CN111775056A - Splash guard for chemical mechanical polishing - Google Patents
Splash guard for chemical mechanical polishing Download PDFInfo
- Publication number
- CN111775056A CN111775056A CN202010635681.4A CN202010635681A CN111775056A CN 111775056 A CN111775056 A CN 111775056A CN 202010635681 A CN202010635681 A CN 202010635681A CN 111775056 A CN111775056 A CN 111775056A
- Authority
- CN
- China
- Prior art keywords
- pair
- groove
- cover part
- ring
- shaped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
The invention discloses a splash guard for chemical mechanical polishing, which is arranged around a circular plate-shaped polishing platform; the splash guard body comprises a circular supporting seat; the rotation central shafts of the supporting seat and the grinding platform are arranged in a collinear way; the supporting seat is positioned at the lower side of the grinding platform; the upper end surface of the supporting seat is formed with a coaxially arranged circular ring groove-shaped falling groove; a pair of fan-ring-shaped fixed cover parts which are symmetrically arranged left and right are arranged in the falling groove; a sector ring-shaped movable cover part is arranged on the outer cylindrical surface of the fixed cover part in a circumferential moving manner; the pair of movable cover parts are synchronously arranged; when the opening between the pair of movable cover parts is opposite to the opening between the pair of fixed cover parts, the grinding head can be horizontally moved out of the opposite opening; the sum of the angle of the pair of movable cover portions and the angle of the pair of fixed cover portions is greater than three hundred and sixty degrees.
Description
Technical Field
The invention relates to the technical field of chemical mechanical polishing, in particular to a splash guard for chemical mechanical polishing.
Background
A Chemical Mechanical Polishing (CMP) process, also called a chemical mechanical planarization process or a chemical mechanical polishing process, is a mainstream polishing process at present, and is used for reducing the surface roughness of a wafer or thinning the wafer. The chemical mechanical polishing machine is at the in-process that carries out the grinding operation, and rotatory grinding platform can be thrown the waste liquid around the grinding platform from grinding platform's surface, contains a large amount of lapping liquid compositions in these waste liquids, consequently, can separate out a large amount of crystallisates after the waste liquid volatilizees, and these crystallisates not only lead to the fact the hindrance to each moving part on the chemical polishing machine, still can cause the corruption to metal part, influence the life of board.
In the prior art, a splash guard is additionally arranged around a grinding platform to prevent waste liquid from splashing on parts around the grinding platform, the splash guard is arranged around the grinding platform and is made of plastic, the splash guard is fixedly connected with three cylinders positioned in different directions, the connection mode adopts a mode that the cylinders are in point contact with the splash guard, when a grinding head is matched with the grinding platform to carry out grinding operation, the splash guard needs to be lifted under the driving of the cylinders so as to cover the grinding platform, and the waste liquid thrown out by the grinding platform in the grinding operation process can be received by the splash guard and then is discharged along the splash guard flowing to a water outlet; after the grinding operation is completed, the grinding head needs to rotate to the next stop point, and at the moment, the air cylinder drives the splash guard to descend below the grinding platform so as to avoid hindering the rotation of the grinding head. In this process, because the splatter shield is a whole, consequently to 3 cylinder driven synchronization requirements of driving the splatter shield very high, if arbitrary 1 cylinder leads to up-and-down velocity and other cylinders inconsistent because of the trouble, will lead to the splatter shield to receive to drag, leads to the cover body distortion, damages even. The deformed splash guard can extrude and pull the cylinder in turn, and the service life of the cylinder is shortened.
Disclosure of Invention
The invention aims to solve the technical problems that the existing splash guard is easy to deform and short in service life, and provides a splash guard for chemical mechanical grinding, which can effectively block liquid splashed by various working machines, prevent the splash guard from deforming, prolong the service life of the machines and save the replacement cost.
The technical scheme for solving the technical problems is as follows: a splash guard for chemical mechanical polishing is arranged around a circular plate-shaped polishing platform; the splash guard comprises a splash guard body; the splash guard body comprises a circular supporting seat; the rotation central shafts of the supporting seat and the grinding platform are arranged in a collinear way; the supporting seat is positioned at the lower side of the grinding platform; the upper end surface of the supporting seat is formed with a coaxially arranged circular ring groove-shaped falling groove; a pair of fan-ring-shaped fixed cover parts which are symmetrically arranged left and right are arranged in the falling groove; a sector ring-shaped movable cover part is arranged on the outer cylindrical surface of the fixed cover part in a circumferential moving manner; the pair of movable cover parts are synchronously arranged; when the opening between the pair of movable cover parts is opposite to the opening between the pair of fixed cover parts, the grinding head can be horizontally moved out of the opposite opening; the sum of the angles of the pair of movable cover parts and the angles of the pair of fixed cover parts is more than three hundred and sixty degrees; the upper end surface of the grinding platform is coplanar with the horizontal central surfaces of the movable cover part and the fixed cover part.
Preferably, the diameter of the inner cylindrical surface of the drop chute is smaller than the diameter of the polishing platen.
Preferably, a coaxially arranged annular water retaining ring is formed around the lower end face of the grinding platform; the water retaining ring is positioned in the falling groove, and the lower end surface of the water retaining ring is higher than the bottom surface of the falling groove; the inner end of the upper end surface of the supporting seat is provided with a ring-shaped upper water retaining ring which is coaxially arranged.
Preferably, the bottom surface of the falling groove is provided with a plurality of downpipes which are uniformly distributed on the circumference.
Preferably, an inner water retaining groove is formed on the inner cylindrical surface of the movable cover part; an outer water retaining groove is formed on the inner cylindrical surface of the fixed cover part; the cross sections of the inner water retaining groove and the outer water retaining groove are inner waist triangles with the middle parts facing outwards.
Preferably, a plurality of connecting rods which are uniformly distributed on the circumference are formed on the bottom surface of the fixed cover part; the bottom of the connecting rod is fixed on the bottom surface of the falling groove; a fan-ring-shaped guide ring which is coaxially arranged is formed on the lower end surface of the movable cover part; the guide ring is positioned in the falling groove, the outer diameter of the guide ring is the same as that of the falling groove, and the inner diameter of the guide ring is the same as that of the fixed cover part; a pair of driving support plates which are uniformly distributed on the circumference are fixed on the supporting seat; a driving motor is fixed on the bottom surface of the driving support plate; a driving gear is fixed at the upper end of an output shaft of the driving motor; the lower end of the outer cylindrical surface of the movable cover part is formed with an arc-shaped rack which is coaxially arranged; the arc-shaped rack is meshed with the driving gear on the corresponding side.
The invention has the beneficial effects that: the structure is simple, the grinding head can move in and out conveniently, the service life of the splash guard is long, and the effect is good; the grinding waste liquid is convenient to collect.
Drawings
FIG. 1 is a schematic top view of an opening of the present invention;
FIG. 2 is a schematic structural view of the cross section A-A of FIG. 1 according to the present invention;
FIG. 3 is a schematic top view of the present invention in normal operation;
in the figure, 10, the polishing platen; 11. a water retaining ring; 20. a grinding head; 30. a splash guard body; 31. a supporting seat; 310. a dropping groove is formed; 311. an upper water retaining ring; 312. a downpipe; 313. a drive support plate; 32. a fixed cover part; 321. a connecting rod; 33. a movable cover part; 331. an arc-shaped rack; 332. a guide ring; 34. the gears are driven.
Detailed Description
As shown in fig. 1 to 3, a splash guard for chemical mechanical polishing is provided around a circular plate-shaped polishing platen 10; the splash shield includes a splash shield body 30; the splash guard body 30 comprises a circular support base 31; the rotation central axes of the supporting seat 31 and the grinding platform 10 are arranged in a collinear way; the supporting seat 31 is located at the lower side of the grinding platform 10; a drop groove 310 in the shape of a circular groove is coaxially formed on the upper end surface of the support seat 31; a pair of fan-ring-shaped fixed cover parts 32 which are arranged symmetrically left and right are arranged in the falling groove 310; a fan-ring-shaped movable cover part 33 is arranged on the outer cylindrical surface of the fixed cover part 32 in a circumferential movement manner; the pair of movable cover parts 33 are synchronously moved; when the opening between the pair of movable cover portions 33 is opposed to the opening between the pair of fixed cover portions 32, the polishing head 20 can be horizontally moved out of the opposed openings; the sum of the angles of the pair of movable hood portions 33 and the angles of the pair of fixed hood portions 32 is greater than three hundred sixty degrees; the upper end surface of the polishing table 10 is coplanar with the horizontal center surfaces of the movable hood section 33 and the fixed hood section 32.
As shown in fig. 2, the inner cylindrical surface of the drop chute 310 has a diameter smaller than that of the polishing platform 10.
As shown in fig. 2, a coaxially arranged annular water retaining ring 11 is formed around the lower end surface of the grinding platform 10; the water retaining ring 11 is positioned in the drop groove 310 and the lower end surface of the water retaining ring 11 is higher than the bottom surface of the drop groove 310; an upper water retaining ring 311 of a ring shape is coaxially formed at the inner end of the upper end surface of the support base 31.
As shown in fig. 2, a plurality of downpipes 312 are disposed on the bottom surface of the dropping chute 310 and are uniformly distributed circumferentially.
As shown in fig. 2, an inner water blocking groove is formed on the inner cylindrical surface of the movable hood portion 33; an outer water retaining groove is formed on the inner cylindrical surface of the fixed hood part 32; the cross sections of the inner water retaining groove and the outer water retaining groove are inner waist triangles with the middle parts facing outwards.
As shown in fig. 1 to 3, a plurality of connecting rods 321 with uniformly distributed circumference are formed on the bottom surface of the fixed cover part 32; the bottom of the connecting rod 321 is fixed on the bottom surface of the drop groove 310; a fan-ring-shaped guide ring 332 coaxially arranged is formed on the lower end surface of the movable cover part 33; the guide ring 332 is located in the drop slot 310 and the guide ring 332 has the same outer diameter as the drop slot 310 and the same inner diameter as the fixed hood portion 32; a pair of driving support plates 313 which are uniformly distributed on the circumference are fixed on the support seat 31; a driving motor is fixed on the bottom surface of the driving support plate 313; a driving gear 34 is fixed at the upper end of an output shaft of the driving motor; an arc-shaped rack 331 which is coaxially arranged is formed at the lower end of the outer cylindrical surface of the movable cover part 33; the arc-shaped rack 331 is engaged with the driving gear 34 of the corresponding side.
The working principle of the splash guard of the chemical mechanical grinding;
as shown in fig. 3 in normal operation, the pair of movable hood parts 33 are located at front and rear positions to block front and rear openings of the pair of fixed hood parts 32, so that waste grinding fluid splashed from the grinding platform 10 in a rotating state is blocked by the pair of movable hood parts 33 and the pair of fixed hood parts 32, so that a splash-proof effect is good, and simultaneously, because the openings are opened by synchronously rotating the pair of movable hood parts 33 to allow the grinding head 20 to horizontally move in and out, problems encountered by the splash-proof hood in the lifting process cannot occur, so that the service life of the splash-proof hood is long; since the stopped waste grinding fluid eventually drops into the drop tank 310, the waste grinding fluid is collected conveniently.
The above description is only a preferred embodiment of the present invention, and for those skilled in the art, the present invention should not be limited by the description herein, since various changes and modifications can be made in the details of the embodiment and the application range according to the spirit of the present invention.
Claims (6)
1. A splash guard for chemical mechanical polishing is arranged around a circular plate-shaped polishing platform (10); the method is characterized in that: the splash shield comprises a splash shield body (30); the splash guard body (30) comprises a circular supporting seat (31); the rotation central axes of the supporting seat (31) and the grinding platform (10) are arranged in a collinear way; the supporting seat (31) is positioned at the lower side of the grinding platform (10); a ring groove-shaped drop groove (310) which is coaxially arranged is formed on the upper end surface of the supporting seat (31); a pair of fan-ring-shaped fixed cover parts (32) which are arranged symmetrically left and right are arranged in the falling groove (310); a sector ring-shaped movable cover part (33) is arranged on the outer cylindrical surface of the fixed cover part (32) in a circumferential movement manner; a pair of movable cover parts (33) are synchronously arranged; when the opening between the pair of movable cover portions (33) is opposite to the opening between the pair of fixed cover portions (32), the polishing head (20) can be horizontally moved out of the opposite opening; the sum of the angles of the pair of movable cover parts (33) and the angle of the pair of fixed cover parts (32) is more than three hundred and sixty degrees; the upper end face of the grinding platform (10) is coplanar with the horizontal central planes of the movable cover part (33) and the fixed cover part (32).
2. A chemical mechanical polishing splash shield as claimed in claim 1, wherein: the inner cylindrical surface of the drop groove (310) has a diameter smaller than the diameter of the polishing platen (10).
3. A chemical mechanical polishing splash shield as claimed in claim 2, wherein: a circular water retaining ring (11) which is coaxially arranged is formed around the lower end face of the grinding platform (10); the water retaining ring (11) is positioned in the falling groove (310) and the lower end surface of the water retaining ring (11) is higher than the bottom surface of the falling groove (310); an annular upper water retaining ring (311) which is coaxially arranged is formed at the inner side end of the upper end surface of the supporting seat (31).
4. A chemical mechanical polishing splash guard according to any one of claims 1 to 3, wherein: a plurality of downpipes (312) which are uniformly distributed on the circumference are arranged on the bottom surface of the falling groove (310).
5. A chemical mechanical polishing splash shield as claimed in claim 1, wherein: an inner water retaining groove is formed on the inner cylindrical surface of the movable cover part (33); an outer water retaining groove is formed on the inner cylindrical surface of the fixed cover part (32); the cross sections of the inner water retaining groove and the outer water retaining groove are inner waist triangles with the middle parts facing outwards.
6. A chemical mechanical polishing splash shield as claimed in claim 1, wherein: a plurality of connecting rods (321) which are uniformly distributed on the circumference are formed on the bottom surface of the fixed cover part (32); the bottom of the connecting rod (321) is fixed on the bottom surface of the falling groove (310); a sector ring-shaped guide ring (332) which is coaxially arranged is formed on the lower end surface of the movable cover part (33); the guide ring (332) is positioned in the drop groove (310), the outer diameter of the guide ring (332) is the same as that of the drop groove (310), and the inner diameter of the guide ring is the same as that of the fixed cover part (32); a pair of driving support plates (313) which are uniformly distributed on the circumference are fixed on the support seat (31); a driving motor is fixed on the bottom surface of the driving support plate (313); a driving gear (34) is fixed at the upper end of an output shaft of the driving motor; an arc-shaped rack (331) which is coaxially arranged is formed at the lower end of the outer cylindrical surface of the movable cover part (33); the arc-shaped gear rack (331) is meshed with the driving gear (34) on the corresponding side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010635681.4A CN111775056A (en) | 2020-07-04 | 2020-07-04 | Splash guard for chemical mechanical polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010635681.4A CN111775056A (en) | 2020-07-04 | 2020-07-04 | Splash guard for chemical mechanical polishing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111775056A true CN111775056A (en) | 2020-10-16 |
Family
ID=72758727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010635681.4A Pending CN111775056A (en) | 2020-07-04 | 2020-07-04 | Splash guard for chemical mechanical polishing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111775056A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112936091A (en) * | 2021-02-09 | 2021-06-11 | 华海清科(北京)科技有限公司 | Polishing solution anti-splash device, chemical mechanical polishing system and polishing method |
| CN113467199A (en) * | 2021-09-06 | 2021-10-01 | 宁波润华全芯微电子设备有限公司 | Device convenient to dismantle and capable of preventing wafer from being polluted by splashing liquid |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63150154A (en) * | 1986-12-15 | 1988-06-22 | Shimadzu Corp | Chemical polishing device |
| JP2003142442A (en) * | 2001-11-02 | 2003-05-16 | Nec Kansai Ltd | Semiconductor substrate polishing apparatus |
| KR20050056811A (en) * | 2003-12-10 | 2005-06-16 | 동부아남반도체 주식회사 | Chemical mechanical polishing apparatus |
| US20060042666A1 (en) * | 2004-08-25 | 2006-03-02 | Tokyo Seimitsu Co., Ltd. | Spin cleaning and drying apparatus and method of spin cleaning and drying |
| KR20110124465A (en) * | 2010-05-11 | 2011-11-17 | 삼성전자주식회사 | Rinsing and drying device of chemical mechanical polishing system |
| CN202317963U (en) * | 2011-11-24 | 2012-07-11 | 无锡华润上华科技有限公司 | Chemical mechanical grinding device |
| KR20120126410A (en) * | 2011-05-11 | 2012-11-21 | (주)디나옵틱스 | Substrate Polishing Apparatus |
| CN105382677A (en) * | 2014-08-26 | 2016-03-09 | 株式会社荏原制作所 | buff process module, SUBSTRATE PROCESSING APPARATUS and buff pad cleaning method |
-
2020
- 2020-07-04 CN CN202010635681.4A patent/CN111775056A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63150154A (en) * | 1986-12-15 | 1988-06-22 | Shimadzu Corp | Chemical polishing device |
| JP2003142442A (en) * | 2001-11-02 | 2003-05-16 | Nec Kansai Ltd | Semiconductor substrate polishing apparatus |
| KR20050056811A (en) * | 2003-12-10 | 2005-06-16 | 동부아남반도체 주식회사 | Chemical mechanical polishing apparatus |
| US20060042666A1 (en) * | 2004-08-25 | 2006-03-02 | Tokyo Seimitsu Co., Ltd. | Spin cleaning and drying apparatus and method of spin cleaning and drying |
| KR20110124465A (en) * | 2010-05-11 | 2011-11-17 | 삼성전자주식회사 | Rinsing and drying device of chemical mechanical polishing system |
| KR20120126410A (en) * | 2011-05-11 | 2012-11-21 | (주)디나옵틱스 | Substrate Polishing Apparatus |
| CN202317963U (en) * | 2011-11-24 | 2012-07-11 | 无锡华润上华科技有限公司 | Chemical mechanical grinding device |
| CN105382677A (en) * | 2014-08-26 | 2016-03-09 | 株式会社荏原制作所 | buff process module, SUBSTRATE PROCESSING APPARATUS and buff pad cleaning method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112936091A (en) * | 2021-02-09 | 2021-06-11 | 华海清科(北京)科技有限公司 | Polishing solution anti-splash device, chemical mechanical polishing system and polishing method |
| CN113467199A (en) * | 2021-09-06 | 2021-10-01 | 宁波润华全芯微电子设备有限公司 | Device convenient to dismantle and capable of preventing wafer from being polluted by splashing liquid |
| CN113467199B (en) * | 2021-09-06 | 2021-11-12 | 宁波润华全芯微电子设备有限公司 | Device convenient to dismantle and capable of preventing wafer from being polluted by splashing liquid |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN205734260U (en) | A kind of buffing machine | |
| CN108161015B (en) | Metal powder metallurgy is reducing mechanism for automatic feeding device | |
| CN101947749B (en) | Numerical control machine tool capable of grinding two sides of plane by dislocation self-rotation and ultrasonic vibration | |
| CN111775056A (en) | Splash guard for chemical mechanical polishing | |
| CN208262535U (en) | A kind of gear grinding device | |
| CN102172864A (en) | Method and equipment for precisely grinding high and hard large spherical-surface double grinding wheels | |
| CN111250470A (en) | Rotatory integrative cleaning machine of throwing | |
| CN208512743U (en) | A kind of latex dispersions grinding pot | |
| CN110039424A (en) | A kind of industrialization workpiece producing unit | |
| CN116021359B (en) | Silicon wafer fine grinding device capable of automatically adjusting polished workpiece | |
| CN208681293U (en) | The spray system of vertical wheel disc burnishing device based on force flow fluid | |
| CN210847549U (en) | Device for cleaning inner cover of bell-type annealing furnace | |
| CN209425259U (en) | A kind of grinding wafer polissoir | |
| CN216859324U (en) | Polishing turntable and multi-process polishing platform thereof | |
| CN113967862B (en) | Component for solving problem of unbalanced contact at seal end of seal head during polishing | |
| CN215318100U (en) | Rotary sand blasting device capable of recycling sand | |
| CN206493225U (en) | Polishing equipment is polished in bowling automatically | |
| CN112372367B (en) | Metal finish cutting machine tool with separable liquid chips | |
| CN111890218B (en) | Chemical mechanical polishing splash guard capable of rotating and lifting | |
| CN208811844U (en) | The lower polishing mechanism of the eccentric grinding and polishing device of sphere part | |
| CN108515292B (en) | Welding equipment for tank type chemical equipment | |
| CN212855380U (en) | Device is prepared fast to cutting fluid for glass processing | |
| CN217371842U (en) | Multi-station turnover positioning movement device for polishing machine | |
| CN214080631U (en) | Stainless steel valve plate double-inclined-plane deburring machine | |
| CN220616399U (en) | Liquid filling machine for sauce |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201016 |
|
| RJ01 | Rejection of invention patent application after publication |