CN109687266A - A kind of 2.79 microns of erbium lasers of high-peak power - Google Patents

A kind of 2.79 microns of erbium lasers of high-peak power Download PDF

Info

Publication number
CN109687266A
CN109687266A CN201811551993.6A CN201811551993A CN109687266A CN 109687266 A CN109687266 A CN 109687266A CN 201811551993 A CN201811551993 A CN 201811551993A CN 109687266 A CN109687266 A CN 109687266A
Authority
CN
China
Prior art keywords
laser
mirror
crystal
peak power
microns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811551993.6A
Other languages
Chinese (zh)
Inventor
张百涛
聂鸿坤
施炳楠
杨克建
何京良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shandong University
Original Assignee
Shandong University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shandong University filed Critical Shandong University
Priority to CN201811551993.6A priority Critical patent/CN109687266A/en
Publication of CN109687266A publication Critical patent/CN109687266A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/11Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1106Mode locking
    • H01S3/1112Passive mode locking
    • H01S3/1115Passive mode locking using intracavity saturable absorbers
    • H01S3/1118Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123Q-switching
    • H01S3/115Q-switching using intracavity electro-optic devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123Q-switching
    • H01S3/117Q-switching using intracavity acousto-optic devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/1601Solid materials characterised by an active (lasing) ion
    • H01S3/1603Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1608Solid materials characterised by an active (lasing) ion rare earth erbium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/163Solid materials characterised by a crystal matrix
    • H01S3/164Solid materials characterised by a crystal matrix garnet
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/163Solid materials characterised by a crystal matrix
    • H01S3/1645Solid materials characterised by a crystal matrix halide

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)

Abstract

The present invention relates to a kind of 2.79 microns of erbium lasers of high-peak power, belong to all solid state laser field, including laser pumping source A, focusing coupled system A, laser crystal, tune Q module, resonator mirror A resonant cavity mirror B;It is incident on laser crystal after the light line focus coupled system A that laser pumping source A is issued, resonator mirror A, laser crystal adjust Q module resonant cavity mirror B to constitute 2.79 mu m waveband erbium laser resonant cavities, and 2.79 mu m waveband mid-infrared lasers of generation are exported from resonator mirror B end mirror;Laser crystal is Er3+、Pr3+The laser crystal being co-doped with.The present invention uses laser pumped by pulsed laser source face-pumping structure, effectively overcome the low problem of flash lamp pumping laser repetition rate, the fuel factor of laser resonator is alleviated simultaneously, and good cavity mode matching is realized by the rational design of resonant cavity, obtain 2.79 μm of erbium lasers output of high efficiency, high-peak power, high light beam quality.

Description

A kind of 2.79 microns of erbium lasers of high-peak power
Technical field
The present invention relates to a kind of 2.79 microns of (μm) erbium lasers of high-peak power, belong to all solid state laser technology neck Domain.
Background technique
2.79 mu m waveband lasers can be used for infrared illumination, laser radar, photoelectronic warfare, free-space communication, chemistry and life The fields such as physical prospecting survey, environmental pollution monitoring.2.79 mu m waveband mid-infrared ultra-short pulse lasers are combed in middle infrared frequency, Ah Miao is ultrashort Pulse, artificial dynamic band gap and the detection of ground near space etc. have irreplaceable role.In addition it can be pumped Infrared optical parametric oscillator obtains the high power infrared laser of 5.0-8.0 μm of more long wavelength.Importantly, 2.79 mu m wavebands Laser is Chong Die with the strong absworption peak position of water, thus water is especially high to its absorptivity, makes it in the thin layer of more water soft tissues It is absorbed, therefore can accurately be cut under the premise of not generating any thermal damage to surrounding soft tissue, be fine surgery It performs the operation ideal service band, is widely used in biological and medical field.As noted previously, as 2.79 μm of mid-infrared laser tools There are important application background and very big demand, it has become the emphasis of recent domestic all-solid state laser area research.
Based on erbium (Er3+) ion doping crystalline material be LD directly pump generate 2.79 μm of mid-infrared lasers output master Want gain media.But Er3+There are the fluorescence lifetimes of " bottleneck "-upper laser level for 2.79 mu m waveband laser transition of ion Much smaller than the fluorescence lifetime of laser lower level, in stimulated emission process, the particle that transition is got off is accumulated on lower energy level, unfavorable Enough population inversion are kept in During laser emission.Therefore, 2.79 mu m waveband mid-infrared laser of Yao Shixian high efficiency is defeated Out, the particle (reducing its fluorescence lifetime) for effectively discharging lower energy level is just had to.
It has been investigated that by mixing certain energy levels and Er3+The close ion of energy level under ion, passes through interionic resonance energy Amount transfer can accelerate the speed for evacuating laser lower level particle, effectively reduce the fluorescence lifetime of lower energy level.
In a particular application, 2.79 μm of lasers of burst pulse, high-peak power are generally required, and Q-regulating technique is to obtain The technical way of the light source.Common Q-regulating technique includes electric-optically Q-switched, acousto-optic Q modulation and passive Q-adjusted (saturable absorber tune Q) etc..Previous burst pulse, high-peak power 2.79 μm of lasers all flash lamp is used to be pumped, using profile pump Mode results in following problems in this way: one, flash of light etc. in the spectral lines of emission in addition to by the very small part others of absorption of crystal all Heat can be generated, and then generates thermal lens and Depolarization, influences final beam quality and output energy;Two, side pumps Pu mode pattern match is poor, is difficult to obtain the laser output of high light beam quality;Three, the repetition frequency of flash lamp pumping laser pulse Rate is lower, generally less than 20Hz;Four, flash lamp pumping structure, lamp and laser crystal are required using the water flowing of high-power water-cooling machine It is cooling, cause whole system very huge, and cost is also very high.
Summary of the invention
In view of the deficiencies of the prior art, the present invention provides a kind of compact-sized (miniaturization), high efficiency, high light beam quality 2.79 microns of erbium lasers of high-peak power.
The invention adopts the following technical scheme:
A kind of 2.79 microns of erbium lasers of high-peak power, including laser pumping source A, focusing coupled system A, laser are brilliant Body adjusts Q module, resonator mirror A resonant cavity mirror B;
It is incident on laser crystal after the light line focus coupled system A that laser pumping source A is issued, resonator mirror A, laser Crystal adjusts Q module resonant cavity mirror B to constitute 2.79 mu m waveband erbium laser resonant cavities, 2.79 mu m waveband mid-infrared lasers of generation It is exported from resonator mirror B end mirror;
The laser crystal is erbium (Er3+), praseodymium (Pr3+) laser crystal that is co-doped with, crystalline host material can be pomegranate The crystal of stone structure such as YAG, GGG, YSGG, GAGG, GYSGG etc. are also possible to crystal of fluoride such as YLF, LLF, BYF, CaF2 Deng;
Laser crystal is erbium (Er3+), praseodymium (Pr3+) laser crystal that is co-doped with, ion doping concentration there are optimal proportion, Optimal proportion is 1:1~5:1, the laser lower level service life can be made to greatly reduce within this range, while to upper laser level shadow Very little is rung, so that the upper laser level service life be made to be greater than laser lower level, population inversion is advantageously implemented and obtains laser output;
Preferably, the invention also includes resonator mirror C, resonator mirror A, laser crystal adjust Q module, resonator mirror B harmonious The hysteroscope C that shakes constitutes 2.79 mu m waveband erbium laser resonant cavities.
Preferably, the invention also includes resonator mirror D, resonator mirror A, laser crystal adjust Q module, are resonator mirror B, humorous The hysteroscope C resonant cavity mirror D that shakes constitutes 2.79 mu m waveband erbium laser resonant cavities.
Preferably, the invention also includes focus coupled system B, a beam splitter and three reflecting mirrors, reflecting mirror can be 45 ° of reflecting mirrors of pump light, the laser pumping source A are both-end pumping structure, and both-end pumping structure issues laser pumping source A For light through being divided into the equal two parts of power after beam splitter, a portion is incident on laser crystal through over-focusing coupled system A On, another part is incident on laser crystal after beam splitter is reflected by reflecting mirror using focusing coupled system B.
It preferably, further include focusing coupled system B and laser pumping source B, laser pumping source A and laser pumping source B to issue Light respectively line focus coupled system A and focus coupled system B be incident on laser crystal.
It is further preferred that the host material of the laser crystal is the crystal or crystal of fluoride of garnet structure.
It is further preferred that the laser pumping source A is the semiconductor laser (LD) of pulsed operation, linear polarization can be , it is also possible to random polarization;It, then will be according to the requirement (polarization absorption characteristic) of laser crystal if it is linear polarization pump light Determine polarization direction.
The tune Q module, can be electric-optically Q-switched module, is also possible to acousto-optic Q modulation switch, is also possible to passive Q-adjusted mould Block is also opened to be the combination of both of the above;
Above-mentioned electric-optically Q-switched module, including quarter-wave plate and electro-optical Q-switch, wherein electro-optical Q-switch can use phosphorus One of acid dihydride potassium (KDP), rubidium oxygen titanium phosphate (RTP), lithium niobate (LN), barium silicate (LGS);Working method can adopt It can also be used with adding pressure type and move back pressure type;
Above-mentioned acousto-optic Q modulation module, acousto-optic Q-switching can use vitreous silica, can also use tellurium dioxide, can also be with Using crystal of barium tellurium aluminate;
Above-mentioned passive Q-adjusted module, saturable absorber can use different two-dimensional materials, including graphene, black phosphorus, One of transient metal sulfide, topological insulator or hetero-junctions of different two-dimensional materials, can also use semiconductor can Saturated absorption mirror (SESAM) is also possible to the laser crystal for having saturated absorption in the wave band, such as Fe:ZnSe.
Resonant cavity of the invention can be simple two mirrors chamber, be also possible to three resonator mirror refrative cavities, four resonator mirrors folding Folded chamber;Single-ended pump mode can be used, both-end pumping mode can also be used;
In the present invention, pump light works as pumping through being incident in laser crystal after over-focusing coupled system resonant cavity mirror Light energy generates laser when being more than the threshold value of 2.79 μm of oscillations, the laser of generation is exported from resonator mirror.
The invention has the benefit that
1) end pumping mode is used, the Mode Coupling of pump light and oscillation light can be effectively realized, ensure that laser Power, efficiency, beam quality and long-time stability with higher;
2) it is combined using pulse LD pumping and Q-regulating technique, Gao Zhongying (100Hz magnitude) burst pulse peak value can be obtained Power laser output;
3) laser crystal for using the codope of erbium praseodymium, can effectively reduce the service life of laser lower level, greatly improve pumping effect Rate;
4) entire laser structure is not required to water cooling, can be cooling using semiconductor cooler (TEC), so that whole system body Product substantially reduces.
The lower problem of flash lamp pumping laser repetition rate before the present invention effectively overcomes, while can alleviate sharp The fuel factor of optical cavity, and good cavity mode matching is realized by the rational design of resonant cavity, to obtain high efficiency, peak It is worth 2.79 μm of erbium lasers output of power, high light beam quality.By reasonably configuring optical element, the pumping configuration of optimization is set Meter, realize miniaturization, high efficiency, high-peak power, high light beam quality 2.79 mu m waveband mid-infrared laser devices.
Detailed description of the invention
Fig. 1 is a schematic structural view of Embodiment 1 of the present invention;
Fig. 2 is a schematic structural view of Embodiment 2 of the present invention;
Fig. 3 is a schematic structural view of Embodiment 3 of the present invention;
Fig. 4 is a schematic structural view of Embodiment 4 of the present invention;
Fig. 5 is a schematic structural view of Embodiment 5 of the present invention;
Wherein: 1, laser pumping source A, 2, focusing coupled system A, 3, resonator mirror A, 4, laser crystal, 5, tune Q module, 6, resonator mirror B, 7, resonator mirror C, 8, resonator mirror D, 9, focusing coupled system B, 10, beam splitter, 11,12,13 be reflection Mirror, 14, laser pumping source B.
Specific embodiment:
To keep the technical problem to be solved in the present invention, technical solution and advantage clearer, below in conjunction with attached drawing and tool Body embodiment is described in detail, but is not limited only to this, what the present invention did not elaborated, presses this field routine techniques.
Embodiment 1:
A kind of 2.79 microns of erbium lasers of high-peak power, as shown in Figure 1, including laser pumping source A1, focusing coupled systemes System A2, laser crystal 4, Q module 5, resonator mirror A3 resonant cavity mirror B6 are adjusted;
It is incident on laser crystal 4 after the light line focus coupled system A2 that laser pumping source A1 is issued, resonator mirror A3, Laser crystal 4 adjusts 5 resonant cavity mirror B6 of Q module to constitute 2.79 mu m waveband erbium laser resonant cavities, red in 2.79 mu m wavebands of generation Outer laser is exported from resonator mirror B6 end mirror;
Laser crystal 4 is Er3+、Pr3+The laser crystal being co-doped with, the ratio of doping concentration are 1:3.
The present embodiment 1 carries out end pumping using laser pumped by pulsed laser source, makes pump light and oscillation hot spot implementation pattern Match, high efficiency, the output of 2.79 mu m waveband mid-infrared laser of high light beam quality are obtained while alleviating laser crystal fuel factor, this Inventive structure it is simple and compact, it can be achieved that laser miniaturization.
Embodiment 2:
A kind of 2.79 microns of erbium lasers of high-peak power, structure is as described in Example 1, the difference is that such as Fig. 2 institute Show, further include resonator mirror C7, resonator mirror A1, laser crystal 4 adjust Q module 5, resonator mirror B6 resonant cavity mirror C7 to constitute 2.79 mu m waveband mid-infrared lasers of 2.79 mu m waveband erbium, three mirror laser resonator, generation are exported from resonator mirror B end mirror.
Embodiment 3:
A kind of 2.79 microns of erbium lasers of high-peak power, structure is as described in Example 2, the difference is that such as Fig. 3 institute Show, further includes resonator mirror D8, resonator mirror A1, laser crystal 4, adjust Q module 5, resonator mirror B6, resonator mirror C7 and resonance Hysteroscope D8 constitutes 2.79 mu m waveband erbium laser resonant cavities.
Embodiment 4:
A kind of 2.79 microns of erbium lasers of high-peak power, structure is as described in Example 2, the difference is that such as Fig. 4 institute Show, including focus coupled system B9, a beam splitter 10 and three reflecting mirrors 11,12,13, laser pumping source A1 is both-end pumping The light that laser pumping source A1 is issued is divided into the equal two parts of power later through beam splitter 10 by structure, both-end pumping structure, Middle a part is incident on laser crystal 4 through over-focusing coupled system A2, another part through beam splitter 10 by reflecting mirror 11,12, It is incident on laser crystal 4 after 13 reflections using focusing coupled system B9, constitutes both-end pumping structure, resonator mirror A3, swash Luminescent crystal 4 adjusts Q module 5, resonator mirror B6 resonant cavity mirror C7 to constitute 2.79 mu m waveband erbium, three mirror laser resonator, generation 2.79 mu m waveband mid-infrared lasers are exported from resonator mirror B6 end mirror.
Can be to avoid the waste of unpolarized pump light energy using both-end pumping structure, while laser crystal can be alleviated Fuel factor facilitates the 2.79 mu m waveband mid-infrared lasers output for obtaining high power, high light beam quality.
Embodiment 5:
A kind of 2.79 microns of erbium lasers of high-peak power, structure is as described in Example 2, the difference is that such as Fig. 5 institute Show, including focuses the light difference that coupled system B9 and laser pumping source B14, laser pumping source A1 and laser pumping source B14 are issued Line focus coupled system A2 and focusing coupled system B9 are incident on laser crystal 4;
Laser pumping source A1 is the semiconductor laser of pulsed operation;Adjusting Q module 5 is electric-optically Q-switched module.
The above is a preferred embodiment of the present invention, it is noted that for those skilled in the art For, without departing from the principles of the present invention, it can also make several improvements and retouch, these improvements and modifications It should be regarded as protection scope of the present invention.

Claims (10)

1. a kind of 2.79 microns of erbium lasers of high-peak power, which is characterized in that including laser pumping source A, focus coupled system A, laser crystal, tune Q module, resonator mirror A resonant cavity mirror B;
It is incident on laser crystal after the light line focus coupled system A that laser pumping source A is issued, resonator mirror A, laser are brilliant Body adjusts Q module resonant cavity mirror B to constitute 2.79 mu m waveband erbium laser resonant cavities, 2.79 mu m waveband mid-infrared lasers of generation from The output of resonator mirror B end mirror;
The laser crystal is Er3+、Pr3+The laser crystal being co-doped with.
2. 2.79 microns of erbium lasers of high-peak power according to claim 1, which is characterized in that further include resonator mirror C, resonator mirror A, laser crystal adjust Q module, resonator mirror B resonant cavity mirror C to constitute 2.79 mu m waveband erbium laser resonant cavities.
3. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that further include resonator mirror D, resonator mirror A, laser crystal adjust Q module, resonator mirror B, resonator mirror C resonant cavity mirror D 2.79 mu m waveband erbiums of composition to swash Optical cavity.
4. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that further include focusing coupling System B, a beam splitter and three reflecting mirrors, the laser pumping source A are both-end pumping structure, and both-end pumping structure is by laser Through being divided into the equal two parts of power after beam splitter, a portion enters the light that pumping source A is issued through over-focusing coupled system A It is mapped on laser crystal, another part is incident on laser crystalline substance using focusing coupled system B after beam splitter is reflected by reflecting mirror On body.
5. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that further include focusing coupling The light difference line focus coupled system A and focusing that system B and laser pumping source B, laser pumping source A and laser pumping source B are issued Coupled system B is incident on laser crystal.
6. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that the laser crystal Host material is the crystal or crystal of fluoride of garnet structure.
7. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that Er3+、Pr3+It adulterates dense The ratio of degree is 1:1~5:1.
8. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that the laser pumping source A is the semiconductor laser of pulsed operation, is linear polarization or random polarization.
9. 2.79 microns of erbium lasers of high-peak power according to claim 2, which is characterized in that the tune Q module is One of electric-optically Q-switched module, acousto-optic Q modulation switch, passive Q-adjusted module or any two kinds of combination;
Preferably, the electric-optically Q-switched module includes quarter-wave plate and electro-optical Q-switch, wherein electro-optical Q-switch be KDP, RTP, One of LN, LGS;The working method of the light tune Q module is using adding pressure type or moves back pressure type.
10. 2.79 microns of erbium lasers of high-peak power according to claim 9, which is characterized in that the acousto-optic Q modulation is opened It closes and uses vitreous silica, tellurium dioxide or crystal of barium tellurium aluminate;
Preferably, saturable absorber using graphene, black phosphorus, transient metal sulfide or is opened up in the passive Q-adjusted module Flutter insulator.
CN201811551993.6A 2018-12-19 2018-12-19 A kind of 2.79 microns of erbium lasers of high-peak power Pending CN109687266A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811551993.6A CN109687266A (en) 2018-12-19 2018-12-19 A kind of 2.79 microns of erbium lasers of high-peak power

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811551993.6A CN109687266A (en) 2018-12-19 2018-12-19 A kind of 2.79 microns of erbium lasers of high-peak power

Publications (1)

Publication Number Publication Date
CN109687266A true CN109687266A (en) 2019-04-26

Family

ID=66186812

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811551993.6A Pending CN109687266A (en) 2018-12-19 2018-12-19 A kind of 2.79 microns of erbium lasers of high-peak power

Country Status (1)

Country Link
CN (1) CN109687266A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111416271A (en) * 2020-02-29 2020-07-14 济南大学 Tunable frequency mode-locked laser based on two-dimensional material heterojunction and active modulation switch dual modulation
CN111628399A (en) * 2020-05-06 2020-09-04 西北核技术研究院 Passive pulse width compression method for electric excitation non-chained pulse HF laser and laser
CN111969398A (en) * 2020-08-06 2020-11-20 南京信息工程大学 Voltage-controllable all-solid-state passively Q-switched laser based on graphene saturable absorber
CN113036587A (en) * 2021-02-07 2021-06-25 中国科学院合肥物质科学研究院 Amplified mid-infrared laser based on erbium-doped single crystal fiber seed light source
CN113644536A (en) * 2021-07-08 2021-11-12 北京遥测技术研究所 High-vibration-resistance kilohertz miniaturized laser
CN113991412A (en) * 2021-09-15 2022-01-28 中国科学院福建物质结构研究所 Intermediate infrared Q-switched laser based on YIG magneto-optical crystal
CN114792925A (en) * 2022-06-21 2022-07-26 中国工程物理研究院应用电子学研究所 Microminiature intermediate infrared 3 micron waveband solid laser
CN117154527A (en) * 2023-08-31 2023-12-01 山西大学 Dual-color associated light beam generation device and method based on dual-doped gain medium
CN117277038A (en) * 2023-11-21 2023-12-22 武汉光谷航天三江激光产业技术研究院有限公司 Single-end pumping airborne pulse laser based on double-crystal serial connection and control method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102136670A (en) * 2011-01-27 2011-07-27 山西大学 Double-end end-pumped solid laser based on polarization coupling
CN102787357A (en) * 2012-08-14 2012-11-21 中国科学院合肥物质科学研究院 2.7 to 3 micron laser crystals and preparation method thereof
CN103614776A (en) * 2013-10-25 2014-03-05 中国科学院合肥物质科学研究院 Laser crystal with wavelength near 2.9 micron and preparation method thereof
CN104659643A (en) * 2015-02-12 2015-05-27 天津大学 0.9-mu m laser device for double-end polarization pump
CN105261924A (en) * 2015-11-09 2016-01-20 黑龙江工程学院 Solid-state laser generating green continuous laser and method thereof
CN107482425A (en) * 2017-10-16 2017-12-15 中国科学院合肥物质科学研究院 A kind of Gao Zhongying, single longitudinal mode, narrow spaces 2.79um laser pumping source
CN107732643A (en) * 2017-11-24 2018-02-23 深圳市杰普特光电股份有限公司 Single pump both-end pumping infrared laser

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102136670A (en) * 2011-01-27 2011-07-27 山西大学 Double-end end-pumped solid laser based on polarization coupling
CN102787357A (en) * 2012-08-14 2012-11-21 中国科学院合肥物质科学研究院 2.7 to 3 micron laser crystals and preparation method thereof
CN103614776A (en) * 2013-10-25 2014-03-05 中国科学院合肥物质科学研究院 Laser crystal with wavelength near 2.9 micron and preparation method thereof
CN104659643A (en) * 2015-02-12 2015-05-27 天津大学 0.9-mu m laser device for double-end polarization pump
CN105261924A (en) * 2015-11-09 2016-01-20 黑龙江工程学院 Solid-state laser generating green continuous laser and method thereof
CN107482425A (en) * 2017-10-16 2017-12-15 中国科学院合肥物质科学研究院 A kind of Gao Zhongying, single longitudinal mode, narrow spaces 2.79um laser pumping source
CN107732643A (en) * 2017-11-24 2018-02-23 深圳市杰普特光电股份有限公司 Single pump both-end pumping infrared laser

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111416271A (en) * 2020-02-29 2020-07-14 济南大学 Tunable frequency mode-locked laser based on two-dimensional material heterojunction and active modulation switch dual modulation
CN111628399A (en) * 2020-05-06 2020-09-04 西北核技术研究院 Passive pulse width compression method for electric excitation non-chained pulse HF laser and laser
CN111969398A (en) * 2020-08-06 2020-11-20 南京信息工程大学 Voltage-controllable all-solid-state passively Q-switched laser based on graphene saturable absorber
CN113036587A (en) * 2021-02-07 2021-06-25 中国科学院合肥物质科学研究院 Amplified mid-infrared laser based on erbium-doped single crystal fiber seed light source
CN113036587B (en) * 2021-02-07 2022-07-01 中国科学院合肥物质科学研究院 Amplified mid-infrared laser based on erbium-doped single crystal fiber seed light source
CN113644536A (en) * 2021-07-08 2021-11-12 北京遥测技术研究所 High-vibration-resistance kilohertz miniaturized laser
CN113644536B (en) * 2021-07-08 2023-03-03 北京遥测技术研究所 High-vibration-resistance kilohertz miniaturized laser
CN113991412A (en) * 2021-09-15 2022-01-28 中国科学院福建物质结构研究所 Intermediate infrared Q-switched laser based on YIG magneto-optical crystal
CN114792925A (en) * 2022-06-21 2022-07-26 中国工程物理研究院应用电子学研究所 Microminiature intermediate infrared 3 micron waveband solid laser
CN117154527A (en) * 2023-08-31 2023-12-01 山西大学 Dual-color associated light beam generation device and method based on dual-doped gain medium
CN117154527B (en) * 2023-08-31 2024-04-12 山西大学 Dual-color associated light beam generation device and method based on dual-doped gain medium
CN117277038A (en) * 2023-11-21 2023-12-22 武汉光谷航天三江激光产业技术研究院有限公司 Single-end pumping airborne pulse laser based on double-crystal serial connection and control method

Similar Documents

Publication Publication Date Title
CN109687266A (en) A kind of 2.79 microns of erbium lasers of high-peak power
CN101414729B (en) Self-mode-locking laser
CN204103242U (en) A kind of high power single longitudinal mode ultraviolet all-solid-state laser
CN101179176A (en) Semiconductor dual-end pumped third harmonic ultraviolet laser
CN104201556A (en) High-power single-longitudinal-mode ultraviolet all-solid-state laser
CN203747233U (en) Seed injection type vertical surface launch terahertz parameter generator
CN102005694B (en) Single-end pumped intra-cavity frequency doubled ultraviolet solid laser
Huang et al. Passively Q-switched Tm/Ho composite laser
CN103500911A (en) Multipoint vertical surface emitting terahertz parametric oscillator and application thereof
CN103811990A (en) Terahertz parameter source and application thereof on the basis of potassium titanium oxide arsenate crystals
CN104051943A (en) A diode pumped passive mode-locked Nd, Y: caF2all-solid-state femtosecond laser
CN103825189A (en) Seed injection type surface vertical launching terahertz parameter generator and application thereof
CN103972778B (en) A kind of all solid state femto-second laser of kerr lens mode locking Yb:YCOB of diode pumping
CN102208745A (en) Miniaturized passive Q-switching eye-safe Raman laser
CN106058632B (en) A kind of adjustable passive Q-adjusted raman laser system of pulse energy based on bonded crystals
CN111262120A (en) Based on mix Nd3+Method for generating 1.8-micron waveband pulse laser of ceramic optical fiber
CN102097737A (en) High pulse repetition frequency ultra-short pulse laser method
CN208368938U (en) A kind of Q-switched laser of semiconductor laser pumping
CN202423819U (en) Laser diode end-pump ultraviolet laser generation device
CN104901157A (en) High-power side-pumping 1525nm (human-eye safe waveband) automatic self-raman laser
CN105098589A (en) Dual-wavelength Raman mode locked laser
CN101159364A (en) LD terminal pump Nd:YAG/SrWO4/KTP yellow light laser
Yuan et al. Dual-end-pumped high-power Cr 2+: ZnS passively Q-switched Ho: YAG ceramic laser
CN103001113B (en) 473nm electro-optic q-switch laser
CN211859139U (en) All-solid-state femtosecond laser of Kerr mode-locked ytterbium-doped lanthanum gadolinium silicate crystal

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20190426

RJ01 Rejection of invention patent application after publication