CN110018542A - 光学滤波器 - Google Patents
光学滤波器 Download PDFInfo
- Publication number
- CN110018542A CN110018542A CN201811554720.7A CN201811554720A CN110018542A CN 110018542 A CN110018542 A CN 110018542A CN 201811554720 A CN201811554720 A CN 201811554720A CN 110018542 A CN110018542 A CN 110018542A
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- Prior art keywords
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- Pending
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- 230000003287 optical effect Effects 0.000 title claims abstract description 193
- 239000000758 substrate Substances 0.000 claims abstract description 81
- 230000003595 spectral effect Effects 0.000 claims description 53
- 238000000034 method Methods 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 33
- 238000004544 sputter deposition Methods 0.000 claims description 33
- 239000006096 absorbing agent Substances 0.000 claims description 32
- 230000008569 process Effects 0.000 claims description 31
- 238000001259 photo etching Methods 0.000 claims description 17
- 238000005516 engineering process Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 238000001914 filtration Methods 0.000 claims description 8
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 8
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 8
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 6
- 238000004062 sedimentation Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 138
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 238000000059 patterning Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 5
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- 241000538562 Banjos Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
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- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/0214—Constructional arrangements for removing stray light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
- G01J1/0492—Optical or mechanical part supplementary adjustable parts with spectral filtering using at least two different filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0262—Constructional arrangements for removing stray light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1213—Filters in general, e.g. dichroic, band
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1226—Interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1226—Interference filters
- G01J2003/123—Indexed discrete filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12109—Filter
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/845,607 US11156753B2 (en) | 2017-12-18 | 2017-12-18 | Optical filters |
| US15/845,607 | 2017-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110018542A true CN110018542A (zh) | 2019-07-16 |
Family
ID=64664992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811554720.7A Pending CN110018542A (zh) | 2017-12-18 | 2018-12-18 | 光学滤波器 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11156753B2 (https=) |
| EP (1) | EP3499279A1 (https=) |
| JP (1) | JP2019133137A (https=) |
| KR (1) | KR20190073290A (https=) |
| CN (1) | CN110018542A (https=) |
| AU (1) | AU2018274929A1 (https=) |
| CA (1) | CA3026713A1 (https=) |
| TW (1) | TW201928410A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115461657A (zh) * | 2020-05-29 | 2022-12-09 | 松下知识产权经营株式会社 | 滤波器阵列及光检测系统 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10876889B2 (en) | 2019-02-12 | 2020-12-29 | Viavi Solutions Inc. | Sensor device and method of use |
| CN112179491B (zh) * | 2019-07-01 | 2022-03-25 | 华为技术有限公司 | 一种高光谱成像系统、摄像头以及终端设备 |
| US11789188B2 (en) * | 2019-07-19 | 2023-10-17 | Viavi Solutions Inc. | Optical filter |
| US11287317B2 (en) * | 2019-08-27 | 2022-03-29 | Viavi Solutions Inc. | Optical measurement device including internal spectral reference |
| CN114846306A (zh) * | 2019-12-26 | 2022-08-02 | ams传感器德国有限公司 | 集成uv辐射传感器 |
| US11914181B2 (en) | 2020-04-08 | 2024-02-27 | Samsung Electronics Co., Ltd. | Optical filter and spectrometer including the same |
| EP3943988B1 (en) | 2020-07-20 | 2023-12-27 | Samsung Electronics Co., Ltd. | Spectral filter, and image sensor and electronic device including the spectral filter |
| JP7818358B2 (ja) | 2020-07-23 | 2026-02-20 | 三星電子株式会社 | イメージセンサ及びイメージ処理方法、並びにイメージセンサを含む電子装置 |
| US12174405B2 (en) * | 2020-11-19 | 2024-12-24 | Visera Technologies Company Limited | Optical structure having polymer-covered protrusions contacting bandpass filter |
| US12339478B2 (en) | 2021-04-22 | 2025-06-24 | Samsung Electronics Co., Ltd. | Spectral filter, and image sensor and electronic device including spectral filter |
| KR102883986B1 (ko) | 2021-10-14 | 2025-11-07 | 삼성전자주식회사 | 이미지 획득 장치 및 방법, 이를 포함하는 전자 장치 |
| CN115268210A (zh) * | 2022-07-25 | 2022-11-01 | 北京理工大学 | 一种基于光刻的多光谱计算传感器制备方法及装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6342970B1 (en) * | 1994-03-03 | 2002-01-29 | Unaxis Balzers Aktiengesellschaft | Dielectric interference filter system, LCD-display and CCD-arrangement as well as process for manufacturing a dielectric interference filter system and use of this process |
| US20090321865A1 (en) * | 2008-06-30 | 2009-12-31 | Panasonic Corporation | Solid-state imaging device and camera |
| CN102447826A (zh) * | 2010-10-12 | 2012-05-09 | 全视科技有限公司 | 可见及红外双重模式成像系统 |
| US20160099280A1 (en) * | 2014-10-06 | 2016-04-07 | Visera Technologies Company Limited | Image sensors and methods of forming the same |
| CN105514132A (zh) * | 2014-10-08 | 2016-04-20 | 全视技术有限公司 | 具有信号分离的颜色滤波器阵列的双模图像传感器及其方法 |
| WO2017147991A1 (zh) * | 2016-02-29 | 2017-09-08 | 京东方科技集团股份有限公司 | 彩膜基板及其制作方法、显示装置 |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6800378B2 (en) | 1998-02-19 | 2004-10-05 | 3M Innovative Properties Company | Antireflection films for use with displays |
| CH693076A5 (de) | 1998-02-20 | 2003-02-14 | Unaxis Trading Ag | Verfahren zur Herstellung einer Farbfilterschichtsystem-Struktur auf einer Unterlage. |
| US6638668B2 (en) | 2000-05-12 | 2003-10-28 | Ocean Optics, Inc. | Method for making monolithic patterned dichroic filter detector arrays for spectroscopic imaging |
| JP2003042845A (ja) * | 2001-07-30 | 2003-02-13 | Sony Corp | 光学装置 |
| JP2004080605A (ja) * | 2002-08-21 | 2004-03-11 | Minolta Co Ltd | 撮像装置 |
| US7652685B2 (en) * | 2004-09-13 | 2010-01-26 | Omnivision Cdm Optics, Inc. | Iris image capture devices and associated systems |
| TW200524150A (en) | 2004-01-15 | 2005-07-16 | Matsushita Electric Industrial Co Ltd | Solid state imaging device, process for fabricating solid state imaging device and camera employing same |
| CN1306288C (zh) | 2005-04-27 | 2007-03-21 | 中国科学院上海技术物理研究所 | 具有平整谐振腔层的滤光片列阵 |
| US7692855B2 (en) | 2006-06-28 | 2010-04-06 | Essilor International Compagnie Generale D'optique | Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers |
| FR2904432B1 (fr) | 2006-07-25 | 2008-10-24 | Commissariat Energie Atomique | Structure matricielle de filtrage optique et capteur d'images associe |
| CN104316987A (zh) | 2006-08-09 | 2015-01-28 | 光学解决方案纳米光子学有限责任公司 | 光学滤波器及其生产方法以及用于检查电磁辐射的装置 |
| CN101506721B (zh) * | 2006-09-28 | 2011-03-02 | 夏普株式会社 | 液晶显示面板和液晶显示装置 |
| US20100140461A1 (en) | 2006-12-13 | 2010-06-10 | Georgia Tech Research Corporation | Systems and methods for real time multispectral imaging |
| JP5517404B2 (ja) | 2006-12-28 | 2014-06-11 | 株式会社日本触媒 | 光選択透過フィルター |
| JP2008244246A (ja) * | 2007-03-28 | 2008-10-09 | Matsushita Electric Ind Co Ltd | 固体撮像装置、カメラ、車両及び監視装置 |
| FR2926635B1 (fr) | 2008-01-21 | 2012-08-03 | Silios Technologies | Dispositif de spectroscopie en longueur d'onde a filtres integres |
| US8363185B2 (en) | 2008-10-10 | 2013-01-29 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters |
| US8264637B2 (en) | 2008-10-10 | 2012-09-11 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter |
| JP5489604B2 (ja) | 2009-01-14 | 2014-05-14 | ホーヤ レンズ マニュファクチャリング フィリピン インク | 光学物品の製造方法 |
| US8692198B2 (en) * | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
| JP2012019113A (ja) | 2010-07-08 | 2012-01-26 | Panasonic Corp | 固体撮像装置 |
| DE202012013052U1 (de) | 2011-02-23 | 2014-09-29 | Schott Ag | Saphirglas-Scheibe mit Antireflexionsbeschichtung sowie deren Verwendung |
| EP2773929B1 (en) | 2011-11-04 | 2023-12-13 | IMEC vzw | Spectral camera with mosaic of filters for each image pixel |
| EP2791733B1 (en) | 2011-12-12 | 2017-10-25 | View, Inc. | Thin-film devices and fabrication |
| JP2013156523A (ja) | 2012-01-31 | 2013-08-15 | Topcon Corp | 基板 |
| FR2994282B1 (fr) * | 2012-07-31 | 2014-09-05 | Commissariat Energie Atomique | Structure de filtrage optique dans le domaine visible et/ou infrarouge |
| US9261634B2 (en) * | 2013-01-29 | 2016-02-16 | Viavi Solutions Inc. | Variable optical filter and a wavelength-selective sensor based thereon |
| EP2987007B1 (en) * | 2013-04-16 | 2019-11-27 | Materion Corporation | Filter array with reduced stray light |
| US20140339606A1 (en) | 2013-05-16 | 2014-11-20 | Visera Technologies Company Limited | Bsi cmos image sensor |
| KR102299714B1 (ko) | 2014-08-18 | 2021-09-08 | 삼성전자주식회사 | 컬러 필터 격리층을 구비하는 이미지 센서 및 상기 이미지 센서의 제조 방법 |
| JP6269387B2 (ja) * | 2014-08-21 | 2018-01-31 | セイコーエプソン株式会社 | 表示装置及び電子機器 |
| DE102014013550A1 (de) | 2014-09-12 | 2016-03-31 | Schott Ag | Beschichtetes chemisch vorgespanntes flexibles dünnes Glas |
| US20160182846A1 (en) * | 2014-12-22 | 2016-06-23 | Google Inc. | Monolithically integrated rgb pixel array and z pixel array |
| JP6611443B2 (ja) | 2015-03-19 | 2019-11-27 | キヤノン株式会社 | 光学フィルタおよび光学装置 |
| CN107850713B (zh) * | 2015-07-31 | 2020-05-12 | Ａｇｃ株式会社 | 光学滤波器和近红外线截止滤波器 |
| CN108351449B (zh) | 2015-11-03 | 2021-02-12 | 美题隆公司 | 具有减少的杂散聚焦光的滤光片阵列 |
| US10170509B2 (en) | 2016-02-12 | 2019-01-01 | Viavi Solutions Inc. | Optical filter array |
| CN109477966B (zh) * | 2016-02-18 | 2022-06-03 | 苹果公司 | 具有内-外位置跟踪、用户身体跟踪和环境跟踪的用于虚拟现实和混合现实的头戴式显示器 |
| WO2018043500A1 (ja) * | 2016-08-31 | 2018-03-08 | 株式会社大真空 | 光学フィルタ |
-
2017
- 2017-12-18 US US15/845,607 patent/US11156753B2/en not_active Expired - Fee Related
-
2018
- 2018-12-05 AU AU2018274929A patent/AU2018274929A1/en not_active Abandoned
- 2018-12-06 TW TW107143818A patent/TW201928410A/zh unknown
- 2018-12-06 CA CA3026713A patent/CA3026713A1/en active Pending
- 2018-12-12 EP EP18211892.7A patent/EP3499279A1/en not_active Withdrawn
- 2018-12-17 KR KR1020180163593A patent/KR20190073290A/ko not_active Abandoned
- 2018-12-17 JP JP2018235692A patent/JP2019133137A/ja active Pending
- 2018-12-18 CN CN201811554720.7A patent/CN110018542A/zh active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6342970B1 (en) * | 1994-03-03 | 2002-01-29 | Unaxis Balzers Aktiengesellschaft | Dielectric interference filter system, LCD-display and CCD-arrangement as well as process for manufacturing a dielectric interference filter system and use of this process |
| US20090321865A1 (en) * | 2008-06-30 | 2009-12-31 | Panasonic Corporation | Solid-state imaging device and camera |
| CN102447826A (zh) * | 2010-10-12 | 2012-05-09 | 全视科技有限公司 | 可见及红外双重模式成像系统 |
| US20160099280A1 (en) * | 2014-10-06 | 2016-04-07 | Visera Technologies Company Limited | Image sensors and methods of forming the same |
| CN105514132A (zh) * | 2014-10-08 | 2016-04-20 | 全视技术有限公司 | 具有信号分离的颜色滤波器阵列的双模图像传感器及其方法 |
| WO2017147991A1 (zh) * | 2016-02-29 | 2017-09-08 | 京东方科技集团股份有限公司 | 彩膜基板及其制作方法、显示装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115461657A (zh) * | 2020-05-29 | 2022-12-09 | 松下知识产权经营株式会社 | 滤波器阵列及光检测系统 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019133137A (ja) | 2019-08-08 |
| AU2018274929A1 (en) | 2019-07-04 |
| CA3026713A1 (en) | 2019-06-18 |
| US20190187347A1 (en) | 2019-06-20 |
| EP3499279A1 (en) | 2019-06-19 |
| KR20190073290A (ko) | 2019-06-26 |
| US11156753B2 (en) | 2021-10-26 |
| TW201928410A (zh) | 2019-07-16 |
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