CN109602636A - A kind of production technology of preservative free facial mask - Google Patents
A kind of production technology of preservative free facial mask Download PDFInfo
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- CN109602636A CN109602636A CN201910082053.5A CN201910082053A CN109602636A CN 109602636 A CN109602636 A CN 109602636A CN 201910082053 A CN201910082053 A CN 201910082053A CN 109602636 A CN109602636 A CN 109602636A
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/736—Chitin; Chitosan; Derivatives thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0212—Face masks
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/64—Proteins; Peptides; Derivatives or degradation products thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/735—Mucopolysaccharides, e.g. hyaluronic acid; Derivatives thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/08—Radiation
- A61L2/081—Gamma radiation
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
- A61Q17/005—Antimicrobial preparations
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
- A61K2800/20—Chemical, physico-chemical or functional or structural properties of the composition as a whole
- A61K2800/30—Characterized by the absence of a particular group of ingredients
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Abstract
The present invention relates to daily cosmetics technical fields, and in particular to a kind of production technology of preservative free facial mask.It is utilized in the production technology of preservative free facial mask provided by the invention60Co- gamma-ray irradiation, microorganism can effectively be killed, guarantee that the effective component of facial mask essence in facial mask is not destroyed, room temperature is protected from light storage 2-3, facial mask never degenerates, fails, and overcomes the shortcomings that traditional mounted facial mask sterilizes incomplete, operation repetition and destructible effective component using high pressure steam sterilization, it can be achieved that producing in enormous quantities, sterilizing, it is simple and easy, save resource.In addition, chitosan oligosaccharide mucus fiber passes through in preservative free facial mask preparation of the invention60Co- gamma-rays is that 3kGy-8kGy is irradiated with irradiation dose, can also increase sticking nature, hygroscopicity and the pliability of facial mask, promote moisture absorption.
Description
Technical field
The present invention relates to daily cosmetics technical fields, and in particular to a kind of production technology of preservative free facial mask.
Background technique
With the improvement of people's life quality, especially people seeking beauty, pursues a daily facial mask, to maintain the bright of skin
Damp, smooth, whitening, thus it is higher and higher to the demand of the daily skin-protection product such as facial mask, for the docile property and benefit for guaranteeing facial mask
Water moistening effect, the water content in mask product is very more, causes it vulnerable to the pollution of bacterium and fungi, because of the master in facial mask
Wanting functional component is that the ingredients such as polysaccharide, amino acid and polypeptide will affect the activity of effective component if microbial growth can not be prevented
And go bad.
To protect a product from microbial contamination, going bad, extends the shelf life of product, commonly use to be added in the prior art and prevent
Rotten agent prevents the breeding of microorganism, but the addition of preservative will increase the irritation to skin, and skin is caused flush, erythema occur
Sensitization phenomenon, if but the usage amount of adding preservative agent or preservative is not inadequate, and the problem of not can solve microbial growth, and
And though preservative can inhibit the breeding of bacterium and fungi, bacterium and fungi can not be killed, also needs to combine sterilization steps, jointly
Guarantee the shelf-life of facial mask.
Therefore, in facial mask production process, sterilization functions are very crucial, and patent document CN201510514030.9 discloses one
Facial mask obtained and packing material are put into togerther in sterilizer by the sterilization process method of kind preservative free facial mask, this method, need weight
It is added with temperature, pressurization, constant temperature sterilizes 1-3 times, and each 10-180min belongs to moist hear heat test, which can be realized batch
Sterilizing, facial mask bag are protected without deformation expansion, fracture phenomena, facial mask absolutesterility, shelf life of products, but in sterilization process
To guarantee to kill gemma, need to sterilize repeatedly, it is difficult to guarantee polysaccharide, amino acid, growth factor and the vitamin isoreactivity in facial mask
The effect of ingredient is not destroyed, and influences facial mask.
Patent document CN201710890931.7 discloses a plant extraction eye sticker, and the sterilization method in the invention is that will plant extraction
After the stoste of eye sticker is heated to 80-100 DEG C of maintenance 1-2h, it is down to room temperature, operates 2 times and is concentrated repeatedly, it is rear again to fill stoste
In pleasing to the eye out pocket, ordinary irradiation 1-2h further sterilizes, sterilizes, and can reach sterilization effect.High temperature is combined in the sterilizing methods
Sterilizing and ordinary irradiation sterilize two ways, can not can avoid addition preservative still: parahydroxyacet-ophenone and hexylene glycol to prevent
Only microbial growth.
Therefore, it is easy still to lack a kind of production technology on the market, without adding the facial mask of preservative.
Summary of the invention
The present invention is directed to the deficiency of above-mentioned conventional facial mask sterilizing methods, it is desirable to provide a kind of simpler, effective without anti-
The production technology of rotten agent facial mask is not added anti-in the case where guaranteeing that facial mask active constituent is not destroyed in prepared facial mask
Rotten agent can also long-term preservation, extend the shelf storage life of product, cost reduced, for commercially producing and using.
The present invention provides a kind of production technology of preservative free facial mask, production stage is as follows:
S1: the preparation of modification nonwoven cloth facial mask: chitosan oligosaccharide Essence fiber being made into netted, with a thickness of 0.2-0.5mm, is dried
Dry, the round facial mask of cut growth 20 ± 3cm, wide 18 ± 2cm are to get modification nonwoven cloth facial mask；
S2: by modification nonwoven cloth facial mask made from step S1 be immersed in volume be 20-30mL facial mask essence in after, be packed into
It in facial mask bag, tiles, vanning is placed under oxygen-free environment and uses60Co- gamma-ray irradiation, irradiation dose 3.0kGy-8.0kGy, sealing
To obtain the final product.
Preferably, the production stage of the preservative free facial mask is as follows:
S1: the preparation of modification nonwoven cloth facial mask: chitosan oligosaccharide Essence fiber being made into netted, with a thickness of 0.3-0.4mm, is dried
Dry, the round facial mask of cut growth 20 ± 3cm, wide 18 ± 2cm are to get modification nonwoven cloth facial mask；
S2: by modification nonwoven cloth facial mask made from step S1 be immersed in volume be 20mL facial mask essence in after, be packed into face
It in film bag, tiles, vanning is placed under oxygen-free environment60Co- gamma-ray irradiation, irradiation dose 3.0kGy-8.0kGy, is sealed to obtain the final product.
Preferably, the chitosan oligosaccharide Essence fiber in the step S1 the preparation method is as follows:
A: chitosan oligosaccharide is added to the water, and dropwise addition second acid for adjusting pH is 4-5, and stirring and dissolving, being configured to mass concentration is 5-
10% chitosan oligosaccharide aqueous solution, is added epoxychloropropane thereto, is warming up to 60-75 DEG C, is stirred to react 2-3h, obtains material A；
B: the pH for adjusting material A is 8-9, is added in viscose rayon, is stirred to react 1-2h, and decompression, which filters, removes epoxy chlorine
Propane obtains material B；
C: material B is tiled, and is used60Co- gamma-ray irradiation penetrates 10-15min, and being added with material B mass ratio is (40-60): 1
Distilled water in, impregnate 4-6h and material B wet spinning obtained into chitosan oligosaccharide Essence fiber.
Preferably, the mass ratio of epoxychloropropane and chitosan oligosaccharide is (0.2-0.4) in the step A: 1.
Preferably, the mass ratio of viscose rayon and chitosan oligosaccharide is (2.4-2.8) in the step B: 1.
Preferably, in the step C60The dosage of Co- gamma-ray irradiation is 3.0kGy-5.0kGy.
Preferably, in the step C by material B tile with a thickness of 2 ± 0.5cm.
Preferably, the facial mask essence in the step S2 contains following component and its parts by weight: ethoxy is deacetylated
4-6 parts of chitin, 5-6 parts of beta glucan, 2-3 parts of Porcine HGF, 0.1-0.8 parts of sodium hyaluronate and ultrapure water 25-40
Part；
The facial mask essence the preparation method comprises the following steps: by ethoxy chitosan, beta glucan and cell growth factor
Son be added 40-50 DEG C of water in, stirring and dissolving is uniform, adds sodium hyaluronate, stir evenly to get.
The production technology of preservative free facial mask provided in the present invention is first to prepare modification nonwoven cloth using irradiation technique
Facial mask: by chitosan oligosaccharide after 3.0kGy-8.0kGy radiation treatment, the Essence being prepared can kill a large amount of bacteriums and true
Bacterium, purity is high.Inventor also also found after irradiation, and the modification nonwoven cloth facial mask being prepared is more soft, and viscosity is high, weave
Screen cloth can effectively keep moisture, solve the problems, such as that the non-woven fabrics facial mask sticking nature of the prior art is poor, which may be with shell widow
After sugar is irradiated, structure changes, and the effect for foring the stronger small molecule chitosan oligosaccharide of adhesiveness is related.
In further production process, the modification nonwoven cloth facial mask of drying is immersed in facial mask essence and is encapsulated, cased
Afterwards, it passes through60Co- gamma-rays with irradiation dose 3.0kGy-8.0kGy irradiation, can effectively by facial mask bacterium and fungi kill, hair
Bright people also found that beta glucan is added in facial mask essence can prevent from irradiating, and in Long-Duration Exposure, guarantee facial mask essence
Interior effective component is not inactivated because of irradiation, guarantees its stability.Meanwhile the present invention is found surprisingly that, will have the nothing of chitosan oligosaccharide
Woven fabric facial mask is mixed with Essence, can not only significantly improve the sterilizing ability of facial mask, also acts as certain moistening effect.
Compared with prior art, the production technology of preservative free facial mask of the invention has the advantage that
(1) in preservative free facial mask production technology of the invention, the modification nonwoven cloth facial mask provided increases the patch of facial mask
Clothes property, moisture retention and flexibility.
(2) in the production technology of preservative free facial mask provided by the invention, the facial mask being prepared is utilized60Co- gamma-rays
Irradiation, while killing microorganism, it is also ensured that the effective component in facial mask essence is not destroyed, and is protected from light facial mask room temperature and is deposited
2-3 is put to never degenerate, fail.
(3) it in the production technology of preservative free facial mask provided by the invention, overcomes traditional mounted facial mask and utilizes high pressure
The shortcomings that steam sterilizing operation repeats, destructible effective component, adds a large amount of preservatives is, it can be achieved that produce in enormous quantities, sterilizing, letter
It is single easy, save resource.
Specific embodiment
Below in conjunction with specific embodiment, the present invention will be described in detail, herein illustrative examples and explanation of the invention
For explaining the present invention, but it is not as a limitation of the invention.
The preparation of embodiment 1, chitosan oligosaccharide Essence fiber
The chitosan oligosaccharide Essence fiber the preparation method is as follows:
Chitosan oligosaccharide is added to the water by A, and it is 4 that second acid for adjusting pH, which is added dropwise, stirring and dissolving, is configured to the shell that mass concentration is 8%
The epoxychloropropane for being 0.3:1 with the mass ratio of chitosan oligosaccharide is added thereto, is warming up to 70 DEG C, is stirred to react for oligosaccharides aqueous solution
2.5h obtains material A；
The pH that B adjusts material A is 8, is added in the viscose rayon for being 2.5:1 with the mass ratio of chitosan oligosaccharide, is stirred to react
2h, decompression, which filters, removes epoxychloropropane, obtains material B；
C tiles material B, with a thickness of 2 ± 0.5cm use60Co- gamma-ray irradiation is penetrated, and the dosage of irradiation is 3.0kGy-
5.0kGy, be added with material B mass ratio be 50:1 distilled water in, impregnate 5h, by material B wet spinning to get.
The production technology of embodiment 2, preservative free facial mask
The production craft step of the preservative free facial mask is as follows:
S1: chitosan oligosaccharide Essence fiber made from embodiment 1 preparation of modification nonwoven cloth facial mask: is made into netted, thickness
For 0.2mm, drying, the round facial mask of cut growth 17cm, wide 16cm to get；
S2: the preparation of facial mask essence: by 5 parts of ethoxy chitosan, 5 parts of beta glucan, Porcine HGF
2.5 parts be added 40 DEG C 30 parts of water in, stirring and dissolving is uniform, adds 0.5 part of sodium hyaluronate, stir evenly to get；
S3: modification nonwoven cloth facial mask made from step S1 is immersed in the 20mL facial mask essence that step S2 is prepared
Afterwards, it is fitted into facial mask bag, tiles, vanning is placed in 35 DEG C of oxygen-free environments60Co- gamma-ray irradiation, irradiation dose 4.0kGy-
6.0kGy, irradiation time 2h, is sealed to obtain the final product.
The production technology of embodiment 3, preservative free facial mask
The production craft step of the preservative free facial mask is as follows:
S1: chitosan oligosaccharide Essence fiber made from embodiment 1 preparation of modification nonwoven cloth facial mask: is made into netted, thickness
For 0.5mm, drying, the round facial mask of cut growth 23cm, wide 20cm to get；
S2: the preparation of facial mask essence: by 4 parts of ethoxy chitosan, 6 parts of beta glucan, Porcine HGF 3
Part be added 50 DEG C 30 parts of water in, stirring and dissolving is uniform, adds 0.8 part of sodium hyaluronate, stir evenly to get；
S3: modification nonwoven cloth facial mask made from step S1 is immersed in the 20mL facial mask essence that step S2 is prepared
In, it is fitted into facial mask bag, tiles, vanning is placed in 40 DEG C of oxygen-free environments60Co- gamma-ray irradiation, irradiation dose 5.0kGy-
8.0kGy, irradiation time 2h, is sealed to obtain the final product.
The production technology of embodiment 4, preservative free facial mask
The production craft step of the preservative free facial mask is as follows:
S1: the preparation of modification nonwoven cloth facial mask: chitosan oligosaccharide mucus fiber made from embodiment 1 is made into it is netted, with a thickness of
0.35mm, drying, the round facial mask of cut growth 20cm, wide 18cm to get；
S2: the preparation of facial mask essence: by 5 parts of ethoxy chitosan, 5.5 parts of beta glucan, cell growth factor
Son 2.5 parts be added 45 DEG C 30 parts of water in, stirring and dissolving is uniform, adds 0.5 part of sodium hyaluronate, stir evenly to get；
S3: modification nonwoven cloth facial mask made from step S1 is immersed in the 20mL facial mask essence that step S2 is prepared
In, it is fitted into facial mask bag, tiles, vanning is placed in 37 DEG C of oxygen-free environments60Co- gamma-ray irradiation, irradiation dose 5.0kGy-
8.0kGy is sealed to obtain the final product.
The production technology of comparative example 1, preservative free facial mask
The production craft step of the preservative free facial mask is similar to Example 4；
Difference with embodiment 4 is, the chitosan oligosaccharide in the step S1 it is mucofibrous the preparation method is as follows:
Chitosan oligosaccharide is added to the water by A, and it is 4.0 that second acid for adjusting pH, which is added dropwise, stirring and dissolving, and being configured to mass concentration is 8%
The epoxychloropropane for being 0.3:1 with the mass ratio of chitosan oligosaccharide is added in chitosan oligosaccharide aqueous solution thereto, is warming up to 70 DEG C, stirring is anti-
2.5h is answered, material A is obtained；
The pH that B adjusts material A is 8
, it is added in the viscose rayon for being 2.5:1 with the mass ratio of chitosan oligosaccharide, is stirred to react 2h, decompression, which filters, removes decyclization
Oxygen chloropropane obtains material B；
C tiles material B, with a thickness of 2cm use60Co- gamma-ray irradiation is penetrated, and the dosage of irradiation is 500Gy, addition and material
B mass ratio be 50:1 distilled water in, impregnate 5h, by material B wet spinning to get.
The production technology of comparative example 2, preservative free facial mask
The production craft step of the preservative free facial mask is similar to Example 4；
Difference with embodiment 4 is in the step S2 in the preparation of facial mask essence that replacing β-Portugal with chitosan oligosaccharide gathers
Sugar.
The production technology of comparative example 3, preservative free facial mask
The production craft step of the preservative free facial mask is similar to Example 4；
Difference with embodiment 4 is to encapsulate facial mask in the step S3, damp and hot using high pressure after being fitted into facial mask bag
Sterilization substitutes irradiation sterilization method.
The fungistatic effect test of test example one, preservative free facial mask
1. subjects: the preservative free that commercially available non-woven fabrics MASQUE APAISANT HYDRATANT, embodiment 2-4 and comparative example 1-3 are prepared
Facial mask.
2. test method:
Nothing made from commercially available common MASQUE APAISANT HYDRATANT (a leaf MASQUE APAISANT HYDRATANT), embodiment 2-4 and comparative example 1-3 is tested respectively
The taking-up of preservative facial mask is divided, at 40 DEG C, under conditions of humidity is 60 ± 5%, be protected from light lower storage 3 months, 6 months, 9 months and
It 12 months, records on facial mask that whether there is or not bacterial growths and mildew, and records bacterium and the mould group number of same area.
3. test result:
Test result is as shown in table 1.
The stability test of table 1. embodiment 2-4 and comparative example 1-5
Accelerated stability test the results show that commercially available MASQUE APAISANT HYDRATANT begins with a small amount of bacterium and mould after 9 months breeds,
Bacterium and fungus growth quantitative change are more after 12 months, and facial mask that embodiment 2-4 is prepared is stored and just begins within 1 year bacterium and mould
The growth of bacterium, the sterilization for illustrating irradiation technique well, compared with commercially available MASQUE APAISANT HYDRATANT, can extend the facial mask shelf-life.
Comparative example 1, because irradiation dose is 500Gy in the preparation process of chitosan oligosaccharide viscose rayon, since dosage is relatively low, still
Good sterilization effect is not achieved, just detects bacterium and mould after 3 months.
After replacing beta glucan with chitosan oligosaccharide in comparative example 2, bacterium starts obviously to breed after six months, illustrates that β-Portugal is poly-
Sugar has certain fungistatic effect, and fungistatic effect, than being applied alone the effect of chitosan oligosaccharide good, possible cause is to contain simultaneously in facial mask
The fungistatic effect of beta glucan and chitosan oligosaccharide (chitosan oligosaccharide viscose rayon) is more preferable.
Comparative example 3 can turn out a small amount of bacterium and mildew after storage 3 months using high pressure moist heat sterilization, with storage
The quantity of the extension of time, bacterium and mildew is continuously increased, and illustrates that traditional high pressure sterilization effect does not have spoke provided by the invention
It is good according to sterilization effect.
In conclusion the effect that the irradiation technique in the facial mask production technology provided by the invention kills microorganism is good, gram
It has taken prior art mesohigh moist heat sterilization and has sterilized incomplete phenomenon.
Test example two, the moisturizing effect of preservative free facial mask
1. subjects: preservative free facial mask made from commercially available non-woven fabrics MASQUE APAISANT HYDRATANT, embodiment 2-4 and comparative example 1-2
Preservative free facial mask obtained.
2. test method:
Subject: 60 people of healthy women without allergies, subject volunteer to be added.
Age: 18-35 years old.
Subject is divided into 6 groups, every group of 10 people are obtained without anti-corrosion by commercially available common MASQUE APAISANT HYDRATANT, embodiment 2-4 respectively
Preservative free facial mask made from agent facial mask and comparative example 1-2 is spread on subject's arm, and moisture content is measured after 20min.
3. test result:
Test result such as table 2.
2. moisture of skin of table
| Group | Moisture content % |
| Commercially available non-woven fabrics MASQUE APAISANT HYDRATANT | 65.5±2.4 |
| Embodiment 2 | 72.4±2.1 |
| Embodiment 3 | 75.3±1.8 |
| Embodiment 4 | 78.6±3.4 |
| Comparative example 1 | 45.3±2.7 |
| Comparative example 2 | 60.1±1.3 |
As seen from the results in Table 2, the moisture of skin for the preservative free facial mask that embodiment 2-4 is made 70% or more,
The preservative free facial mask that middle embodiment 4 is made is up to 78.6 ± 3.4%, and preservative free made from comparative example 1, comparative example 3
Facial mask moisture is respectively 45.3 ± 2.7% and 51.1 ± 1.3%, lower than the 65.5 ± 2.4% of commercially available MASQUE APAISANT HYDRATANT, far below real
The preservative free facial mask that example 4 is made is applied,
The moisturizing Contrast on effect for the preservative free facial mask that comparative example 1 and each embodiment are prepared, illustrates chitosan oligosaccharide viscose glue
Fiber warp60After Co- gamma-ray irradiation, because chitosan oligosaccharide molecule is degraded, the viscosity of mask substrate increases, and makes to weave the modification come
The moistening effect of non-woven fabrics facial mask enhances, and promotes absorption of the skin to facial mask essence.
The moisturizing Contrast on effect of preservative free facial mask water made from comparative example 2 and each embodiment illustrates to add beta glucan
It can guarantee that effective component is not inactivated because of irradiation in facial mask, also have the effect of increasing facial mask replenishing water and preserving moisture.
Test example 3: preservative free facial mask performance evaluation
1. test material: preservative free prepared by commercially available non-woven fabrics MASQUE APAISANT HYDRATANT, embodiment 4, comparative example 1 and comparative example 3
Facial mask.
2. subjects: 80 volunteers.
3. test method: 80 volunteers being equally divided into 4 groups, use a commercially available MASQUE APAISANT HYDRATANT (leaf moisturizing face respectively
Film), the preservative free non-woven fabrics facial mask for preparing of the embodiment of the present invention 4 and comparative example 1, comparative example 3, respectively to the softness of facial mask
Property, hygroscopicity, gas permeability and patch skin etc. performances carry out sensory evaluation (scoring range 0-10, score nonwoven used in higher expression
The flexibility of cloth facial mask, hygroscopicity, gas permeability and patch skin are better, and irritation is smaller), the results are shown in Table 3.
3 embodiment and comparative example preservative free facial mask Performance Score of table
It learns according to the result of table 3:
Preservative free non-woven fabrics facial mask prepared by the embodiment of the present invention 4 is equal in flexibility, hygroscopicity, gas permeability and patch skin
Higher than preservative free non-woven fabrics facial mask prepared by comparative example 1 and comparative example 3, illustrate that irradiation dose is not in 3kGy-8kGy when sterilizing
In range, flexibility, hygroscopicity, gas permeability and the patch skin of facial mask are all than the preservative free non-woven fabrics facial mask of the preparation of embodiment 4
Difference, even lower than commercially available MASQUE APAISANT HYDRATANT, may with when preparing chitosan oligosaccharide viscose rayon without irradiation, not because of chitosan oligosaccharide molecule
It degrades, flexibility, hygroscopicity, gas permeability and the patch skin decline of facial mask.
The foregoing is only a preferred embodiment of the present invention, but scope of protection of the present invention is not limited thereto,
Anyone skilled in the art in the technical scope disclosed by the present invention, according to the technique and scheme of the present invention and its
Inventive concept is subject to equivalent substitution or change, should be covered by the protection scope of the present invention.
Claims (8)
1. a kind of production technology of preservative free facial mask, which is characterized in that production stage is as follows:
S1: the preparation of modification nonwoven cloth facial mask: chitosan oligosaccharide Essence fiber is made into it is netted, with a thickness of 0.2-0.5mm, drying,
The round facial mask of cut growth 20 ± 3cm, wide 18 ± 2cm are to get modification nonwoven cloth facial mask；
S2: by modification nonwoven cloth facial mask made from step S1 be immersed in volume be 20-30mL facial mask essence in after, be packed into facial mask
It in bag, tiles, vanning is placed under oxygen-free environment and uses60Co- gamma-ray irradiation, irradiation dose 3.0kGy-8.0kGy, sealing, i.e.,
?.
2. the production technology of preservative free facial mask according to claim 1, which is characterized in that the shell in the step S1 is few
Sugared Essence fiber the preparation method is as follows:
A: chitosan oligosaccharide is added to the water, and dropwise addition second acid for adjusting pH is 4-5, and stirring and dissolving, being configured to mass concentration is 5-10%'s
Epoxychloropropane is added in chitosan oligosaccharide aqueous solution thereto, is warming up to 60-75 DEG C, is stirred to react 2-3h, obtains material A；
B: the pH for adjusting material A is 8-9, is added in viscose rayon, is stirred to react 1-2h, and decompression, which filters, removes epoxy chloropropionate
Alkane obtains material B；
C: material B is tiled, and is used60Co- gamma-ray irradiation is penetrated, and being added with material B mass ratio is (40-60): in 1 distilled water,
Impregnate 4-6h, by material B wet spinning to get.
3. the production technology of preservative free facial mask according to claim 4, which is characterized in that epoxy chlorine in the step A
The mass ratio of propane and chitosan oligosaccharide is (0.2-0.4): 1.
4. the production technology of preservative free facial mask according to claim 4, which is characterized in that viscose glue is fine in the step B
The mass ratio of dimension and chitosan oligosaccharide is (2.4-2.8): 1.
5. the production technology of preservative free facial mask according to claim 4, which is characterized in that in the step C60Co-γ
The dosage of x ray irradiation x is 3.0kGy-8.0kGy.
6. the production technology of preservative free facial mask according to claim 4, which is characterized in that by material B in the step C
Tiling with a thickness of 2 ± 0.5cm.
7. the production technology of preservative free facial mask according to claim 1, which is characterized in that the facial mask in the step S2
Essence contains following component and its parts by weight: 2-3 parts of ethoxy chitosan, 5-6 parts of beta glucan and ultrapure water
25-40 parts.
8. the production technology of preservative free facial mask according to claim 7, which is characterized in that the facial mask in the step S2
Essence the preparation method comprises the following steps: by ethoxy chitosan, beta glucan and Porcine HGF be added 40-50 DEG C of water
In, stirring and dissolving is uniform, adds sodium hyaluronate, stir evenly to get.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112493395A (en) * | 2020-11-27 | 2021-03-16 | 湖南湘华华大生物科技有限公司 | Irradiation sterilization method for tea |
| CN112515977A (en) * | 2020-12-19 | 2021-03-19 | 尹雪娟 | Production process of preservative-free mask |
| CN113930897A (en) * | 2021-04-02 | 2022-01-14 | 武汉纺织大学 | Water-soluble non-woven fabric mask and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103394114A (en) * | 2013-07-03 | 2013-11-20 | 东华大学 | Method for preparing chitosan-based superfine fiber carrier material for medical dressing |
| CN106757521A (en) * | 2016-12-15 | 2017-05-31 | 宜宾屏山辉瑞油脂有限公司 | A kind of preparation method of chitosan oligosaccharide cellulose fibre |
| CN108166157A (en) * | 2017-12-25 | 2018-06-15 | 合肥洁诺无纺布制品有限公司 | Antibacterial spunlace non-woven cloth beauty mask base fabric of a kind of moisture absorption and preparation method thereof |
| CN108245598A (en) * | 2017-09-27 | 2018-07-06 | 广州奥蓓斯化妆品有限公司 | One kind is planted extraction eye sticker and preparation method thereof |
-
2019
- 2019-01-28 CN CN201910082053.5A patent/CN109602636B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103394114A (en) * | 2013-07-03 | 2013-11-20 | 东华大学 | Method for preparing chitosan-based superfine fiber carrier material for medical dressing |
| CN106757521A (en) * | 2016-12-15 | 2017-05-31 | 宜宾屏山辉瑞油脂有限公司 | A kind of preparation method of chitosan oligosaccharide cellulose fibre |
| CN108245598A (en) * | 2017-09-27 | 2018-07-06 | 广州奥蓓斯化妆品有限公司 | One kind is planted extraction eye sticker and preparation method thereof |
| CN108166157A (en) * | 2017-12-25 | 2018-06-15 | 合肥洁诺无纺布制品有限公司 | Antibacterial spunlace non-woven cloth beauty mask base fabric of a kind of moisture absorption and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112493395A (en) * | 2020-11-27 | 2021-03-16 | 湖南湘华华大生物科技有限公司 | Irradiation sterilization method for tea |
| CN112515977A (en) * | 2020-12-19 | 2021-03-19 | 尹雪娟 | Production process of preservative-free mask |
| CN113930897A (en) * | 2021-04-02 | 2022-01-14 | 武汉纺织大学 | Water-soluble non-woven fabric mask and preparation method thereof |
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| CN109602636B (en) | 2020-07-07 |
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