CN110952078B - 半导体装置的制造方法、存储介质和基板处理装置 - Google Patents
半导体装置的制造方法、存储介质和基板处理装置 Download PDFInfo
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- CN110952078B CN110952078B CN201910865389.9A CN201910865389A CN110952078B CN 110952078 B CN110952078 B CN 110952078B CN 201910865389 A CN201910865389 A CN 201910865389A CN 110952078 B CN110952078 B CN 110952078B
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- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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