CN109791371B - 图案描绘装置及图案描绘方法 - Google Patents

图案描绘装置及图案描绘方法 Download PDF

Info

Publication number
CN109791371B
CN109791371B CN201780061213.7A CN201780061213A CN109791371B CN 109791371 B CN109791371 B CN 109791371B CN 201780061213 A CN201780061213 A CN 201780061213A CN 109791371 B CN109791371 B CN 109791371B
Authority
CN
China
Prior art keywords
substrate
scanning
light
light beam
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201780061213.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN109791371A (zh
Inventor
加藤正纪
中山修一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to CN202110922904.XA priority Critical patent/CN113552778B/zh
Publication of CN109791371A publication Critical patent/CN109791371A/zh
Application granted granted Critical
Publication of CN109791371B publication Critical patent/CN109791371B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
CN201780061213.7A 2016-10-04 2017-05-15 图案描绘装置及图案描绘方法 Active CN109791371B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110922904.XA CN113552778B (zh) 2016-10-04 2017-05-15 图案描绘装置及图案描绘方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016196797 2016-10-04
JP2016-196797 2016-10-04
PCT/JP2017/018139 WO2018066159A1 (ja) 2016-10-04 2017-05-15 パターン描画装置、およびパターン描画方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN202110922904.XA Division CN113552778B (zh) 2016-10-04 2017-05-15 图案描绘装置及图案描绘方法

Publications (2)

Publication Number Publication Date
CN109791371A CN109791371A (zh) 2019-05-21
CN109791371B true CN109791371B (zh) 2021-08-06

Family

ID=61830834

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201780061213.7A Active CN109791371B (zh) 2016-10-04 2017-05-15 图案描绘装置及图案描绘方法
CN202110922904.XA Active CN113552778B (zh) 2016-10-04 2017-05-15 图案描绘装置及图案描绘方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN202110922904.XA Active CN113552778B (zh) 2016-10-04 2017-05-15 图案描绘装置及图案描绘方法

Country Status (5)

Country Link
JP (1) JP6919660B2 (ja)
KR (1) KR102414046B1 (ja)
CN (2) CN109791371B (ja)
TW (1) TWI736621B (ja)
WO (1) WO2018066159A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI777841B (zh) * 2020-11-02 2022-09-11 日商尼康股份有限公司 圖案曝光裝置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015152218A1 (ja) * 2014-04-01 2015-10-08 株式会社ニコン 基板処理装置、デバイス製造方法及び基板処理方法
WO2015166910A1 (ja) * 2014-04-28 2015-11-05 株式会社ニコン パターン描画装置、パターン描画方法、デバイス製造方法、レーザ光源装置、ビーム走査装置、および、ビーム走査方法
JP2016133623A (ja) * 2015-01-19 2016-07-25 株式会社ニコン 基板処理装置及びデバイス製造方法
WO2016152758A1 (ja) * 2015-03-20 2016-09-29 株式会社ニコン ビーム走査装置、ビーム走査方法、および描画装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01237513A (ja) * 1987-05-13 1989-09-22 Dainippon Screen Mfg Co Ltd 光ビーム偏向走査装置
JPH052152A (ja) * 1990-12-19 1993-01-08 Hitachi Ltd 光ビーム作成方法、装置、それを用いた寸法測定方法、外観検査方法、高さ測定方法、露光方法および半導体集積回路装置の製造方法
US5386221A (en) * 1992-11-02 1995-01-31 Etec Systems, Inc. Laser pattern generation apparatus
EP2003506A2 (en) * 2006-03-20 2008-12-17 Nikon Corporation Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
IN2015DN01909A (ja) * 2012-08-28 2015-08-07 Nikon Corp

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015152218A1 (ja) * 2014-04-01 2015-10-08 株式会社ニコン 基板処理装置、デバイス製造方法及び基板処理方法
WO2015166910A1 (ja) * 2014-04-28 2015-11-05 株式会社ニコン パターン描画装置、パターン描画方法、デバイス製造方法、レーザ光源装置、ビーム走査装置、および、ビーム走査方法
JP2016133623A (ja) * 2015-01-19 2016-07-25 株式会社ニコン 基板処理装置及びデバイス製造方法
WO2016152758A1 (ja) * 2015-03-20 2016-09-29 株式会社ニコン ビーム走査装置、ビーム走査方法、および描画装置

Also Published As

Publication number Publication date
WO2018066159A1 (ja) 2018-04-12
CN113552778B (zh) 2023-10-20
TW201826035A (zh) 2018-07-16
KR20190055243A (ko) 2019-05-22
JPWO2018066159A1 (ja) 2019-07-18
CN113552778A (zh) 2021-10-26
KR102414046B1 (ko) 2022-06-29
CN109791371A (zh) 2019-05-21
TWI736621B (zh) 2021-08-21
JP6919660B2 (ja) 2021-08-18

Similar Documents

Publication Publication Date Title
CN109991733B (zh) 图案描绘装置及基板处理装置
CN109343214B (zh) 图案描绘装置
CN109478018B (zh) 图案描绘装置
JP6583451B2 (ja) パターン描画装置
CN109791371B (zh) 图案描绘装置及图案描绘方法
JP6870755B2 (ja) パターン描画方法
JP6582782B2 (ja) パターン描画装置
JP6690214B2 (ja) パターン描画装置
JP6835163B2 (ja) パターン露光装置
JP6504293B2 (ja) パターン描画装置
JP6780750B2 (ja) 基板処理装置のテスト方法
JP2017058494A (ja) パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
REG Reference to a national code

Ref country code: HK

Ref legal event code: DE

Ref document number: 40001179

Country of ref document: HK

GR01 Patent grant
GR01 Patent grant