CN109300843B - 晶片的加工方法和晶片的加工中使用的辅助器具 - Google Patents
晶片的加工方法和晶片的加工中使用的辅助器具 Download PDFInfo
- Publication number
- CN109300843B CN109300843B CN201810800995.8A CN201810800995A CN109300843B CN 109300843 B CN109300843 B CN 109300843B CN 201810800995 A CN201810800995 A CN 201810800995A CN 109300843 B CN109300843 B CN 109300843B
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- Prior art keywords
- wafer
- opening
- auxiliary tool
- dividing
- device region
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- 238000003672 processing method Methods 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 24
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- 230000001678 irradiating effect Effects 0.000 claims description 7
- 235000012431 wafers Nutrition 0.000 description 122
- 239000010410 layer Substances 0.000 description 24
- 238000003384 imaging method Methods 0.000 description 10
- 238000000227 grinding Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
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- 230000003287 optical effect Effects 0.000 description 4
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- 239000006061 abrasive grain Substances 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
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- 229910052710 silicon Inorganic materials 0.000 description 2
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- 230000015572 biosynthetic process Effects 0.000 description 1
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- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
- Micromachines (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017-143565 | 2017-07-25 | ||
JP2017143565A JP6935257B2 (ja) | 2017-07-25 | 2017-07-25 | ウエーハの加工方法及びウエーハの加工に用いる補助具 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109300843A CN109300843A (zh) | 2019-02-01 |
CN109300843B true CN109300843B (zh) | 2024-03-01 |
Family
ID=65167886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810800995.8A Active CN109300843B (zh) | 2017-07-25 | 2018-07-20 | 晶片的加工方法和晶片的加工中使用的辅助器具 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6935257B2 (ko) |
KR (1) | KR102561376B1 (ko) |
CN (1) | CN109300843B (ko) |
TW (1) | TWI761558B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113732525A (zh) * | 2021-09-03 | 2021-12-03 | 湖北三维半导体集成创新中心有限责任公司 | 一种晶圆的切割方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010073884A (ja) * | 2008-09-18 | 2010-04-02 | Fujitsu Microelectronics Ltd | 半導体ウェーハ用治具及び半導体装置の製造方法 |
JP2013041908A (ja) * | 2011-08-12 | 2013-02-28 | Disco Abrasive Syst Ltd | 光デバイスウェーハの分割方法 |
JP2013247130A (ja) * | 2012-05-23 | 2013-12-09 | Disco Abrasive Syst Ltd | ウェーハの分割方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990030006U (ko) * | 1997-12-29 | 1999-07-26 | 구본준 | 웨이퍼 홀더 |
JP3408805B2 (ja) | 2000-09-13 | 2003-05-19 | 浜松ホトニクス株式会社 | 切断起点領域形成方法及び加工対象物切断方法 |
JP2004273895A (ja) * | 2003-03-11 | 2004-09-30 | Disco Abrasive Syst Ltd | 半導体ウエーハの分割方法 |
JP5074719B2 (ja) * | 2006-07-14 | 2012-11-14 | 東京応化工業株式会社 | ウエハを薄くする方法及びサポートプレート |
JP2010141061A (ja) * | 2008-12-10 | 2010-06-24 | Sumco Techxiv株式会社 | エピタキシャルウェーハの製造方法に用いる冶具 |
TW201630105A (zh) * | 2015-02-12 | 2016-08-16 | 漢民科技股份有限公司 | 晶圓保持器 |
JP5641766B2 (ja) * | 2010-04-22 | 2014-12-17 | 株式会社ディスコ | ウェーハの分割方法 |
JP5294358B2 (ja) * | 2012-01-06 | 2013-09-18 | 古河電気工業株式会社 | ウエハ加工用テープ及びこれを使用した半導体装置の製造方法 |
JP2013152995A (ja) * | 2012-01-24 | 2013-08-08 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
JP6360411B2 (ja) * | 2014-10-09 | 2018-07-18 | 株式会社ディスコ | ウエーハの加工方法 |
JP2016147342A (ja) * | 2015-02-12 | 2016-08-18 | 株式会社ディスコ | 加工装置のチャックテーブル |
-
2017
- 2017-07-25 JP JP2017143565A patent/JP6935257B2/ja active Active
-
2018
- 2018-07-11 KR KR1020180080368A patent/KR102561376B1/ko active IP Right Grant
- 2018-07-20 TW TW107125156A patent/TWI761558B/zh active
- 2018-07-20 CN CN201810800995.8A patent/CN109300843B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010073884A (ja) * | 2008-09-18 | 2010-04-02 | Fujitsu Microelectronics Ltd | 半導体ウェーハ用治具及び半導体装置の製造方法 |
JP2013041908A (ja) * | 2011-08-12 | 2013-02-28 | Disco Abrasive Syst Ltd | 光デバイスウェーハの分割方法 |
JP2013247130A (ja) * | 2012-05-23 | 2013-12-09 | Disco Abrasive Syst Ltd | ウェーハの分割方法 |
Also Published As
Publication number | Publication date |
---|---|
CN109300843A (zh) | 2019-02-01 |
TWI761558B (zh) | 2022-04-21 |
JP2019029368A (ja) | 2019-02-21 |
JP6935257B2 (ja) | 2021-09-15 |
TW201909336A (zh) | 2019-03-01 |
KR20190011675A (ko) | 2019-02-07 |
KR102561376B1 (ko) | 2023-07-28 |
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