CN110047728A - A kind of insulating base and dry etching equipment - Google Patents
A kind of insulating base and dry etching equipment Download PDFInfo
- Publication number
- CN110047728A CN110047728A CN201910234711.8A CN201910234711A CN110047728A CN 110047728 A CN110047728 A CN 110047728A CN 201910234711 A CN201910234711 A CN 201910234711A CN 110047728 A CN110047728 A CN 110047728A
- Authority
- CN
- China
- Prior art keywords
- radio
- pedestal
- frequency coil
- insulating base
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32807—Construction (includes replacing parts of the apparatus)
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Plasma Technology (AREA)
Abstract
The invention discloses a kind of insulating bases, are related to semiconductor etching techniques field, comprising: a pedestal, the pedestal include one for fixing the pedestal in the side on the dry etching equipment；Plurality of openings, the opening is set to the other side of the pedestal relative to the side, and distance of the opening from top to bottom to the side is sequentially reduced；Each opening includes a U-shaped portion, and the U-shaped portion, which is used to support, fixes a radio-frequency coil.The beneficial effect of above-mentioned technical proposal is: passing through the improvement being open to insulating base; enable the pedestal while displacement on limitation of radio frequency coil vertical direction; can also effective limitation of radio frequency coil lateral displacement; to make radio-frequency coil is more firm to be fixed on dry etching equipment; effectively preventing radio-frequency coil leads to the phenomenon that falling off due to overheat or machine such as move at the reasons; the position of radio-frequency coil is consolidated, to further protect the safety of quartz member.
Description
Technical field
The present invention relates to semiconductor etching techniques field more particularly to a kind of insulation bases applied in dry etching equipment
Seat.
Background technique
In semiconductor etching techniques field, in most cases, need to carve chip after performing etching technique
Processing after erosion, such as goes photoresist to handle, and dry etching equipment is that one kind removes photoresist device, including radio-frequency coil and use
In the insulating base of fixed RF coil, in the prior art, the opening on insulating base is transverse opening, and radio-frequency coil is located at
In transverse opening, for the displacement on the vertical direction of limitation of radio frequency coil, however, meeting during due to radio-frequency coil work
Because overheating and lateral displacement occurring in the reasons such as machine is moved, the opening on insulating base in the prior art can not
Limit displacement in radio-frequency coil X direction well, this will lead to radio-frequency coil because position built on the sand due to fall, dry
A quartz member is surrounded in method etching apparatus, among radio-frequency coil, falling for radio-frequency coil will lead to a part of radio-frequency coil
Too close to quartz member, the heat of radio-frequency coil can accelerate the loss of quartz member at this time, cause quartz member due to overheat
The problem of generating defect, causing initial failure.
Summary of the invention
For the above-mentioned problems in the prior art, a kind of insulation base applied in dry etching equipment is now provided
Seat, by being improved to the opening for being used to support fixed RF coil in insulating base, to keep radio-frequency coil more firm
Be fixed on dry etching equipment, effective solution is led because of the shaking of overheat and machine in the radio-frequency coil course of work
The problem of causing radio-frequency coil to fall off from insulating base, in turn result in quartz member initial failure.
Specific technical solution is as follows:
A kind of insulating base is applied to dry etching equipment, including:
One pedestal, the pedestal include one for fixing the pedestal in the side on the dry etching equipment；
Plurality of openings, the opening is set to the other side of the pedestal relative to the side, and the opening is certainly
It is upper and the distance down toward the side is sequentially reduced；
Each opening includes a U-shaped portion, and the U-shaped portion, which is used to support, fixes a radio-frequency coil.
Preferably, wherein the bore that the U-shaped portion includes is greater than the outer diameter of the radio-frequency coil.
Preferably, wherein the pedestal is isolation material.
Preferably, wherein the pedestal is high temperature resistant material.
Preferably, wherein the upper opening portion is additionally provided with a transverse groove backwards to the side.
Preferably, wherein the bore of the transverse groove is greater than the outer diameter of the radio-frequency coil.
Preferably, wherein the pedestal is additionally provided with pilot hole close to the side side, and the pilot hole is used for institute
Pedestal is stated to be fixed on the dry etching equipment.
Preferably, wherein it further include radio frequency source including the insulating base as described in any one of claim 1-7, institute
Radio frequency source is stated mainly to be formed by the radio-frequency coil.
Preferably, wherein the insulating base is along the radio-frequency coil radial equipartition.
Preferably, wherein the insulating base is 3 to 5.
Above-mentioned technical proposal beneficial effect is: providing a kind of insulating base applied in dry etching equipment, passes through
The opening for being used to support fixed RF coil in insulating base is improved, keeps the pedestal perpendicular in limitation of radio frequency coil
While histogram upward displacement, moreover it is possible to the lateral displacement of effective limitation of radio frequency coil, to keep radio-frequency coil more firm
It is fixed on dry etching equipment, effectively prevents radio-frequency coil showing for causing to fall off due to overheat or machine such as move at the reasons
As having consolidated the position of radio-frequency coil, to further protect the safety of quartz member, having avoided quartz member because excessively leaning on
Nearly radio-frequency coil and cause to overheat, and then the problem of generate defect particles, cause initial failure.
Detailed description of the invention
Fig. 1 is the overall structure diagram of insulating base in presently preferred embodiments of the present invention；
Fig. 2 is the structural schematic diagram of insulating base and radio-frequency coil cooperation in presently preferred embodiments of the present invention.
Appended drawing reference indicates explanation in description above:
Pedestal (1)；Side (2)；It is open (3)；Pilot hole (4)；Radio-frequency coil (5).
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art without creative labor it is obtained it is all its
His embodiment, shall fall within the protection scope of the present invention.
It should be noted that in the absence of conflict, the feature in embodiment and embodiment in the present invention can phase
Mutually combination.
The present invention will be further explained below with reference to the attached drawings and specific examples, but not as the limitation of the invention.
A kind of insulating base is applied to dry etching equipment, as shown in Figure 1, including: a pedestal 1, pedestal 1 include
One is used for fixed base frame 1 in the side 2 on dry etching equipment；Plurality of openings 3, opening 3 are set to pedestal 1 relative to side
2 other side, and 3 distance from top to bottom to side 2 that is open is sequentially reduced；Each opening 3 includes a U-shaped portion, such as Fig. 2 institute
Show, U-shaped portion, which is used to support, fixes a radio-frequency coil 5.
In one particular embodiment of the present invention, a total of 4 of opening 3, position and radio frequency of the opening 3 on pedestal 1
The relative position of 5 coil of coil corresponds, and is used for clamping radio-frequency coil 5.
In a preferred embodiment of the present invention, the bore that the U-shaped portion includes is greater than the outer of the radio-frequency coil 5
Diameter.
In a specific embodiment, the bore of U-shaped portion is slightly larger than the outer diameter of radio-frequency coil 5, can either make radio frequency in this way
Coil 5 is easily put into the opening 3 of insulating base, will not because the opening of insulating base and radio-frequency coil lean on it is too close due to influence
The heat dissipation of radio-frequency coil, and be unlikely to cause radio-frequency coil under the clamping of insulating base because the opening of insulating base is excessive
Freedom degree is excessive.
In the preferred embodiment, pedestal 1 is isolation material.
In the preferred embodiment, pedestal 1 is high temperature resistant material.
In a specific embodiment, pedestal 1 with radio-frequency coil 5 because will directly contact, and meeting when the work of radio-frequency coil 5
It emits light and heat, and extreme temperatures, therefore pedestal 1 must use high temperature resistant material, to guarantee that pedestal 1 will not be in radio-frequency coil high temperature
Under the influence of and deform, lead to security risk.
In the preferred embodiment, 3 tops of opening are additionally provided with a transverse groove backwards to side 2.
In a specific embodiment, opening 3 is respectively the first opening, the second opening, third opening, the 4th from top to bottom
Opening, the first opening only include a U-shaped portion, the second opening because being located at the top of pedestal, and third opening is opened with the 4th
Mouth include a U-shaped portion and one backwards to side 2 transverse groove, the design of such structure is both on 5 vertical direction of radio-frequency coil
Displacement limited, and to X direction displacement limited, enable radio-frequency coil 5 it is more firm be trapped in insulation base
On seat.
In the preferred embodiment, the bore of the transverse groove is greater than the outer diameter of radio-frequency coil 5.
In a specific embodiment, the bore of transverse groove should be advisable with facilitating radio-frequency coil to free in and out opening 3.
In the preferred embodiment, as described in Figure 1, pedestal 1 is additionally provided with pilot hole 4 by 2 side of proximal edges, fills
Distribution 4 is used to pedestal 1 being fixed on dry etching equipment.
A kind of dry etching equipment further includes radio frequency source, radio frequency source is mainly by radio frequency including above-mentioned insulating base
The formation of coil 5.
In the preferred embodiment, insulating base is along 5 radial equipartition of radio-frequency coil.
In the preferred embodiment, insulating base is 3 to 5.
Above-mentioned technical proposal beneficial effect is: providing a kind of insulating base applied in dry etching equipment, passes through
The opening for being used to support fixed RF coil in insulating base is improved, keeps the pedestal perpendicular in limitation of radio frequency coil
While histogram upward displacement, moreover it is possible to the lateral displacement of effective limitation of radio frequency coil, to keep radio-frequency coil more firm
It is fixed on dry etching equipment, effectively prevents radio-frequency coil showing for causing to fall off due to overheat or machine such as move at the reasons
As having consolidated the position of radio-frequency coil, to further protect the safety of quartz member, having avoided quartz member because excessively leaning on
Nearly radio-frequency coil and cause to overheat, and then the problem of generate defect particles, cause initial failure.
The foregoing is merely preferred embodiments of the present invention, are not intended to limit embodiments of the present invention and protection model
It encloses, to those skilled in the art, should can appreciate that all with made by description of the invention and diagramatic content
Equivalent replacement and obviously change obtained scheme, should all be included within the scope of the present invention.
Claims (10)
1. a kind of insulating base is applied to dry etching equipment characterized by comprising
One pedestal, the pedestal include one for fixing the pedestal in the side on the dry etching equipment；
Plurality of openings, the opening are set to the other side of the pedestal relative to the side, and the opening from upper and
Distance down toward the side is sequentially reduced；
Each opening includes a U-shaped portion, and the U-shaped portion, which is used to support, fixes a radio-frequency coil.
2. insulating base according to claim 1, which is characterized in that the bore that the U-shaped portion includes is greater than the radio frequency
The outer diameter of coil.
3. insulating base according to claim 1, which is characterized in that the pedestal is isolation material.
4. insulating base according to claim 1, which is characterized in that the pedestal is high temperature resistant material.
5. insulating base according to claim 1, which is characterized in that the upper opening portion is additionally provided with one backwards to the side
The transverse groove on side.
6. insulating base according to claim 5, which is characterized in that the bore of the transverse groove is greater than the radio-frequency coil
Outer diameter.
7. insulating base according to claim 1, which is characterized in that the pedestal is additionally provided with close to the side side
Pilot hole, the pilot hole are used to the pedestal being fixed on the dry etching equipment.
8. a kind of dry etching equipment, which is characterized in that including the insulating base as described in any one of claim 1-7,
It further include radio frequency source, the radio frequency source is mainly formed by the radio-frequency coil.
9. dry etching equipment according to claim 8, which is characterized in that the insulating base is along the radio-frequency coil diameter
To uniformly.
10. dry etching equipment according to claim 8, which is characterized in that the insulating base is 3 to 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910234711.8A CN110047728A (en) | 2019-03-26 | 2019-03-26 | A kind of insulating base and dry etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910234711.8A CN110047728A (en) | 2019-03-26 | 2019-03-26 | A kind of insulating base and dry etching equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110047728A true CN110047728A (en) | 2019-07-23 |
Family
ID=67275192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910234711.8A Pending CN110047728A (en) | 2019-03-26 | 2019-03-26 | A kind of insulating base and dry etching equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110047728A (en) |
Citations (11)
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| CN102548180A (en) * | 2010-12-27 | 2012-07-04 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Medium window, inductive coupling coil assembly, and plasma processing equipment |
| CN103578905A (en) * | 2012-07-30 | 2014-02-12 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Inductively coupled plasma processing device |
| CN203910744U (en) * | 2014-04-09 | 2014-10-29 | 中芯国际集成电路制造(北京)有限公司 | Adaptability coupling plasma etching machine |
| CN203983879U (en) * | 2014-08-04 | 2014-12-03 | 绵阳华正电子科技有限公司 | A kind of wire bushing and bunch structure thereof |
| CN204028421U (en) * | 2014-08-19 | 2014-12-17 | 苏州联城通信设备有限公司 | A kind of fiber termination box |
| CN204391038U (en) * | 2015-03-05 | 2015-06-10 | 苏州阿特斯阳光电力科技有限公司 | A kind of plasma etching machine |
| CN106711007A (en) * | 2015-11-17 | 2017-05-24 | 中微半导体设备(上海)有限公司 | Inductive coupling type plasma processing device |
| CN106816396A (en) * | 2015-11-27 | 2017-06-09 | 中芯国际集成电路制造(上海)有限公司 | A kind of plasma processing apparatus |
| CN206283036U (en) * | 2016-12-22 | 2017-06-27 | 佛山市顺德区美的电热电器制造有限公司 | Elastic cable button, lid, electric cooker |
| CN207039760U (en) * | 2017-08-22 | 2018-02-23 | 深圳创维－Rgb电子有限公司 | Card wire structure and television set |
| CN207665377U (en) * | 2018-01-16 | 2018-07-27 | 平湖市陈达仓储办公设备有限公司 | A kind of laptop charging cabinet lineation button |
-
2019
- 2019-03-26 CN CN201910234711.8A patent/CN110047728A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102548180A (en) * | 2010-12-27 | 2012-07-04 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Medium window, inductive coupling coil assembly, and plasma processing equipment |
| CN103578905A (en) * | 2012-07-30 | 2014-02-12 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Inductively coupled plasma processing device |
| CN203910744U (en) * | 2014-04-09 | 2014-10-29 | 中芯国际集成电路制造(北京)有限公司 | Adaptability coupling plasma etching machine |
| CN203983879U (en) * | 2014-08-04 | 2014-12-03 | 绵阳华正电子科技有限公司 | A kind of wire bushing and bunch structure thereof |
| CN204028421U (en) * | 2014-08-19 | 2014-12-17 | 苏州联城通信设备有限公司 | A kind of fiber termination box |
| CN204391038U (en) * | 2015-03-05 | 2015-06-10 | 苏州阿特斯阳光电力科技有限公司 | A kind of plasma etching machine |
| CN106711007A (en) * | 2015-11-17 | 2017-05-24 | 中微半导体设备(上海)有限公司 | Inductive coupling type plasma processing device |
| CN106816396A (en) * | 2015-11-27 | 2017-06-09 | 中芯国际集成电路制造(上海)有限公司 | A kind of plasma processing apparatus |
| CN206283036U (en) * | 2016-12-22 | 2017-06-27 | 佛山市顺德区美的电热电器制造有限公司 | Elastic cable button, lid, electric cooker |
| CN207039760U (en) * | 2017-08-22 | 2018-02-23 | 深圳创维－Rgb电子有限公司 | Card wire structure and television set |
| CN207665377U (en) * | 2018-01-16 | 2018-07-27 | 平湖市陈达仓储办公设备有限公司 | A kind of laptop charging cabinet lineation button |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190723 |