CN110725134A - 棉类织物的超亮光抗撕裂硅胶涂层处理工艺 - Google Patents
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Abstract
本发明公开了一种棉类织物的超亮光抗撕裂硅胶涂层处理工艺,包括以下操作步骤:a、将染色布或者半漂布预缩,得A品;b、将A品反打底上卷,得B品;c、将B品的正面先涂覆硅胶涂层,再涂覆高分子涂膜,得成品。本发明具有高环保性能和较好的成膜性和超亮光性能的特点。
Description
技术领域
本发明涉及一种织物涂层处理工艺,特别是一种棉类织物的超亮光抗撕裂硅胶涂层处理工艺。
背景技术
现有的对于棉类织物的涂层工艺通常为染色布/半漂经过预缩后上卷,然后涂层烫膜,得到成品,其中采用的涂层一般为溶剂性硅胶,然而采用该种方式满足不了高环保的要求,而采用的具有环保性能的硅胶涂层,则成膜性不佳,无法体现出优异的超亮光性能,产品质量有待提高。因此,现有的棉类织物涂层具有无法在成膜性和超亮光性能较好的情况下兼顾棉类涂层的高环保要求。
发明内容
本发明的目的在于,提供一种棉类织物的超亮光抗撕裂硅胶涂层处理工艺。本发明具有高环保性能和较好的成膜性和超亮光性能的特点。
本发明的技术方案:棉类织物的超亮光抗撕裂硅胶涂层处理工艺,包括以下操作步骤:
a、将染色布或者半漂布预缩,得A品;
b、将A品反打底上卷,得B品;
c、将B品的正面先涂覆硅胶涂层,再涂覆高分子涂膜,得成品。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤a具体为,将染色布或者半漂布预缩3-4%,得A品。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤b中,反打底的涂层包括以下重量配比的原料:底胶10-20份、水80-90份、增稠剂2-5份。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述底胶采用聚氨脂类涂层胶,聚氨脂类涂层胶中含有30%的高分子硅油。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤b中,反打底的涂层机速度为30-50m/min。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤b中,反打底的烘干温度为150-170℃,烘干时间为2min。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤b中,反打底的涂层厚度为0.1mm。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤c中,硅胶涂层的涂料包括以下重量配比的原料:硅胶60-70份、水30-40份、增稠剂2-5份。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤c中,硅胶涂层的涂层机速度为15-50m/min,涂层压力为0.8-1.2kg,硅胶涂层的厚度为0.2-0.3mm。
前述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺中,所述步骤c中,硅胶涂层的烘干温度为150-170℃,烘干时间为2min。
与现有技术相比,本发明通过多层涂胶,控制底胶和面胶的量以及相关的工艺参数,使得面料成膜均匀、平整,膜感更强,具有良好的防粘性、稳定性和调节手感的功能,赋予织物干滑手感并有一定的增量效果,成膜性较好;采用的底胶、高分子涂膜相配合,含有自成膜的高分子硅油,具有超亮光的特性,还满足高环保的要求;采用的硅胶涂层附予织物的高度的硅胶滑爽感以及皮膜感,可以提高织物的撕破强力,具有良好的抗撕裂的效果。整个硅胶涂层处理工艺操作简单,控制方便,成本较低。因此,本发明具有高环保性能和较好的成膜性和超亮光性能的特点。
具体实施方式
下面结合实施例对本发明作进一步的说明,但并不作为对本发明限制的依据。
实施例1。
棉类织物的超亮光抗撕裂硅胶涂层处理工艺,包括以下操作步骤:
a、将染色布或者半漂布预缩3-4%,预缩机预缩3-4%,下机布缩率不大于3%,得A品;
b、将A品反打底上卷,反打底的涂层包括以下重量配比的原料:底胶10-20份、水80-90份、增稠剂2-5份;所述底胶采用聚氨脂类涂层胶,聚氨脂类涂层胶中含有30%的高分子硅油;反打底的涂层机速度为30-50m/min,烘干温度为150-170℃,烘干时间为2min,反打底的涂层厚度为0.1mm,得B品;
c、将B品的正面先涂覆硅胶涂层,再涂覆高分子涂膜;硅胶涂层的涂料包括以下重量配比的原料:硅胶60-70份、水30-40份、增稠剂2-5份;硅胶涂层的涂层机速度为15-50m/min,涂层压力为0.8-1.2kg,硅胶涂层的厚度为0.2-0.3mm,硅胶涂层的烘干温度为150-170℃,烘干时间为2min,得成品。
实施例2。
棉类织物的超亮光抗撕裂硅胶涂层处理工艺,包括以下操作步骤:
a、将染色布或者半漂布预缩,其中预缩机预缩3%,下机布缩率为2%,得A品;
b、将A品反打底上卷,反打底的涂层包括以下重量配比的原料:底胶10份、水80份、增稠剂2份;所述底胶采用聚氨脂类涂层胶,聚氨脂类涂层胶中含有30%的高分子硅油;反打底的涂层机速度为30m/min,烘干温度为170℃,烘干时间为2min,反打底的涂层厚度为0.1mm,得B品;
c、将B品的正面先涂覆硅胶涂层,再涂覆高分子涂膜;硅胶涂层的涂料包括以下重量配比的原料:硅胶60份、水30份、增稠剂2份;硅胶涂层的涂层机速度为30m/min,涂层压力为1.2kg,硅胶涂层的厚度为0.2mm,硅胶涂层的烘干温度为170℃,烘干时间为2min,得成品。
实施例3。
棉类织物的超亮光抗撕裂硅胶涂层处理工艺,包括以下操作步骤:
a、将染色布或者半漂布预缩,预缩机预缩4%,下机布缩率为3%,得A品;
b、将A品反打底上卷,反打底的涂层包括以下重量配比的原料:底胶20份、水90份、增稠剂5份;所述底胶采用聚氨脂类涂层胶,聚氨脂类涂层胶中含有30%的高分子硅油;反打底的涂层机速度为40m/min,烘干温度为150℃,烘干时间为2min,反打底的涂层厚度为0.1mm,得B品;
c、将B品的正面先涂覆硅胶涂层,再涂覆高分子涂膜;硅胶涂层的涂料包括以下重量配比的原料:硅胶70份、水40份、增稠剂5份;硅胶涂层的涂层机速度为50m/min,涂层压力为1.0kg,硅胶涂层的厚度为0.3mm,硅胶涂层的烘干温度为150℃,烘干时间为2min,得成品。
Claims (10)
1.棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:包括以下操作步骤:
a、将染色布或者半漂布预缩,得A品;
b、将A品反打底上卷,得B品;
c、将B品的正面先涂覆硅胶涂层,再涂覆高分子涂膜,得成品。
2.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤a具体为,将染色布或者半漂布预缩3-4%,得A品。
3.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤b中,反打底的涂层包括以下重量配比的原料:底胶10-20份、水80-90份、增稠剂2-5份。
4.根据权利要求3所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述底胶采用聚氨脂类涂层胶。
5.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤b中,反打底的涂层机速度为30-50m/min。
6.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤b中,反打底的烘干温度为150-170℃,烘干时间为2min。
7.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤b中,反打底的涂层厚度为0.1mm。
8.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤c中,硅胶涂层包括以下重量配比的原料:硅胶60-70份、水30-40份、增稠剂2-5份。
9.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤c中,硅胶涂层的涂层机速度为15-50m/min,硅胶涂层的涂层压力为0.8-1.2kg,硅胶涂层的厚度为0.2-0.3mm。
10.根据权利要求1所述的棉类织物的超亮光抗撕裂硅胶涂层处理工艺,其特征在于:所述步骤c中,硅胶涂层的烘干温度为150-170℃,烘干时间为2min。
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US3989458A (en) * | 1973-04-16 | 1976-11-02 | Commonwealth Scientific And Industrial Research Organization | Compositions containing bisulphite adducts of polyisocyanates and method of use |
CN108951189A (zh) * | 2018-09-28 | 2018-12-07 | 无锡佳纺面料有限公司 | 一种棉纱全棉皮膜肤感涂层处理工艺 |
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