CN109643057A - 掩膜板的制造方法和掩膜板 - Google Patents

掩膜板的制造方法和掩膜板 Download PDF

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Publication number
CN109643057A
CN109643057A CN201780053958.9A CN201780053958A CN109643057A CN 109643057 A CN109643057 A CN 109643057A CN 201780053958 A CN201780053958 A CN 201780053958A CN 109643057 A CN109643057 A CN 109643057A
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CN
China
Prior art keywords
layer
mask plate
substrate
enhancement layer
electroconductive magnetic
Prior art date
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Pending
Application number
CN201780053958.9A
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English (en)
Inventor
赵小虎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Royole Technologies Co Ltd
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Shenzhen Royole Technologies Co Ltd
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Application filed by Shenzhen Royole Technologies Co Ltd filed Critical Shenzhen Royole Technologies Co Ltd
Publication of CN109643057A publication Critical patent/CN109643057A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种掩膜板(100)的制造方法，包括以下步骤。在基板(10)上形成加强层(20)；在加强层(20)上形成导电磁性层(30)；对带有加强层(20)的导电磁性层(30)进行第一图案化处理以得到形成在基板(10)上的图案化结构层(22)；对带有图案化结构层(22)的基板(10)进行第二图案化处理以形成掩膜板(100)。

Description

PCT国内申请，说明书已公开。

Claims (9)

  1. PCT国内申请，权利要求书已公开。
CN201780053958.9A 2017-07-21 2017-07-21 掩膜板的制造方法和掩膜板 Pending CN109643057A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2017/093949 WO2019014947A1 (zh) 2017-07-21 2017-07-21 掩膜板的制造方法和掩膜板

Publications (1)

Publication Number Publication Date
CN109643057A true CN109643057A (zh) 2019-04-16

Family

ID=65014850

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780053958.9A Pending CN109643057A (zh) 2017-07-21 2017-07-21 掩膜板的制造方法和掩膜板

Country Status (2)

Country Link
CN (1) CN109643057A (zh)
WO (1) WO2019014947A1 (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104755648A (zh) * 2012-10-30 2015-07-01 株式会社V技术 成膜掩膜
CN104797733A (zh) * 2012-11-15 2015-07-22 株式会社V技术 成膜掩模的制造方法
CN205687999U (zh) * 2016-06-07 2016-11-16 光宏光电技术（深圳）有限公司 一种用于蒸镀oled显示面板的掩模板
CN106795618A (zh) * 2014-10-15 2017-05-31 夏普株式会社 蒸镀掩模、蒸镀装置、蒸镀方法以及蒸镀掩模的制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003272838A (ja) * 2002-03-14 2003-09-26 Dainippon Printing Co Ltd マスキング部材
JP2008255449A (ja) * 2007-04-09 2008-10-23 Kyushu Hitachi Maxell Ltd 蒸着マスクとその製造方法
CN103205678A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀用掩模板的制备方法
CN103205697B (zh) * 2012-01-16 2016-03-02 昆山允升吉光电科技有限公司 蒸镀掩模板及其制造方法
CN105720083A (zh) * 2016-04-01 2016-06-29 昆山允升吉光电科技有限公司 一种高精度蒸镀用复合掩模板组件
CN106847505A (zh) * 2017-01-17 2017-06-13 国华自然科学研究院（深圳）有限公司 电能储存装置的制作方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104755648A (zh) * 2012-10-30 2015-07-01 株式会社V技术 成膜掩膜
CN104797733A (zh) * 2012-11-15 2015-07-22 株式会社V技术 成膜掩模的制造方法
CN106795618A (zh) * 2014-10-15 2017-05-31 夏普株式会社 蒸镀掩模、蒸镀装置、蒸镀方法以及蒸镀掩模的制造方法
CN205687999U (zh) * 2016-06-07 2016-11-16 光宏光电技术（深圳）有限公司 一种用于蒸镀oled显示面板的掩模板

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Publication number Publication date
WO2019014947A1 (zh) 2019-01-24

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Address after: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province

Applicant after: Shenzhen Ruoyu Technology Co.,Ltd.

Address before: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province

Applicant before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd.

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Application publication date: 20190416