CN109602636B - Production process of preservative-free mask - Google Patents
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- CN109602636B CN109602636B CN201910082053.5A CN201910082053A CN109602636B CN 109602636 B CN109602636 B CN 109602636B CN 201910082053 A CN201910082053 A CN 201910082053A CN 109602636 B CN109602636 B CN 109602636B
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/736—Chitin; Chitosan; Derivatives thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0212—Face masks
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/64—Proteins; Peptides; Derivatives or degradation products thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/735—Mucopolysaccharides, e.g. hyaluronic acid; Derivatives thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/08—Radiation
- A61L2/081—Gamma radiation
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
- A61Q17/005—Antimicrobial preparations
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
- A61K2800/20—Chemical, physico-chemical or functional or structural properties of the composition as a whole
- A61K2800/30—Characterized by the absence of a particular group of ingredients
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Abstract
The invention relates to the technical field of daily cosmetics, in particular to a production process of a preservative-free mask. The preservative-free mask provided by the invention is utilized in the production process60Co-gamma ray irradiation can effectively kill microorganisms, ensure that the active ingredients of facial mask essence in the facial mask are not damaged, and the facial mask is stored in a dark place at room temperature for 2-3 years without deterioration or failure, overcomes the defects of incomplete sterilization, repeated operation and easy damage of the active ingredients of the traditional patch facial mask by utilizing high-pressure steam, can realize mass production and sterilization, is simple and easy to implement, and saves resources. In addition, in the preparation of the preservative-free mask, the chitosan oligosaccharide mucus fiber is processed60Co-gamma rays are irradiated in the irradiation dose of 3kGy-8kGy, so that the attaching property, the hygroscopicity and the softness of the mask can be improved, and the moisture absorption is promoted.
Description
Technical Field
The invention relates to the technical field of daily cosmetics, in particular to a production process of a preservative-free mask.
Background
With the improvement of the living quality of people, particularly beauty lovers, pursue a daily facial mask to maintain the brightness, smoothness and whitening of skin, so the demand of daily skin care products such as facial masks is higher and higher, in order to ensure the compliance and the moisturizing effect of the facial mask, the water content in the facial mask product is very high, so the facial mask is easily polluted by bacteria and fungi, and the active ingredients are affected and deteriorated if the main effective ingredients in the facial mask are polysaccharides, amino acids, polypeptides and the like, so the breeding of microorganisms cannot be prevented.
In order to protect products from being polluted and deteriorated by microorganisms and prolong the shelf life of the products, preservatives are commonly added in the prior art to prevent the propagation of the microorganisms, but the addition of the preservatives can increase the irritation to the skin and cause the skin to have the sensitization phenomena of flushing and erythra, but the problem of the propagation of the microorganisms cannot be solved if the preservatives are not added or the use amount of the preservatives is not enough, and the preservatives can inhibit the propagation of bacteria and fungi but cannot kill the bacteria and the fungi, and a sterilization step is also needed to be combined to ensure the shelf life of the mask together.
Therefore, in the mask production process, the sterilization effect is critical, and patent document CN201510514030.9 discloses a sterilization process method of a preservative-free mask, the method puts the prepared mask and a packing material into a sterilizer together, and the sterilization is carried out for 1-3 times at constant temperature without repeatedly heating and pressurizing, each time for 10-180min, which belongs to a damp-heat sterilization method, the sterilization method can realize batch sterilization, the mask bag has no deformation expansion and rupture phenomena, the mask is absolutely sterile, the shelf life of the product is guaranteed, but in the sterilization process, the repeated sterilization is needed to ensure that active ingredients such as polysaccharide, amino acid, growth factors and vitamins in the mask are not destroyed, and the efficacy of the mask is influenced.
Patent document CN201710890931.7 discloses a plant extraction eye patch, in which the sterilization method comprises heating the stock solution of the plant extraction eye patch to 80-100 ℃ for 1-2h, cooling to normal temperature, repeating the operation for 2 times to concentrate, then filling the stock solution into an eye patch bag, and performing ordinary irradiation for 1-2h to further sterilize and disinfect, thereby achieving the sterilization effect. The sterilization method combines two modes of high-temperature sterilization and common irradiation sterilization, and can still avoid the addition of preservatives: p-hydroxyacetophenone and hexanediol to prevent microbial growth.
Therefore, a mask which is simple and convenient in production process and does not need to be added with preservative is still lacked in the market.
Disclosure of Invention
Aiming at the defects of the conventional mask sterilization method, the invention aims to provide a simpler and effective preservative-free mask production process, and the prepared mask can be stored for a long time without adding a preservative under the condition of ensuring that the active ingredients of the mask are not damaged, so that the shelf life of the product is prolonged, and the cost is reduced, thereby being suitable for commercial production and use.
The invention provides a production process of a preservative-free mask, which comprises the following production steps:
s1: preparing a modified non-woven fabric mask: weaving chitosan oligosaccharide essence fiber into mesh with thickness of 0.2-0.5mm, oven drying, and cutting into round facial mask with length of 20 + -3 cm and width of 18 + -2 cm to obtain modified non-woven facial mask;
s2: soaking the modified non-woven fabric facial mask prepared in the step S1 in 20-30mL facial mask essence, filling into facial mask bags, spreading, boxing, placing in an oxygen-free environment, and using60Irradiating with Co-gamma ray in the dosage of 3.0-8.0 kGy, and sealing.
Preferably, the preservative-free mask is produced by the following steps:
s1: preparing a modified non-woven fabric mask: weaving chitosan oligosaccharide essence fiber into mesh with thickness of 0.3-0.4mm, oven drying, and cutting into round facial mask with length of 20 + -3 cm and width of 18 + -2 cm to obtain modified non-woven facial mask;
s2: soaking the modified non-woven fabric mask prepared in the step S1 in 20mL of mask essence, filling the mask essence into a mask bag, flatly laying, boxing, and placing in an oxygen-free environment60Irradiating with Co-gamma ray in the dosage of 3.0-8.0 kGy, and sealing.
Preferably, the preparation method of the chitosan oligosaccharide essence fiber in the step S1 is as follows:
a: adding chitosan oligosaccharide into water, dropwise adding acetic acid to adjust the pH value to 4-5, stirring and dissolving to prepare a chitosan oligosaccharide aqueous solution with the mass concentration of 5-10%, adding epoxy chloropropane, heating to 60-75 ℃, stirring and reacting for 2-3h to obtain a material A;
b: adjusting the pH value of the material A to 8-9, adding the material A into viscose, stirring and reacting for 1-2h, and performing vacuum filtration to remove epichlorohydrin to obtain a material B;
c: lay the material B flat and use60Irradiating with Co-gamma ray for 10-15min, adding into distilled water at a mass ratio of (40-60):1, soaking for 4-6h, and wet spinning the material B to obtain chitosan oligosaccharide essence fiber.
Preferably, the mass ratio of the epoxy chloropropane to the chitosan oligosaccharide in the step A is (0.2-0.4): 1.
Preferably, the mass ratio of the viscose fibers to the chitosan oligosaccharides in the step B is (2.4-2.8): 1.
Preferably, in said step C60The dose of Co-gamma ray irradiation is 3.0kGy-5.0 kGy.
Preferably, the thickness of the material B laid flat in the step C is 2 +/-0.5 cm.
Preferably, the mask essence in the step S2 comprises, by weight, 4-6 parts of hydroxyethyl chitosan, 5-6 parts of β -dextran, 2-3 parts of cell growth factor, 0.1-0.8 part of sodium hyaluronate and 25-40 parts of ultrapure water;
the facial mask essence is prepared by adding hydroxyethyl chitosan, β -dextran and cell growth factor into water of 40-50 deg.C, stirring to dissolve, adding sodium hyaluronate, and stirring.
The production process of the preservative-free mask provided by the invention is characterized in that the modified non-woven fabric mask is prepared by utilizing an irradiation technology: after the chitosan oligosaccharide is subjected to irradiation treatment of 3.0kGy-8.0kGy, the prepared essence can kill a large amount of bacteria and fungi, and has high purity. The inventor also finds that the prepared modified non-woven fabric mask is softer and has high viscosity, woven fabric can effectively keep moisture, the problem of poor fit of the non-woven fabric mask in the prior art is solved, and the effect is probably related to the effect that chitosan oligosaccharide forms micromolecule chitosan oligosaccharide with stronger adhesiveness due to structural change after irradiation.
In the further production process, the dried modified non-woven fabric mask is soaked in mask essence for packaging, boxed and subjected to60The inventor also finds that the β -glucan added into the mask essence can prevent irradiation, ensures that effective components in the mask essence are not inactivated due to irradiation in long-time irradiation, and ensures the stability of the mask essence.
Compared with the prior art, the production process of the preservative-free mask has the following advantages:
(1) in the preservative-free mask production process, the modified non-woven mask provided by the invention increases the fit, moisture retention and flexibility of the mask.
(2) In the production process of the preservative-free mask provided by the invention, the prepared mask is utilized60Co-gamma ray irradiation can kill microorganisms and ensure that effective components in the mask essence are not damaged, so that the mask does not deteriorate or lose efficacy after being stored at room temperature in a dark place for 2-3 years.
(3) In the production process of the preservative-free mask provided by the invention, the defects that the traditional patch type mask is repeatedly sterilized by high-pressure steam, the active ingredients are easily damaged, and a large amount of preservative is added are overcome, the mass production and sterilization can be realized, the operation is simple and feasible, and the resources are saved.
Detailed Description
The present invention will be described in detail with reference to specific embodiments, which are illustrative of the invention and are not to be construed as limiting the invention.
Example 1 preparation of Chitosan oligosaccharide essence fiber
The preparation method of the chitosan oligosaccharide essence fiber comprises the following steps:
adding chitosan oligosaccharide into water, dropwise adding acetic acid to adjust the pH value to 4, stirring and dissolving to prepare a chitosan oligosaccharide aqueous solution with the mass concentration of 8%, adding epoxy chloropropane with the mass ratio of 0.3:1 to the chitosan oligosaccharide, heating to 70 ℃, and stirring and reacting for 2.5 hours to obtain a material A;
b, adjusting the pH value of the material A to 8, adding the material A into viscose fiber with the mass ratio of chitosan oligosaccharide to chitosan oligosaccharide of 2.5:1, stirring for reaction for 2 hours, and performing vacuum filtration to remove epichlorohydrin to obtain a material B;
c spreading the material B to a thickness of 2 +/-0.5 cm60Irradiating by Co-gamma rays with the irradiation dose of 3.0-5.0 kGy, adding the Co-gamma rays into distilled water with the mass ratio of 50:1 to the material B, soaking for 5 hours, and carrying out wet spinning on the material B to obtain the material B.
Example 2 production Process of preservative-free facial mask
The production process of the preservative-free mask comprises the following steps:
s1: preparing a modified non-woven fabric mask: weaving the chitosan oligosaccharide essence fiber prepared in the embodiment 1 into a net shape, wherein the thickness of the net shape is 0.2mm, drying the net shape, and cutting the net shape into a circular mask with the length of 17cm and the width of 16cm to obtain the chitosan oligosaccharide essence fiber;
s2, preparing facial mask essence, namely adding 5 parts of hydroxyethyl chitosan, 5 parts of β -glucan and 2.5 parts of cell growth factor into 30 parts of water with the temperature of 40 ℃, stirring and dissolving uniformly, adding 0.5 part of sodium hyaluronate, and stirring uniformly to obtain the facial mask essence;
s3: soaking the modified non-woven fabric mask prepared in the step S1 in 20mL of mask essence prepared in the step S2, filling the mask essence into a mask bag, flatly laying, boxing, and placing in an oxygen-free environment at 35 DEG C60Co-gamma ray irradiation is carried out, the irradiation dose is 4.0kGy-6.0kGy, the irradiation time is 2h, and the product is obtained after sealing.
EXAMPLE 3 preservative-free mask production Process
The production process of the preservative-free mask comprises the following steps:
s1: preparing a modified non-woven fabric mask: weaving the chitosan oligosaccharide essence fiber prepared in the embodiment 1 into a net shape, wherein the thickness of the net shape is 0.5mm, drying the net shape, and cutting the net shape into a circular facial mask with the length of 23cm and the width of 20cm to obtain the chitosan oligosaccharide essence fiber;
s2, preparing a facial mask essence, namely adding 4 parts of hydroxyethyl chitosan, 6 parts of β -glucan and 3 parts of cell growth factors into 30 parts of water at the temperature of 50 ℃, uniformly stirring and dissolving, adding 0.8 part of sodium hyaluronate, and uniformly stirring to obtain the facial mask essence;
s3: soaking the modified non-woven fabric facial mask prepared in the step S1 in 20mL of facial mask essence prepared in the step S2, filling the facial mask essence into facial mask bags, flatly laying, boxing, and placing in an oxygen-free environment at 40 DEG C60Co-gamma ray irradiation is carried out, the irradiation dose is 5.0kGy-8.0kGy, the irradiation time is 2h, and the product is obtained after sealing.
EXAMPLE 4 production of preservative-free facial mask
The production process of the preservative-free mask comprises the following steps:
s1: preparing a modified non-woven fabric mask: weaving the chitosan oligosaccharide mucus fiber prepared in the example 1 into a net shape, wherein the thickness is 0.35mm, drying, and cutting into a round facial mask with the length of 20cm and the width of 18cm to obtain the chitosan oligosaccharide mucus fiber mucus mask;
s2, preparing facial mask essence, namely adding 5 parts of hydroxyethyl chitosan, 5.5 parts of β -glucan and 2.5 parts of cell growth factor into 30 parts of water with the temperature of 45 ℃, uniformly stirring and dissolving, then adding 0.5 part of sodium hyaluronate, and uniformly stirring to obtain the facial mask essence;
s3: soaking the modified non-woven fabric facial mask prepared in the step S1 in 20mL of facial mask essence prepared in the step S2, filling the facial mask essence into facial mask bags, flatly laying, boxing, and placing in an oxygen-free environment at 37 DEG C60Irradiating with Co-gamma ray at a dose of 5.0-8.0 kGy, and sealing.
Comparative example 1 production Process of preservative-free mask
The procedure of the production process of the preservative-free mask is similar to that of example 4;
the difference from example 4 is that the preparation method of the chitosan oligosaccharide viscose rayon in step S1 is as follows:
adding chitosan oligosaccharide into water, dropwise adding acetic acid to adjust the pH value to 4.0, stirring and dissolving to prepare a chitosan oligosaccharide aqueous solution with the mass concentration of 8%, adding epoxy chloropropane with the mass ratio of 0.3:1 to the chitosan oligosaccharide, heating to 70 ℃, and stirring and reacting for 2.5 hours to obtain a material A;
b adjusting the pH of the material A to 8
Adding the mixture into viscose fiber with the mass ratio of chitosan oligosaccharide being 2.5:1, stirring for reaction for 2 hours, and carrying out vacuum filtration to remove epichlorohydrin to obtain a material B;
c spreading the material B to a thickness of 2cm60And (3) irradiating by Co-gamma rays with the irradiation dose of 500Gy, adding the Co-gamma rays into distilled water with the mass ratio of 50:1 to the material B, soaking for 5 hours, and performing wet spinning on the material B to obtain the material B.
Comparative example 2 production Process of preservative-free mask
The procedure of the production process of the preservative-free mask is similar to that of example 4;
the difference from example 4 is that β -glucan was replaced with chitosan oligosaccharide in the preparation of the facial mask serum in the step S2.
Comparative example 3 production Process of preservative-free mask
The procedure of the production process of the preservative-free mask is similar to that of example 4;
the difference from the example 4 is that the mask pack is packaged in the step S3, and after the pack is packed in a pack bag, high-pressure moist heat sterilization is used instead of irradiation sterilization.
Test example I, bacteriostatic effect test of preservative-free mask
1. Test subjects: commercially available nonwoven fabric hydrating mask, preservative-free mask prepared in examples 2-4 and comparative examples 1-3.
2. The test method comprises the following steps:
the preservative-free masks prepared in the commercially available normal moisturizing mask (one-leaf moisturizing mask), examples 2 to 4 and comparative examples 1 to 3 were each tested and taken out flat, stored in the dark at 40 ℃ under a humidity of 60 ± 5% for 3 months, 6 months, 9 months and 12 months, recorded for the presence or absence of bacterial growth and mold spots on the mask, and recorded for the number of bacterial and mold colonies in the same area.
3. And (3) test results:
the test results are shown in table 1.
TABLE 1 stability test of examples 2-4 and comparative examples 1-5
The accelerated stability test result shows that a small amount of bacteria and mold grow after 9 months, and the amount of bacteria and mold grow is increased after 12 months, while the masks prepared in examples 2 to 4 have bacteria and mold grow after 1 year of storage, which indicates that the sterilization of the irradiation technology is good, and the shelf life of the masks can be prolonged compared with the commercial moisturizing masks.
In comparative example 1, since the irradiation dose is 500Gy in the preparation process of the chitosan oligosaccharide viscose fiber, a good sterilization effect cannot be achieved due to a low dose, and bacteria and mold can be detected after 3 months.
In comparative example 2, β -glucan was replaced by chitosan oligosaccharide, and bacteria began to grow obviously after 6 months, which indicates that β -glucan has a certain antibacterial effect, and the antibacterial effect is better than that of chitosan oligosaccharide alone, probably because the mask contains β -glucan and chitosan oligosaccharide (chitosan oligosaccharide viscose fiber) at the same time, and the antibacterial effect is better.
Comparative example 3 a small amount of bacteria and mold spots were cultured after 3 months of storage using high pressure moist heat sterilization, and the number of bacteria and mold spots increased with the increase of the storage time, indicating that the conventional high pressure sterilization effect was not as good as the irradiation sterilization effect provided by the present invention.
In conclusion, the irradiation technology in the mask production process provided by the invention has a good effect of killing microorganisms, and overcomes the phenomenon of incomplete high-pressure moist heat sterilization in the prior art.
Test example two, moisturizing effect of preservative-free mask
1. Test subjects: commercially available nonwoven fabric hydrating mask, preservative-free mask prepared in examples 2-4 and preservative-free mask prepared in comparative examples 1-2.
2. The test method comprises the following steps:
subject: healthy women without a history of allergies for 60, volunteers were enrolled.
Age: 18-35 years old.
The subjects were divided into 6 groups of 10 persons each, and a commercially available normal moisturizing mask, preservative-free masks prepared in examples 2 to 4 and preservative-free masks prepared in comparative examples 1 to 2 were applied to the arms of the subjects, respectively, and the moisture content was measured after 20 min.
3. And (3) test results:
the test results are shown in Table 2.
TABLE 2 skin moisture
| Group of | Water content% |
| Commercially available non-woven fabric moisturizing mask | 65.5±2.4 |
| Example 2 | 72.4±2.1 |
| Example 3 | 75.3±1.8 |
| Example 4 | 78.6±3.4 |
| Comparative example 1 | 45.3±2.7 |
| Comparative example 2 | 60.1±1.3 |
As is clear from the results in Table 2, the skin moisture of the preservative-free facial masks prepared in examples 2 to 4 were all 70% or more, wherein the preservative-free facial mask prepared in example 4 was as high as 78.6. + -. 3.4%, while the preservative-free facial masks prepared in comparative examples 1 and 3 had moisture of 45.3. + -. 2.7% and 51.1. + -. 1.3%, respectively, which were lower than 65.5. + -. 2.4% of the commercially available hydrating facial mask, and much lower than the preservative-free facial mask prepared in example 4,
comparative example 1 comparing the moisturizing effect of the preservative-free facial mask prepared in each example, it is demonstrated that chitosan oligosaccharide viscose fiber60After Co-gamma ray irradiation, chitosan oligosaccharide molecules are degraded, so that the viscosity of the mask base cloth is increased, the moisture-preserving effect of the woven modified non-woven fabric mask is enhanced, and the absorption of the mask essence by the skin is promoted.
Comparative example 2 compares the moisturizing effect of the preservative-free facial mask water prepared in each example, and shows that β -glucan is added to ensure that the active ingredients in the facial mask are not inactivated by irradiation, and the moisturizing effect of the facial mask is improved.
Test example 3: evaluation of preservative-free mask Performance
1. Test materials: commercially available nonwoven moisturizing masks, preservative-free masks prepared in example 4, comparative example 1, and comparative example 3.
2. Test subjects: 80 volunteers.
3. The test method comprises the following steps: 80 volunteers were divided into 4 groups on an average, and the softness, hygroscopicity, air permeability, and skin-contacting property of the facial mask were evaluated organoleptically (the higher the score, the better the softness, hygroscopicity, air permeability, and skin-contacting property of the used nonwoven facial mask, the less irritability), using commercially available hydrating facial mask (one leaf hydrating facial mask), antiseptic-free nonwoven facial masks prepared according to example 4 of the present invention, comparative example 1, and comparative example 3, respectively, and the results are shown in table 3.
Table 3 examples and comparative preservative-free mask performance scores
From the results of table 3, it can be seen that:
the softness, the hygroscopicity, the air permeability and the skin adhesiveness of the non-woven fabric mask without the preservative prepared in the embodiment 4 are higher than those of the non-woven fabric mask without the preservative prepared in the comparative example 1 and the comparative example 3, and the irradiation dose is not in the range of 3kGy-8kGy during sterilization, so that the softness, the hygroscopicity, the air permeability and the skin adhesiveness of the non-woven fabric mask are poorer than those of the non-woven fabric mask without the preservative prepared in the embodiment 4, even lower than those of the moisturizing mask sold in the market, and the softness, the hygroscopicity, the air permeability and the skin adhesiveness of the non-woven fabric mask without the preservative are reduced because chitosan oligosaccharide molecules are not degraded when chitosan viscose fiber.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (5)
1. A preparation method of the preservative-free mask is characterized by comprising the following preparation steps:
s1: preparing a modified non-woven fabric mask: weaving chitosan oligosaccharide essence fiber into mesh with thickness of 0.2-0.5mm, oven drying, and cutting into round facial mask with length of 20 + -3 cm and width of 18 + -2 cm to obtain modified non-woven facial mask;
s2: soaking the modified non-woven fabric facial mask prepared in the step S1 in 20-30mL facial mask essence, filling into facial mask bags, spreading, boxing, placing in an oxygen-free environment, and using60Irradiating with Co-gamma ray in the irradiation dose of 3.0-8.0 kGy, and sealing;
the facial mask essence in the step S2 comprises the following components in parts by weight of 2-3 parts of hydroxyethyl chitosan, 5-6 parts of β -glucan and 25-40 parts of ultrapure water;
the preparation method of the chitosan oligosaccharide essence fiber in the step S1 is as follows:
a: adding chitosan oligosaccharide into water, dropwise adding acetic acid to adjust the pH value to 4-5, stirring and dissolving to prepare a chitosan oligosaccharide aqueous solution with the mass concentration of 5-10%, adding epoxy chloropropane, heating to 60-75 ℃, stirring and reacting for 2-3h to obtain a material A;
b: adjusting the pH value of the material A to 8-9, adding the material A into viscose, stirring and reacting for 1-2h, and performing vacuum filtration to remove epichlorohydrin to obtain a material B;
c: lay the material B flat and use60Irradiating with Co-gamma ray, adding into distilled water with the mass ratio of (40-60):1, soaking for 4-6h, and wet spinning the material B.
2. The production process of the preservative-free mask pack according to claim 1, wherein the mass ratio of epichlorohydrin to chitosan oligosaccharide in the step A is (0.2-0.4): 1;
3. the manufacturing process of the preservative-free mask pack according to claim 1, wherein the mass ratio of the viscose fibers to the chitosan oligosaccharides in the step B is (2.4-2.8): 1.
4. The process for producing a preservative-free facial mask according to claim 1, wherein the step C is a step60The dose of Co-gamma ray irradiation is 3.0kGy-8.0 kGy.
5. The process for producing a preservative-free facial mask according to claim 1, wherein the thickness of the spread of the material B in the step C is 2 ± 0.5 cm.
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| CN112515977A (en) * | 2020-12-19 | 2021-03-19 | 尹雪娟 | Production process of preservative-free mask |
| CN113930897B (en) * | 2021-04-02 | 2022-12-13 | 武汉纺织大学 | Water-soluble non-woven fabric mask and preparation method thereof |
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