CN110379872A - 铜铟镓硒太阳能电池吸收层的制备方法及太阳能电池 - Google Patents
铜铟镓硒太阳能电池吸收层的制备方法及太阳能电池 Download PDFInfo
- Publication number
- CN110379872A CN110379872A CN201910470993.1A CN201910470993A CN110379872A CN 110379872 A CN110379872 A CN 110379872A CN 201910470993 A CN201910470993 A CN 201910470993A CN 110379872 A CN110379872 A CN 110379872A
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- CN
- China
- Prior art keywords
- indium gallium
- copper indium
- precursor solution
- preparation
- absorbed layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000002360 preparation method Methods 0.000 title claims abstract description 42
- QNWMNMIVDYETIG-UHFFFAOYSA-N gallium(ii) selenide Chemical compound [Se]=[Ga] QNWMNMIVDYETIG-UHFFFAOYSA-N 0.000 title claims abstract description 23
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 239000002243 precursor Substances 0.000 claims abstract description 48
- 239000011669 selenium Substances 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 239000012528 membrane Substances 0.000 claims abstract description 29
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000002994 raw material Substances 0.000 claims abstract description 24
- 238000000137 annealing Methods 0.000 claims abstract description 16
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 10
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 10
- 239000007790 solid phase Substances 0.000 claims abstract description 9
- 238000004090 dissolution Methods 0.000 claims abstract description 7
- 239000003960 organic solvent Substances 0.000 claims abstract description 6
- 150000003839 salts Chemical class 0.000 claims abstract description 6
- 238000001548 drop coating Methods 0.000 claims abstract description 4
- 239000010949 copper Substances 0.000 claims description 21
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 18
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- -1 polytetrafluoroethylene Polymers 0.000 claims description 2
- 238000007790 scraping Methods 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 2
- 239000004642 Polyimide Substances 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
- 150000003346 selenoethers Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 30
- 239000010409 thin film Substances 0.000 abstract description 27
- 238000012423 maintenance Methods 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 12
- 239000010408 film Substances 0.000 description 21
- 239000007788 liquid Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000007787 solid Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 239000013064 chemical raw material Substances 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000011031 large-scale manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000005118 spray pyrolysis Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical group [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000006193 liquid solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
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CN201910470993.1A CN110379872A (zh) | 2019-05-31 | 2019-05-31 | 铜铟镓硒太阳能电池吸收层的制备方法及太阳能电池 |
Applications Claiming Priority (1)
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CN201910470993.1A CN110379872A (zh) | 2019-05-31 | 2019-05-31 | 铜铟镓硒太阳能电池吸收层的制备方法及太阳能电池 |
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CN110379872A true CN110379872A (zh) | 2019-10-25 |
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CN201910470993.1A Pending CN110379872A (zh) | 2019-05-31 | 2019-05-31 | 铜铟镓硒太阳能电池吸收层的制备方法及太阳能电池 |
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05232452A (ja) * | 1991-12-27 | 1993-09-10 | Dainippon Printing Co Ltd | 高分子分散型液晶表示装置およびその製造方法 |
CN101471394A (zh) * | 2007-12-29 | 2009-07-01 | 中国科学院上海硅酸盐研究所 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
CN102201495A (zh) * | 2011-05-04 | 2011-09-28 | 苏州瑞晟太阳能科技有限公司 | 全溶液法制备铜铟镓硒(cigs)薄膜太阳能电池 |
CN102825878A (zh) * | 2011-06-17 | 2012-12-19 | 上海晋飞复合材料科技有限公司 | 厚树脂层碳纤维板材表面粘覆碳纤维布的成型方法 |
KR20150037038A (ko) * | 2013-09-30 | 2015-04-08 | 재단법인대구경북과학기술원 | 다공성 czts계 박막의 제조방법 |
JP2016225628A (ja) * | 2015-05-29 | 2016-12-28 | 三菱化学株式会社 | 有機薄膜太陽電池モジュール |
JP2017069395A (ja) * | 2015-09-30 | 2017-04-06 | 三菱化学株式会社 | 有機薄膜太陽電池モジュール |
CN107180744A (zh) * | 2016-03-11 | 2017-09-19 | 晶门科技有限公司 | 一种基于溶液法的薄膜制备方法及薄膜 |
CN108624854A (zh) * | 2018-06-29 | 2018-10-09 | 北京铂阳顶荣光伏科技有限公司 | 一种新型制备薄膜的装置及方法 |
CN109671787A (zh) * | 2019-01-08 | 2019-04-23 | 哈尔滨理工大学 | 一种无硒化过程非真空法制备的铜铟镓硒吸收层 |
-
2019
- 2019-05-31 CN CN201910470993.1A patent/CN110379872A/zh active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05232452A (ja) * | 1991-12-27 | 1993-09-10 | Dainippon Printing Co Ltd | 高分子分散型液晶表示装置およびその製造方法 |
CN101471394A (zh) * | 2007-12-29 | 2009-07-01 | 中国科学院上海硅酸盐研究所 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
CN102201495A (zh) * | 2011-05-04 | 2011-09-28 | 苏州瑞晟太阳能科技有限公司 | 全溶液法制备铜铟镓硒(cigs)薄膜太阳能电池 |
CN102825878A (zh) * | 2011-06-17 | 2012-12-19 | 上海晋飞复合材料科技有限公司 | 厚树脂层碳纤维板材表面粘覆碳纤维布的成型方法 |
KR20150037038A (ko) * | 2013-09-30 | 2015-04-08 | 재단법인대구경북과학기술원 | 다공성 czts계 박막의 제조방법 |
JP2016225628A (ja) * | 2015-05-29 | 2016-12-28 | 三菱化学株式会社 | 有機薄膜太陽電池モジュール |
JP2017069395A (ja) * | 2015-09-30 | 2017-04-06 | 三菱化学株式会社 | 有機薄膜太陽電池モジュール |
CN107180744A (zh) * | 2016-03-11 | 2017-09-19 | 晶门科技有限公司 | 一种基于溶液法的薄膜制备方法及薄膜 |
CN108624854A (zh) * | 2018-06-29 | 2018-10-09 | 北京铂阳顶荣光伏科技有限公司 | 一种新型制备薄膜的装置及方法 |
CN109671787A (zh) * | 2019-01-08 | 2019-04-23 | 哈尔滨理工大学 | 一种无硒化过程非真空法制备的铜铟镓硒吸收层 |
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Application publication date: 20191025 |