CN109402576A - 一种氟掺杂的疏水类金刚石薄膜制备方法 - Google Patents
一种氟掺杂的疏水类金刚石薄膜制备方法 Download PDFInfo
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Abstract
本发明涉及镀膜技术领域，具体地说是一种氟掺杂的疏水类金刚石薄膜制备方法。一种氟掺杂的疏水类金刚石薄膜制备方法，包括基材、底层、TAC薄膜层、含氟TAC层，其特征在于：具体步骤如下：S1：在基材的表面使用磁控溅射镀膜方式镀一层金属底层；S2：在底层的表面使用FCVA镀膜技术镀一层高耐磨性的TAC薄膜层；S3：在TAC薄膜层的表面使用FCVA镀膜技术镀一层含氟TAC薄膜层。同现有技术相比，使用FCVA技术，在基材上镀一层疏水性类金刚石涂层，同时达到高耐磨防腐等对基材的保护性能。其中滴水角可以达到110°以上。FCVA技术制备的TAC可以具有高耐磨性等特点，所以在表层进行氟掺杂后，可以大大提升产品的疏水性和耐磨性。
Description
技术领域
本发明涉及镀膜技术领域，具体地说是一种氟掺杂的疏水类金刚石薄膜制备方法。
背景技术
真空镀膜是真空应用领域的一个重要方面，它是以真空技术为基础，利用物理或化学方法，并吸收电子束、分子束、离子束、等离子束、射频和磁控等一系列新技术，为科学研究和实际生产提供薄膜制备的一种新工艺。简单地说，在真空中把金属、合金或化合物进行蒸发或溅射，使其在被涂覆的物体(称基板、基片或基体)上凝固并沉积的方法，称为真空镀膜。
众所周知，在某些材料的表面上，只要镀上一层薄膜，就能使材料具有许多新的、良好的物理和化学性能。真空镀膜是指在高真空的条件下加热金属或非金属材料，使其蒸发并凝结于镀件(金属、半导体或绝缘体)表面而形成薄膜的一种方法。例如，真空镀铝、真空镀铬等
而类金刚石薄膜(DLC)，是真空镀膜中的一大类。目前市场上传统的是由CVD进行沉积实现的，要求较高的镀膜温度，因此对于一些如塑料、橡胶等材料，就不能进行类金刚石涂覆。
在现在的应用中，更多的场合要求薄膜有较好的机械性能的同时，也能有一定的疏水性。而对于类金刚石薄膜，普遍的水接触角在70°～80°，达不到疏水的效果。
发明内容
本发明为克服现有技术的不足，采用纳峰国际专利的FCVA过滤阴极真空电弧技术，镀膜粒子为100％离化的等离子。在无需加热被镀工件的条件下，经过电磁场交互作用后，FCVA镀膜离子与普通镀膜PVD、CVD镀膜技术相比具有更高，更均匀的能量，从而在低温条件下可在工件表面形成致密、超高硬度、超强附着力的膜层，解决了其他传统镀膜技术不可避免的由于高温沉积而引发的众多问题。
为实现上述目的，设计一种氟掺杂的疏水类金刚石薄膜制备方法，包括基材、底层、TAC薄膜层、含氟TAC层，其特征在于：具体步骤如下：
S1：在基材的表面使用磁控溅射镀膜方式镀一层金属底层；
S2：在底层的表面使用FCVA镀膜技术镀一层高耐磨性的TAC薄膜层；
S3：在TAC薄膜层的表面使用FCVA镀膜技术镀一层含氟TAC薄膜层。
所述的基材为不锈钢、铝等金属，以及PC、橡胶等非金属材料中的一种。
所述的底层为使用磁控溅射方式沉积的金属附着层。
所述的TAC薄膜层为非晶四面体碳薄膜。
所述的含氟TAC层为氟掺杂的类金刚石碳膜，并且含氟TAC层的表面滴水角大于110°。
此含氟TAC层是通过FCVA镀膜技术，使用石墨靶，在真空室中掺入CF4或C2F6或C3F8等含氟气体，通过镀膜过程的离子轰击使气体电离分解，并在产品表面形成一层含氟的类金刚石薄膜，实现薄膜的氟掺杂效果。
所述的FCVA镀膜技术为过滤阴极真空电弧镀膜技术。
本发明同现有技术相比，使用FCVA技术，在基材上镀一层疏水性类金刚石涂层，同时达到高耐磨防腐等对基材的保护性能。其中滴水角可以达到110°以上。FCVA技术制备的TAC可以具有高耐磨性等特点，所以在表层进行氟掺杂后，可以大大提升产品的疏水性和耐磨性。主要先在产品表面镀一层导电底层，再使用FCVA技术沉积一层高耐磨性的TAC膜层，再镀一层掺杂了氟元素的TAC-F层。底层一般是金属层，不具备耐磨性，但是可以增加产品和TAC膜层间的结合力，再镀一层TAC膜层，增加产品耐磨性，最后的氟掺杂层，增加产品的疏水性。增加有耐磨性和疏水性需求的产品的使用寿命，达到高疏水性和高耐磨性，提升产品质量。
使用FCVA技术所制备的TAC-ONTM(非晶钻石膜，简称TAC)薄膜具有稳定的钻石结构，可形成钻石成分高达88％的sp3斜四方键合。该膜层具有低温沉积、超高硬度，超强附着力、低摩擦系数、化学性质稳定、耐磨损等特点。由FCVA技术产生的特殊无氢类金刚石膜层可显著延长各类模具、工具、部件的使用寿命，并大幅降低生产维护成本，从而显著提高产能。
采用纳峰国际专利的FCVA过滤阴极真空电弧技术，镀膜粒子为100％离化的等离子。在无需加热被镀工件的条件下，经过电磁场交互作用后，FCVA镀膜离子与普通镀膜PVD、CVD镀膜技术相比具有更高，更均匀的能量，从而在低温条件下可在工件表面形成致密、超高硬度、超强附着力的膜层，解决了其他传统镀膜技术不可避免的由于高温沉积而引发的众多问题。
具体实施方式
使用FCVA技术，在基材上镀一层疏水性类金刚石涂层，同时达到高耐磨的性能。其中滴水角可以达到110°以上。
FCVA技术制备的TAC可以具有高耐磨性等特点，所以将有疏水性能的氟元素掺杂在TAC中，可以大大提升产品的疏水性和耐磨性。
主要先在产品表面镀一层导电底层，再沉积使用FCVA技术镀一层高耐磨性的TAC膜层，再镀一层掺杂了氟元素的TAC层。
底层一般是金属层，不具备耐磨性，但是可以增加产品和TAC膜层间的结合力，再镀一层TAC膜层，增加产品耐磨性，最后的掺氟层，增加产品的疏水性。
增加有耐磨性和疏水性需求的产品的使用寿命，达到高疏水性和高耐磨性，可以缩减成本，提升产品质量。
具体步骤如下：
S1：在基材的表面使用磁控溅射镀膜方式镀一层金属底层；
S2：在底层的表面使用FCVA镀膜技术镀一层高耐磨性的TAC薄膜层；
S3：在TAC薄膜层的表面使用FCVA镀膜技术镀一层含氟TAC薄膜层。
基材为不锈钢、铝等金属，以及PC、橡胶等非金属材料中的一种。
底层为使用磁控溅射方式沉积的金属附着层。
TAC薄膜层为非晶四面体碳薄膜。
此含氟TAC层是通过FCVA镀膜技术，使用石墨靶，在真空室中掺入CF4或C2F6或C3F8等含氟气体，通过镀膜过程的离子轰击使气体电离分解，并在产品表面形成一层含氟的类金刚石薄膜，实现薄膜的氟掺杂效果。气体通入真空室后，镀膜的工作真空维持在1.0E-4Torr到1.0E-3Torr的范围。
FCVA镀膜技术为过滤阴极真空电弧镀膜技术。
Claims (7)
1.一种氟掺杂的疏水类金刚石薄膜制备方法，包括基材、底层、TAC薄膜层、含氟TAC层，其特征在于：具体步骤如下：
S1：在基材的表面使用磁控溅射镀膜方式镀一层金属底层；
S2：在底层的表面使用FCVA镀膜技术镀一层高耐磨性的TAC薄膜层；
S3：在TAC薄膜层的表面使用FCVA镀膜技术镀一层含氟TAC薄膜层。
2.根据权利要求1所述的一种氟掺杂的疏水类金刚石薄膜制备方法，其特征在于：所述的基材为不锈钢、铝等金属，以及PC、橡胶等非金属材料中的一种。
3.根据权利要求1所述的一种氟掺杂的疏水类金刚石薄膜制备方法，其特征在于：所述的底层为使用磁控溅射方式沉积的金属附着层。
4.根据权利要求1所述的一种氟掺杂的疏水类金刚石薄膜制备方法，其特征在于：所述的TAC薄膜层为非晶四面体碳薄膜。
5.根据权利要求1所述的一种氟掺杂的疏水类金刚石薄膜制备方法，其特征在于：所述的含氟TAC层为氟掺杂的类金刚石碳膜，并且含氟TAC层的表面滴水角大于110°。
6.此含氟TAC层是通过FCVA镀膜技术，使用石墨靶，在真空室中掺入CF4或C2F6或C3F8等含氟气体，通过离子轰击使气体电离分解，并在产品表面形成一层含氟的类金刚石薄膜，实现薄膜的氟掺杂效果。
7.根据权利要求1所述的一种氟掺杂的疏水类金刚石薄膜制备方法，其特征在于：所述的FCVA镀膜技术为过滤阴极真空电弧镀膜技术。
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