CN111081800A - 一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法 - Google Patents
一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法 Download PDFInfo
- Publication number
- CN111081800A CN111081800A CN201911338917.1A CN201911338917A CN111081800A CN 111081800 A CN111081800 A CN 111081800A CN 201911338917 A CN201911338917 A CN 201911338917A CN 111081800 A CN111081800 A CN 111081800A
- Authority
- CN
- China
- Prior art keywords
- hole transport
- transport layer
- graphene
- cuscn
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005525 hole transport Effects 0.000 title claims abstract description 58
- PDZKZMQQDCHTNF-UHFFFAOYSA-M copper(1+);thiocyanate Chemical compound [Cu+].[S-]C#N PDZKZMQQDCHTNF-UHFFFAOYSA-M 0.000 title claims abstract description 54
- 229910001218 Gallium arsenide Inorganic materials 0.000 title claims abstract description 53
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 48
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 43
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000000137 annealing Methods 0.000 claims description 27
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 20
- 238000004528 spin coating Methods 0.000 claims description 17
- 238000001704 evaporation Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 5
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 claims description 5
- 239000010432 diamond Substances 0.000 claims description 5
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 claims description 5
- 238000005566 electron beam evaporation Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 5
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 238000002791 soaking Methods 0.000 claims description 5
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 5
- 239000012498 ultrapure water Substances 0.000 claims description 5
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 5
- 238000001291 vacuum drying Methods 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000006798 recombination Effects 0.000 description 5
- 238000005215 recombination Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005036 potential barrier Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0735—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising only AIIIBV compound semiconductors, e.g. GaAs/AlGaAs or InP/GaInAs solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/074—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a heterojunction with an element of Group IV of the Periodic System, e.g. ITO/Si, GaAs/Si or CdTe/Si solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
- H01L31/1856—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising nitride compounds, e.g. GaN
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
本发明公开了一种含有CuSCN空穴传输层的GaAs太阳电池,其结构由下至上依次为的Au背电极、GaAs衬底、CuSCN空穴传输层、石墨烯层和银浆顶电极。本发明还公开了以上含有CuSCN空穴传输层的GaAs太阳电池的制备方法。本发明的GaAs太阳电池,不仅制备工艺简单,电池制备成本较低,而且光电转换效率高,能长时间稳定工作。
Description
技术领域
本发明属于太阳电池的技术领域,特别涉及一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法。
背景技术
随着地球人口数量的不断增加以及生态环境的日渐恶劣,发展可再生的清洁能源成早已为了世界各国的焦点。而太阳能是自然界中分布最为广泛,总量最大的清洁能源。因此,提高太阳电池的转化效率,降低电池的制备成本具有极为重要实际意义。
GaAs是一种禁带宽度为1.42eV的直接带隙半导体,具有载流子迁移率高,抗辐射性能强等优点,常被用作为高效太阳电池的衬底材料。将GaAs与石墨烯相结合,可简化材料制备工艺,制备出低成本高性能的太阳电池。然而两者界面的载流子复合速率较高,使得器件反向电流大,开路电压低,阻碍了电池性能的进一步提高。
发明内容
为了克服上述技术存在的缺点与不足之处,本发明的首要目的在于提供一种含有CuSCN空穴传输层的GaAs太阳电池。新型空穴传输层的应用极大抑制了载流子的复合并提高器件的开路电压,可以有效提高太阳电池的光电转换效率。此外,相比大多数有机空穴传输材料,CuSCN是一种更为廉价的无机材料,因此可显著降低电池制作成本,同时该电池结构简单,制作周期短,易于实现,具有广阔的商业化前景。
本发明的另一目的在于提供上述含有CuSCN空穴传输层的GaAs太阳电池的制备方法。
本发明目的通过以下技术方案实现:
一种含有CuSCN空穴传输层的GaAs太阳电池,由下至上依次为Au背电极、GaAs衬底、CuSCN空穴传输层、石墨烯和导电银浆顶电极。
进一步地,所述GaAs衬底晶向为(100),掺杂剂为Si,掺杂浓度为1×1017-×1018/cm3。
进一步地,所述Au背电极的厚度为50-200nm,GaAs衬底厚度为100-500μm,CuSCN空穴传输层为50-500nm,石墨烯层的厚度为1-7层原子厚度,导电银浆顶电极厚度为0.1-2μm。
上述含有空穴传输层的GaAs太阳电池的制备方法,包括下列制备步骤:
(1)采用电子束蒸发法在GaAs衬底背面蒸镀一层Au作为背电极,蒸镀结束后退火处理;
(2)用金刚笔将衬底片裂成1-4cm2小片,并清洗;
(3)在步骤(2)的衬底正面以旋涂的方法制备一层CuSCN空穴阻挡层,并进行退火处理;
(4)将泡取好的石墨烯进行转移,石墨烯漂浮在水面,用镊子夹住已制备了空穴传输层的衬底片,使得石墨烯与空穴传输层接触后捞出,放置于真空干燥箱中抽真空室温干燥1-2小时。然后在50-100℃的丙酮中浸泡20-40分钟以去除石墨烯表面的PMMA。
(5)在石墨烯边缘贴上绝缘胶带以减少漏电,然后用注射器在绝缘胶带上涂一圈导电银浆,并保证导电银浆与石墨烯接触。最后在50-100℃加热烘干30-50分钟制得电池。
进一步地,步骤(1)中所述背电极的蒸镀速率为0.6-1.5nm/s。
进一步地,步骤(1)中所述退火处理是指升温至200-800℃退火处理10-30min。
进一步地,步骤(2)中所述清洗是指依次经丙酮、乙醇和超纯水进行超声清洗1-5分钟,然后用盐酸润洗1-5分钟,并用去离子水清洗残留的盐酸,最后用乙醇超声清洗残留的水分。
进一步地,步骤(3)中所述空穴传输层的制备方法为:将CuSCN粉末溶解于二乙基硫醚中,制备出浓度为20-50mg/ml的旋涂液,将旋涂液滴至衬底片上,以3000-5000转/分的旋涂速度制备空穴传输层,退火温度为50-100℃,退火时间为10-20分钟。
本发明的原理如下:
n型GaAs与p型CuSCN之间形成异质结,GaAs衬底受光激发产生电子空穴对,空穴通过CuSCN空穴传输层输送至石墨烯薄膜并通往外电路,与此同时CuSCN与GaAs之间存在着很高的势垒,阻碍了电子往石墨烯一侧运动,有利于降低载流子的复合,维持电势差。
相比于现有技术,本发明具有如下优点及有益效果:
(1)本发明在GaAs/石墨烯太阳能电池中间插入一层CuSCN作为高效空穴传输材料,利用CuSCN与GaAs之间的势垒阻挡电子向石墨烯一侧传输,有效将电子和空穴有效分离,从而降低电子和空穴的复合几率,减小反向电流,提高开路电压,最终实现太阳能电池光电转换效率的提高。
(2)CuSCN空穴传输材料在光照条件下不会发生分解,因此能有效提高电池在工作过程中的稳定性,延长电池的使用寿命。
(3)相比大多数有机空穴传输材料,CuSCN更为廉价,发明制备的电池结构得到简化,制备方法简单,电池制作成本显著降低,因此可有效降低电池制作成本,使得GaAs太阳电池拥有更加广阔的应用前景。
附图说明
图1为本发明实施例中含有CuSCN空穴传输层的GaAs太阳电池的结构示意图。
图2为本发明实施例中加入CuSCN空穴传输层前后的GaAs太阳电池J-V曲线对比图。
图中各个部件如下:
Au背电极1、GaAs衬底2、CuSCN空穴传输层3、石墨烯层4,导电银浆电极5。
具体实施方式
下面结合实施例及附图对本发明作进一步详细的描述,但本发明的实施方式不限于此。
实施例1
本实施例的一种含有CuSCN空穴传输层的GaAs太阳电池,其结构示意图如图1所示。包括由下至上依次层叠的Au背电极1、GaAs衬底2、CuSCN空穴传输层3、石墨烯层4,导电银浆电极5。
所述含有CuSCN空穴传输层的GaAs太阳电池通过如下方法制备:
(1)采用Si掺杂的n型GaAs半导体为衬底,厚度为350μm,晶向为(100)掺杂浓度是1×1017/cm3。通过电子束蒸镀系统在背面蒸镀一层Au作为背电极,蒸镀速率为1.2nm/s,厚度为100nm,蒸镀结束后进行退火处理。退火温度为500℃,退火时间为10min。
(2)用金刚笔将衬底片裂成1cm2的小片,然后依次用丙酮、乙醇以及超纯水对衬底片进行5分钟的超声清洗,其后用10%的盐酸浸泡3分钟,随后用去离子水冲洗衬底表面的盐酸;最后用乙醇对衬底片进行5分钟的超声清洗以洗去表面水分。
(3)将CuSCN粉末溶解于二乙基硫醚中,制备出浓度为20mg/ml的旋涂液,将旋涂液滴至步骤(2)的衬底片上,以3000转/分的旋涂速度制备空穴传输层,退火温度为50℃,退火时间为10分钟。
(4)将泡取好的石墨烯进行转移,石墨烯面积为40mm2,石墨烯漂浮在水面,用镊子夹住已制备了空穴传输层的衬底片,使得石墨烯与空穴传输层接触后捞出,放置于真空干燥箱中抽真空室温干燥1小时。然后在60℃的丙酮中浸泡20分钟以去除石墨烯表面的PMMA。
(5)在石墨烯边缘贴上绝缘胶带以减少漏电,然后用注射器在绝缘胶带上涂一圈导电银浆,并保证导电银浆与石墨烯接触。最后在60℃加热烘干30分钟制得电池。
图2是加入CuSCN空穴传输层前后的GaAs太阳电池J-V曲线对比图,参比电池的短路电流密度为15.98毫安每平方厘米,开路电压为0.56伏特,转换效率为5.6%;通过在GaAs和石墨烯之间加入一层空穴传输层,开路电压提高为0.77伏特,转换效率提高到7.8%,太阳能电池短路电流密度略有降低到15.69毫安每平方厘米太阳电池,这主要是因为CuSCN的导电性能较差,导致器件的串联电阻增大,从而引起电池的电流密度略有下降。总体来看,太阳电池的性能有所提高的。
本实施例中提供了一种含有CuSCN空穴传输层的的太阳电池元件,一方面p型半导体CuSCN与n型半导体GaAs形成异质结,且CuSCN具有较强的空穴抽取能力,可增强载流子的分离。另一方面CuSCN具有较高的导带能级,可以阻碍电子向顶电极的运输,抑制载流子的复合。因此CuSCN可有效提高器件的开路电压和电池效率。此外,相比大多数有机空穴传输材料,CuSCN是一种更为廉价的材料,因此可显著降低电池制作成本,同时该电池结构简单,制作周期短,易于实现,具有广阔的商业化前景。
实施例2
本实施例的一种含有CuSCN空穴传输层的GaAs太阳电池制备方法如下:
(1)采用Si掺杂的n型GaAs半导体为衬底,厚度为350μm,晶向为(100)掺杂浓度是1×1017/cm3。通过电子束蒸镀系统在背面蒸镀一层Au作为背电极,蒸镀速率为1.5nm/s,厚度为150nm,蒸镀结束后进行退火处理。退火温度为400℃,退火时间为10min。
(2)用金刚笔将衬底片裂成1cm2的小片,然后依次用丙酮、乙醇以及超纯水对衬底片进行5分钟的超声清洗,其后用10%的盐酸浸泡3分钟,随后用去离子水冲洗衬底表面的盐酸;最后用乙醇对衬底片进行5分钟的超声清洗以洗去表面水分。
(3)将CuSCN粉末溶解于二乙基硫醚中,制备出浓度为50mg/ml的旋涂液,将旋涂液滴至步骤(2)的衬底片上,以5000转/分的旋涂速度制备空穴传输层,退火温度为100℃,退火时间为20分钟。
(4)将泡取好的石墨烯进行转移,石墨烯面积为36mm2,石墨烯漂浮在水面,用镊子夹住已制备了空穴传输层的衬底片,使得石墨烯与空穴传输层接触后捞出,放置于真空干燥箱中抽真空室温干燥1小时。然后在60℃的丙酮中浸泡20分钟以去除石墨烯表面的PMMA。
(5)在石墨烯边缘贴上绝缘胶带以减少漏电,然后用注射器在绝缘胶带上涂一圈导电银浆,并保证导电银浆与石墨烯接触。最后在70℃加热烘干30分钟制得电池。
实施例3
本实施例的一种含有CuSCN空穴传输层的GaAs太阳电池制备方法如下:
(1)采用Si掺杂的n型GaAs半导体为衬底,厚度为350μm,晶向为(100)掺杂浓度是1×1017/cm3。通过电子束蒸镀系统在背面蒸镀一层Au作为背电极,蒸镀速率为1.5nm/s,厚度为200nm,蒸镀结束后进行退火处理。退火温度为400℃,退火时间为10min。
(2)用金刚笔将衬底片裂成1cm2的小片,然后依次用丙酮、乙醇以及超纯水对衬底片进行5分钟的超声清洗,其后用10%的盐酸浸泡3分钟,随后用去离子水冲洗衬底表面的盐酸;最后用乙醇对衬底片进行5分钟的超声清洗以洗去表面水分。
(3)将CuSCN粉末溶解于二乙基硫醚中,制备出浓度为40mg/ml的旋涂液,将旋涂液滴至步骤(2)的衬底片上,以4000转/分的旋涂速度制备空穴传输层,退火温度为80℃,退火时间为10分钟。
(4)将泡取好的石墨烯进行转移,石墨烯面积为16mm2,石墨烯漂浮在水面,用镊子夹住已制备了空穴传输层的衬底片,使得石墨烯与空穴传输层接触后捞出,放置于真空干燥箱中抽真空室温干燥1小时。然后在60℃的丙酮中浸泡20分钟以去除石墨烯表面的PMMA。
(5)在石墨烯边缘贴上绝缘胶带以减少漏电,然后用注射器在绝缘胶带上涂一圈导电银浆,并保证导电银浆与石墨烯接触。最后在80℃加热烘干30分钟制得电池。
上述实施例为本发明较佳的实施方式,但本发明的实施方式并不受上述实施例的限制,其它的任何未背离本发明的精神实质与原理下所作的改变、修饰、替代、组合、简化,均应为等效的置换方式,都包含在本发明的保护范围之内。
Claims (10)
1.一种含有CuSCN空穴传输层的GaAs太阳电池,其特征在于:由下至上的结构依次为Au背电极、GaAs衬底、CuSCN空穴传输层、石墨烯层和导电银浆顶电极;所述GaAs外延层晶向为(100),掺杂浓度为1×1017-1×1018/cm3;所述CuSCN空穴传输层为50-500nm。
2.根据权利要求1所述的一种含有CuSCN空穴传输层的GaAs太阳电池,其特征在于:所述GaAs衬底为Si掺杂的n型GaAs半导体衬底。
3.根据权利要求1所述的一种含有CuSCN空穴传输层的GaAs太阳电池,其特征在于:所述Au背电极的厚度为50-200nm,GaAs衬底厚度为100-500μm。
4.根据权利要求1所述的一种含有CuSCN空穴传输层的GaAs太阳电池,其特征在于:所述石墨烯层的厚度为1-7层原子厚度。
5.根据权利要求1所述的一种含有CuSCN空穴传输层的GaAs太阳电池,其特征在于:所述导电银浆顶电极厚度为0.1-2μm。
6.权利要求1-5任一项所述的一种含有CuSCN空穴传输层的GaAs太阳电池的制备方法,其特征在于,包括如下制备步骤:
(1)采用电子束蒸发法在GaAs衬底背面蒸镀一层Au作为背电极,蒸镀结束后退火处理;
(2)用金刚笔将衬底片裂成1-4cm2小片,并清洗;
(3)在步骤(2)的衬底正面以旋涂的方法制备一层CuSCN空穴传输层,并进行退火处理;
(4)将泡取好的石墨烯进行转移,石墨烯漂浮在水面,用镊子夹住已制备了空穴传输层的衬底片,使得石墨烯与空穴传输层接触后捞出,放置于真空干燥箱中抽真空室温干燥1-2小时,然后在50-100℃的丙酮中浸泡20-40分钟以去除石墨烯表面的PMMA;
(5)在石墨烯边缘贴上绝缘胶带以减少漏电,然后用注射器在绝缘胶带上涂一圈导电银浆,并保证导电银浆与石墨烯接触,最后在50-100℃加热烘干30-50分钟制得电池。
7.根据权利要求6所述的一种含有CuSCN空穴传输层的GaAs太阳电池的制备方法,其特征在于:步骤(1)中,所述背电极的蒸镀速率为0.6-1.5nm/s。
8.根据权利要求6所述的一种含有CuSCN空穴传输层的GaAs太阳电池的制备方法,其特征在于:步骤(1)中,所述退火处理是指升温至200-800℃退火处理10-30min。
9.根据权利要求6所述的一种含有CuSCN空穴传输层的GaAs太阳电池的制备方法,其特征在于:步骤(2)中,所述清洗是指依次经丙酮、乙醇和超纯水进行超声清洗1-5分钟,然后用盐酸润洗1-5分钟,并用去离子水清洗残留的盐酸,最后用乙醇超声清洗残留的水分。
10.根据权利要求6所述的一种含有CuSCN空穴传输层的GaAs太阳电池的制备方法,其特征在于:步骤(3)中,所述空穴传输层的制备方法为:将CuSCN粉末溶解于二乙基硫醚中,制备出浓度为20-50mg/ml的旋涂液,将旋涂液滴至衬底片上,以3000-5000转/分的旋涂速度制备空穴传输层,退火温度为50-100℃,退火时间为10-20分钟。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911338917.1A CN111081800A (zh) | 2019-12-23 | 2019-12-23 | 一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911338917.1A CN111081800A (zh) | 2019-12-23 | 2019-12-23 | 一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111081800A true CN111081800A (zh) | 2020-04-28 |
Family
ID=70316856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201911338917.1A Pending CN111081800A (zh) | 2019-12-23 | 2019-12-23 | 一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111081800A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115000215A (zh) * | 2022-07-26 | 2022-09-02 | 华南理工大学 | 一种具有PEDOT:PSS/石墨烯/GaAs结构的太阳电池及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104737254A (zh) * | 2012-09-12 | 2015-06-24 | 韩国化学研究院 | 具备光吸收结构体的太阳能电池 |
CN108365047A (zh) * | 2018-01-31 | 2018-08-03 | 华南理工大学 | 一种石墨烯-GaAs肖特基结太阳能电池及其制备方法 |
CN109312464A (zh) * | 2016-05-08 | 2019-02-05 | 耶达研究及发展有限公司 | 制备卤化物钙钛矿和钙钛矿相关材料的方法 |
US20190312168A1 (en) * | 2018-04-04 | 2019-10-10 | California Institute Of Technology | Epitaxy-Free Nanowire Cell Process for the Manufacture of Photovoltaics |
-
2019
- 2019-12-23 CN CN201911338917.1A patent/CN111081800A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104737254A (zh) * | 2012-09-12 | 2015-06-24 | 韩国化学研究院 | 具备光吸收结构体的太阳能电池 |
CN109312464A (zh) * | 2016-05-08 | 2019-02-05 | 耶达研究及发展有限公司 | 制备卤化物钙钛矿和钙钛矿相关材料的方法 |
CN108365047A (zh) * | 2018-01-31 | 2018-08-03 | 华南理工大学 | 一种石墨烯-GaAs肖特基结太阳能电池及其制备方法 |
US20190312168A1 (en) * | 2018-04-04 | 2019-10-10 | California Institute Of Technology | Epitaxy-Free Nanowire Cell Process for the Manufacture of Photovoltaics |
Non-Patent Citations (1)
Title |
---|
HANG HE ET AL.: ""13.7% Efficency grapheme-gallium arsenide Schottky junction solar cells with a P3HT hole transport layer"", 《NANO ENERGY》 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115000215A (zh) * | 2022-07-26 | 2022-09-02 | 华南理工大学 | 一种具有PEDOT:PSS/石墨烯/GaAs结构的太阳电池及其制备方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108767118B (zh) | 一种三元全聚合物太阳能电池 | |
CN110600614B (zh) | 一种钙钛矿/钙钛矿两端叠层太阳能电池的隧穿结结构 | |
CN111081878A (zh) | 一种钙钛矿/硅基异质结叠层太阳能电池及其制备方法 | |
CN107546328B (zh) | 一种阴极修饰层及其制备方法和应用 | |
CN113206123A (zh) | 一种钙钛矿/晶硅叠层电池及其制备方法 | |
KR20200075640A (ko) | 텐덤 태양전지 | |
JP2012186415A (ja) | 光電変換素子の製造方法、光電変換素子およびタンデム型光電変換素子 | |
CN102244110B (zh) | 硒化钒薄膜作背接触层的CdTe太阳电池 | |
CN112103392A (zh) | 一种复合空穴传输层及包含其的钙钛矿太阳能电池 | |
CN114256387A (zh) | 一种钙钛矿-异质结三端mwt结构叠层太阳能电池的制备方法 | |
CN111816773A (zh) | 钙钛矿太阳能电池、叠层电池太阳能电池及加工方法、电池组件 | |
CN110416413B (zh) | 一种高性能梯度电子传输层的钙钛矿太阳电池及其制备方法 | |
CN103985778B (zh) | 具有选择性发射极的异质结太阳能电池及其制备方法 | |
CN114784193A (zh) | 一种基于金属诱导有机界面层的有机光电器件及制备方法 | |
CN108682740B (zh) | 钙钛矿电池及其制备方法 | |
CN111081800A (zh) | 一种含有CuSCN空穴传输层的GaAs太阳电池及其制备方法 | |
CN110085683A (zh) | 无掺杂晶体硅异质结太阳能电池及其制备方法 | |
CN104882287A (zh) | 一种提高量子点敏化太阳能电池光电转换效率的方法 | |
CN108615775A (zh) | 一种叉指背接触异质结单晶硅电池 | |
CN102810638A (zh) | 一种p型掺杂聚合物太阳能电池及其制备方法 | |
KR101410392B1 (ko) | 이종 접합 태양전지 및 그 제조방법 | |
CN104241532A (zh) | 一种有机光伏电池及制备方法 | |
WO2023098038A1 (zh) | 一种钙钛矿太阳能电池的柱状电极结构的制备方法 | |
CN102790177A (zh) | 聚合物太阳能电池及其制备方法 | |
CN114914365A (zh) | 一种具有倒置结构的钙钛矿/钙钛矿叠层太阳电池 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200428 |