CN109913939A - 热屏蔽组件、拉晶炉系统及其工作方法 - Google Patents
热屏蔽组件、拉晶炉系统及其工作方法 Download PDFInfo
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- CN109913939A CN109913939A CN201910280398.1A CN201910280398A CN109913939A CN 109913939 A CN109913939 A CN 109913939A CN 201910280398 A CN201910280398 A CN 201910280398A CN 109913939 A CN109913939 A CN 109913939A
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112144106A (zh) * | 2020-09-28 | 2020-12-29 | 上海新昇半导体科技有限公司 | 单晶生长设备及生长方法 |
TWI770953B (zh) * | 2021-04-22 | 2022-07-11 | 環球晶圓股份有限公司 | 長晶爐 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0437686A (ja) * | 1990-05-31 | 1992-02-07 | Sumitomo Electric Ind Ltd | 単結晶の引上方法および引上装置 |
JPH10158091A (ja) * | 1996-11-22 | 1998-06-16 | Shin Etsu Handotai Co Ltd | 単結晶の製造装置および製造方法 |
CN101849043A (zh) * | 2007-12-25 | 2010-09-29 | 信越半导体股份有限公司 | 单晶制造装置及制造方法 |
CN105358743A (zh) * | 2013-06-27 | 2016-02-24 | 信越半导体株式会社 | 单晶制造装置及单晶制造方法 |
CN106813504A (zh) * | 2015-11-30 | 2017-06-09 | 天津开发区信达化工技术发展有限公司 | 一种防迸溅高效坩埚炉膛 |
CN107805840A (zh) * | 2016-09-09 | 2018-03-16 | 上海新昇半导体科技有限公司 | 一种拉晶炉的拉晶机构 |
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- 2019-04-09 CN CN201910280398.1A patent/CN109913939B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0437686A (ja) * | 1990-05-31 | 1992-02-07 | Sumitomo Electric Ind Ltd | 単結晶の引上方法および引上装置 |
JPH10158091A (ja) * | 1996-11-22 | 1998-06-16 | Shin Etsu Handotai Co Ltd | 単結晶の製造装置および製造方法 |
CN101849043A (zh) * | 2007-12-25 | 2010-09-29 | 信越半导体股份有限公司 | 单晶制造装置及制造方法 |
CN105358743A (zh) * | 2013-06-27 | 2016-02-24 | 信越半导体株式会社 | 单晶制造装置及单晶制造方法 |
CN106813504A (zh) * | 2015-11-30 | 2017-06-09 | 天津开发区信达化工技术发展有限公司 | 一种防迸溅高效坩埚炉膛 |
CN107805840A (zh) * | 2016-09-09 | 2018-03-16 | 上海新昇半导体科技有限公司 | 一种拉晶炉的拉晶机构 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112144106A (zh) * | 2020-09-28 | 2020-12-29 | 上海新昇半导体科技有限公司 | 单晶生长设备及生长方法 |
TWI770953B (zh) * | 2021-04-22 | 2022-07-11 | 環球晶圓股份有限公司 | 長晶爐 |
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Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee after: Xi'an Yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |