CN111226314A - 多层复合半导体基板结构及其制备方法 - Google Patents
多层复合半导体基板结构及其制备方法 Download PDFInfo
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- CN111226314A CN111226314A CN201880040129.1A CN201880040129A CN111226314A CN 111226314 A CN111226314 A CN 111226314A CN 201880040129 A CN201880040129 A CN 201880040129A CN 111226314 A CN111226314 A CN 111226314A
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- 239000000758 substrate Substances 0.000 title claims abstract description 84
- 239000004065 semiconductor Substances 0.000 title claims abstract description 38
- 239000002131 composite material Substances 0.000 title claims abstract description 37
- 238000002360 preparation method Methods 0.000 title abstract description 15
- 239000010410 layer Substances 0.000 claims abstract description 254
- 239000000463 material Substances 0.000 claims abstract description 164
- 239000003989 dielectric material Substances 0.000 claims abstract description 69
- 238000000034 method Methods 0.000 claims abstract description 62
- 239000002346 layers by function Substances 0.000 claims abstract description 50
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- 238000012545 processing Methods 0.000 claims abstract description 8
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 28
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 25
- 229910003460 diamond Inorganic materials 0.000 claims description 25
- 239000010432 diamond Substances 0.000 claims description 25
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 23
- 229910002601 GaN Inorganic materials 0.000 claims description 22
- 238000000151 deposition Methods 0.000 claims description 22
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 21
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 18
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 13
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- VQCBHWLJZDBHOS-UHFFFAOYSA-N erbium(iii) oxide Chemical compound O=[Er]O[Er]=O VQCBHWLJZDBHOS-UHFFFAOYSA-N 0.000 claims description 12
- 238000001994 activation Methods 0.000 claims description 11
- 230000004913 activation Effects 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 9
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 9
- 229910052582 BN Inorganic materials 0.000 claims description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 6
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 6
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 6
- 238000000678 plasma activation Methods 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 5
- 239000002344 surface layer Substances 0.000 claims description 5
- 238000012546 transfer Methods 0.000 claims description 4
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 3
- DBKNIEBLJMAJHX-UHFFFAOYSA-N [As]#B Chemical compound [As]#B DBKNIEBLJMAJHX-UHFFFAOYSA-N 0.000 claims description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 3
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 3
- 239000002041 carbon nanotube Substances 0.000 claims description 3
- 229910021389 graphene Inorganic materials 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000017525 heat dissipation Effects 0.000 abstract description 22
- 230000006378 damage Effects 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 4
- 238000005137 deposition process Methods 0.000 abstract description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000007704 transition Effects 0.000 description 5
- 239000003292 glue Substances 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 4
- 229910002704 AlGaN Inorganic materials 0.000 description 3
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 3
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 239000002052 molecular layer Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
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- 230000001737 promoting effect Effects 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/04—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances mica
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Recrystallisation Techniques (AREA)
Abstract
Description
Claims (15)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2018/097478 WO2020019312A1 (zh) | 2018-07-27 | 2018-07-27 | 多层复合半导体基板结构及其制备方法 |
Publications (2)
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CN111226314A true CN111226314A (zh) | 2020-06-02 |
CN111226314B CN111226314B (zh) | 2023-12-22 |
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CN (1) | CN111226314B (zh) |
WO (1) | WO2020019312A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111769191A (zh) * | 2020-07-31 | 2020-10-13 | 佛山紫熙慧众科技有限公司 | 一种紫外led芯片散热复合基板 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103682148A (zh) * | 2012-08-31 | 2014-03-26 | 三星显示有限公司 | 有机发光装置及其制造方法 |
CN105826434A (zh) * | 2016-03-23 | 2016-08-03 | 陕西科技大学 | 一种金刚石热沉GaN基LED制作方法 |
CN106783998A (zh) * | 2016-12-16 | 2017-05-31 | 中国电子科技集团公司第五十五研究所 | 一种基于金刚石衬底的氮化镓高电子迁移率晶体管及其制备方法 |
CN107919413A (zh) * | 2017-11-17 | 2018-04-17 | 陕西科技大学 | 一种GaN基LED向金刚石热沉转移方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101524902A (zh) * | 2008-03-04 | 2009-09-09 | 佳邦科技股份有限公司 | 低热阻且高导热系数高分子介电复合材料 |
US20140080951A1 (en) * | 2012-09-19 | 2014-03-20 | Chandrashekar Raman | Thermally conductive plastic compositions, extrusion apparatus and methods for making thermally conductive plastics |
US9722011B2 (en) * | 2014-04-25 | 2017-08-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Film scheme for MIM device |
JP2017531900A (ja) * | 2014-09-26 | 2017-10-26 | モメンティブ パフォーマンス マテリアルズ インコーポレイテッド | 変圧器用絶縁紙における窒化ホウ素積層複合体 |
-
2018
- 2018-07-27 WO PCT/CN2018/097478 patent/WO2020019312A1/zh active Application Filing
- 2018-07-27 CN CN201880040129.1A patent/CN111226314B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103682148A (zh) * | 2012-08-31 | 2014-03-26 | 三星显示有限公司 | 有机发光装置及其制造方法 |
CN105826434A (zh) * | 2016-03-23 | 2016-08-03 | 陕西科技大学 | 一种金刚石热沉GaN基LED制作方法 |
CN106783998A (zh) * | 2016-12-16 | 2017-05-31 | 中国电子科技集团公司第五十五研究所 | 一种基于金刚石衬底的氮化镓高电子迁移率晶体管及其制备方法 |
CN107919413A (zh) * | 2017-11-17 | 2018-04-17 | 陕西科技大学 | 一种GaN基LED向金刚石热沉转移方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111769191A (zh) * | 2020-07-31 | 2020-10-13 | 佛山紫熙慧众科技有限公司 | 一种紫外led芯片散热复合基板 |
CN111769191B (zh) * | 2020-07-31 | 2022-04-08 | 佛山紫熙慧众科技有限公司 | 一种紫外led芯片散热复合基板 |
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Publication number | Publication date |
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CN111226314B (zh) | 2023-12-22 |
WO2020019312A1 (zh) | 2020-01-30 |
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