CN109154678A - Optical component and laser machine - Google Patents

Optical component and laser machine Download PDF

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Publication number
CN109154678A
CN109154678A CN201780028538.5A CN201780028538A CN109154678A CN 109154678 A CN109154678 A CN 109154678A CN 201780028538 A CN201780028538 A CN 201780028538A CN 109154678 A CN109154678 A CN 109154678A
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Prior art keywords
film
optical component
substrate
film thickness
thickness
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CN109154678B (en
Inventor
福永圭佑
中井秀和
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Laser Beam Processing (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The present invention provides a kind of optical component, which is characterized in that in at least single side of Ge substrate, fluoride films, Ge film and diamond-film-like (DLC film) are sequentially laminated with from the Ge substrate-side.The film thickness of preferred fluorinated object film is 500nm~950nm, and preferably the film thickness of Ge film is 50nm~150nm, and preferably the film thickness of DLC film is 50nm~300nm.Preferred fluorinated object film is by from passing through YF3、YbF3And MgF2At least one of the group selection of composition is constituted.

Description

Optical component and laser machine
Technical field
The present invention relates to optical component and equipped with the laser machine of the optical component.
Background technique
The CO vibrated with 9 μm~11 μm of wavelength2Laser is able to carry out the high absorptivity height for exporting and vibrating, in resin, therefore It is used for the aperture processing to built-in printing distributing board in the electronic equipment using smart phone as representative.
In the laser machine of aperture processing, collector lens is set to the top of machining area, therefore there are following Problem, that is, due to the steam of the resin generated in processing, resin sputtering, copper sputtering etc., dirt can be attached to collector lens. In the past, the problem, the optical component of referred to as protecting window (protection window) were configured at collector lens and machined object in order to prevent Between, it is therefore prevented that damage, the deterioration of collector lens.The main performance required for protecting window is, relative to as infrared The CO of light2Wearability of the laser with high-permeability and with the wiping for bearing the dust for attachment, sputtering object etc..
Following infrared rays are proposed in patent document 1 through tectosome, that is, in the surface side of ZnS substrate, from substrate It rises and is sequentially laminated with 1Y in face2O3Layer, YF3Layer, 2Y2O3The infrared ray of layer and diamond like carbon layer penetrates tectosome, Yi Ji The surface side of ZnS substrate is sequentially laminated with ZnS, Al of 10~200nm of thickness from real estate2O3、Y2O3In wantonly 1 layer, The diamond like carbon layer of the Ge layer of 100~750nm of thickness, 500~2000nm of thickness.
In patent document 1, compared with infrared ray so far is through tectosome, with excellent impact resistance and resistance to Long property, and peel resistance and the excellent infrared ray of transmitance are realized through tectosome.
Patent document 1: Japanese Unexamined Patent Publication 2008-268277 bulletin
Summary of the invention
But the infrared ray proposed in patent document 1 penetrates tectosome, there are following problems, that is, is formed on most surface layer There is diamond like carbon layer, therefore wearability is good, but cannot get in the case where the optical component as laser machine uses Sufficient optical property.The case where implementing laser processing by the laser machine equipped with optical component as described above Under, optical component absorbs infrared light, thus generates Temperature Distribution in ZnS substrate, occurs to be referred to as thermal lensing effect Laser transmission precision reduction.Particularly, in the laser for the aperture processing for carrying optical component as protecting window In processing machine, optical component absorbs infrared light, and thermal lensing effect thus occurs, and cannot achieve desired hole site and hole The processing of shape, there are rejected product such problems outside generation standard.In the laser machine of aperture processing, in order to Problem as described above is prevented, the speed of laser processing is limited and realizes required machining accuracy, but due to processing The limitation of speed, causes productivity to reduce.
The present invention proposes that its purpose is to provide be directed to CO in order to solve the problem above-mentioned2Laser has height Transmitance and the excellent optical component of wearability.
The present invention is a kind of optical component, which is characterized in that in at least single side of Ge substrate, from the Ge substrate-side successively It is laminated with fluoride films, Ge film and diamond-film-like (DLC film).
The effect of invention
In accordance with the invention it is possible to provide for CO2Laser has high transmittance and the excellent optical component of wearability.Separately Outside, the laser machine equipped with optical component of the invention, high-precision processing is also able to carry out in High-speed machining.
Detailed description of the invention
Fig. 1 is the schematic sectional view for indicating the structure of optical component involved in embodiment 1.
Fig. 2 is the schematic sectional view for indicating the other structures of optical component involved in embodiment 1.
Fig. 3 is the schematic sectional view for indicating the structure of optical component involved in embodiment 2.
Fig. 4 is the schematic diagram for indicating the structure of laser machine involved in embodiment 3.
Fig. 5 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 1.
Fig. 6 is the figure of the wavelength dependency of the transmitance in the optical component for indicate comparative example 1.
Fig. 7 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 3.
Fig. 8 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 4.
Fig. 9 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 5.
Figure 10 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 6.
Figure 11 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 7.
Figure 12 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 8.
Specific embodiment
Embodiment 1.
Optical component involved in embodiments of the present invention 1 is characterized in that, in at least single side of Ge substrate, from the Ge Substrate-side rises and is sequentially laminated with fluoride films, Ge film and diamond-film-like (DLC film).
Fig. 1 is the schematic sectional view for indicating the structure of optical component involved in embodiment 1.As shown in Figure 1, optical section Part is provided with multilayer film 14 on the two sides of Ge substrate 10, the multilayer film 14 by be laminated on Ge substrate 10 fluoride films 11, The Ge film 12 being laminated on fluoride films 11 and the DLC film 13 being laminated on Ge film 12 are constituted.Fig. 2 is indicated involved by embodiment 1 And optical component other structures schematic sectional view.As shown in Fig. 2, optical component is provided in a face of Ge substrate 10 Multilayer film 14 is provided with antireflection film 15 in another face of Ge substrate 10, and the multilayer film 14 on Ge substrate 10 by being laminated Fluoride films 11, the Ge film 12 being laminated on fluoride films 11 and the DLC film 13 being laminated on Ge film 12 are constituted, the antireflection film 15 is different from multilayer film 14.
In the optical component of patent document 1, ZnS is set as substrate, but if the low ZnS of thermal conductivity, which is set as substrate, to be made With generating Temperature Distribution on substrate then when continuously being laser machined.If producing temperature as described above point Cloth, then due to thermal lensing effect, machining accuracy is reduced, therefore ZnS is not suitable as the base of laser machine optical component Plate.
Therefore, in optical component of the invention, the high Ge of thermal conductivity is used for substrate.For Ge substrate 10, if not Optical property, mechanical property are had an impact, then can adulterate the element other than Ge.In addition, the shape of Ge substrate 10 is simultaneously It is not limited, such as laser machine protecting window, preferably with the diameter and 2mm~10mm of 80mm~140mm Thickness plectane.
The fluoride films 11 being laminated on Ge substrate 10, such as include YF3、YbF3、MgF2、BaF2、CaF2In equal fluorides At least one, from the excellent this point of the permeability in infrared region, preferably by from passing through YF3、YbF3And MgF2Structure At at least one of group selection constitute.
As fluoride films 11, if film thickness becomes larger, tensile stress becomes larger, so if film thickness is excessive, is then being fluorinated The damage that film is cracked etc. and caused in the film forming of object film 11, is difficult to ensure the stickiness of film sometimes.On the other hand, if fluorine The film thickness of compound film 11 is too small, then is difficult to obtain anti-reflection effect sometimes, the transmitance of infrared light reduces.From the fitting for ensuring film Property and be directed to infrared light and realize that high transmittance this point is set out, the film thickness of preferred fluorinated object film 11 is the film of 500nm~950nm It is thick.
The Ge film 12 being laminated on fluoride films 11, due to good with the adhesion of DLC film 13, by being set as Ge film 12 and can ensure the stickiness of DLC film 13.In the DLC film 13 with compression stress and the fluoride films with tensile stress 11 Between Ge film 12 is configured, therefore ensure that the equilibrium of the stress in 14 entirety of multilayer film, prevent the interface weak to adhesive force Apply load i.e. between fluoride films 11 and Ge film 12 and between fluoride films 11 and Ge substrate 10.
If the film thickness of Ge film 12 is excessive, the equilibrium of the stress in 14 entirety of multilayer film is difficult to ensure, in fluoride films Removing is easy to happen between 11 and Ge film 12 and between fluoride films 11 and Ge substrate 10.On the other hand, if the film of Ge film 12 Thicker than small, then it is difficult to obtain anti-reflection effect sometimes, the transmitance of infrared light reduces.From the stickiness for ensuring film and for infrared Light and realize that high transmittance this point is set out, preferably the film thickness of Ge film 12 be 50nm~150nm, more preferably 100nm~ 130nm。
The DLC film 13 being laminated on Ge film 12, high by the stability as substance and with other materials reactivity are low Diamond-like is constituted.By the way that DLC film 13 as described above to be set to the most surface of optical component, so as to prevent due to print The dust of brush substrate etc. generated in aperture processing sputters object and makes membrane damage, corrosion.Also, diamond-like has high hard It spends and sputtering object is weak relative to the adhesive force of diamond-like, therefore do not have to the generation of worry scar and optical component can be carried out Sputtering object is readily removable, can simply regenerate optical component, recycle by cleaning.
If the film thickness of DLC film 13 is excessive, the absorption for the infrared light realized by DLC film 13 becomes larger, the transmission of infrared light Rate reduces, and compression stress becomes larger, and also reduces with the adhesive force of film sometimes.On the other hand, if the film thickness mistake of DLC film 13 It is small, then the wearability of 13 script of DLC film is influenced and can not played sometimes by the substrate of DLC film 13 in abrasion.If examined Consider these points, then the film thickness of DLC film 13 is preferably 50nm~300nm.
If do not impacted to optical property, the mechanical property of multilayer film 14, it can be adulterated to above-mentioned each film His element, alternatively, it is also possible to form the film other than above-mentioned film.
It is fixed that antireflection film 15 is not limited, for example, stacking gradually the film with 600nm~800nm from 10 side of Ge substrate Thick YF3The MgF of film, the Ge film of film thickness with 110nm~180nm and the film thickness with 50nm~800nm2Film.By will be as The upper antireflection film 15 is set to a face of the Ge substrate 10 of the plane of incidence as laser, to set with by multilayer film 14 The case where being placed in the two sides of Ge substrate 10 is compared, and 9.3 μm of wavelength or 10.6 μm of wavelength of transmitance can be made to improve.
As the forming method of multilayer film 14 and antireflection film 15 in optical component of the invention, as long as in Ge substrate The method that film is capable of forming on 10, it is unrelated with its classification.As the film build method in generally known road, vacuum evaporation is enumerated The vapour deposition method (CVD method) of the chemistry such as the vapour deposition methods (PVD method) of the physics such as method, sputtering method, plasma CVD method.In the present invention, from The excellent this point of production efficiency in the case where being formed a film using multiple materials is set out, and preferably forms fluorine by vacuum vapour deposition Compound film 11, Ge film 12 and antireflection film 15.In addition, in the present invention, from can component to film, thickness accurately adjust This point is set out, and preferably forms DLC film 13 by plasma CVD method.
According to embodiment 1, it is capable of providing the CO for 9 μm~11 μm of wavelength2Laser and there is high transmittance and wear-resisting The excellent optical component of property.
Embodiment 2.
Optical component involved in embodiment 2 is characterized in that, in at least single side of Ge substrate, from the Ge substrate-side It is sequentially laminated with fluoride films, Ge film and DLC film, fluoride films are covered by DLC film and Ge film does not expose.
Fig. 3 is the schematic sectional view for indicating the structure of optical component involved in embodiment 2.As shown in figure 3, optical section Part is provided with multilayer film 20 in a face of Ge substrate 10, the multilayer film 20 by be laminated on Ge substrate 10 fluoride films 11, The Ge film 12 that is laminated on fluoride films 11 and in such a way that fluoride films 11 and Ge film 12 do not expose by fluoride films 11 and The DLC film 13 that Ge film 12 covers is constituted, and the antireflection film 15 illustrated in the embodiment 1 is set to another of Ge substrate 10 Face.In Fig. 3, a face of Ge substrate 10 is provided with multilayer film 20, but multilayer can also be set on the two sides of Ge substrate 10 Film 20.
About Ge substrate 10, fluoride films 11, Ge film 12 and antireflection film 15, with the structure illustrated in the embodiment 1 It is identical, therefore omit their explanation.
In the film thickness for the DLC film 13 that the upper surface of Ge film 12 is formed, in the same manner as embodiment 1, preferably 50nm~ 300nm.It is formed in such a way that fluoride films 11 and Ge film 12 do not expose in the side of fluoride films 11 and the side of Ge film 12 The film thickness of DLC film 13, as long as the film thickness that fluoride films 11 and Ge film 12 do not expose.DLC film 13 as described above, makes It can be formed when being formed a film with mask by sputtering method by adjusting the size of the opening portion of mask.It will be in optical component Fluoride films 11 and Ge film 12 are covered by DLC film 13, and thus, it is possible to play excellent for the gas generated in processing Corrosion resistance.
According to embodiment 2, it is capable of providing for CO2Laser has high transmittance, and wearability is excellent, and will not be by The optical component of the gas attack generated in processing.
Embodiment 3.
Laser machine involved in embodiment 3 is characterized in that having involved in above-mentioned embodiment 1 or 2 Optical component.
Fig. 4 is the schematic diagram for indicating the structure of laser machine involved in embodiment 3.As shown in figure 4, laser processing Machine has laser oscillator 30, to the collector lens 32, saturating in optically focused of the progress optically focused of laser 31 projected from laser oscillator 30 The protecting window 34 of the optical path midway configuration of laser 31 between the machined objects such as mirror 32 and printing distributing board 33, as protection window Mouth 34, uses optical component involved in above-mentioned embodiment 1 or 2.Herein, protecting window 34 is set as, in embodiment party The multilayer film 14 illustrated in formula 1 or the multilayer film 20 illustrated in embodiment 2 are towards processing space side (33 side of machined object). In addition, the structure of laser machine shown in Fig. 4 is an example, as long as being made of laser oscillator and optical system, then It is not limited to the structure.
In laser machine formed as described above, the laser 31 projected from laser oscillator 30 is gathered by collector lens 32 Light exposes to machined object 33 after penetrating protecting window 34, is able to carry out aperture processing.
Optical component involved in above-mentioned embodiment 1 or 2 is directed to CO2Laser has high transmittance, therefore can incite somebody to action It is used as protecting window 34, thus prevents the thermal lensing effect for causing the absorption of laser, can be realized and do not cause machining accuracy Reduce and be able to carry out the laser machine of High-speed machining.In addition, protecting window 34 is set as being formed with DLC film 13 in most surface Multilayer film 14,20 towards processing space side, therefore do not have to worry scar generation, can will protected by long-time service Dust, the sputtering object of the surface attachment of window 34 are readily removable.Usually, protecting window 34 only can be from machined object 33 Separation about 100mm or so is played, therefore protecting window 34 is exposed to a large amount of sputtering object, dust in processing.In embodiment 2 The corrosion resistance of the optical component of middle explanation is also excellent, therefore by being used as protecting window 34, so as to add laser The service life of the optical component of work machine improves.
According to embodiment 3, it is capable of providing maintainability raising, and the reduction of machining accuracy will not be caused just to be able to carry out The laser machine of High-speed machining.
Embodiment
In the following, the present invention is concretely demonstrated by embodiment and comparative example, but the present invention is not limited by them.
[embodiment 1]
As optical component, following laser machine protecting windows are produced, that is, (become in a face of Ge substrate The face of the exit facet of laser) it is formed with multilayer film (from Ge substrate-side MgF2Film (film thickness 500nm)/Ge film (film thickness 80nm)/ DLC film (film thickness 500nm)), antireflection film is formed with (from Ge substrate-side in another face (face of the plane of incidence as laser) YF3Film (film thickness 650nm)/Ge film (film thickness 130nm)/MgF2Film (film thickness 200nm)).As Ge substrate, diameter 90mm has been used And the plectane of thickness 5mm.Constitute the MgF of multilayer film2Film and Ge film and antireflection film are formed by vacuum vapour deposition, structure DLC film at multilayer film is formed by sputtering method.In addition, the transmitance for the optical component produced, is become using Fourier Infrared spectrophotometer of remodeling is evaluated.
The structure for the optical component produced in embodiment 1 is, DLC film (film thickness 500nm)/Ge film (film thickness 80nm)/ MgF2Film (film thickness 500nm)/Ge substrate (thickness 5mm)/YF3Film (film thickness 650nm)/Ge film (film thickness 130nm)/MgF2Film (film thickness 200nm)。
Fig. 5 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 1.As can be seen from FIG. 5, in reality In the optical component for applying example 1, in optical maser wavelength i.e. 9.3 μm, 97.2% transmitance can be realized.It has as hope is greater than Or the laser machine protecting window of the transmitance equal to 97%, there is sufficient optical property.
[embodiment 2]
As optical component, following laser machine protecting windows are produced, that is, (become in a face of Ge substrate The face of the exit facet of laser), MgF is sequentially formed with from Ge substrate-side2Film, Ge film and DLC film and pass through DLC film cover MgF2Film and Ge film do not expose, and are formed with antireflection film (from Ge substrate-side in another face (face of the plane of incidence as laser) Play YF3Film (film thickness 650nm)/Ge film (film thickness 130nm)/MgF2Film (film thickness 200nm)).As Ge substrate, diameter has been used The plectane of 90mm and thickness 5mm.Constitute the MgF of multilayer film2Film and Ge film are formed by vacuum vapour deposition, and multilayer film is constituted DLC film be to be formed using the mask with defined opening portion by sputtering method.In addition, the optical component produced Transmitance is evaluated using Fourier transform type infrared spectrophotometer.
The structure for the optical component produced in example 2 is, DLC film (film thickness 500mm)/Ge film (film thickness 80nm)/ MgF2Film (film thickness 500nm)/Ge substrate (thickness 5mm)/YF3Film (film thickness 650nm)/Ge film (film thickness 130nm)/MgF2Film (film thickness 200nm)。
In the optical component of embodiment 2, in optical maser wavelength i.e. 9.3 μm, 97.2% transmitance can be realized.Its conduct Wish the laser machine protecting window with the transmitance more than or equal to 97%, there is sufficient optical property.
Next, the optical component about embodiment 1 and 2, implement that " wear test (1) is (according to MIL-C-675's SEVERE ABRASION) " and " corrosion test (being impregnated 1 hour in the aqueous hydrochloric acid solution for being diluted to 50%) ".By result in table 1 shows.After wear test (1), the case where removing that multilayer film will have occurred, is set as zero, by there is no the removings of multilayer film The case where be set as ×.In addition, after the corrosion test, zero is set as by there is no the case where removing of multilayer film, it is more by having occurred The case where removing of tunic is set as ×.
(table 1)
Wear test (1) Corrosion test
Embodiment 1 ○ ×
Embodiment 2 ○ ○
As shown in table 1, in the optical component of embodiment 1 and 2, there is no the strippings of multilayer film after wear test (1) From wearability is excellent.In addition, as corrosion test (1) as a result, multilayer film has occurred in the optical component of embodiment 1 Removing, in contrast, in the optical component of embodiment 2, multilayer film is not removed, and the 3rd layer of DLC film of multilayer film is by the 1st The MgF of layer2Film and the 2nd layer of Ge film cover with not exposing, thus it enables that the service life of the optical component under corrosive environment mentions It is high.
[comparative example 1]
In comparative example 1, the optics parsing of optical component corresponding with patent document 1 is implemented.
The structure of the optical component of comparative example 1 is DLC film (film thickness 300nm)/Ge film (film thickness 30nm)/Y2O3Film (film thickness 30nm)/YF3Film (film thickness 600nm)/Y2O3Film (film thickness 30nm)/ZnS substrate (thickness 5mm)/Y2O3Film (film thickness 80nm)/YF3Film (1300nm)/MgF2Film (film thickness 400nm).
Fig. 6 is the optical component indicated about comparative example 1, uses optical thin film design software Essential Macleod Implement the figure of the wavelength dependency of transmitance when optics parses.As can be seen from FIG. 6, in the optical component of comparative example 1, In optical maser wavelength i.e. 9.3 μm, for the transmitance less than or equal to 95%.It is protected using the optical component as laser machine Window and in the case where applying, it may occur that thermal lensing effect, thus generate the machining accuracy in High-speed machining deteriorate as ask Topic.
[embodiment 3]
As optical component, following laser machine protecting windows are produced, that is, on the two sides of Ge substrate, be formed with Multilayer film (from Ge substrate-side YF3Film (film thickness 660nm)/Ge film (film thickness 120nm)/DLC film (film thickness 80nm)).As Ge base Plate has used the plectane of diameter 110mm and thickness 5mm.Constitute the MgF of multilayer film2Film and Ge film and antireflection film are to pass through What vacuum vapour deposition was formed, the DLC film for constituting multilayer film is formed by plasma CVD method.In addition, the optical section produced The transmitance of part is evaluated using Fourier transform type infrared spectrophotometer.
The structure for the optical component produced in embodiment 3 is, DLC film (film thickness 80nm)/Ge film (film thickness 120nm)/ YF3Film (film thickness 660nm)/Ge substrate (thickness 5mm)/YF3Film (film thickness 660nm)/Ge film (film thickness 120nm)/DLC film (film thickness 80nm)。
Fig. 7 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 3.As can be seen from FIG. 7, in reality In the optical component for applying example 3, in optical maser wavelength i.e. 9.3 μm, 99.0% transmitance can be realized, be greater than as wishing to have Or the laser machine protecting window of the transmitance equal to 97%, there is sufficient optical property.
[embodiment 4]
In addition to the structure of optical component is changed to DLC film (film thickness 130nm)/Ge film (film thickness 110nm)/YbF3Film (film Thick 670nm)/Ge substrate (thickness 5mm)/YbF3Film (film thickness 670nm)/Ge film (film thickness 110nm)/DLC film (film thickness 130nm) with Outside, the optical component of embodiment 4 is produced similarly to Example 3.
Fig. 8 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 4.As can be seen from FIG. 8, in reality In the optical component for applying example 4, in optical maser wavelength i.e. 9.3 μm, 98.4% transmitance can be realized.It has as hope is greater than Or the laser machine protecting window of the transmitance equal to 97%, there is sufficient optical property.
[embodiment 5]
In addition to the structure of optical component is changed to DLC film (film thickness 50nm)/Ge film (film thickness 130nm)/MgF2Film (film thickness 640nm)/Ge substrate (thickness 5mm)/MgF2Other than film (film thickness 640nm)/Ge film (film thickness 130nm)/DLC film (film thickness 50nm), The optical component of embodiment 5 is produced similarly to Example 3.
Fig. 9 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 5.As can be seen from FIG. 9, in reality In the optical component for applying example 5, in optical maser wavelength i.e. 9.3 μm, 99.3% transmitance can be realized.It has as hope is greater than Or the laser machine protecting window of the transmitance equal to 97%, there is sufficient optical property.
[embodiment 6]
As optical component, following laser machine protecting windows are produced, that is, (become in a face of Ge substrate The face of the exit facet of laser) it is formed with multilayer film (from Ge substrate-side YF3Film (film thickness 700nm)/Ge film (film thickness 110nm)/ DLC film (film thickness 300nm)), antireflection film is formed with (from Ge substrate-side in another face (face of the plane of incidence as laser) YF3Film (film thickness 750nm)/Ge film (film thickness 150nm)/MgF2Film (film thickness 200nm)).As Ge substrate, diameter 110mm has been used And the plectane of thickness 5mm.Constitute the YF of multilayer film3Film and Ge film and antireflection film are formed by vacuum vapour deposition, structure DLC film at multilayer film is formed by plasma CVD method.In addition, the saturating of the optical component produced is become using Fourier Infrared spectrophotometer of remodeling is evaluated.
The structure for the optical component produced in embodiment 6 is, DLC film (film thickness 300nm)/Ge film (film thickness 110nm)/ YF3Film (film thickness 700nm)/Ge substrate (thickness 5mm)/YF3Film (film thickness 750nm)/Ge film (film thickness 150nm)/MgF2Film (film thickness 200nm)。
Figure 10 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 6.As can be seen from FIG. 10, exist In the optical component of embodiment 6, in optical maser wavelength i.e. 10.6 μm, 98.4% transmitance can be realized.It, which is used as, wishes have The laser machine protecting window of transmitance more than or equal to 97% has sufficient optical property.
[embodiment 7]
In addition to the structure of optical component is changed to DLC film (film thickness 50nm)/Ge film (film thickness 110nm)/YbF3Film (film thickness 950nm)/Ge substrate (thickness 5mm)/YF3Film (film thickness 750nm)/Ge film (film thickness 150nm)/MgF2Other than film (film thickness 200nm), The optical component of embodiment 7 is produced similarly to Example 6.
Figure 11 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 7.As can be seen from FIG. 11, exist In the optical component of embodiment 7, in optical maser wavelength i.e. 10.6 μm, 98.2% transmitance can be realized.It, which is used as, wishes have The laser machine protecting window of transmitance more than or equal to 97% has sufficient optical property.
[embodiment 8]
In addition to the structure of optical component is changed to DLC film (film thickness 170nm)/Ge film (film thickness 150nm)/MgF2Film (film Thick 600nm)/Ge substrate (thickness 5mm)/YF3Film (film thickness 750nm)/Ge film (film thickness 150nm)/MgF2Film (film thickness 200nm) with Outside, the optical component of embodiment 8 is produced similarly to Example 6.
Figure 12 is the figure of the wavelength dependency of the transmitance in the optical component for indicate embodiment 8.As can be seen from FIG. 12, exist In the optical component of embodiment 8, in optical maser wavelength i.e. 10.6 μm, 98.3% transmitance can be realized.It, which is used as, wishes have The laser machine protecting window of transmitance more than or equal to 97% has sufficient optical property.
Next, the optical component about embodiment 1 and embodiment 3~8, implement that " wear test (1) is (according to MIL- The SEVERE ABRASION of C-675) " and " wear test (2) (sandy erasing rubber is made reciprocal 50 times with the load of 3kg) ".It will As a result it is shown in Table 2.After each wear test, zero is set as by there is no the case where removing of multilayer film, it is more by having occurred The case where removing of tunic is set as ×.
(table 2)
Wear test (1) Wear test (2)
Embodiment 1 ○ ×
Embodiment 3 ○ ○
Embodiment 4 ○ ○
Embodiment 5 ○ ○
Embodiment 6 ○ ○
Embodiment 7 ○ ○
Embodiment 8 ○ ○
As shown in table 2, in the optical component of embodiment 1 and embodiment 3~7, there is no more after wear test (1) The removing of tunic.In addition, the removing of multilayer film has occurred after wear test (2), with this in the optical component of embodiment 1 Relatively, in the optical component of embodiment 3~7, there is no the removings of multilayer film after wear test (2), by composition The film thickness of the fluoride films of multilayer film, Ge film and DLC film is adjusted, so as to further increase wearability.
In addition, this international application is required based in Japanese patent application 2016- filed on May 13rd, 2016 No. 096876 priority, this international application quote the full content of the Japanese patent application.
The explanation of label
10 Ge substrates, 11 fluoride films, 12 Ge films, 13 DLC films, 14 multilayer films, 15 antireflection films, 20 multilayers Film, 30 laser oscillators, 31 laser, 32 collector lenses, 33 machined objects, 34 protecting windows.

Claims (5)

1. a kind of optical component, which is characterized in that
In at least single side of Ge substrate, fluoride films, Ge film and diamond-film-like i.e. DLC are sequentially laminated with from the Ge substrate-side Film.
2. optical component according to claim 1, which is characterized in that
The fluoride films are by from passing through YF3、YbF3And MgF2At least one of the group selection of composition is constituted.
3. optical component according to claim 1 or 2, which is characterized in that
The fluoride films are covered by the diamond-film-like and the Ge film does not expose.
4. optical component according to any one of claim 1 to 3, which is characterized in that
The film thickness of the fluoride films is 500nm~950nm, and the film thickness of the Ge film is 50nm~150nm, the DLC film Film thickness is 50nm~300nm.
5. a kind of laser machine, which is characterized in that the optical component recorded with any one of claims 1 to 4.
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