CN109643057A - 掩膜板的制造方法和掩膜板 - Google Patents
掩膜板的制造方法和掩膜板 Download PDFInfo
- Publication number
- CN109643057A CN109643057A CN201780053958.9A CN201780053958A CN109643057A CN 109643057 A CN109643057 A CN 109643057A CN 201780053958 A CN201780053958 A CN 201780053958A CN 109643057 A CN109643057 A CN 109643057A
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- CN
- China
- Prior art keywords
- layer
- mask plate
- substrate
- enhancement layer
- electroconductive magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
一种掩膜板(100)的制造方法,包括以下步骤。在基板(10)上形成加强层(20);在加强层(20)上形成导电磁性层(30);对带有加强层(20)的导电磁性层(30)进行第一图案化处理以得到形成在基板(10)上的图案化结构层(22);对带有图案化结构层(22)的基板(10)进行第二图案化处理以形成掩膜板(100)。
Description
PCT国内申请,说明书已公开。
Claims (9)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2017/093949 WO2019014947A1 (zh) | 2017-07-21 | 2017-07-21 | 掩膜板的制造方法和掩膜板 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN109643057A true CN109643057A (zh) | 2019-04-16 |
Family
ID=65014850
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201780053958.9A Pending CN109643057A (zh) | 2017-07-21 | 2017-07-21 | 掩膜板的制造方法和掩膜板 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN109643057A (zh) |
WO (1) | WO2019014947A1 (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104755648A (zh) * | 2012-10-30 | 2015-07-01 | 株式会社V技术 | 成膜掩膜 |
CN104797733A (zh) * | 2012-11-15 | 2015-07-22 | 株式会社V技术 | 成膜掩模的制造方法 |
CN205687999U (zh) * | 2016-06-07 | 2016-11-16 | 光宏光电技术(深圳)有限公司 | 一种用于蒸镀oled显示面板的掩模板 |
CN106795618A (zh) * | 2014-10-15 | 2017-05-31 | 夏普株式会社 | 蒸镀掩模、蒸镀装置、蒸镀方法以及蒸镀掩模的制造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003272838A (ja) * | 2002-03-14 | 2003-09-26 | Dainippon Printing Co Ltd | マスキング部材 |
JP2008255449A (ja) * | 2007-04-09 | 2008-10-23 | Kyushu Hitachi Maxell Ltd | 蒸着マスクとその製造方法 |
CN103205678A (zh) * | 2012-01-16 | 2013-07-17 | 昆山允升吉光电科技有限公司 | 蒸镀用掩模板的制备方法 |
CN103205697B (zh) * | 2012-01-16 | 2016-03-02 | 昆山允升吉光电科技有限公司 | 蒸镀掩模板及其制造方法 |
CN105720083A (zh) * | 2016-04-01 | 2016-06-29 | 昆山允升吉光电科技有限公司 | 一种高精度蒸镀用复合掩模板组件 |
CN106847505A (zh) * | 2017-01-17 | 2017-06-13 | 国华自然科学研究院(深圳)有限公司 | 电能储存装置的制作方法 |
-
2017
- 2017-07-21 WO PCT/CN2017/093949 patent/WO2019014947A1/zh active Application Filing
- 2017-07-21 CN CN201780053958.9A patent/CN109643057A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104755648A (zh) * | 2012-10-30 | 2015-07-01 | 株式会社V技术 | 成膜掩膜 |
CN104797733A (zh) * | 2012-11-15 | 2015-07-22 | 株式会社V技术 | 成膜掩模的制造方法 |
CN106795618A (zh) * | 2014-10-15 | 2017-05-31 | 夏普株式会社 | 蒸镀掩模、蒸镀装置、蒸镀方法以及蒸镀掩模的制造方法 |
CN205687999U (zh) * | 2016-06-07 | 2016-11-16 | 光宏光电技术(深圳)有限公司 | 一种用于蒸镀oled显示面板的掩模板 |
Also Published As
Publication number | Publication date |
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WO2019014947A1 (zh) | 2019-01-24 |
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PB01 | Publication | ||
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Address after: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province Applicant after: Shenzhen Ruoyu Technology Co.,Ltd. Address before: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province Applicant before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd. |
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RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190416 |