提出的掺杂型氧化亚铜纳米材料的制备方法,具体步骤为:
(1)将固态硫氰酸亚铜(CuSCN)与“金属离子-硫氰酸根”水溶液复合,制备吸附有“金属离子-硫氰酸根”物种的硫氰酸亚铜;
(2)再与碱水溶液反应,然后进行分离、洗涤,再烘干或者烘烤,制备得到掺杂型的氧化亚铜纳米材料。
所述的固态硫氰酸亚铜,可以采用硫氰酸亚铜薄膜,也可以采用硫氰酸亚铜粉末;
所述的“金属离子-硫氰酸根”水溶液体系可采用水溶性金属盐与水溶性硫氰酸盐的混合水溶液。与金属盐相比,水溶性硫氰酸盐的用量为等当量、或者少量、或者微量;硫氰酸根与金属离子的物质的量的比为:4.0~0.001(摩尔数之比);所述水溶性硫氰酸盐采用硫氰酸钠、硫氰酸钾、硫氰酸铵之一种。
所述的金属离子采用二价金属离子、三价金属离子、四价金属离子之一种,具体的金属离子可以有很多,这些金属离子都可以与硫氰酸根形成“金属离子-硫氰酸根”水溶液。
进一步,所述金属离子具体可选自:铟离子、钛离子、锆离子、铬离子、锰离子、铁离子、亚铁离子、钴离子、镍离子、铜离子、铅离子、镁离子、钙离子、钡离子、锶离子、铝离子、镓离子、锌离子中的一种或几种。优选锌离子、钴离子等。
所述的吸附有“金属离子-硫氰酸根”物种的硫氰酸亚铜,由固态硫氰酸亚铜与“金属离子-硫氰酸根”水溶液复合制备获得。具体分二种方法为:(一)将粉末状态的硫氰酸亚铜分散到“金属离子-硫氰酸根”水溶液中,通过混合来吸附,制备吸附有“金属离子-硫氰酸根”物种的硫氰酸亚铜,再与碱水溶液反应;(二)将硫氰酸亚铜薄膜浸泡在“金属离子-硫氰酸根”水溶液中,制备吸附有“金属离子-硫氰酸根”物种的硫氰酸亚铜,再与碱水溶液反应。
所述碱水溶液为氢氧化钠水溶液、氢氧化钾水溶液、氨水水溶液之一种。
所述烘干温度不超过120℃;所述烘烤温度通常不超过350℃。
本发明以锌离子为例,说明掺杂型氧化亚铜纳米材料的制备方法:配制“锌离子-硫氰酸根”水溶液,与硫氰酸亚铜复合,制备吸附有“锌离子-硫氰酸根”物种的硫氰酸亚铜,再与碱溶液反应,制备锌掺杂的氧化亚铜纳米材料(又名:氧化锌掺杂的氧化亚铜纳米材料)。其他金属离子或者混合金属离子可参照此方法来制备。
在本发明中,采用其他的二价、三价、四价金属离子或者混合金属离子,也可以用类似的方法制备掺杂型的氧化亚铜纳米材料,即:配制“金属离子-硫氰酸根”水溶液(或者“混合金属离子-硫氰酸根”水溶液)作为掺杂液,用于制备吸附有“金属离子-硫氰酸根”物种的硫氰酸亚铜,再与碱溶液反应,分别制备各种掺杂型的氧化亚铜纳米材料。
本发明制备得到的掺杂型氧化亚铜纳米材料可以保持纳米线形态,类似未掺杂的氧化亚铜纳米线材料;也可以不是纳米线形态。
本发明通过对比实验证明,“金属离子-硫氰酸根”水溶液与通常的金属盐水溶液存在明显的差别,进一步证明“金属离子-硫氰酸根”体系具有不同寻常的性质。
本发明制备得到的掺杂型氧化亚铜纳米材料具有光致发光性能,可用做光致发光材料和光致发光薄膜,应用于发光器件、柔性发光器件以及大面积显示屏等。
例如,对锌掺杂的氧化亚铜纳米材料进行了光致发光性能测量,在绿光(532纳米)激发下,能够发射高亮度的红色发光,可以作为三原色之一用于构建白光发光器件(LED)。在发光器件、柔性显示器件、大面积显示屏等领域有应用价值。
本发明制备得到的掺杂型氧化亚铜纳米线,具备纳米尺度效应和量子效应,有潜力用作新型量子材料和量子信息材料,在未来新材料领域有重大价值,包括量子线发光、量子线激光材料、量子信息发射、量子信息传输、量子信息接收以及量子信息处理等。
本发明制备得到的掺杂型氧化亚铜纳米材料能应用于太阳能电池领域、光致发光领域、电致发光领域、光致变色领域、电致变色领域、介电薄膜领域、传感器领域以及光催化薄膜领域。
本发明制备得到的掺杂型氧化亚铜纳米材料,还可以用于颜料、涂料、填料和涂层等领域,用作添加剂;也可以直接用于制备涂层和薄膜,作为颜料涂层和防污涂层,应用于日常生产和生活等广泛领域;特别是还可以应用于海洋装备和船舰的涂层,用于防污染和防海洋生物繁殖。
本发明提出的涂层和防污涂层的制备方法为:以钢铁和合金片材为基底,在表面上沉积薄的铜膜(或者含铜薄膜),与硫氰酸盐水溶液反应,原位制备沉积在钢铁和合金表面上的硫氰酸亚铜薄膜,再用“金属离子-硫氰酸根”水溶液处理,使硫氰酸亚铜薄膜掺杂“金属离子-硫氰酸根”物种,然后再用碱溶液处理,洗涤,烘干(或者烘烤),制备获得各种金属离子掺杂的氧化亚铜涂层或者薄膜。
附图说明
图1为实施例1制备的材料样品的SEM图像(A、B)及532纳米绿光激发下的光致发光图谱(C)。
图2为实施例2制备的材料样品的SEM图像(A、B)及532纳米绿光激发下的光致发光图谱(C)。
具体实施方式
下面通过实施例进一步描述本发明提出的掺杂型氧化亚铜纳米材料的制备方法及其应用:
实施例1
硫氰酸亚铜薄膜可由铜膜与硫氰酸盐水溶液反应,制备获得。 [(1)徐伟,肖星星,夏鹏,一种氧化亚铜纳米线多孔薄膜及其制备方法和应用,发明专利申请号:2014100140030]。
将硫氰酸亚铜薄膜浸入“锌离子-硫氰酸根”水溶液中吸附,再与碱溶液反应,来制备锌掺杂的氧化亚铜薄膜:
将5毫升0.5摩尔/升的硫氰酸钠溶液与10毫升0.1摩尔/升的硫酸锌水溶液混合均匀,再将柔性塑料基底上的硫氰酸亚铜薄膜浸入其中,浸泡20分钟,取出,除去多余的溶液;再将薄膜样品浸入过量的氢氧化钠水溶液中,浸泡1小时,反取出,洗涤,烘干,制得锌掺杂的氧化亚铜薄膜。
扫描电子显微镜图像(SEM)显示锌掺杂的氧化亚铜薄膜为纳米线结构,如图1(A)和1(B)所示。
该薄膜在绿光(532纳米)激发下,可以发射高亮度的红色发光,如图1(C)所示。
改变实验配方,包括硫氰酸盐的用量,采用类似的方法可以制备出许多种锌掺杂的氧化亚铜薄膜。
这类锌掺杂的氧化亚铜纳米结构薄膜可以作为三原色之一用于构建白光发光器件(LED)。在发光器件、柔性显示器件、大面积显示屏等领域有应用价值。
实施例2
用硫酸锌水溶液代替“锌离子-硫氰酸根”水溶液。
将硫氰酸亚铜薄膜浸入硫酸锌水溶液中吸附,再与碱溶液反应,来制备锌掺杂的氧化亚铜薄膜。实验步骤类似,但是产物的聚集形态和光致发光性能有明显差别。
SEM图像如图2(A)和2(B)所示。该薄膜在绿光(532纳米)激发下,可以发光,但是发光强度明显降低,发射波长也有移动,如图2(C)所示。
本实施例说明,在制备锌掺杂的氧化亚铜薄膜的过程中,“锌离子-硫氰酸根”水溶液与一般的无机盐水溶液(比如硫酸锌水溶液)有非常大的差别。
本实施例进一步证明,“金属离子-硫氰酸根”水溶液具有不同寻常的性质。
实施例3
将市售的硫氰酸亚铜粉末,碾磨成很细的粉末,代替实施例1中的硫氰酸亚铜薄膜,来制备锌掺杂的氧化亚铜纳米材料。
得到锌掺杂的氧化亚铜粉末样品,类似实施例1的产物,为纳米线结构。
改变实验配方,包括硫氰酸盐的用量以及溶液浓度,采用类似的方法可以制备出许多种锌掺杂的氧化亚铜纳米材料。
这类锌掺杂的氧化亚铜纳米材料可以作为三原色之一用于构建白光发光器件(LED),是一类新型的荧光粉。也可以用做防污涂层添加剂。
实施例4
将100毫升0.05摩尔/升的CoCl2溶液与100毫升0.1摩尔/升的NaSCN溶液混合,制得“钴离子-硫氰酸根”水溶液,作为掺杂液。
在不锈钢基底表面上沉积薄的铜膜或者含铜薄膜,再与硫氰酸盐水溶液反应,制得沉积在不锈钢基底上的硫氰酸亚铜薄膜,备用。
将沉积在不锈钢基底上的硫氰酸亚铜薄膜浸入上述“钴离子-硫氰酸根”水溶液中,浸泡5分钟,取出薄膜,除去多余的溶液,再将薄膜浸入氢氧化钾水溶液中,浸泡30分钟。用去离子水充分洗涤薄膜后,在60℃烘干,制得钴掺杂的氧化亚铜纳米结构薄膜。
这类纳米结构薄膜可用做功能薄膜,比如用做催化薄膜、颜料涂层、防污涂层。
实施例5
在150毫升0.05摩尔/升的CoCl2溶液中,滴加与2毫升0.1摩尔/升的NaSCN溶液,制得“钴离子-硫氰酸根”水溶液,作为掺杂液。
将市售硫氰酸亚铜粉末碾磨半小时,再加入到上述“钴离子-硫氰酸根”水溶液中,搅拌15分钟,过滤,得固体粉末。再将固体粉末加入到过量的氢氧化钾水溶液中,搅拌15分钟,再用超声波作用30分钟。过滤,洗涤,固体粉末在60℃烘干,再在350℃烘烤1小时,制得钴掺杂的氧化亚铜纳米粉体材料。
这类钴掺杂的纳米材料可用做催化剂、增强型填充料、颜料、以及防污涂层添加剂。
实施例6
50毫升0.2摩尔/升的NiSO4溶液与100毫升 0.2摩尔/升的KSCN溶液混合,制得“镍离子-硫氰酸根”水溶液,作为掺杂液。
将市售硫氰酸亚铜粉末碾磨半小时,再加入到上述“镍离子-硫氰酸根”水溶液中,搅拌30分钟,过滤,得固体粉末。再将固体粉末加入到过量的氢氧化钾水溶液中,搅拌30分钟。过滤,洗涤,固体粉末在60℃烘干,再在350℃烘烤1小时,制得镍掺杂的氧化亚铜纳米粉体材料。
这类镍掺杂的纳米材料可用做催化剂、填充料、颜料、以及防污涂层添加剂。
实施例7
50毫升0.2摩尔/升的MgSO4溶液与50毫升0.2摩尔/升的ZnSO4溶液混合,再加入1毫升 0.2摩尔/升的KSCN溶液,制得“镁锌离子-硫氰酸根”水溶液,作为掺杂液。
将沉积在导电玻璃表面上的硫氰酸亚铜薄膜浸入到上述“镁锌离子-硫氰酸根”水溶液中,浸泡15分钟,取出。再将薄膜浸入到过量氢氧化钠水溶液中,浸泡30分钟。取出薄膜,洗涤,在60℃烘干,再在350℃烘烤1小时,制得镁锌掺杂的氧化亚铜纳米结构薄膜。
这类镁锌掺杂的氧化亚铜纳米结构薄膜可用作光催化薄膜、半导体薄膜、光发射材料。
实施例8
50毫升0.1摩尔/升的CuSO4溶液与50毫升0.1摩尔/升的ZnSO4溶液混合,再加入100毫升 0.2摩尔/升的NaSCN溶液,制得“铜锌离子-硫氰酸根”水溶液,作为掺杂液。
在金属和合金片材表面上沉积铜膜或者含铜薄膜,再与硫氰酸盐水溶液反应,制备沉积在金属和合金片材表面上的硫氰酸亚铜薄膜,备用。
将沉积在金属和合金片材表面上的硫氰酸亚铜薄膜浸入到上述“铜锌离子-硫氰酸根”水溶液中,浸泡30分钟,取出。再将薄膜浸入到过量氢氧化钠水溶液中,浸泡15分钟~1小时。取出薄膜,洗涤,在60℃烘干,再在350℃烘烤0.5小时,制得铜锌掺杂的氧化亚铜纳米结构薄膜。
这类铜锌掺杂的氧化亚铜纳米结构薄膜可用作光催化薄膜、防污涂层、半导体薄膜、发光薄膜。
实施例9
5毫升0.1摩尔/升的CuSO4水溶液与5毫升0.1摩尔/升的Ti(SO4)2水溶液混合,再加入2毫升 0.2摩尔/升的NaSCN溶液,制得“铜钛离子-硫氰酸根”水溶液,作为掺杂液。
将上述“铜钛离子-硫氰酸根”水溶液滴加到硫氰酸亚铜薄膜表面上,静置30分钟,除去多余的掺杂液。再将薄膜浸入到过量氢氧化钠水溶液中,浸泡15分钟。取出薄膜,洗涤,在60℃烘干,再在350℃烘烤1小时,制得铜钛掺杂的氧化亚铜薄膜。
这类铜钛掺杂的氧化亚铜薄膜可用做光电功能薄膜、防污涂层。
实施例10
将50毫升0.05摩尔/升的二氯化钴水溶液、50毫升0.05摩尔/升的三氯化铁水溶液、以及50毫升0.05摩尔/升的二氯化锌水溶液混合,再加入200毫升0.1摩尔/升的硫氰酸钠水溶液,混合均匀后,制得“钴铁锌离子-硫氰酸根”水溶液,作为掺杂液。
将沉积在聚酰亚胺薄膜上的硫氰酸亚铜薄膜浸入上述“钴铁锌离子-硫氰酸根”水溶液中,浸泡5分钟,取出,除去多余的掺杂液。再将薄膜浸入到过量氢氧化钠水溶液中,浸泡15分钟。取出薄膜,洗涤,在60℃烘干,再在300℃烘烤1小时,制得钴铁锌掺杂的氧化亚铜薄膜。
这类钴铁锌掺杂的氧化亚铜薄膜可用做光电功能薄膜、防污涂层。
Claims (7)
1.一种掺杂型氧化亚铜纳米材料的制备方法,其特征在于,具体步骤为:
(1)将固态硫氰酸亚铜与金属离子-硫氰酸根水溶液复合,制备吸附有金属离子-硫氰酸根物种的硫氰酸亚铜;
(2)再与碱水溶液反应,然后进行分离、洗涤,再烘干或者烘烤,制备得到掺杂型的氧化亚铜纳米材料;所述烘干温度不超过120℃,所述烘烤温度不超过350℃;
所述的固态硫氰酸亚铜采用硫氰酸亚铜薄膜或硫氰酸亚铜粉末;
所述的金属离子-硫氰酸根水溶液体系采用水溶性金属盐与水溶性硫氰酸盐的混合水溶液;硫氰酸根与金属离子的摩尔数之比为:4.0~0.001;所述水溶性硫氰酸盐采用硫氰酸钠、硫氰酸钾、硫氰酸铵之一种;
所述的金属离子采用二价金属离子、三价金属离子、四价金属离子之一种;
所述制备吸附有金属离子-硫氰酸根物种的硫氰酸亚铜,具体方法分二种:
第一种是将粉末状态的硫氰酸亚铜分散到金属离子-硫氰酸根水溶液中,通过混合来吸附,制备吸附有金属离子-硫氰酸根物种的硫氰酸亚铜;
第二种是将硫氰酸亚铜薄膜浸泡在金属离子-硫氰酸根水溶液中,制备吸附有金属离子-硫氰酸根物种的硫氰酸亚铜。
2.根据权利要求1所述的掺杂型氧化亚铜纳米材料的制备方法,其特征在于,所述金属离子具体可选自:铟离子、钛离子、锆离子、铬离子、锰离子、铁离子、亚铁离子、钴离子、镍离子、铜离子、铅离子、镁离子、钙离子、钡离子、锶离子、铝离子、镓离子、锌离子中的一种或几种。
3.根据权利要求1所述的掺杂型氧化亚铜纳米材料的制备方法,其特征在于,所述碱水溶液为氢氧化钠水溶液、氢氧化钾水溶液、氨水水溶液之一种。
4.由权利要求2所述制备方法得到的锌掺杂的氧化亚铜纳米材料。
5.根据权利要求4所述的锌掺杂的氧化亚铜纳米材料,其特征在于,保持纳米线形态。
6.根据权利要求4所述的锌掺杂的氧化亚铜纳米材料,其特征在于,为掺杂型的薄膜,或者为掺杂型的粉体材料。
7.如权利要求4、5或6所述的锌掺杂的氧化亚铜纳米材料作为光致发光材料的应用,用于发光器件。
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