CN110640623A - Splash guard and chemical mechanical polishing machine - Google Patents
Splash guard and chemical mechanical polishing machine Download PDFInfo
- Publication number
- CN110640623A CN110640623A CN201910926513.8A CN201910926513A CN110640623A CN 110640623 A CN110640623 A CN 110640623A CN 201910926513 A CN201910926513 A CN 201910926513A CN 110640623 A CN110640623 A CN 110640623A
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- China
- Prior art keywords
- splash guard
- cover
- splash
- driving device
- shield according
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a splash guard and a chemical mechanical polishing machine, belonging to the technical field of semiconductor manufacturing, wherein the splash guard is arranged around a working machine and used for blocking liquid thrown out by the working machine; the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down. The chemical mechanical polishing machine employs a splash shield as described above. The integral splash guard is changed into the combined splash guard, so that the requirement on the synchronism of each driving device is greatly reduced, when a single driving device fails and cannot be normally lifted or lowered, the whole splash guard cannot be dragged, other driving devices which normally work cannot be influenced, the combined splash guard can be designed to be only replaced aiming at a damaged cover part, and the maintenance cost is saved.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to a splash guard and a chemical mechanical polishing machine.
Background
A Chemical Mechanical Polishing (CMP) process, also called a chemical mechanical planarization process or a chemical mechanical polishing process, is a mainstream polishing process at present, and is used for reducing the surface roughness of a wafer or thinning the wafer. The chemical mechanical polishing machine is at the in-process that carries out the grinding operation, and rotatory grinding platform can be thrown the waste liquid around the grinding platform from grinding platform's surface, contains a large amount of lapping liquid compositions in these waste liquids, consequently, can separate out a large amount of crystallisates after the waste liquid volatilizees, and these crystallisates not only lead to the fact the hindrance to each moving part on the chemical polishing machine, still can cause the corruption to metal part, influence the life of board.
In the prior art, a splash guard is additionally arranged around a grinding platform to prevent waste liquid from splashing on parts around the grinding platform, the splash guard is arranged around the grinding platform and is made of plastic, the splash guard is fixedly connected with three cylinders positioned in different directions, the connection mode adopts a mode that the cylinders are in point contact with the splash guard, when a grinding head is matched with the grinding platform to carry out grinding operation, the splash guard needs to be lifted under the driving of the cylinders so as to cover the grinding platform, and the waste liquid thrown out by the grinding platform in the grinding operation process can be received by the splash guard and then is discharged along the splash guard flowing to a water outlet; after the grinding operation is completed, the grinding head needs to rotate to the next stop point, and at the moment, the air cylinder drives the splash guard to descend below the grinding platform so as to avoid hindering the rotation of the grinding head. In this process, because the splatter shield is a whole, consequently to 3 cylinder driven synchronization requirements of driving the splatter shield very high, if arbitrary 1 cylinder leads to up-and-down velocity and other cylinders inconsistent because of the trouble, will lead to the splatter shield to receive to drag, leads to the cover body distortion, damages even. The deformed splash guard can extrude and pull the cylinder in turn, and the service life of the cylinder is shortened.
The invention provides a splash guard which can effectively block liquid thrown out by various working machines, prevent the splash guard from deforming, prolong the service life of the machines and save the replacement cost.
Disclosure of Invention
According to the problems in the prior art, the splash guard and the chemical mechanical polishing machine are provided, and the integral splash guard in the prior art is changed into the combined splash guard.
The technical scheme specifically comprises the following steps: a splash guard is arranged around a working machine table and used for blocking liquid splashed by the working machine table and is characterized in that,
the splash guard is composed of a plurality of cover components, and each cover component is fixedly arranged on a lifting platform;
the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down.
Preferably, the plurality of shroud components are the same size.
Preferably, the cover parts are arranged in sequence, and gaps among the cover parts are small so as to cover the working machine table.
Preferably, two adjacent cover members are staggered inside and outside and partially overlap at the joint.
Preferably, the driving means is a motor.
Preferably, the driving means is a cylinder.
Preferably, the cylinder includes a cylinder body and a driving rod; the contact area of the cover component and the lifting table is larger than the cross-sectional area of the driving rod.
Preferably, the lifting table is provided with a groove on the upper surface, and the cover component is embedded in the groove.
Preferably, the driving means employs a method of unified control such that the up-and-down movements of the plurality of cover members are synchronized, or a method of independent control separately.
The invention also discloses a chemical mechanical polishing machine table, which adopts the splash guard, and is characterized by comprising the following components:
the grinding platform is used for bearing the wafer;
the grinding head is matched with the grinding platform to grind the wafer;
the power source interface is used for connecting the driving device;
the beneficial effects of the above technical scheme are that: the utility model provides a splashproof cover and chemical mechanical polishing board, through changing the integral type splashproof cover among the prior art into combination formula splashproof cover, thereby greatly reduced the requirement to each drive arrangement synchronism, and when individual drive arrangement breaks down and can not normally rise or descend, can not drag whole splashproof cover production, and then can not influence the drive arrangement of other normal work yet, the design of combination formula splashproof cover can only be changed to the cover part of damage, and the maintenance cost has been practiced thrift.
Drawings
FIG. 1 is a three-dimensional view of a preferred embodiment of a splash shield of the present invention;
FIG. 2 is a three-dimensional view of a preferred embodiment of a splash shield of the present invention;
FIG. 3 is a top view of a preferred embodiment of a splash shield of the present invention;
FIG. 4 is a schematic diagram of the operation of a splash guard at top dead center in a preferred embodiment of a CMP apparatus of the present invention;
FIG. 5 is a schematic diagram of the operation of the splash guard at the bottom dead center of the CMP apparatus according to the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.
The invention is further described with reference to the following drawings and specific examples, which are not intended to be limiting.
A splash guard is arranged around a working machine table and used for blocking liquid splashed by the working machine table, and is characterized by comprising a plurality of cover parts, wherein each cover part is fixedly arranged on a lifting table; the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down.
As shown in fig. 1-3, the splash guard is composed of a plurality of cover members 1, each cover member 1 being fixedly mounted to a lifting table 2, 4 cover members being shown in the figures, but other numbers are possible. The cover members 1 may be the same size or different sizes, and in the preferred embodiment of the present invention, the cover members 1 are the same size.
In one embodiment of the invention, the splash guard has an overall shape that is adapted to the shape of the edge of the work platform. Referring to fig. 4-5, taking CMP process as an example, in a conventional CMP machine, the polishing platform 4 is mostly in a circular plate structure, and at this time, the splash guard is in a frame structure, and the frame is covered around the polishing platform, and the corresponding cover component 1 is in an arc structure, because the polishing platform 4 rotates around the center of a circle during the polishing operation, the cover component 1 is not in contact with the polishing platform 4, but the cover component 1 cannot be too far away from the edge of the polishing platform 4, otherwise, the splash guard will lose the function of blocking the slurry 6 thrown out during the polishing process of the polishing platform 4. When the grinding table 4 has other regular or irregular configurations, the arrangement principle is the same as above, and the description thereof is omitted.
Each lifting platform 2 is connected with a driving device 3, and the driving device 3 drives the lifting platform 2 to move up and down so that the corresponding cover component 1 is respectively positioned at the top dead center and the bottom dead center. The driving device 3 may be an air cylinder or a motor, and the driving device 3 may be other devices capable of lifting the lifting platform 2 up and down, or may even be driven manually.
In the above-described embodiment, when each driving device 3 drives the corresponding cover member 1 to move up and down, the adjacent two cover members 1 are independent from each other, and no interference, friction, or the like is generated. Meanwhile, in order to ensure that the polishing liquid thrown off by the polishing platform 4 is not thrown off from the matching gap between the adjacent cover components, the gap between the adjacent cover components 1 is as small as possible.
The manner of cooperation between the cover members can be varied. As shown in fig. 1, a plurality of cover members 1 are arranged in sequence, and the gap between the adjacent cover members is small to cover the work machine, and the gap between the adjacent cover members should be minimized. As shown in fig. 2, two adjacent cover members 1 are arranged inside and outside in a staggered manner, and are partially overlapped at the joint, when the cover members 1 are in the circular arc structure, the sum of the degrees of the corresponding circular arcs of all the cover members 1 is more than 360 degrees, and in a preferred embodiment, the circular arcs of 5-10 degrees are overlapped between the two adjacent cover members, so that no gap is formed in the circumferential direction of the plane where the working surface is located of the cover members 1, and liquid drops are prevented from being thrown out. In short, the cover members 1 are independent of one another, and the fitting manner of the cover members can be designed in various ways to reduce the gap between the cover members and ensure that liquid is not thrown out of the gap between adjacent cover members.
Each cover component 1 is fixedly connected with one lifting platform 2, and the lifting platforms 2 are connected with corresponding driving devices 3, so that the driving devices 3 can drive the cover components 1 to move up and down through the lifting platforms 2. The connection mode between the driving device 3 and the lifting platform 2 can be rigid connection or non-rigid connection, and the specific connection method is matched with the type of the driving device 3 and only needs to achieve the connection effect.
If the driving means 3 is a cylinder, as shown in fig. 4-5, the cylinder further comprises a cylinder block 30 and a driving rod 31.
In another embodiment of the invention, since the splash guard is of a combined design, the individual drives 3 for driving the entire splash guard up and down may be controlled in a unified manner, so that the cover parts move up and down synchronously, or individually. However, no matter what control method is adopted for the driving device 3, compared with the method that the splash guard is designed as a whole in the prior art, the cover parts 1 of the splash guard disclosed by the application are independent and do not influence each other. Therefore, no matter whether the individual driving device fails to go up or down or the driving device cannot accurately keep synchronization in the process of going up or down, the splash guard cannot be deformed integrally, and further the splash guard is damaged. And due to the combined design, under the condition that one cover component 1 of the splash guard is damaged, a maintainer can only replace the damaged cover component without replacing the whole splash guard, thereby saving the production cost.
Meanwhile, because the splash guard is designed in a combined mode, the cover part 1 cannot be normally lifted or lowered due to the fact that a single driving device cannot normally ascend or descend, so that other cover parts 1 in the splash guard cannot be affected, the other cover parts 1 can be completely lifted or lowered to the designated working position, at the moment, the chemical mechanical polishing machine can continue grinding operation by means of the cover part 1 located at the normal working position, the grinding operation can be restarted without waiting for the driving device to be repaired like in the existing machine, and production efficiency of equipment is greatly improved.
The contact area of the cover member 1 with the lift table 2 is larger than the cross-sectional area of the drive rod 31.
In the preferred embodiment of the present invention, the upper surface of the lifting table 2 is provided with a groove, and the cover member is embedded in the groove.
In one embodiment of the present invention, the cylinder is located right below the lifting platform 2, the lifting platform 2 is connected, fixedly connected or detachably connected to the driving rod 31 of the cylinder, and the lifting platform 2 and the cover member 1 fixed to the lifting platform 2 are driven to move up and down by the up-and-down movement of the driving rod 31. Because the cross-sectional area of the driving rod 31 is smaller, when the cover component 1 is directly installed on the driving rod 31, the cover component 1 and the driving rod 31 can be regarded as point contact, the driving rod 31 cannot play a good clamping role on the cover component 1 at the moment, and the cover component 1 is easy to deform and bend after long-term use. Since the lifting table 2 is in surface contact with the cover member 1, the lifting table 2 can effectively clamp the cover member 1 and effectively suppress the deformation of the cover member 1.
It should be noted that the splash guard of the present invention can be used not only on a chemical mechanical polishing machine, but also in the field of semiconductor lithography, a photoresist needs to be coated on a wafer, and the photoresist will be thrown off a working platform during a spin coating process, or a developing solution will be thrown off the working platform during a developing process if a spin spraying manner is adopted, which will affect the cleaning, the service life, etc. of other machines or components.
The invention discloses a splash guard which is arranged around a working machine table and used for blocking liquid thrown out by the working machine table, and is characterized by comprising a plurality of cover components, wherein each cover component is fixedly arranged on a lifting table; the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down, so that the corresponding cover components are respectively positioned at the top dead center and the bottom dead center. Through the design of the invention, the splashing of liquid can be effectively prevented, the deformation of the splash guard is prevented, the service life of the machine table is prolonged, and the replacement cost is saved.
The invention further discloses a chemical mechanical polishing machine, which adopts the splash guard design as described above, as shown in fig. 4-5, and is characterized by comprising:
a grinding platform 4 for bearing the wafer;
a grinding head 5 for grinding the wafer in cooperation with the grinding platform 4;
and the power source interface is used for connecting the driving device 3.
The working principle is as follows: before the polishing head 5 performs the polishing operation, the driving device 3 drives the cover component 1 to move to a top dead center so as to receive the polishing liquid 6 thrown and splashed out during the polishing operation; when the polishing head 5 stops the polishing work and is ready to be separated from the polishing platen 4, the drive unit 3 drives the cover member 1 to move to the bottom dead center.
In an embodiment of the invention, the top dead center is an upper working position of the splash guard during operation, and is used for blocking the grinding liquid thrown out during the receiving grinding operation. The lower dead point is the lower station that the splashproof cover was located when the work, and after the grinding operation was finished, grinding head 5 probably need shift to another grinding platform 4 and continue the grinding operation, before shifting, drive arrangement 3 drove the splashproof cover and descends to the lower dead point position from the upper dead point to can not block the removal of grinding head 5 at the in-process that grinding head 5 shifted.
In the preferred embodiment of the present invention, the driving device 3 is a cylinder, and the power source interface provides compressed air.
In the preferred embodiment of the present invention, the cover member 1 is spaced apart from the surrounding polishing platen 4 by a predetermined distance. In one embodiment of the present invention, since the polishing platen 4 needs to be rotated around the center during the polishing operation, the cover member 1 and the polishing platen 4 cannot be in contact with each other, and need to be separated by a predetermined distance, the predetermined distance should not be set excessively, so that the cover member 1 can block the polishing liquid thrown off by the polishing platen 4 and the polishing head 5, the cover member will be deactivated by the excessively large predetermined distance, and the cover members 1 are overlapped and dislocated from each other, so that the distances between the cover members and the polishing platen differ, and the predetermined distance is specifically set for the specific position of each cover member.
In the preferred embodiment of the present invention, when the cover member 1 is located at the top dead center, the upper end of the cover member 1 is higher than the polishing surface of the polishing platen 4 and the lower end of the cover member 1 is lower than the polishing surface of the polishing platen 4.
In an embodiment of the present invention, when the cover member 1 is located at the top dead center, the polishing surface of the polishing platform 4 is preferably flush with the middle position of the upper end and the lower end of the cover member 1, so as to better play a role of blocking and receiving the slurry thrown out, and prevent the slurry from bypassing the splash guard and throwing to the outside of the polishing machine.
In the preferred embodiment of the present invention, when the cover member 1 is located at the bottom dead center, the upper end of the cover member 1 is lower than the polishing surface of the polishing platen 4.
The beneficial effects of the above technical scheme are that: the utility model provides a chemical mechanical polishing board, through changing the integral type splatter shield among the prior art into combination formula splatter shield to greatly reduced the requirement to each drive arrangement synchronism, and when individual drive arrangement breaks down and can not normally rise or descend, can not drag whole splatter shield production, and then can not influence the drive arrangement of other normal works yet, the design of combination formula splatter shield can only be changed to the cover part of damage, has practiced thrift the maintenance cost.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention.
Claims (10)
1. A splash guard is arranged around a working machine table and used for blocking liquid splashed by the working machine table and is characterized in that,
the splash guard is composed of a plurality of cover components, and each cover component is fixedly arranged on a lifting platform;
the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down.
2. The splash shield according to claim 1, wherein said plurality of shield members are the same size.
3. The splash shield according to claim 1, wherein the cover parts are arranged in sequence, and gaps between the cover parts are small so as to cover the working machine.
4. The splash shield according to claim 1, wherein adjacent shield parts are staggered inside and outside and partially overlap at a junction.
5. The splash shield according to claim 1, wherein said drive means is a motor.
6. The splash shield according to claim 1, wherein said drive means is a pneumatic cylinder.
7. The splash shield according to claim 6, wherein said cylinder comprises a cylinder body and a drive rod;
the contact area of the cover component and the lifting table is larger than the cross-sectional area of the driving rod.
8. The splash shield according to claim 1, wherein the lift table upper surface is provided with a groove, and the shield member is embedded in the groove.
9. Splash shield according to claim 1, wherein said drive means are controlled in a unified way, such that the up and down movements of said cover parts are synchronized, or in an individually controlled way.
10. A chemical mechanical polishing machine employing the splash guard of any of claims 1-9, comprising:
the grinding platform is used for bearing the wafer;
the grinding head is matched with the grinding platform to grind the wafer;
and the power source interface is used for connecting the driving device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910926513.8A CN110640623A (en) | 2019-09-27 | 2019-09-27 | Splash guard and chemical mechanical polishing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910926513.8A CN110640623A (en) | 2019-09-27 | 2019-09-27 | Splash guard and chemical mechanical polishing machine |
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| Publication Number | Publication Date |
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| CN110640623A true CN110640623A (en) | 2020-01-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201910926513.8A Pending CN110640623A (en) | 2019-09-27 | 2019-09-27 | Splash guard and chemical mechanical polishing machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111890218A (en) * | 2020-07-04 | 2020-11-06 | 刘永 | Chemical mechanical polishing splash guard capable of rotating and lifting |
| CN112936091A (en) * | 2021-02-09 | 2021-06-11 | 华海清科(北京)科技有限公司 | Polishing solution anti-splash device, chemical mechanical polishing system and polishing method |
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| CN112936091A (en) * | 2021-02-09 | 2021-06-11 | 华海清科(北京)科技有限公司 | Polishing solution anti-splash device, chemical mechanical polishing system and polishing method |
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Application publication date: 20200103 |